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1. 发明公开

EP2994798A1 ALIGNMENT SENSOR, LITHOGRAPHIC APPARATUS AND ALIGNMENT METHOD 有权
标题翻译：方向感应器，平版印刷装置对和排列进程
公开(公告)号：EP2994798A1
公开(公告)日：2016-03-16
申请号：EP14724011.3
申请日：2014-04-25
申请人： ASML Netherlands B.V.
发明人： DEN BOEF, Arie, Jeffrey , MATHIJSSEN, Simon, , TINNEMANS, Patricius
IPC分类号： G03F9/00
CPC分类号： G03F7/70141 , G01B11/272 , G03F9/7069 , G03F9/7088 , G03F9/7092
摘要： Disclosed is an alignment sensor comprising, and associated method comprising an illumination source, such as a white light source, having an illumination grating operable to diffract higher order radiation at an angle dependent on wavelength; and illumination optics to deliver the diffracted radiation onto an alignment grating from at least two opposite directions. For every component wavelength incident on the alignment grating, and for each direction, the zeroth diffraction order of radiation incident from one of the two opposite directions overlaps a higher diffraction order of radiation incident from the other direction. This optically amplifies the higher diffraction orders with the overlapping zeroth orders.

2. 发明公开

EP2648044A3 Measurement apparatus and measurement method 审中-公开
标题翻译：测定装置和测量方法
公开(公告)号：EP2648044A3
公开(公告)日：2015-06-17
申请号：EP13158297.5
申请日：2013-03-08
申请人： Canon Kabushiki Kaisha
发明人： Okuda, Hiroshi
IPC分类号： G03F9/00 , G01B9/02
CPC分类号： G01B11/14 , G01B9/02002 , G01B9/02003 , G01B9/02007 , G01B2290/60 , G01B2290/70 , G03F9/7023 , G03F9/7092
摘要： A measurement apparatus, which measures a surface position of an object (111) by detecting interfering light between measurement light reflected by the object and reference light reflected by a reference surface, includes: a detector (114) configured to detect the interfering light to output an interference signal; and a processor (115) configured to obtain the surface position based on a sine signal and a cosine signal which are obtained from the interference signal output from the detector and have a phase corresponding to an optical path length difference between the measurement light and the reference light. The processor includes a correction processing unit (211, 212, 213, 214) configured to correct the sine signal and the cosine signal to reduce frequency noise components contained in the sine signal and the cosine signal.

3. 发明公开

EP1431833A3 Lithographic apparatus, device manufacturing method, and device manufactured thereby 审中-公开
标题翻译：光刻设备，用于生产制品和制造制品的方法
公开(公告)号：EP1431833A3
公开(公告)日：2009-04-15
申请号：EP03079077.8
申请日：2003-12-15
申请人： ASML Netherlands B.V.
发明人： Den Boef, Arie Jeffrey , Mos, Everhardus Cornelis , van der Schaar, Maurits
IPC分类号： G03F9/00
CPC分类号： G03F9/7076 , G03F9/7011 , G03F9/7019 , G03F9/7084 , G03F9/7088 , G03F9/7092
摘要： During device manufacturing a projection beam is projected onto a substrate through a mask. The substrate is aligned with the mask using an alignment structure on the substrate. Properties of the light reflected from the alignment structure are used to determine the relative position of the substrate. Preceding processing of the substrate potentially causes errors in the position determined from the reflected light. measurement of properties of the reflected light are used to determine the size of a correction that is needed to correct for the errors caused by processing of the substrate. Preferably parameters of a physical model of the alignment structure are estimated from the reflected light and used to determine the correction. Preferably, the amplitudes of a plurality of different diffraction peaks are measured to determine the correction.

4. 发明公开

EP1930777A2 Exposure apparatus 有权
标题翻译： Belichtungsgerät
公开(公告)号：EP1930777A2
公开(公告)日：2008-06-11
申请号：EP07122285.5
申请日：2007-12-04
申请人： Canon Kabushiki Kaisha
发明人： Egashira, Shinichi
IPC分类号： G03F9/00
CPC分类号： G03F9/7003 , G03F9/7046 , G03F9/7076 , G03F9/7088 , G03F9/7092
摘要： An exposure apparatus exposes each of a plurality of regions arranged on a substrate. The apparatus includes a processor (9) configured to i) cause a measurement device (7, 8) to acquire an image signal of an alignment mark formed in each of plural regions which are at least a part of the plurality of regions and to measure a position of the alignment mark under a plurality of measurement conditions, ii) calculate a feature value of the signal acquired with respect to each of the plural regions under each of the plurality of measurement conditions, and iii) calculate, with respect to each of the plurality of measurement conditions, a coefficient of a transformation equation which transforms a coordinate of a designed position of the alignment mark to a value that approximate the feature value corresponding to the designed position, and a console (100) configured to display information of the calculated coefficients.
摘要翻译：曝光装置暴露布置在基板上的多个区域中的每一个。该装置包括：处理器（9），其被配置为：i）使得测量装置（7,8）获取形成在多个区域中的至少一部分的多个区域中的每一个中形成的对准标记的图像信号，并且测量在多个测量条件下的对准标记的位置，ii）计算在多个测量条件中的每一个下针对多个区域中的每一个获取的信号的特征值，以及iii）针对每个所述多个测量条件，将所述对准标记的设计位置的坐标变换为与所述设计位置对应的所述特征值近似的值的变换方程式的系数，以及配置为显示所述对准标记的信息的控制台计算系数。

5. 发明公开

EP1326141A3 Alignment method and parameter selection method 审中-公开
标题翻译：对准方法和参数的选择过程
公开(公告)号：EP1326141A3
公开(公告)日：2008-05-21
申请号：EP03250015.9
申请日：2003-01-06
申请人： CANON KABUSHIKI KAISHA
发明人： Haginiwa, Kuniyasu
IPC分类号： G03F9/00
CPC分类号： G03F9/7092
摘要： An object of this invention is to provide an alignment method which can execute accurate alignment using only one kind of alignment detection apparatus. In order to achieve this object, an alignment method of aligning an object to be aligned by measuring an alignment mark position on the object includes detecting the alignment mark on the object, obtaining the position data of the alignment mark on the basis of the detected mark information, extracting the feature amount of the alignment mark on the basis of the mark information, obtaining the correction value of the position data on the basis of the extracted feature amount of the alignment mark, and aligning the object on the basis of position information corrected using the correction value.

6. 发明授权

EP1076264B1 Multi-channel grating interference alignment system 有权
标题翻译：使用干涉光栅多通道对齐
公开(公告)号：EP1076264B1
公开(公告)日：2006-08-30
申请号：EP00115757.7
申请日：2000-07-21
申请人： ASML Holding N.V.
发明人： Stanton, Stuart T.
IPC分类号： G03F9/00
CPC分类号： G03F9/7065 , G03F9/70 , G03F9/7092

7. 发明公开

EP1076264A3 Multi-channel grating interference alignment sensor 有权
标题翻译：使用干涉光栅的多通道对准传感器
公开(公告)号：EP1076264A3
公开(公告)日：2005-03-02
申请号：EP00115757.7
申请日：2000-07-21
申请人： SVG LITHOGRAPHY SYSTEMS, INC.
发明人： Stanton, Stuart T.
IPC分类号： G03F9/00
CPC分类号： G03F9/7065 , G03F9/70 , G03F9/7092
摘要： An alignment sensor (30) having a fixed reference grating (60) and a movable wafer grating (68) receiving electromagnetic radiation from a coherent illumination source (34). The illumination source (34) is split into two beams by a beamsplitter (50). One beam is directed to a fixed reference grating (60) and the diffracted orders (64A, 64B, 64C, 64D) are collected. The other beam from the beamsplitter (50) is directed to a movable wafer grating (68). The diffracted orders (70A, 70B, 70C, 70D) from the movable wafer grating (68) are collected and caused to interfere with the diffracted orders from the fixed reference grating (60), causing a phase shift indicative of the wafer movement or misalignment with respect to the fixed reference grating (60). Multiple channels having discrete wavelengths or colors are used to optimize detection and alignment irrespective of wafer processing variables. A polarization fixture (38) on the illumination source (34) and a central polarizing portion (52) on the beamsplitter (50) is used to provide contrast optimization, or alternately a latent image metrology mode. The alignment sensor improves alignment accuracy irrespective of processing variables and provides flexibility improving efficiency in the manufacture of semiconductor devices.

8. 发明公开

EP1006413A3 Alignment method and exposure apparatus using the same 有权
标题翻译：相同的对准和曝光装置使用
公开(公告)号：EP1006413A3
公开(公告)日：2005-01-26
申请号：EP99309585.0
申请日：1999-11-30
申请人： CANON KABUSHIKI KAISHA
发明人： Ina, Hideki, Canon Kabushiki Kaisha , Yoshii, Minoru, Canon Kabushiki Kaisha , Hasegawa, Masanobu, Canon Kabushiki Kaisha , Satoh, Takashi, Canon Kabushiki Kaisha
IPC分类号： G03F9/00
CPC分类号： G03F9/7061 , B82Y10/00 , G03F9/7076 , G03F9/7084 , G03F9/7092
摘要： An alignment method for aligning first and second objects, in an exposure apparatus for transferring a pattern of the first object onto the second object as being coated with a resist, includes a process of producing an alignment offset value related to an alignment mark forming region on the second object, after formation of the resist coating thereon, and a process of aligning the first object with the second object as being coated with the resist, in the exposure apparatus, on the basis of the offset value as produced.

9. 发明公开

EP1150249A1 MARK DETECTING METHOD, EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, MARK DETECTOR, EXPOSURE APPARATUS, AND DEVICE 审中-公开
标题翻译：用于确定品牌，曝光方法，用于生产部件，标检测器，曝光装置及零件
公开(公告)号：EP1150249A1
公开(公告)日：2001-10-31
申请号：EP99931487.5
申请日：1999-07-22
申请人： Nikon Corporation
发明人： NAKAJIMA, Shin-ichi Niki Corporation
IPC分类号： G06T7/00 , G01B11/00 , H01L21/027
CPC分类号： G03F9/7092 , G03F9/70 , G03F9/7088
摘要： The object of the present invention is to provide a mark detection method, an exposure method, a device manufacturing method, a mark detection apparatus, an exposure apparatus, and a device manufactured by the use of the exposure apparatus, which are capable of reducing a position measurement error in a short time even in the case where a sampling interval must be set to about 0.2 times or more of a lower limit of a minimum periodic component. In the present invention, a mark formed on an object is irradiated with a detection beam, an image of the mark is picked up through an image-forming system, the image of the mark formed on an image pickup device is converted into an electrical image signal, a signal related to the image signal is output at predetermined sampling intervals, and a signal related to the image signal is interpolated in a cycle equal to or less than the predetermined sampling interval.
摘要翻译：本发明的目的是提供一种标记检测方法中，在曝光方法中，一种器件制造方法，标记检测装置，曝光装置，以及通过使用曝光装置的，其能够降低制造设备在即使在采样间隔必须设定为最小周期性分量的下限为约0.2倍以上的情况下短的时间位置的测量误差。在本发明中，形成在到对象的标记上照射检测光束，所述标记的图像通过图像形成系统拾起，形成在图像拾取器件上的标记的图像在电图像转换成信号，与图像信号的信号是在预定的采样间隔输出，并且与所述图像信号的信号在比所述预定采样间隔等于或小于一个周期被内插。

10. 发明公开

EP1090329A1 ALIGNMENT SIMULATION 审中-公开
标题翻译：定向仿真
公开(公告)号：EP1090329A1
公开(公告)日：2001-04-11
申请号：EP99920243.5
申请日：1999-04-29
申请人： NIKON CORPORATION
发明人： COON, Paul, Derek , CHAU, Henry, Kwok, Pang , AIYER, Arun, Ananth
IPC分类号： G03B27/42 , G03B27/58
CPC分类号： G03F9/7092 , G03F9/7076
摘要： An alignment simulation method simulates the signal waveform for an alignment mark using various alignment methods as well as the signal strength for an alignment mark, which is useful in optimizing the thickness of one or more layers as well as the geometry of the mark. The simulation of signal strength is also useful in optimizing the thickness of a layer for artifact wafers. The alignment simulation method includes accurately modeling the alignment mark, including one or more layers of various thicknesses and materials. The accurate modeling of the alignment mark includes such things as smoothing regions of the alignment mark and generating lateral shifts of the layers. The model of the alignment mark is a series of small pixels, each including the thickness of the layers and the layers indices of refraction. Using scalar diffraction, a complex reflectivity is generated for each pixel and a fast fourier transform is performed on the series of pixels. The results of the fast fourier transform are used to simulate the diffraction intensities for the alignment mark alignment systems, such as LIA or LSA as well as the signal waveforms. The LSA signal waveform, however, requires additional modeling of the alignment mark. An FIA image is generated by removing appropriate orders from the fast fourier transform result and performing an inverse fast fourier transform and repeating the process at different light wavelengths and illumination angles. The signal strength is the maximum value of the image minus the minimum.

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