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    • 21. 发明专利
    • HEAT TREATMENT FURNACE
    • JPH04139381A
    • 1992-05-13
    • JP26181690
    • 1990-09-28
    • TEL SAGAMI LTD
    • HIDANO MASARU
    • F27D1/12C30B31/12F27B17/00H01L21/205H01L21/22H01L21/31
    • PURPOSE:To perform an efficient cooling of a circumference of a furnace chamber and prevent any influence of heat from being applied to an air pipe disposed around the furnace chamber or various wirings by a method wherein a circulating pipe for circulating cooling medium is disposed between a thermal insulating material and a partition wall spaced apart from the thermal insulating material. CONSTITUTION:An outside part of a heater 30 is covered by a thermal insulating material 34 and a metallic cylindrical inner shell 36 is disposed at an outer surface of the thermal insulating material 34. A metallic outer shell 38 of cylindrical form acting as a partition wall is disposed at an outside part of the inner shell 36 while being spaced apart. A circulating pipe 40 in which cooling medium for cooling an outer side of the thermal insulating material is disposed between the inner shell 36 and the outer shell 38. As the inner shell 36 is cooled by flowing cooling water in a circulating pipe 40, heat generated at the heater 30 is transmitted to the inner shell 36 through the thermal insulating material 34 and this is cooled by the cooling water circulating pipe 40. In addition, since it is possible to decrease a temperature outside the outer shell 38 by the heat exchanging with the cooling medium in the cooling pipe, the circumference part of a furnace chamber 14 can be efficiently cooled.
    • 23. 发明专利
    • VERTICAL-TYPE HEAT TREATMENT APPARATUS
    • JPH04133314A
    • 1992-05-07
    • JP25493190
    • 1990-09-25
    • TEL SAGAMI LTD
    • NISHI HIRONOBU
    • H01L21/22H01L21/205H01L21/31H01L21/677H01L21/68
    • PURPOSE:To suppress drop of the treatment efficiency due to the transfer operation of an object to be treated and to suppress the defect of the object due to an increase in the waiting time by a method wherein a function of pretreating the object is additionaly provided to a stocker for storing a container for treatment use, which has been provided so as to keep the object on standby and all devices from the stocker of a container, for conveyance use, in which the object has been housed to a vertical- type heat treatment furnace are incorporated inside a series of devices. CONSTITUTION:A wafer boat 4 conveyed to a vertical-type heat treatment furnace 30 by using a boat conveyance mechanism 40 is loaded inside a reaction container 31 by using a boat elevator 38; a semiconductor wafer 2 is treated. On the other hand, the wafer boat 4 conveyed to a boat stocker 50 is placed on a turntable 52; it is covered with a reaction table 54 which has been lowered; a desired pretreatment is executed during the waiting period of a heat treatment process by using a gas, for pretreatment use, which has been supplied from a treatment gas introduction pipe 56. The boat stocker 50, a carrier stocker in which a wafer carrier 3 conveyed from a previous process is housed, a transfer mechanism of the semiconductor wafer 2 and individual mechanisms 40, 60 which transfer and convey the wafer boat 4 are installed inside one apparatus.
    • 24. 发明专利
    • HEAT TREATMENT DEVICE
    • JPH04114424A
    • 1992-04-15
    • JP23418390
    • 1990-09-04
    • TEL SAGAMI LTD
    • MIYAGAWA KAZUHISA
    • F27B17/00F27D3/06H01L21/205H01L21/22H01L21/31
    • PURPOSE:To improve the fixing efficiency of a boat carrier by a method wherein the fine adjustment mechanism of the retainer part of a boat holding bar type member in the right and left directions as well as the other fine adjustment mechanism making alignment of the central line direction of a fork with that of a heat treatment chamber by swiveling the other end side of said bar type member using one side of said member as a fulcrum are provided. CONSTITUTION:The position of a reaction tube 4 as a heat treatment chamber is roughly set up and then a boat 3 carrier is arranged. Next, after this arrangement, a seesaw base 51 is aligned by shifting in the right and left directions on a sliding plate 58 using a bolt 61 and a nut 62 so that the point-held position by a screw 40 in a retainer part 2 may be located on the prolonged line of the central line of the reaction tube 4 to fix the position in the right and left directions to a fixing base 6. Next, the retainer part 2 is rotated on the seesaw base 51 centered on the point-held position by the screw 40 turning a knob thereby swivelling the other end 1B of a fork l in the right and left directions. Finally, the central line direction of the fork l is aligned with the central line direction of the reaction tube 4.
    • 25. 发明专利
    • BOAT TRANSFER APPARATUS
    • JPH04113616A
    • 1992-04-15
    • JP23281490
    • 1990-09-03
    • TEL SAGAMI LTD
    • MIYAGAWA KAZUHISA
    • H01L21/22H01L21/205H01L21/31
    • PURPOSE:To prevent that an object to be treated such as a wafer or the like is contaminated when an impurity metal is diffused by a method wherein a mounting stand by which the other end side of a rod-shaped member for boat support use is supported by using the lower part of a boat mounting part is installed and a contact part of the mounting stand with the rod-shaped member for boat support use is constituted of quartz or SiC. CONSTITUTION:In a state that a boat mounting part on the other end side 1B at a fork 1 is separated from a contact member 19 at a mounting stand 17, an operator adjusts an up-and-down direction movement mechanism and adjusts the boat mounting part on the other end side 1B at the fork 1 in such a way that it comes into contact with the contact member 18 at the mounting stand 17. Crystal as the contact member 18 is cleaned so as to be completely free from impurities. Then, a boat 3 on which a plurality of wafers have been loaded is placed on the other end side 1B at the fork 1 by using an elevator mechanism. Then, the other end side 1B at the fork 1 is set to a state to be separated from the contact member 18 at the mounting stand 17. Since the contact member 18 is constituted of crystal in this case, impurities such as a metal and the like do not adhere to a contact part of the fork 1 with the contact member 18.
    • 30. 发明专利
    • VERTICAL HEAT TREATMENT DEVICE
    • JPH0468522A
    • 1992-03-04
    • JP18069390
    • 1990-07-10
    • TEL SAGAMI LTD
    • WATANABE SHINGO
    • F27B17/00F27D7/02H01L21/22H01L21/31
    • PURPOSE:To improve sectional heat equalization property of a treatment object and to realize in-plane uniformity of a high density element by making treatment gas flow inside a vertical reaction tube which contains a plurality of treatment objects for pre-heating and by injecting treatment gas to the treatment objects thereafter. CONSTITUTION:When a wafer 19 is mounted on a specified position of a boat 20 and is transferred into a reaction tube 11, the tube 11 is heated to a set temperature by a heater 17. A clearance is provided to an outer peripheral wall of the reaction tube 11 to arrange an outer tube 12 coaxially and gas distribution means 13 is provided to the inside of the clearance; then, treatment gas supplied to a gas supply port 15 rises and flows in laminar flow uniformly through gas distribution holes 14a to 14e provided inside a clearance between the reaction tube 11 and the outer tube 12. Since treatment gas is pre-heated uniformly by the heater 17 and gas whose temperature is close to a gas temperature inside the reaction tube 11 is introduced, generation of downflow is reduced and a treatment gas temperature is approximately the same in any places in a plane of the wafer 19. Thereby, it is possible to improve sectional heat equalization property and to realize in-plane uniformity of a high density element.