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1. 发明专利

JP2007219363A Polarization separating film, illuminator for liquid crystal display element and liquid crystal display device 审中-公开
标题翻译：极化分离膜，液晶显示元件和液晶显示器件的照明器
公开(公告)号：JP2007219363A
公开(公告)日：2007-08-30
申请号：JP2006042101
申请日：2006-02-20
申请人： Asahi Glass Co Ltd , 旭硝子株式会社
发明人： SHIN NAOKO , OYAMA TAKUJI
IPC分类号： G02B5/30 , G02F1/1335
摘要： PROBLEM TO BE SOLVED: To provide a polarization separating film through which a large quantity of p-waves is transmitted, an illuminator for a liquid crystal display element, of which the rate of p-waves contained in emitted light is large, and a liquid crystal display device with high luminance. SOLUTION: The polarization separating film 10 has a film base material 12, and niobium oxide layers 14 formed on both faces of the film base material 12. The illuminator for the liquid crystal display element is equipped with a light guide plate, a light source arranged on the side face of the light guide plate, the polarization separating film disposed on the light emission side of the light guide plate, and a light reflection body disposed opposite to the polarization separating film with the light guide plate interposed in between. The liquid crystal display device is equipped with the liquid crystal display element, and the illuminator for the liquid crystal display element disposed on the rear face side of the liquid crystal display element. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：为了提供透射大量p波的偏振分离膜，发射光中包含的p波的速率大的液晶显示元件用照明器，以及具有高亮度的液晶显示装置。解决方案：偏振分离膜10具有膜基材12和形成在膜基材12的两面上的铌氧化物层14.用于液晶显示元件的照明器配备有导光板，布置在导光板的侧面上的光源，设置在导光板的发光侧的偏振分离膜和与偏振分离膜相对设置的光反射体，导光板插入其间。液晶显示装置配备有液晶显示元件和设置在液晶显示元件的背面侧的液晶显示元件用照明器。版权所有（C）2007，JPO＆INPIT

2. 发明专利

JP2006313918A Plasma display protective plate and manufacturing method thereof 有权
标题翻译：等离子显示保护板及其制造方法
公开(公告)号：JP2006313918A
公开(公告)日：2006-11-16
申请号：JP2006148628
申请日：2006-05-29
申请人： Asahi Glass Co Ltd , 旭硝子株式会社
发明人： SAKURADA NOBUYOSHI , MIKATA TOSHIHIRO , OSADA KOICHI , MORIWAKI TAKESHI , AIKAWA KATSUAKI , NODA KAZUYOSHI , OYAMA TAKUJI
IPC分类号： H05K9/00 , G02B1/11 , G02B1/111 , G06F3/041 , G06F3/044 , G09F9/00
CPC分类号： H01J2211/446
摘要： PROBLEM TO BE SOLVED: To provide a plasma display protective plate installed on the front surface of a plasma display for shielding near-infrared rays and electromagnetic waves generated by the plasma display, for preventing the reflection of external light, and for protecting the main body of the display. SOLUTION: The protective plate comprises a substrate 1 composed of a glass plate, and an electrically conductive film 2 composed of a multi-layer film of an oxide and a metal for shielding electromagnetic waves; an electrode 3 connected to the electrically conductive film 2; scatter-preventing resin films 5; and a near-infrared absorbing resin film 6, which are formed on the substrate 1. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种安装在等离子体显示器的前表面上的等离子体显示保护板，用于屏蔽近红外线和等离子体显示器产生的电磁波，以防止外部光的反射，并用于保护主体的显示。解决方案：保护板包括由玻璃板构成的基板1和由用于屏蔽电磁波的氧化物和金属的多层膜构成的导电膜2; 连接到导电膜2的电极3; 防散射树脂膜5; 和近红外吸收树脂膜6，其形成在基板1上。版权所有（C）2007，JPO＆INPIT

3. 发明专利

JP2001174611A MULTILAYER FILM TYPE REFLECTING MIRROR 失效
公开(公告)号：JP2001174611A
公开(公告)日：2001-06-29
申请号：JP36273799
申请日：1999-12-21
申请人： ASAHI GLASS CO LTD
发明人： YAMADA TOMOHIRO , SUGIYAMA TAKASHI , OYAMA TAKUJI , ADACHI KUNIHIKO
IPC分类号： G02B5/08
摘要： PROBLEM TO BE SOLVED: To provide a multilayer film type reflecting mirror which retains electromagnetic wave transmittance, does not emit backlight even when a light source is placed behind the mirror and can be post-hot-worked. SOLUTION: A thin film 2 of a high refractive index material and a thin film 3 of a low refractive index material having visible light transmittance are laminated on the surface of a transparent substrate 1 or such thin films 2 and 3 are alternately laminated a plurality times and a thin film 4 of a high refractive index material having visible light transmittance is formed on the surface of the top thin film 3. A thin film 5 of a light absorbing metal oxide is then formed on the surface of the thin film 4 as the outermost layer to obtain the objective multilayer film type reflecting mirror 6.

4. 发明专利

JP2000193801A LIGHT ABSORBING REFLECTION PREVENTING FILM 失效
公开(公告)号：JP2000193801A
公开(公告)日：2000-07-14
申请号：JP37128198
申请日：1998-12-25
申请人： ASAHI GLASS CO LTD
发明人： OYAMA TAKUJI
IPC分类号： B32B7/02 , C03C17/34 , G02B1/11 , G02B1/115
摘要： PROBLEM TO BE SOLVED: To satisfy low surface resistance and proper visible ray absorbtance and obtain light absorbing reflection preventing film whose reflectance is low against incidental light from the film surface and the reflection side by forming on a base plate in order from the base plate side a first light absorbing film, minute absorbing high refractive index film, a second light absorbing film, and a transparent low refractive index film. SOLUTION: On a base plate 10, in the order from the base plate 10 side, a first light absorbing film 11, a minute absorbing high refractive index film 12, a second light absorbing film 13, and a transparent low refractive index film 14 are formed, and hence a light absorbing reflection preventing film is formed. At this time, for the geometrical film thickness of the first light absorbing film 11, it is desirable to be in the range of 10-30 nm for realizing low reflection. Further, the film thickness of the minute absorbing high refractive index film 12 on the upper layer is desirable to be between 5 and 20 nm. Meanwhile for the film thickness of the second light absorbing film 13, it is desirable to be 1-8 nm. Further for the film thickness of the transparent low refractive index film 14 is desirable to be in the range of 50-90 nm in a viewpoint of preventing reflection.

5. 发明专利

JPH10230558A ORGANIC SUBSTRATE WITH PHOTOABSORPTIVE REFLECTION PREVENTIVE FILM AND ITS MANUFACTURE 失效
公开(公告)号：JPH10230558A
公开(公告)日：1998-09-02
申请号：JP33909797
申请日：1997-12-09
申请人： ASAHI GLASS CO LTD
发明人： OYAMA TAKUJI , OSAKI HISASHI , YAMADA TOMOHIRO , HIGUCHI TOSHIHIKO
IPC分类号： G02B1/11 , B32B7/02 , B32B9/00 , B32B27/36 , C08J7/00 , C23C14/06 , C23C14/10 , G02B1/113 , G02B1/14 , G09F9/00 , H01J29/89
摘要： PROBLEM TO BE SOLVED: To realize an appropriate visible light absorption factor while an organic substrate with a photoabsorptive reflection preventive film is low in a cost and excellent in durability by a method wherein a layer having silicon, its nitride or its oxide, etc., as main constituents is formed between a plasma treated substrate surface and a photoabsorptive layer. SOLUTION: Metal titanium and silicon are provided as a target on a cathode. Then, a PET film to which an acrylate hard coat layer 11 is applied is set on a substrate holder. At first argon gas is introduced, and RF plasma treatment is applied to the substrate holder. Then, it is changed to a mixed gas of argon and nitrogen, a silicon nitride film (an adhesion layer) 12 is formed, then a mixing ratio of gas is changed, and a titanium nitride film (a photoabsorptive film) 13 is formed. After evacuating an inside of a vacuum tank to a high vacuum, a mixed gas of argon and oxygen is introduced, and a silica film (a low reflective index film) 15 is formed. When a sputtering method is used as a film-forming method, an organic substrate with a light absorptive reflection preventive film can be produced at a low cost.

6. 发明专利

JPH1087348A LIGHT-ABSORBING ANTIREFLECTION BODY AND ITS PRODUCTION 失效
公开(公告)号：JPH1087348A
公开(公告)日：1998-04-07
申请号：JP14264497
申请日：1997-05-30
申请人： ASAHI GLASS CO LTD
发明人： OSAKI HISASHI , TACHIBANA YUUKO , OYAMA TAKUJI , NISHIMURA HIROMICHI
IPC分类号： C03C17/34 , G02B1/11 , G02B1/115 , H01J9/20 , H01J9/24 , H01J29/88 , H01J29/89
摘要： PROBLEM TO BE SOLVED: To develop enough antireflection characteristics and excellent heat resistance in a simple layer structure by forming on a substrate, from the substrate side, a titanium oxide nitride film and a film essentially comprising silica, and specifying the number ratio of oxygen atoms to titanium atoms in the titanium oxide nitride. SOLUTION: This light-absorbing antireflection body is obtd. by forming on a substrate, from the substrate side, a titanium oxide nitride film having 5 to 25nm geometric film thickness and a film essentially silica having 70 to 130nm geometric film thickness in this order. The number ratio of oxygen atoms to titanium atoms in the titanium oxide nitride is controlled to 0.11 to 0.33. For example, a film forming chamber is evacuated to 2μTorr, into which sputtering gas is introduced. Electric power in supplied on a titanium target to form a titanium oxide nitride film to 9nm film thickness on a soda lime glass plate. Almost similarly a silicon nitride film of 5nm film thickness is formed on the film and further a silica having 90nm film thickness is formed thereon. The number ratio of oxygen atoms to titanium atoms in the titanium oxide nitride is 0.21.

7. 发明专利

JP2590532B2 失效
公开(公告)号：JP2590532B2
公开(公告)日：1997-03-12
申请号：JP13840488
申请日：1988-06-07
申请人： ASAHI GLASS CO LTD
发明人： SUZUKI KOICHI , TADA MASASHI , OYAMA TAKUJI , SUZUKI SUSUMU
IPC分类号： B32B9/00 , C03C17/34 , C03C17/36 , C23C14/06 , C23C28/04

8. 发明专利

JPH0718426A VAPOR-DEPOSITION DEVICE 失效
公开(公告)号：JPH0718426A
公开(公告)日：1995-01-20
申请号：JP18726293
申请日：1993-06-30
申请人： ASAHI GLASS CO LTD
发明人： YANAGISAWA SUSUMU , SHIMIZU JUNICHI , OYAMA TAKUJI
IPC分类号： C23C14/32 , H01L21/203 , H05H1/46
摘要： PURPOSE:To move the position of a film thickness distribution on a substrate, to widen the film forming range and to widely form a uniformly distributed film on the entire large-area substrate by providing a second magnetic field generator having a means for reversing the direction of the magnetic field to a vapor-deposition device. CONSTITUTION:A rotating shaft 9 for simultaneously reversing the directions of the magnetic fields generated by a first magnetic field generator 7 and a second magnetic field generator 8, a motor 10 for rotating the shaft and a power source 11 having a magnetic field reversing mechanism are provided to reverse the magnetic field in a short time. Consequently, the position of the film thickness distribution on the substrate is moved to increase the film forming range with one plasma gun, and a uniformly distributed film is widely formed.

9. 发明专利

JPH06340967A VAPOR DEPOSITION DEVICE 失效
公开(公告)号：JPH06340967A
公开(公告)日：1994-12-13
申请号：JP15614193
申请日：1993-06-02
申请人： ASAHI GLASS CO LTD
发明人： SHIMIZU JUNICHI , HASHIMOTO NAOKI , OYAMA TAKUJI
IPC分类号： C23C14/32 , C23C14/54
摘要： PURPOSE:To develop a vapor deposition device excellent in reproducibility, working rate and mass-productivity at the time of forming a deposited film on the surface of a substrate in a plasma current utilizing an arc discharge by arranging a permanent magnet under a vapor-deposition material and vertically moving the magnet. CONSTITUTION:A substrate 2 of glass, plastics, etc., with the face to be formed with a film turned downward is arranged in a plasma film forming chamber 1. The chamber 1 is evacuated, a gaseous reactant 11 such as oxygen and nitrogen is introduced, and a vapor deposition material 3 in a vessel 4 is irradiated with a plasma current from a plasma gun 5 by means of a coil 6 and a magnetic field generated by a permanent magnet 7 and vaporized to form the film of the material 3 on the lower face 2. In this case, the magnet 7 is moved in the vertical direction 9 by a position control mechanism 8, hence the magnetic flux density is kept constant on the material surface even if the material 3 is vaporized and reduced in volume and the surface is lowered, a stabilized deposition reaction is maintained, and a deposited film is formed with excellent reproducibility, working rate and mass-productivity.

10. 发明专利

JPH05145096A TRANSMISSION TYPE SOLAR CELL 失效
公开(公告)号：JPH05145096A
公开(公告)日：1993-06-11
申请号：JP33400591
申请日：1991-11-22
申请人： ASAHI GLASS CO LTD
发明人： ADACHI KUNIHIKO , MATSUI TAKESHI , OYAMA TAKUJI
IPC分类号： H01L31/04
摘要： PURPOSE:To improve the transmittance of a transmission solar cell without sacrificing a solar cell formation area by a method wherein the constitution of a rear electrode is formed into a multilayer structure, which is obtained by laminating in order an inorganic compound film, a metal film and an inorganic compound film and consists of the three layers. CONSTITUTION:When a rear electrode is formed into a three-layer structure of an inorganic compound film 4, a metal film 5 and an inorganic compound film 6, the spectral reflectivity of light, which is reflected in a photoactive layer by the rear electrode and returns, is changed by the constitutions of the respective film thicknesses of the three layers of the films 4, 5 and 6. The spectral transmittance of light, which is reflected from the rear electrode to the photoactive layer, and the spectral transmittance of light, which is transmitted to the side of the atmosphere through the rear electrode, are specified by limiting the film thickness of each layer of this rear electrode in a specified range. The wavelength of the light at the minimum point of reflection is decided by the film thickness of the film 4 and the wavelength of the light at the maximum point of reflection and the reflectivity of the light are decided by the film thickness of the film 6. It is desirable that the film thickness of the film 4 is 600 to 800Angstrom or 1500 to 2000Angstrom from the viewpoint of a conversion efficiency, and is 1500 to 2000Angstrom from the viewpoint of a transmittance. Accordingly, it is desirable that it is finally 1500 to 2000Angstrom .

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