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1. 发明授权

EP3050180B1 MODULAR MICROPLASMA MICROCHANNEL REACTOR DEVICES, MINIATURE REACTOR MODULES AND OZONE GENERATION DEVICES 失效
公开(公告)号：EP3050180B1
公开(公告)日：2018-12-05
申请号：EP14876614.0
申请日：2014-09-24
申请人： The Board of Trustees of the University of Illinois
发明人： EDEN, J. Gary , KIM, Min Hwan , CHO, Jin Hoon , PARK, Sung-Jin
IPC分类号： H01S3/091
CPC分类号： H01J37/32568 , A23L3/34095 , A23L3/3445 , A23V2002/00 , B01J19/0093 , B01J2219/00783 , B01J2219/00806 , B01J2219/0081 , B01J2219/00822 , B01J2219/00853 , B01J2219/0086 , B01J2219/00867 , B01J2219/00869 , B01J2219/00871 , B01J2219/0093 , C01B13/10 , C02F1/78 , C02F2305/02 , H01J37/32798 , H01J37/32908 , H01J2237/327 , H05H1/2406 , H05H2001/2418
摘要： A preferred modular microplasma microchannel reactor device includes a microchannel array arranged with respect to electrodes for generation of plasma and isolated by dielectric from the electrodes. A cover covers a central portion of the microchannel array, while leaving end portions of the microchannel array exposed. A gas inlet and product outlet are arranged to permit flow into, through and out of the microchannel array. Reactor modules of the invention include pluralities of the modular reactor devices. The reactors devices can be arranged by a housing or a frame to be in fluid communication. A system of the invention arranges pluralities of modules. Preferred module housings, frames and reactors include structural features to create alignments and connections. Preferred modules include fans to circulate feedstock and reaction product. Other reactor devices provide plasma actuation for flow.

2. 发明公开

EP2878006A1 VERFAHREN UND VORRICHTUNG ZUM PERMANENTEN BONDEN VON WAFERN 有权
标题翻译：方法和装置永久性粘结WAFERS
公开(公告)号：EP2878006A1
公开(公告)日：2015-06-03
申请号：EP12742856.3
申请日：2012-07-24
申请人： Ev Group E. Thallner GmbH
发明人： PLACH, Thomas , HINGERL, Kurt , WIMPLINGER, Markus , FLÖTGEN, Christoph
IPC分类号： H01L21/18 , H01L21/20
CPC分类号： B32B38/10 , B32B37/0046 , H01J37/32036 , H01J37/32082 , H01J37/32165 , H01J37/32339 , H01J37/32532 , H01J37/32798 , H01J2237/334 , H01L21/187 , H01L21/2007 , H01L21/67092
摘要： The present invention relates to a method for bonding a first contact area of a first substrate to a second contact area of a second substrate, wherein the second substrate has at least one reaction layer, comprising the following steps, more particularly the following sequence: receiving the substrates between a first electrode and a second electrode, or within a coil, and forming a reservoir in a reservoir-forming layer at the first contact area by exposing the first contact area to a plasma generated by means of capacitive coupling of the electrodes, wherein, during the plasma generation, a first frequency is applied to the first electrode, said first frequency being different from a second frequency of the second electrode, or plasma generated by means of inductive coupling of a coil, wherein, during the plasma generation, a first frequency is generated at the first generator, said first frequency being different from a second frequency at the second generator. The present invention additionally relates to a corresponding device.

3. 发明公开

EP3167474A1 EXTREME ULTRAVIOLET REFLECTIVE ELEMENT WITH MULTILAYER STACK AND METHOD OF MANUFACTURING THEREOF 审中-公开
标题翻译：具有多层堆叠的极紫外反射元件及其制造方法
公开(公告)号：EP3167474A1
公开(公告)日：2017-05-17
申请号：EP15819522.2
申请日：2015-07-03
申请人： Applied Materials, Inc.
发明人： HOFMANN, Ralf , HASSAN, Vinayak Vishwanath , BEASLEY, Cara , FOAD, Majeed A.
IPC分类号： H01L21/027
CPC分类号： G03F7/702 , C23C14/0605 , C23C14/0635 , C23C14/14 , C23C16/44 , G02B1/14 , G02B5/085 , G02B5/0891 , G03F1/24 , G03F1/48 , G03F1/52 , G03F7/70033 , G03F7/70316 , G03F7/70916 , G03F7/70958 , G21K1/062 , H01J37/32798 , H01J37/3429
摘要： An apparatus and method of manufacture of an extreme ultraviolet reflective element includes: a substrate; a multilayer stack on the substrate, the multilayer stack includes a plurality of reflective layer pairs having a first reflective layer formed from silicon and a second reflective layer formed from niobium or niobium carbide for forming a Bragg reflector; and a capping layer on and over the multilayer stack for protecting the multilayer stack by reducing oxidation and mechanical erosion.
摘要翻译：一种制造极紫外反射元件的装置和方法，包括：基板; 在所述衬底上的多层堆叠，所述多层堆叠包括多个反射层对，所述多个反射层对具有由硅形成的第一反射层和由铌或碳化铌形成的用于形成布拉格反射器的第二反射层; 以及多层叠层之上和之上的覆盖层，用于通过减少氧化和机械侵蚀来保护多层叠层。

4. 发明授权

EP2878006B1 VERFAHREN UND VORRICHTUNG ZUM PERMANENTEN BONDEN VON WAFERN 有权
标题翻译：方法和装置永久性粘结WAFERS
公开(公告)号：EP2878006B1
公开(公告)日：2016-12-07
申请号：EP12742856.3
申请日：2012-07-24
申请人： Ev Group E. Thallner GmbH
发明人： PLACH, Thomas , HINGERL, Kurt , WIMPLINGER, Markus , FLÖTGEN, Christoph
IPC分类号： H01L21/67 , H01J37/32 , B32B38/10 , B32B37/00 , H01L21/20 , H01L21/18
CPC分类号： B32B38/10 , B32B37/0046 , H01J37/32036 , H01J37/32082 , H01J37/32165 , H01J37/32339 , H01J37/32532 , H01J37/32798 , H01J2237/334 , H01L21/187 , H01L21/2007 , H01L21/67092

5. 发明公开

EP3050180A2 MODULAR MICROPLASMA MICROCHANNEL REACTOR DEVICES, MINIATURE REACTOR MODULES AND OZONE GENERATION DEVICES 失效
标题翻译：模块化微等离子体微通道反应器DEVICES微型反应器组件和臭氧发生装置
公开(公告)号：EP3050180A2
公开(公告)日：2016-08-03
申请号：EP14876614.0
申请日：2014-09-24
申请人： The Board of Trustees of the University of Illinois
发明人： EDEN, J. Gary , KIM, Min Hwan , CHO, Jin Hoon , PARK, Sung-Jin
IPC分类号： H01S3/091
CPC分类号： H01J37/32568 , A23L3/34095 , A23L3/3445 , A23V2002/00 , B01J19/0093 , B01J2219/00783 , B01J2219/00806 , B01J2219/0081 , B01J2219/00822 , B01J2219/00853 , B01J2219/0086 , B01J2219/00867 , B01J2219/00869 , B01J2219/00871 , B01J2219/0093 , C01B13/10 , C02F1/78 , C02F2305/02 , H01J37/32798 , H01J37/32908 , H01J2237/327 , H05H1/2406 , H05H2001/2418
摘要： A preferred modular microplasma microchannel reactor device includes a microchannel array arranged with respect to electrodes for generation of plasma and isolated by dielectric from the electrodes. A cover covers a central portion of the microchannel array, while leaving end portions of the microchannel array exposed. A gas inlet and product outlet are arranged to permit flow into, through and out of the microchannel array. Reactor modules of the invention include pluralities of the modular reactor devices. The reactors devices can be arranged by a housing or a frame to be in fluid communication. A system of the invention arranges pluralities of modules. Preferred module housings, frames and reactors include structural features to create alignments and connections. Preferred modules include fans to circulate feedstock and reaction product. Other reactor devices provide plasma actuation for flow.

6. 发明公开

EP3035370A1 VORRICHTUNG ZUM PERMANENTEN BONDEN VON WAFERN 无效
公开(公告)号：EP3035370A1
公开(公告)日：2016-06-22
申请号：EP16153590.1
申请日：2012-07-24
申请人： EV Group E. Thallner GmbH
发明人： Plach, Thomas , Hingerl, Kurt , Wimplinger, Markus , Flötgen, Christoph
IPC分类号： H01L21/18 , H01L21/20 , H01L21/67 , H01J37/32 , B32B37/00 , B32B38/10
CPC分类号： B32B38/10 , B32B37/0046 , H01J37/32036 , H01J37/32082 , H01J37/32165 , H01J37/32339 , H01J37/32532 , H01J37/32798 , H01J2237/334 , H01L21/187 , H01L21/2007 , H01L21/67092
摘要： Die vorliegende Erfindung betrifft eine Vorrichtung zum Bonden einer ersten Kontaktfläche (3) eines ersten Substrats (1) mit einer zweiten Kontaktfläche (4) eines zweiten Substrats (2), wobei das zweite Substrat (2) zumindest eine Reaktionsschicht (7) aufweist, mit folgenden Merkmalen.
- eine Bondkammer (20, 20', 27),
- eine erste Elektrode (21) und eine gegenüberliegend angeordnete zweite Elektrode (22),
- Aufnahmemittel zur Aufnahme der Substrate (2, 3) zwischen die erste Elektrode (21) und die zweite Elektrode (22),
- Reservoirbildungsmittel zur Ausbildung eines Reservoirs (5) in einer Reservoirbildungsschicht (6) an der ersten Kontaktfläche (3) durch Beaufschlagung der ersten Kontaktfläche (3) mit einem mittels kapazitiver Kopplung der Elektroden (21, 22) erzeugten Plasma, wobei an der ersten Elektrode (21) während der Plasmaerzeugung eine von einer zweiten Frequenz (f 22 ) der zweiten Elektrode (22) unterschiedliche erste Frequenz (f 21 ) anlegbar ist,
- Mittel zum Kontaktieren der ersten Kontaktfläche (3) mit der zweiten Kontaktfläche (4) zur Ausbildung einer Pre-Bond-Verbindung,
wobei die Vorrichtung eine Kammer zur Ausbildung des Reservoirs und eine separat dazu vorgesehene Kammer zur Füllung des Reservoirs und einer, insbesondere separat vorgesehenen Kammer zur Ausbildung der Pre-Bond-Verbindung aufweist, die direkt über ein Vakuumsystem miteinander verbunden sind.
摘要翻译：一种用于将第一基板的第一接触区域接合到第二基板的第二接触区域的方法，所述第二基板具有至少一个反应层，以及用于执行所述方法的设备。该方法包括：（a）在第一电极和第二电极之间或线圈内容纳衬底，（b）通过将第一接触区域暴露于等离子体（c）至少形成第一接触区域上的容器（d）使第一接触区域与第二接触区域接触以形成预接合互连，（e）在第一和第二组之间形成永久性接合接触区域通过第一离子束与包含在第二基底的反应层中的第二离子体的反应至少部分地增强。

7. 发明公开

EP3012342A1 THERMISCHES SPRITZVERFAHREN UND VORRICHTUNG DAFÜR 审中-公开
标题翻译： THERMISCHES SPRITZVERFAHREN UND VORRICHTUNGDAFÜR
公开(公告)号：EP3012342A1
公开(公告)日：2016-04-27
申请号：EP15190970.2
申请日：2015-10-22
申请人： MAHLE International GmbH
发明人： Englert, Peter , Mamber, Dr. Oliver , Trautwein, Ingo , Rodriguez, Tomas
IPC分类号： C23C4/134 , B22F1/00 , H01J37/32 , H05H1/44
CPC分类号： H01J37/32376 , B05B7/22 , B22F7/04 , B22F2007/042 , B22F2999/00 , B23K35/00 , C23C4/134 , H01J37/3277 , H01J37/32798 , H01J2237/332 , H05H1/42 , H05H1/44 , B22F2202/13
摘要： Die Erfindung betrifft ein thermisches Spritzverfahren insbesondere zum Beschichten einer Oberfläche (4) mittels eines Plasmastrahls, unter Verwendung eines geformten Plasmastrahls (3), wobei ein erster Plasmastrahl (1) mittels wenigstens eines zweiten Plasmastrahls (2) gesteuert und/oder geformt wird, wobei der zweite Plasmastrahl (2) den ersten Plasmastrahl (1) wenigstens teilweise und wenigstens zeitweise durchdringt.
摘要翻译：本发明涉及一种热喷涂方法，特别是使用成形等离子体束通过等离子体束涂覆表面，其中通过至少一个第二等离子体束的第一等离子体束被控制和/或成形，其中所述第二等离子体束至少部分地并且至少暂时地穿透所述第一等离子体束。

8. 发明公开

EP3167474A4 EXTREME ULTRAVIOLET REFLECTIVE ELEMENT WITH MULTILAYER STACK AND METHOD OF MANUFACTURING THEREOF 审中-公开
公开(公告)号：EP3167474A4
公开(公告)日：2018-04-18
申请号：EP15819522
申请日：2015-07-03
申请人： APPLIED MATERIALS INC
发明人： HOFMANN RALF , HASSAN VINAYAK VISHWANATH , BEASLEY CARA , FOAD MAJEED A
IPC分类号： H01L21/027 , C23C14/06 , C23C14/14 , G02B1/14 , G02B5/08 , G03F1/24 , G03F1/48 , G03F1/52 , G03F7/20 , G21K1/06
CPC分类号： G03F7/702 , C23C14/0605 , C23C14/0635 , C23C14/14 , C23C16/44 , G02B1/14 , G02B5/085 , G02B5/0891 , G03F1/24 , G03F1/48 , G03F1/52 , G03F7/70033 , G03F7/70316 , G03F7/70916 , G03F7/70958 , G21K1/062 , H01J37/32798 , H01J37/3429
摘要： An apparatus and method of manufacture of an extreme ultraviolet reflective element includes: a substrate; a multilayer stack on the substrate, the multilayer stack includes a plurality of reflective layer pairs having a first reflective layer formed from silicon and a second reflective layer formed from niobium or niobium carbide for forming a Bragg reflector; and a capping layer on and over the multilayer stack for protecting the multilayer stack by reducing oxidation and mechanical erosion.

9. 发明授权

EP3129230B1 INKJET PRINTER COMPRISING A PLASMA GENERATION DEVICE, PLASMA GENERATION DEVICE FOR THE SAME, AND RELATIVE METHODS 有权
标题翻译：包括等离子体发生装置的喷墨打印机，等离子体发生装置及其相关方法
公开(公告)号：EP3129230B1
公开(公告)日：2018-02-28
申请号：EP15713946.0
申请日：2015-04-10
申请人： OCE-Technologies B.V.
发明人： WILLEMS, Guido G. , KUYPERS, Hermanus M.
IPC分类号： B41F23/00 , H05H1/24
CPC分类号： B41J11/002 , B41F23/00 , B41J11/0015 , H01J37/32568 , H01J37/32761 , H01J37/32798 , H01J2237/002 , H05H1/2406 , H05H2001/2412
摘要： A plasma generating device includes a first plasma electrode and a counter electrode facing each other. The first plasma electrode extends in a lateral direction and includes two projections. Each of the two projections protrudes from the first plasma electrode in the direction of the counter electrode over a predetermined distance. The plasma generating device further includes a preload mechanism adapted for urging each of said two projections of the first plasma electrode against the counter electrode. The two projections cooperatively define a plasma gap between the first plasma electrode and the counter electrode. The counter electrode includes a support surface facing said plasma gap. The support surface is substantially flat along the plasma gap.

10. 发明公开

EP3050180A4 MODULAR MICROPLASMA MICROCHANNEL REACTOR DEVICES, MINIATURE REACTOR MODULES AND OZONE GENERATION DEVICES 失效
标题翻译：模块化MIKROPLASMA-MIKROKANAL-REAKTORVORRICHTUNGEN，MINIATURISIERTE REAKTORMODULE UND OZONERZEUGUNGSVORRICHTUNGEN
公开(公告)号：EP3050180A4
公开(公告)日：2017-04-12
申请号：EP14876614
申请日：2014-09-24
申请人： UNIV ILLINOIS
发明人： EDEN J GARY , KIM MIN HWAN , CHO JIN HOON , PARK SUNG-JIN
IPC分类号： H01S3/091
CPC分类号： H01J37/32568 , A23L3/34095 , A23L3/3445 , A23V2002/00 , B01J19/0093 , B01J2219/00783 , B01J2219/00806 , B01J2219/0081 , B01J2219/00822 , B01J2219/00853 , B01J2219/0086 , B01J2219/00867 , B01J2219/00869 , B01J2219/00871 , B01J2219/0093 , C01B13/10 , C02F1/78 , C02F2305/02 , H01J37/32798 , H01J37/32908 , H01J2237/327 , H05H1/2406 , H05H2001/2418
摘要： A preferred modular microplasma microchannel reactor device includes a microchannel array arranged with respect to electrodes for generation of plasma and isolated by dielectric from the electrodes. A cover covers a central portion of the microchannel array, while leaving end portions of the microchannel array exposed. A gas inlet and product outlet are arranged to permit flow into, through and out of the microchannel array. Reactor modules of the invention include pluralities of the modular reactor devices. The reactors devices can be arranged by a housing or a frame to be in fluid communication. A system of the invention arranges pluralities of modules. Preferred module housings, frames and reactors include structural features to create alignments and connections. Preferred modules include fans to circulate feedstock and reaction product. Other reactor devices provide plasma actuation for flow.
摘要翻译：优选的模块化微等离子体微通道反应器装置包括相对于电极布置的微通道阵列，用于产生等离子体并通过电极从电极隔离。盖子覆盖微通道阵列的中心部分，同时使微通道阵列的端部露出。气体入口和产品出口布置成允许流入，通过和流出微通道阵列。本发明的反应器模块包括多个模块化反应器装置。反应器装置可以由壳体或框架布置成流体连通。本发明的系统布置了多个模块。优选的模块外壳，框架和反应器包括用于产生对准和连接的结构特征。优选的模块包括用于循环原料和反应产物的风扇。其他反应器装置为流动提供等离子体驱动。

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