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21. 发明专利

JPH07216543A FORMING METHOD OF THIN FILM 失效
公开(公告)号：JPH07216543A
公开(公告)日：1995-08-15
申请号：JP713494
申请日：1994-01-26
申请人： ASAHI GLASS CO LTD
发明人： OYAMA TAKUJI , SHIMIZU JUNICHI
IPC分类号： C23C14/34
摘要： PURPOSE:To form a compd. thin film in a fast forming rate on a large-size substrate by continuously applying voltage on a target for a specified time in a mixture atmosphere of rare gas and reactive gas when the compd. thin film is formed by sputtering on a substrate surface. CONSTITUTION:When an SiO2 transparent film having low refractive index or Tie, transparent film having high refractive index is formed on a large substrate by sputtering, a target made of Ti conductive Si is disposed in a magnetron sputtering device with a mixture atmosphere comprising rare gas such Ar as the main component and reactive gas such as N2O, NO, NO2, O3 and N2. Negative voltage is intermittently applied on the target to discharge and the target is sputtered with Ar ion to form a thin film of Ti or Si on the substrate. The voltage applied on the target is switched 0.1-1000 msec on- time and 1-1000 msec off-time. During the voltage is applied, the Ti or Si thin film is formed, while during no voltage applied Si or Ti is oxidized or nitrided with the reactive gas. Thus, a transparent SiO2 or TiO2 thin film can be efficiently formed even on a large-size substrate.

22. 发明专利

JPH06316442A MULTILAYER ANTIREFLECTION FILM HAVING CONDUCTIVITY 失效
公开(公告)号：JPH06316442A
公开(公告)日：1994-11-15
申请号：JP3996994
申请日：1994-03-10
申请人： ASAHI GLASS CO LTD
发明人： GOTO YOSHIO , OYAMA TAKUJI , ADACHI KUNIHIKO
IPC分类号： C03C17/245 , C03C17/34
摘要： PURPOSE:To provide a conductive multilayer antireflection film at a low cost with a high productivity by successively laminating a first-layer film of lambda0/4 and a second layer as a specified laminated film of lambda0/4 from the glass substrate side and making the outermost film conductive. CONSTITUTION:A first-layer film of lambda0/4 and a second-layer film of lambda0/4 are successively formed from the glass substrate side to obtain a multilayer antireflection film as follows. Namely, the second-layer film is formed with laminated high-refractive-index film and low-refractive-index film, and the outermost film is made conductive. The first-layer film may be formed with either a conductive material or a nonconductive material, however an almost insulating material is prefreably used. The multilayer antireflection film having conductivity and high transmittance is useful for the electric display element, photoelectric conversion element or touch panel needing improved visibility.

23. 发明专利

JPH05116992A ANTI-IRIDESCENCE TRANSPARENT BODY 失效
公开(公告)号：JPH05116992A
公开(公告)日：1993-05-14
申请号：JP10162892
申请日：1992-03-27
申请人： ASAHI GLASS CO LTD
发明人： OYAMA TAKUJI , AKAO YASUHIKO
IPC分类号： B32B7/02 , B32B9/00 , C03C17/34 , C03C27/12
摘要： PURPOSE:To provide a transparent laminated body free from irregular color and having a large area and is possible to be formed in a short time. CONSTITUTION:A transparent thin film 51 having >=1.6 refracting index and >=0.15mum thickness is formed on a transparent substrate 50 and an absorptive lower layer 52 is formed at the interface between the substrate 50 and the thin film 51 and/or an absorptive upper layer 53 is formed on the transparent thin film 51 to obtain a transparent laminated body, e.g. consisting of a glass substrate, a layer of TiN, a transparent thin film of ITO and an upper layer of TiN.

24. 发明专利

JPH0559544A SPUTTERING DEVICE AND SPUTTERING METHOD 失效
公开(公告)号：JPH0559544A
公开(公告)日：1993-03-09
申请号：JP24513591
申请日：1991-08-30
申请人： ASAHI GLASS CO LTD
发明人： AKAO YASUHIKO , SAITO SEI , OYAMA TAKUJI , HARANO TAKESHI , SUZUKI KOICHI
IPC分类号： C23C14/35
摘要： PURPOSE:To provide a sputtering device and a sputtering method capable of forming an ITO film of quality having low resistance at high speed in low sputtering voltage and low sputtering gas pressure. CONSTITUTION:An electron current emitted from a plasma gun 1 is introduced on a target 3 by a magnetic field B1 generated by a coil 2. The electrons of the electron current introduced on the target 3 are drifted in the direction of the anode 5 by an electric field E generated by impressing voltage on a magnetic field B2 formed on the target 3 by magnetic field generating means 4 and the target 3, and plasma having high density is formed on the surface of the target.

25. 发明专利

JPH03218822A ULTRAVIOLET SCREENING GLASS 失效
公开(公告)号：JPH03218822A
公开(公告)日：1991-09-26
申请号：JP22449389
申请日：1989-09-01
申请人： ASAHI GLASS CO LTD
发明人： ANDO HIDEKAZU , OYAMA TAKUJI
IPC分类号： B32B7/02 , B32B9/00 , C03C17/34
摘要： PURPOSE:To manufacture an ultraviolet screening glass of superior durability and high visibility beam transmittance and high radiation refractive index by composing high refractive index films or low refractive index films forming an air side outermost layer composed of an oxide containing at least one of Zr, Ti, Hf, Sn, Ta and Bi and at least one of B, Si and P. CONSTITUTION:An ultraviolet screening glass is formed by laminating high refractive index films and low refractive index films alternately on a transparent base. The transparent base 1 is composed of glass, plastic or the like. It is preferable to compose high refractive index films 2, 4, 6, 8, 10 and 12 of an oxide composed mainly of at least one kind of Zr, Ti, Hf, Sn, Ta and bi and at least one kind of B, Si and P, and in the case that an air side outermost layer is not formed with the high refractive index films, the high refractive index films can be composed of ZrO2, TiO2, HfO2, SnO2, Ta2O5, Bi2O3 and the like stabilized by ZrO2 and Y2O3. The material for the low refractive index films 3, 5, 7, 9, 11 and 13 is not limited, and particularly the air side outermost layer 13 should be composed of low refractive index oxidized films containing at least one kind of Zr, Ti, Hf, Sn, Ta and Bi and at least one kind of B, Si and P.

26. 发明专利

JPH02240250A CONDUCTIVE COLOR FILTER SUBSTRATE AND COATING METHOD 失效
公开(公告)号：JPH02240250A
公开(公告)日：1990-09-25
申请号：JP5957389
申请日：1989-03-14
申请人： ASAHI GLASS CO LTD
发明人： HARANO TAKESHI , TAKAGI SATORU , SHIGESATO YUZO , SUZUKI KOICHI , HASHIMOTO NAOKI , KOJIMA HIROYASU , OYAMA TAKUJI
IPC分类号： G02B5/20 , C03C17/42 , C23C14/08 , C23C14/32 , G02F1/1335
摘要： PURPOSE:To form a transparent conductive film with low specific resistivity on a substrate at high film forming speed by converging arc discharge plasma on a vapor deposition material to evaporate this material and also disposing a transparent substrate at a low temp. on the vapor deposition material. CONSTITUTION:In an evacuated vapor deposition chamber 10, an arc discharge plasma stream produced by means of an arc discharge plasma gun 1 having an air-core coil 2 is converged by means of a magnet 5, and a vapor deposition material 3 in a vapor deposition hearth 4 is evaporated by using the resulting high density plasma 9. On the other hand, a transparent substrate 6 disposed in the position above the vapor deposition material 3 is heated to

27. 发明专利

JPH02228469A ION PLATING METHOD 失效
公开(公告)号：JPH02228469A
公开(公告)日：1990-09-11
申请号：JP4857189
申请日：1989-03-02
申请人： ASAHI GLASS CO LTD
发明人： KOJIMA HIROYASU , SUZUKI KOICHI , OYAMA TAKUJI , HASHIMOTO NAOKI
IPC分类号： C23C14/32 , C23C14/08
摘要： PURPOSE:To form a uniformly vapor deposited film on a large-area substrate surface with an ion plating method utilizing gaseous He by deforming arc discharge plasma flow to a sheet shape by a magnetic field means, then irradiating raw materials for vapor deposition to evaporate the materials. CONSTITUTION:The large-area substrate 7, such as glass sheet, is disposed in a vacuum chamber 3 and the raw materials 10 to be evaporated, such as metals and alloys and the oxide, boride, carbide, silicide, nitride, etc., thereof, are put into a hearth 2 as anode. The high density plasma flow 8 formed by the arc discharge which is generated by the gaseous He from a plasma generating source 1 is drawn out by an air core coil 6 into the vacuum chamber 3 and further, the N pole surface of a pair of permanent magnets 6 are disposed to face each other to deform the plasma flow 8 to the sheet shape parallel with the hearth 2 and the substrate 7. The plasma flow is bent about 900 in the magnetic field generated by the permanent magnet 9 and is focused onto the hearth 2 to heat and evaporate the raw materials to be evaporated in the hearth 2. The vapor deposited film having the uniform thickness is thus formed on the large-area glass substrate 7.

28. 发明专利

JPH02101160A ION PLATING METHOD 失效
公开(公告)号：JPH02101160A
公开(公告)日：1990-04-12
申请号：JP25092488
申请日：1988-10-06
申请人： ASAHI GLASS CO LTD
发明人： KOJIMA HIROSHI , OYAMA TAKUJI , SUZUKI KOICHI , HASHIMOTO NAOKI
IPC分类号： C23C14/32
摘要： PURPOSE:To efficiently and uniformly form a high-quality thin film over a large area by deforming arc discharge plasma flow to a sheet shape by a magnetic field, then further bending the plasma flow by the magnetic field of a permanent magnet so as to introduce this plasma flow onto a hearth. CONSTITUTION:A DC power source 4 for plasma generation is impressed between an arc discharge plasma flow source 1 and an anode (hearth) 2 to execute arc discharge, by which high-density plasma flow is formed. This plasma flow is drawn out of an air core coil 6 into a vacuum chamber 3 and is deformed to the sheet plasma 8 by a pair of the permanent magnets 5. The sheet plasma 8 is bent about 90 deg. and is focused to the hearth 2 by the magnetic field of the permanent magnet 9 installed under the hearth 2 to evaporate the evaporating raw material 10 in the hearth 2 and to form the film on a substrate 7. The permanent magnet 9 is formed to at least the same length as the length of the hearth 2 in the transverse direction of the sheet plasma 8 at this time. The permanent magnet 9 and the hearth 2 are formed to at least the same length as the length of the base body 7 in the transverse direction of the sheet plasma 8.

29. 发明专利

JPH0273968A HIGH-SPEED SPUTTERING METHOD USING CYLINDRICAL CATHODE 失效
公开(公告)号：JPH0273968A
公开(公告)日：1990-03-13
申请号：JP22473488
申请日：1988-09-09
申请人： ASAHI GLASS CO LTD
发明人： SUZUKI KOICHI , KOJIMA HIROYASU , OYAMA TAKUJI
IPC分类号： C23C14/34
摘要： PURPOSE:To carry out sputtering by arranging a cylindrical cathode having a cooling mechanism inside and a target material on its surface close to sheet plasma, and continuously or intermittently rotating the cathode on its axis. CONSTITUTION:A magnetic field 7 leading to an anode 2 from a plasma source 1 is formed by >=2 air-core coils 6, and a high-density plasma current by an arc discharge is drawn into a vacuum chamber 3. A couple of permanent magnets 8 are arranged between a plasma gun and a sputtering region with the like-pole surfaces opposed to each other to enclose the plasma with the target and substrate, and with the pole surfaces of the permanent magnets in parallel with the target surface or the surface of the substrate 9 to form the plasma into a sheet shape, and sheet-shaped high-density plasma 11 is formed. The cylindrical cathode 10 and the substrate 9 are arranged to enclose the sheet plasma 11, and a sputtering voltage is impressed on the cathode 10 by a sputtering power source 12 so that the cathode 10 is negatively charged with respect to the plasma 11.

30. 发明专利

JPH0247601A PRODUCTION OF GLASS WITH FUNCTIONAL FILM 失效
公开(公告)号：JPH0247601A
公开(公告)日：1990-02-16
申请号：JP19713188
申请日：1988-08-09
申请人： ASAHI GLASS CO LTD
发明人： ISOMURA TOSHIAKI , OYAMA TAKUJI , WAKABAYASHI TSUNEO , HAYASHI NAONORI , MATSUMOTO KIYOSHI , HAYASHI YASUO , HOTTA NAOHIRO
IPC分类号： G02B1/11 , C03C17/23 , C03C17/34 , G02B1/115 , G02B1/14 , G02B1/18
摘要： PURPOSE:To improve the smoothness of a film surface by precisely polishing the film forming surface of glass on which a functional film is formed by a PVD method such as vacuum vapor deposition method. CONSTITUTION:The outermost layer surface of the functional film of the glass formed with the functional film by the physical vapor deposition method such as vacuum deposition method or sputtering is precisely polished. More specifically, a polishing roll 25 is rotated to polish the surface of said film while a polishing material slurry is supplied from a slurry supply nozzle 13 onto the antireflection film. The precision polishing of the outermost layer film of the antireflection film is ended by cooperatively moving both in an arrow direction. The abrasive grains for polishing are preferably colloidal silica, zirconium oxide, and cerium oxide. The surface of the deposited film is smoothed in this way and the stains sticking to the surface of the deposited film at the time of use are easily wiped away by a cloth, etc.

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