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    • 6. 发明公开
    • Semiconductor laser element
    • Halbleiterlaserelement
    • EP1283574A2
    • 2003-02-12
    • EP02013150.4
    • 2002-06-14
    • Sharp Kabushiki Kaisha
    • Matsumoto, Mitsuhiro
    • H01S5/223
    • H01S5/2231H01S5/2004H01S5/222
    • There is provided a semiconductor laser element, which has a small capacitance outside a ridge portion and high response speed and is able to effect pulse oscillation with a satisfactory pulse waveform. On a GaAs substrate 101, there are provided an n-type buffer layer 102, an n-type first clad layer 103, an MQW active layer 104, a p-type second clad layer 105, a p-type etching stop layer 106 that has an energy bandgap smaller than that of this second clad layer 105, a p-type third clad layer 107 that constitutes a ridge portion and a p-type protective layer 108. On both sides in the widthwise direction of the ridge portion are laminated a p-type spacer layer 109, an n-type current light confining layer 110, an n-type current confining layer 111 and a p-type flattening layer 112. On these layers is laminated a p-type contact layer 113. A depletion layer spreads into the spacer layer 109 when a bias voltage is applied. Therefore, a capacitance between the spacer layer 109 and the current light confining layer 110 is reduced, and a response speed during the pulse oscillation of the semiconductor laser element becomes fast.
    • 提供了一种半导体激光元件,其在脊部外部具有小的电容并且响应速度高,并且能够以令人满意的脉冲波形来实现脉冲振荡。 在GaAs衬底101上,设置有n型缓冲层102,n型第一覆盖层103,MQW有源层104,p型第二覆盖层105,p型蚀刻停止层106,p型蚀刻停止层106 具有小于该第二包层105的能量带隙,构成脊部的p型第三包层107和p型保护层108.在脊部的宽度方向的两侧层叠有 p型间隔层109,n型电流限制层110,n型电流限制层111和p型平坦化层112.在这些层上层叠有p型接触层113.耗尽层 当施加偏置电压时,它们扩散到间隔层109中。 因此,间隔层109和电流限制层110之间的电容减小,半导体激光元件的脉冲振荡期间的响应速度变快。