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    • 10. 发明公开
    • CHEMICAL VAPOR DEPOSITION MATERIAL FORMED OF RUTHENIUM COMPLEX, METHOD FOR PRODUCING SAME AND CHEMICAL VAPOR DEPOSITION METHOD
    • 从钌形材料的化学气相沉积,工艺用于制造和用于化学气相沉积程序
    • EP2886679A1
    • 2015-06-24
    • EP13831394.5
    • 2013-08-19
    • Tanaka Kikinzoku Kogyo K.K.
    • HARADA, RyosukeNAKATA, NaokiSAITO, Masayuki
    • C23C16/16C07C17/00C07C21/19C07C23/10C07C23/16C07F15/00
    • C07F15/0046C23C16/18C23C16/46
    • The present invention provides a raw material, formed of a ruthenium complex, for producing a ruthenium thin film or a ruthenium compound thin film by a chemical deposition method, wherein the ruthenium complex is a ruthenium complex represented by the following formula, in which carbonyl groups and a fluoroalkyl derivative of a polyene are coordinated to ruthenium. The present invention provides a raw material for chemical deposition having a preferable decomposition temperature, and the production cost therefor is low:

              [Chemical Formula 1]     (nR - L)Ru(CO) 3

      wherein L is a polyene having a carbon number of from 4 to 8 and 2 to 4 double bonds, wherein the polyene L has n (n ≥ 1) pieces of substituents Rs, wherein the substituents Rs are each a fluoroalkyl group having a carbon number of from 1 to 6 and a fluorine number of from 1 to 13, and in the case when the polyene L has two or more (n ≥ 2) of the substituents Rs, the carbon numbers and the fluorine numbers of the substituents Rs may be different in the same molecule.
    • 本发明提供的原料,形成了钌络合物的,用于通过化学沉积法生产钌薄膜或钌化合物薄膜,worin钌络合物为钌络合物由下式表示,其中,羰基 和多烯的一氟烷基衍生物配位到钌。 本发明提供的原料的具有优选的分解温度化学沉积,且生产成本为此低:€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ[化学式1]€ƒ€ƒ€ ƒ€ƒ€ƒ(n个R - L)的Ru(CO)3 worin L为具有4至8的碳原子数2〜4个双键的多烯,worin多烯L具有n个(n‰¥1)的片 取代基RS,worin取代基R各自具有1至6的碳原子数和从1至13的氟数的氟烷基,和在情况下,当多烯L具有两个或更多个(N‰¥2)的 取代基Rs时,碳原子数和氟取代基Rs的数量可以在同一分子中不同。