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11. 发明专利

JP2004015020A Substrate handling device 有权
公开(公告)号：JP2004015020A
公开(公告)日：2004-01-15
申请号：JP2002170498
申请日：2002-06-11
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： SUGIMOTO KENJI , MATSUNAGA SANENOBU , SANADA MASAKAZU , YOSHIOKA KATSUJI , AOKI KAORU , YANO MORITAKA , YAMAMOTO SATOSHI , MIHASHI TAKESHI , NAGAO TAKASHI , KODAMA MITSUMASA
IPC分类号： H01L21/677 , H01L21/027 , H01L21/68
摘要： PROBLEM TO BE SOLVED: To provide a substrate handling device in which treatment efficiency can be enhanced when the substrate is inspected. SOLUTION: An indexer 1, a carrying mechanism 17 for heat treatment section, and a section T for inspecting a mounted substrate W being delivered between carrying mechanisms 18 for antireflection film forming section are disposed at the starting point of a treatment section carrying passage 25 on a first floor. Similar inspecting sections T are disposed at the end point of the treatment section carrying passage 25, and at the starting point and the end point of a treatment section carrying passage on a second floor. Since the state of the substrate W can be inspected before the substrate is treated or immediately after it is treated and the inspecting sections T are disposed at the starting point or the end point, the waiting time of the substrate W being inspected due to an interference with the other substrate W can be reduced. COPYRIGHT: (C)2004,JPO

12. 发明专利

JP2003309058A Method and apparatus for treating substrate 有权
标题翻译：用于处理基板的方法和装置
公开(公告)号：JP2003309058A
公开(公告)日：2003-10-31
申请号：JP2002113365
申请日：2002-04-16
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： SUGIMOTO KENJI , MATSUNAGA SANENOBU , SANADA MASAKAZU , YOSHIOKA KATSUJI , AOKI KAORU , YANO MORITAKA , YAMAMOTO SATOSHI , MIHASHI TAKESHI , NAGAO TAKASHI , KODAMA MITSUMASA
IPC分类号： G03F7/30 , B05C5/00 , B05C11/10 , B05D1/26 , B05D3/00 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a substrate treating method and a substrate treating apparatus that can improve treatment accuracy when treating substrates by discharging a treatment liquid to the substrates, and can effectively utilize the treatment liquid. SOLUTION: In the substrate treating apparatus, the discharge area of a discharge section 7a in a nozzle 7 is not changed, thus preventing a change in the flow rate of a developer Q due to a change in the discharge area, and irregularities in the development of the substrate W due to the change in the flow rate of the developer Q discharged to the substrate W. Additionally, the developer Q discharged to the substrate W from the nozzle 7 is collected by a slender collection port 22 at a collection section 15 oppositely arranged at the lower side of the discharge section 7a of the nozzle 7. As a result, the developer Q is exposed to air only while the developer Q is discharged from the discharged section 7a for reaching the collection ports 22, thus decreasing the exposure of the developer Q to air for reducing a change in the characteristics, and reusing the developer Q for effective utilization. COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：提供一种基板处理方法和基板处理装置，其可以通过将处理液排出到基板来处理基板时能够提高处理精度，并且可以有效地利用处理液体。解决方案：在基板处理装置中，喷嘴7中的排出部分7a的排放面积不改变，从而防止由于排放区域的变化而导致的显影剂Q的流量变化，并且不规则在由于排出到基板W的显影剂Q的流量的变化引起的基板W的显影中。另外，从喷嘴7排出到基板W的显影剂Q被收集在细长的收集口22上部分15相对地布置在喷嘴7的排出部分7a的下侧。结果是，只有当显影剂Q从排出部分7a排出以达到收集口22时，显影剂Q才暴露于空气中，从而减少将显影剂Q暴露于空气中以减少特性变化，并且重新使用显影剂Q以进行有效利用。版权所有（C）2004，JPO

13. 发明专利

JP2003053244A Substrate treatment apparatus 有权
标题翻译：基板处理设备
公开(公告)号：JP2003053244A
公开(公告)日：2003-02-25
申请号：JP2001247872
申请日：2001-08-17
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： MORITA AKIHIKO , MIHASHI TAKESHI , YAMAMOTO SATOSHI
IPC分类号： G03F7/16 , B05C5/00 , B05C11/00 , B05C11/08 , B05C15/00 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a substrate treatment apparatus capable of stabilizing both of the discharge pressure at the time of the discharge of a treatment liquid to a substrate from a discharge nozzle and the total discharge amount of the treatment liquid in a constant time if necessary. SOLUTION: A liquid pressure sensor 30 for detecting the liquid feed pressure of a resist is interposed between the electromotive pump 26 driven by a motor 24 and the discharge nozzle 18 provided on the way of the liquid feed piping 22 for connecting the discharge nozzle 18 for discharging the resist to a wafer W and a liquid sump part 20 and a control means for controlling the state of the coating film formed on the surface of the wafer W on the basis of the pressure detected by the liquid pressure sensor is provided.
摘要翻译：要解决的问题：提供一种基板处理装置，其能够稳定从排出喷嘴排出处理液到基板时的排出压力和处理液的总排出量的恒定时间，如果必要。解决方案：用于检测抗蚀剂的液体进料压力的液体压力传感器30介于由电动机24驱动的电动泵26和设置在液体供给管道22之间的排出喷嘴18之间，用于连接用于基于由液压传感器检测到的压力，提供将抗蚀剂排放到晶片W和液体贮存部20以及用于控制形成在晶片W的表面上的涂膜的状态的控制装置。

14. 发明专利

JP2006310722A Substrate processing equipment 有权
标题翻译：基板加工设备
公开(公告)号：JP2006310722A
公开(公告)日：2006-11-09
申请号：JP2005216158
申请日：2005-07-26
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： YASUDA SHUICHI , KANEOKA MASA , KANAYAMA KOJI , MIYAGI SATOSHI , SHIGEMORI KAZUSHI , ASANO TORU , TORIYAMA YUKIO , TAGUCHI TAKASHI , MIHASHI TAKESHI , OKUMURA TAKESHI
IPC分类号： H01L21/677 , H01L21/027
CPC分类号： H01L21/67034 , G03F7/38 , H01L21/67028 , H01L21/67051 , H01L21/67178 , H01L21/67207
摘要： PROBLEM TO BE SOLVED: To provide substrate processing equipment, in which malfunctions due to liquid adhering to a substrate, is prevented in an aligner. SOLUTION: The substrate processing equipment 500 includes an indexer block 9, an anti-reflection film processing block 10, a resist film processing block 11, a development processing block 12, a drying processing block 13 and an interface block 14. An aligner 15 is arranged contiguously to the interface block 14. The drying block 13 includes a drying section 80. The interface block 14 includes a carrying mechanism IFR for interface. A substrate W, subjected to exposure in the aligner 15, is carried by the carrying mechanism IFR for interface to the drying section 80. In the drying section 80, the substrate W is subjected to cleaning and drying processings. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供在对准器中防止由于液体粘附到基板而导致故障的基板处理设备。解决方案：基板处理设备500包括分度器块9，防反射膜处理块10，抗蚀剂膜处理块11，显影处理块12，干燥处理块13和接口块14。对准器15邻接于接口块14.干燥块13包括干燥部80.接口块14包括用于接口的承载机构IFR。在对准器15中经受曝光的基板W由承载机构IFR承载，用于与干燥部80的界面。在干燥部80中，对基板W进行清洁和干燥处理。版权所有（C）2007，JPO＆INPIT

15. 发明专利

JP2006190921A Device and method for treating substrate 有权
标题翻译：用于处理基板的装置和方法
公开(公告)号：JP2006190921A
公开(公告)日：2006-07-20
申请号：JP2005095780
申请日：2005-03-29
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： ASANO TORU , TORIYAMA YUKIO , TAGUCHI TAKASHI , MIHASHI TAKESHI , KANAYAMA KOJI , OKUMURA TAKESHI
IPC分类号： H01L21/027 , G03F7/20 , H01L21/677
CPC分类号： G03F7/70991 , G03F7/70341
摘要： PROBLEM TO BE SOLVED: To provide a device and a method for treating a substrate capable of sufficiently preventing the contamination of the rear of the substrate. SOLUTION: When the substrates W are carried to an exposure device 14, a hand H5 is used on the upper side of a carrying mechanism IFR for an interface. When the substrates are carried out from the exposure device 14, the hand H6 on the lower side of the carrying mechanism IFR for the interface is used. When the substrates W after an exposure treatment by the exposure device 14 are carried to a drying treating section 95, the hand CRH10 is used on the lower side of a fifth center robot CR5. When the substrates W are carried after a drying treatment carried out from the drying treating section 95, the hand CRH9 is used on the upper side of the fifth center robot CR5. That is, the hands H5 and CRH9 are employed for carrying the substrates W on which a liquid does not adhere, and the hands H6 and CRH10 are employed for carrying the substrates W on which the liquid adheres. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种用于处理能够充分防止基板后部的污染的基板的装置和方法。解决方案：当基板W被携带到曝光装置14时，手H5用于接口机构IFR的上侧。当从曝光装置14执行基板时，使用用于界面的承载机构IFR下侧的手H6。当通过曝光装置14进行曝光处理后的基板W被传送到干燥处理部95时，在第五中心机器人CR5的下侧使用手CRH10。当在从干燥处理部95进行干燥处理后承载基板W时，在第五中心机器人CR5的上侧使用手CRH9。也就是说，手H5和CRH9用于承载液体不粘附的基板W，并且使用手H6和CRH10来承载液体粘附的基板W。版权所有（C）2006，JPO＆NCIPI

16. 发明专利

JP2004015022A Substrate handling device 审中-公开
标题翻译：基板处理装置
公开(公告)号：JP2004015022A
公开(公告)日：2004-01-15
申请号：JP2002170500
申请日：2002-06-11
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： SUGIMOTO KENJI , MATSUNAGA SANENOBU , SANADA MASAKAZU , YOSHIOKA KATSUJI , AOKI KAORU , YANO MORITAKA , YAMAMOTO SATOSHI , MIHASHI TAKESHI , NAGAO TAKASHI , KODAMA MITSUMASA
IPC分类号： B25J9/06 , B65G49/07 , H01L21/027 , H01L21/677 , H01L21/68
摘要： PROBLEM TO BE SOLVED: To provide a substrate handling device in which the design of a substrate carrying passage is set freely and a mutual influence between treatment sections through the substrate carrying passage is reduced. SOLUTION: An arm base provided in each of carrying mechanisms 17-21, 23 and 24 is arranged to turn about a z-axis and to elevate/lower in the z-axis direction, and each arm is arranged to advance/retract in the radial direction of rotation. Passages for carrying substrates, i.e. treatment section carrying passages 25 and 26, are installed on respective floors by interposing heat treatment sections 16 (16A-16H) and juxtaposing the carrying mechanisms 17-21, 23 and 24 on the same horizontal plane. COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：提供一种基板搬运装置，其中基板承载通道的设计自由设定，并且通过基板承载通道的处理部分之间的相互影响减小。解决方案：设置在每个运送机构17-21,23和24中的臂基座布置成围绕z轴转动并在z轴方向上升/降，并且每个臂布置成前进/ 在径向旋转方向缩回。通过插入热处理部分16（16A-16H）并将携带机构17-21,23和24并置在同一水平面上，将各个承载基板的通道即处理部分承载通道25和26安装在相应的楼层上。版权所有（C）2004，JPO

17. 发明专利

JP2004015019A Substrate handling device 审中-公开
标题翻译：基板处理装置
公开(公告)号：JP2004015019A
公开(公告)日：2004-01-15
申请号：JP2002170497
申请日：2002-06-11
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： SUGIMOTO KENJI , MATSUNAGA SANENOBU , SANADA MASAKAZU , YOSHIOKA KATSUJI , AOKI KAORU , YANO MORITAKA , YAMAMOTO SATOSHI , MIHASHI TAKESHI , NAGAO TAKASHI , KODAMA MITSUMASA
IPC分类号： H01L21/677 , H01L21/02 , H01L21/027 , H01L21/68
摘要： PROBLEM TO BE SOLVED: To provide a substrate handling device in which a footprint is reduced and a means for carrying a substrate can be maintained conveniently. SOLUTION: Heat treatment sections 16A and 16F, 16B and 16G, 16C and 16H, 16D and 16F and 16E and 16G are disposed vertically in a hierarchic structure such that a substrate can be delivered to/from each carrying mechanism. The stacked heat treatment sections 16A-16F are mounted on each rail 27 extended from a steady-state position C facing each carrying mechanism to a retreat position D. Each carrying mechanism can be maintained conveniently by moving each of heat treatment sections 16A-16F from the steady-state position C to the retreat position D and ensuring a common maintenance zone for maintaining each carrying mechanism. COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：提供一种其中足迹减小的基板处理装置，并且可以方便地保持用于承载基板的装置。解决方案：热处理部分16A和16F，16B和16G，16C和16H，16D和16F和16E和16G以分层结构垂直设置，使得可以将基板输送到每个传送机构/从每个传送机构传送。堆叠式热处理部16A-16F安装在从面向各个搬运机构的稳定状态位置C延伸到后退位置D的每个轨道27上。通过将热处理部16A-16F中的每一个从稳定位置C到退回位置D，并且确保用于维持每个承载机构的公共维护区域。版权所有（C）2004，JPO

18. 发明专利

JP2003324139A Substrate treatment apparatus 有权
标题翻译：基板处理设备
公开(公告)号：JP2003324139A
公开(公告)日：2003-11-14
申请号：JP2002129817
申请日：2002-05-01
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： FUKUTOMI YOSHIMITSU , SUGIMOTO KENJI , ITO TAKASHI , OKAMOTO TAKEO , INAGAKI YUKIHIKO , YOSHIOKA KATSUJI , MIHASHI TAKESHI
IPC分类号： G03F7/30 , B05C9/14 , B05C13/00 , B65G1/00 , H01L21/00 , H01L21/027 , H01L21/67 , H01L21/677 , H01L21/68
CPC分类号： H01L21/67173 , H01L21/67178 , H01L21/67225 , H01L21/67276 , H01L21/67778 , Y10S414/135
摘要： PROBLEM TO BE SOLVED: To provide a substrate treatment apparatus which can enhance throughput. SOLUTION: This substrate treatment apparatus comprises an anti-reflection film treatment block 2 including a chemical treatment section, a heat treatment section, and a single main carrying mechanism independently constituted, a resist film treatment block 3, and a development block 4. In every block 2, 3 and 4, main carrying mechanisms 10A-10C carry substrates in each block, and since substrate transfer between adjacent blocks is carried out through each substrate mounting section PASS, the throughput of the substrate treatment apparatus can be enhanced. COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：提供可以提高生产量的基板处理装置。解决方案：该基板处理装置包括防反射膜处理块2，该防反射膜处理块2包括独立构成的化学处理部，热处理部和单个主承载机构，抗蚀剂膜处理块3和显影块4 在每个块2,3和4中，主承载机构10A-10C在每个块中承载衬底，并且由于通过每个衬底安装部PASS执行相邻块之间的衬底传送，因此可以提高衬底处理装置的生产量。版权所有（C）2004，JPO

19. 发明专利

JP2004122066A Degassing device 审中-公开
标题翻译：脱水装置
公开(公告)号：JP2004122066A
公开(公告)日：2004-04-22
申请号：JP2002293301
申请日：2002-10-07
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： IMAMURA MASATAKA , MIHASHI TAKESHI , YAMADA YOSHIHISA
IPC分类号： G03F7/30 , B01D19/00 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a degassing device for effectively preventing bubbles from flowing out to a substrate-treating device, while being simply constituted.
SOLUTION: A treating liquid storage tank 10a includes an upper part 31 made of a hydrophobic materia1 and an lower part 32 made of a hydrophilic material. A treating-liquid supply port 11 disposed in the upper part 31 is connected to a treating-liquid supply source through a treating-liquid supply path. An exhaust port 13 disposed in the upper part 31 is connected to an exhaust pump through an exhaust path. A treating-liquid discharge port 12 disposed in the lower part 32 is connected to the substrate treating device through a treating-liquid-discharge port.
COPYRIGHT: (C)2004,JPO

20. 发明专利

JP2004015023A Substrate handling device and handling method 审中-公开
公开(公告)号：JP2004015023A
公开(公告)日：2004-01-15
申请号：JP2002170501
申请日：2002-06-11
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： SUGIMOTO KENJI , MATSUNAGA SANENOBU , SANADA MASAKAZU , YOSHIOKA KATSUJI , AOKI KAORU , YANO MORITAKA , YAMAMOTO SATOSHI , MIHASHI TAKESHI , NAGAO TAKASHI , KODAMA MITSUMASA
IPC分类号： B65G49/07 , H01L21/027 , H01L21/677 , H01L21/68
摘要： PROBLEM TO BE SOLVED: To provide a substrate handling device and a handling method in which the processing efficiency of a substrate is enhanced without increasing a footprint.
SOLUTION: A first floor treatment section carrying passage 25 and a second floor treatment section carrying passage 26 each arranged vertically in a two-story hierarchic structure are coupled with an indexer 1 and an interface 4, respectively. Since the substrate is retreated or carried to the first floor or second floor processing section carrying passages 25, 26 by the indexer 1 or the interface 4, the interference of substrates can be reduced and the treatment efficiency of the substrate can be enhanced.
COPYRIGHT: (C)2004,JPO

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