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    • 21. 发明专利
    • MAGNETIC HEAD AND MAGNETIC STORAGE
    • JPH1116315A
    • 1999-01-22
    • JP16993297
    • 1997-06-26
    • HITACHI LTD
    • HORIGUCHI YASUYUKITOKISUE HIROMITSUTANAKA HIDEAKIYONEKAWA SUNAO
    • G11B5/60G11B21/21
    • PROBLEM TO BE SOLVED: To enable contact start stop(CSS) activation only by a rotational force of a spindle on a smooth magnetic disk by providing a plurality of fine protrusions at the distal end portion of a protrusion provided at least one of a flying rail surface and a recess surface of a slider of a magnetic head. SOLUTION: Three protrusions 3 are provided on the flying rail surface 1 of a slider, and fine protrusions are further formed at distal end portions of the protrusions 3 by using the texture of the distal end portions of the protrusions 3 that can be in contact with the surface of a magnetic disk. The slider of the magnetic head contacts the surface of the magnetic disk through the fine protrusions at the distal end portions of the protrusions 3. The contact area is the sum of the areas of distal end surfaces of the fine protrusions at the distal end portions of the protrusions 3, and therefore the contact area is reduced in comparison with a conventional technique. Since the contact area is thus small, a frictional force acting on the slider can be reduced and CSS activation can be carried out without particularly carrying out releasing of sticking.
    • 24. 发明专利
    • MAGNETIC DISK DEVICE
    • JPH0714338A
    • 1995-01-17
    • JP15325693
    • 1993-06-24
    • HITACHI LTD
    • SHIMIZU TOSHIHIKOTOKISUE HIROMITSU
    • G11B21/12G11B21/22
    • PURPOSE:To reduce a danger of flawing a disk by providing a restraining plate for restraining a head supporting mechanism from displacing in the perpenducular direction to the surface of a disk at the time of its nonoperation on the head supporting mechanism on its side opposite to the disk surface. CONSTITUTION:Two sets of head supporting mechanism 7 exist between the disk, and the restraining plate 8 is provided to be inserted between these two mechanisms 7. Thus, since a slider 2 is restrained in displacement in the direction of separating from the disk 1 at the time of nonoperation, even when impact is given, the slider 2 is never separated from the disk surface. Consequently, the disk 1 is free from a hit, and a high impact resistance property can be obtained. Then, by making the thickness of the plate 8 about the same size as the space between the mechanisms 7, the mechanism 7 is not required to be lifted up like a loading and unloading mechanism, so that space between the disks can easily be narrowed. Then, at the time of operation, since the mechanism 7 is position in other area on the disk, the operation of the mechanism 7 is not prevented by the plate 8.
    • 26. 发明专利
    • EVACUATION METHOD OF VACUUM APPARATUS
    • JPH0461227A
    • 1992-02-27
    • JP17000290
    • 1990-06-29
    • HITACHI LTD
    • KITSUNAI HIROYUKITOKISUE HIROMITSU
    • C23C14/24H01L21/205H01L21/265H01L21/302H01L21/3065
    • PURPOSE:To effectively prevent dust particles from adhering and to realize a high throughput by a method wherein a cover provided with filters in positions parallel to a vacuum evacuation port and an air introduction port of a vacuum apparatus is arranged and constituted so as to cover a substrate to be treated. CONSTITUTION:A wafer 1 is covered with a cover 17 which is provided with filters 14 in positions parallel to a vacuum evacuation port and a gas introduction port of a load-lock chamber and in which a vacuum evacuation port 15 and an air introduction port 16 have been formed. When the load-lock chamber 4 is evacuated to produce a vacuum from an evacuation port, the wafer 1 is covered with the cover 17 and is not contaminated with dust particles which are stirred up. The evacuation port 15 is situated in a position parallel to the evacuation port 5 and a flow inside the load-lock chamber is not disturbed. The inside of the cover 17 is connected to the load-lock chamber 4 via the filters 14 so as to prevent dust particles from entering the inside of the cover 17. When the load-lock chamber is returned to an atmospheric state, the wafer 1 is covered with the cover 17 and is not contaminated with the dust particles which are stirred up at leakage.
    • 28. 发明专利
    • NON-CONTACT MECHANICAL SEAL
    • JPH02146374A
    • 1990-06-05
    • JP30022088
    • 1988-11-28
    • HITACHI LTD
    • SATO EIICHIINOUE KOTOKISUE HIROMITSUMASE MASAHIRO
    • F16J15/34
    • PURPOSE:To avoid a seal surface contact at the time of a seal gas cut off, by connecting a stationary seal ring back surface and its retaining means with a bellows seal which has an internal space and is expandable/contractable axially, and making the connection of the internal space and the seal surface, and retaining the outside of the bellows seal at an atmospheric pressure. CONSTITUTION:Seal gas is supplied to a seal surface 4a through a gas supply hole 8b under a normal operation condition, and a stationary seal ring 4 receives a right direction force which makes large a seal surface opening h between the ring 4 and a rotary seal ring 3. Also, seal gas is supplied to the internal space 7a of a bellows seal 7 through a connection hole 4b, and a right direction force is added on the stationary seal ring 4, and the opening h is maintained. When seal gas is cut off, the pressure of the seal surface 4a and the internal space 7a lowers, and the seal surface 4a comes under the condition of vacuum due to a space S2 connecting this with a vacuum chamber 10. Also, the internal space 7a comes under the condition of vacuum, too, and as the lower pressure than that at a back surface chamber 9 which is of atmospheric pressure, is brought in, the bellows seal 7 tries to contract itself. As a result, the opening h expands and the condition of non-contact between the sealing 3 and the sealing 4 is maintained.
    • 29. 发明专利
    • PLATE-SHAPED MATERIAL HOLDING APPARATUS
    • JPS63164235A
    • 1988-07-07
    • JP30845186
    • 1986-12-26
    • HITACHI LTD
    • HASHIMOTO TAIZOMURAMATSU KIMIONAKAGAWA TAKASHITSUMAKI NOBUOTOKISUE HIROMITSU
    • B65H5/14B65G49/07B65H3/14H01L21/677H01L21/68
    • PURPOSE:To obtain a holding apparatus, which can prevent the damages and the yield of dust of a plate shaped material, by providing a pushing-force generating part, which generates a force that pushes the plate-shaped material held by a head in the arbitrary engaging direction. CONSTITUTION:A fluid is made to blow to a plate-shaped material 1, or the fluid is sucked through a sucking surface. A stream layer is formed between the plate-shaped material 1 and the sucking surface in this way, and balance is provided between the sucking pressure and the flowing pressure. A head 12 sucks and holds the plate- shaped material 1. A plurality of engaging parts 5 are arranged so as to about on the side surface of the plate-shaped material 1, which is sucked and held with the side surface of the head 2. A pushing-force generating part 16 generates a force, which pushes the plate-shaped material 1 held by the head 2 in the direction of the arbitarry engaging parts 5. Said pushing-force generating part 16 inclines, e.g., the head 2 with respect to the horizontal direction. Thus a force of component F in the direction in parallel with the sucking surface of the head 2 is energized on the plat-shaped material 1. Thus the frequent hitting phenomenons of the plate-shaped material to a guide can be suppressed, and the damages and the yield of dust of the plate-shaped material can be prevented.