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    • 1. 发明专利
    • Method of manufacturing substrate and substrate, method of manufacturing laminate, and laminate
    • 制造基板和基板的方法,制造层压板的方法和层压板
    • JP2011251400A
    • 2011-12-15
    • JP2010128766
    • 2010-06-04
    • Asahi Glass Co Ltd旭硝子株式会社
    • HIRABAYASHI YUSUKEKOJIMA HIROSHI
    • B24B37/00
    • PROBLEM TO BE SOLVED: To provide a method of manufacturing a substrate the defect of which is decreased or removed, and to provide the substrate.SOLUTION: The method of manufacturing the substrate includes a step of grinding the substrate using a fluid including an abrasive member and abrasive particles and a step of grinding a plate to be ground using the abrasive member before grinding the substrate. The step of grinding the plate to be ground grinds the plate to be ground until a time when the rate of an increase of a D90 value per unit time of the abrasive particles included in fluid including the abrasive particles in grinding the plate to be ground by the use of the fluid including the abrasive member and the abrasive particles becomes ≤1.1 times a constant value when the rate of an increase per unit time of the D90 value of the abrasive particles included in the fluid including the abrasive particles is a constant value. The substrate is manufactured by the method of manufacturing the substrate.
    • 要解决的问题:提供一种减少或去除缺陷的基板的制造方法,并提供基板。 解决方案:制造衬底的方法包括使用包括研磨构件和磨料颗粒的流体研磨衬底的步骤,以及在研磨衬底之前使用研磨构件研磨待研磨的板的步骤。 研磨待研磨的板的步骤研磨待研磨的板,直到在包括研磨颗粒的流体中包含的磨料颗粒中包含的磨料颗粒的每单位时间的D90值增加的速度在研磨待研磨的板的时间 当包含研磨颗粒的流体中包含的磨料颗粒的D90值的每单位时间的增加速率是恒定值时,包括研磨部件和磨料颗粒的流体的使用变为恒定值的1.1倍。 通过制造衬底的方法制造衬底。 版权所有(C)2012,JPO&INPIT
    • 2. 发明专利
    • Method of manufacturing highly flat and smooth glass substrate
    • 制造高平板和平板玻璃基板的方法
    • JP2007287737A
    • 2007-11-01
    • JP2006109937
    • 2006-04-12
    • Asahi Glass Co Ltd旭硝子株式会社
    • OTSUKA KOJIKOJIMA HIROSHIITO MASABUMI
    • H01L21/027C03C15/00G03F1/22G03F1/24G21K1/06
    • C03C15/02B24B7/242B24B37/08C03C3/06C03C19/00C03C23/005C03C23/006C03C2201/42C03C2204/08Y10T428/24355
    • PROBLEM TO BE SOLVED: To provide a machining method of manufacturing a highly flat and smooth glass substrate with satisfactory productivity. SOLUTION: Machining is performed to the glass substrate. The machining includes: a process for measuring the surface shape of a glass substrate surface before machining; a machining process (first machining process) for performing machining to the inside of the surface of the substrate by changing machining conditions depending on locations; and a process (second machining process) for performing finish polishing to the glass substrate surface subjected to the first machining process, thus obtaining the highly flat and smooth glass substrate with satisfactory productivity. In this case, the machining conditions of each place in the surface of the substrate in the first machining process are determined by the uneven shape of the glass substrate surface before the machining, and the inplane distribution of the amount of machining by the second machining process measured by using the same substrate separately. COPYRIGHT: (C)2008,JPO&INPIT
    • 要解决的问题:提供一种制造具有令人满意的生产率的高平坦光滑玻璃基板的加工方法。

      解决方案:对玻璃基板进行加工。 该加工包括:在加工前测量玻璃基板表面的表面形状的工艺; 用于通过根据位置改变加工条件对基材表面的内部进行加工的加工工艺(第一加工工艺); 以及用于对经过第一次加工处理的玻璃基板表面进行精加工的工序(第二加工工序),从而以令人满意的生产率得到高平坦光滑的玻璃基板。 在这种情况下,第一加工中的基板表面的各处的加工条件由加工前的玻璃基板表面的凹凸形状以及第二加工工序的加工量的面内分布 通过分别使用相同的底物测量。 版权所有(C)2008,JPO&INPIT

    • 3. 发明专利
    • Process for polishing glass substrate
    • 抛光玻璃基板的工艺
    • JP2006240977A
    • 2006-09-14
    • JP2005337329
    • 2005-11-22
    • Asahi Glass Co Ltd旭硝子株式会社
    • OTSUKA KOJIITO MASABUMIKOJIMA HIROSHI
    • C03C15/00
    • PROBLEM TO BE SOLVED: To provide a process for polishing a glass substrate, capable of polishing a glass substrate having a large waviness formed by mechanical polishing, to have a surface excellent in flatness.
      SOLUTION: The process for polishing a glass substrate, comprising a step of measuring the surface profile of a mechanically polished glass substrate to identify the width of waviness present in the surface of the glass substrate, and a step of applying dry etching using a beam having a beam size in FWHM (full width of half maximum) value of at most the above size of waviness, to polish the surface of the glass substrate.
      COPYRIGHT: (C)2006,JPO&NCIPI
    • 要解决的问题:为了提供一种抛光玻璃基板的方法,该玻璃基板能够抛光具有通过机械抛光形成的大波纹的玻璃基板,以具有优异的平面度的表面。 解决方案:用于抛光玻璃基板的方法,包括测量机械抛光的玻璃基板的表面轮廓以识别存在于玻璃基板的表面中的波纹宽度的步骤,以及使用 具有至多上述波纹尺寸的FWHM(全宽度半值)值的光束的光束,以抛光玻璃基板的表面。 版权所有(C)2006,JPO&NCIPI