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1. 发明公开

EP3346486A1 EXPOSURE METHOD AND EXPOSURE APPARATUS, AND SEMICONDUCTOR DEVICE MANUFACTURING METHODS 审中-公开
公开(公告)号：EP3346486A1
公开(公告)日：2018-07-11
申请号：EP18157586.1
申请日：2005-11-18
申请人： Nikon Corporation
发明人： Yasuda, Masahiko , Sugihara, Taro
IPC分类号： H01L21/027 , G01B11/00 , G03F7/20 , H01L21/68
CPC分类号： G03F7/70341 , G03F7/70691 , G03F7/707 , G03F7/70725 , G03F7/70775 , G03F7/70975 , G03F9/7011 , G03F9/7088 , Y10T29/49002
摘要： A part of a plate (50) of a predetermined shape detachably mounted on a moving body (WST) is detected by an alignment system (ALG) while the position of the moving body is measured by a measurement unit (18 or the like) that sets a movement coordinate system of the movement body, and based on the detection results and the measurement results of the measurement unit corresponding to the detection results, position information of an outer periphery edge of the plate (50) is obtained. Therefore, even if there are no alignment marks (fiducial marks) on the moving body (WST) for position measurement, the position of the plate, or in other words, the position of the moving body can be controlled on the movement coordinate system set by the measurement unit, based on the position information of the outer periphery edge of the plate.

2. 发明公开

EP3223075A2 MEASUREMENT METHOD, MEASUREMENT APPARATUS, LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING ARTICLE 有权
标题翻译：测量方法，测量装置，光刻设备和制造物品的方法
公开(公告)号：EP3223075A2
公开(公告)日：2017-09-27
申请号：EP17159532.5
申请日：2017-03-07
申请人： Canon Kabushiki Kaisha
发明人： TSUJIKAWA, Takuro
IPC分类号： G03F9/00
CPC分类号： G06T7/0004 , G03F9/7011 , G06T7/11 , G06T2207/30148
摘要： The present invention provides a measurement method of measuring a rotational shift amount of pattern regions arranged on a substrate with respect to a reference portion provided at an outer edge of the substrate, including obtaining a first image by capturing a target region including a target object on the substrate during detecting a position of the reference portion while rotating the substrate, obtaining a second image by capturing the target object in a state in which the substrate remains still, obtaining a third image indicating a difference between the first image and the second image by correcting the second image with the first image, and obtaining a position of the target object based on the third image and obtaining the rotational shift amount of the pattern regions with respect to the reference portion based on the obtained position of the target object.
摘要翻译：本发明提供一种测量方法，其测量布置在基板上的图案区域相对于设置在基板的外边缘处的基准部分的旋转移位量，包括：通过拍摄包括目标对象的目标区域来获得第一图像所述基板在旋转所述基板的同时检测所述基准部分的位置期间，通过在所述基板保持静止的状态下捕获所述目标物体而获得第二图像，通过获得表示所述第一图像与所述第二图像之间的差异的第三图像，利用第一图像校正第二图像，并且基于第三图像获得目标物体的位置，并且基于获得的目标物体的位置获得图案区域相对于参考部分的旋转偏移量。

3. 发明公开

EP3048637A1 MEASUREMENT METHOD, MEASUREMENT APPARATUS, EXPOSURE METHOD, AND EXPOSURE APPARATUS 失效
标题翻译： BELICHTUNGSVORRICHTUNG UND BELICHTUNGSVERFAHREN
公开(公告)号：EP3048637A1
公开(公告)日：2016-07-27
申请号：EP15199248.4
申请日：2005-04-20
申请人： Nikon Corporation
发明人： Kobayashi, Mitsuru , Yasuda, Masahiko
IPC分类号： H01L21/027 , G03F9/00
CPC分类号： G03F9/7046 , G03F9/7003 , G03F9/7011 , G03F9/7019 , G03F9/7084
摘要： To perform high-speed and highly accurate measurement by setting desired measuring conditions for each measuring object. In an alignment sensor of exposure apparatus, in the case of performing position measurement for a plurality of sample shots, measurement is performed by changing the measuring conditions, in response to a measuring axis direction, a mark or a layer whereupon a mark to be measured exists. At that time, for the measuring objects to be measured under the same measuring conditions, for example, a position in a Y axis direction and a position in an X axis direction, measurement is continuously performed. When the measuring condition is changed, a baseline value is remeasured. The changeable measuring conditions are wavelength of measuring light, use and selection of a retarder, NA and σ of an optical system, a light quantity of measuring light, illumination shape, signal processing algorithm, etc.
摘要翻译：通过设置每个测量对象的所需测量条件来执行高速和高精度的测量。在曝光装置的对准传感器中，在对多个采样拍摄进行位置测量的情况下，通过根据测量轴方向改变测量条件，进行测量的标记或层，进行测量存在。此时，对于在相同测量条件下测量的测量对象，例如，Y轴方向的位置和X轴方向的位置，连续进行测量。当测量条件改变时，将重新测量基准值。可变测量条件是测量光的波长，延迟器的使用和选择，光学系统的NA和Ã，测量光的光量，照明形状，信号处理算法等。

4. 发明公开

EP2131243A3 Lithographic apparatus and method for calibrating a stage position 有权
标题翻译：一种光刻设备和用于支撑台的位置的校准方法
公开(公告)号：EP2131243A3
公开(公告)日：2012-04-11
申请号：EP09161522.9
申请日：2009-05-29
申请人： ASML Netherlands B.V.
发明人： Aarts, Igor , Geerke, Johan , Van der Pasch, Engelbertus , De Jong, Frederik , Van de Grift, Marc
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F9/7076 , G03F7/70516 , G03F7/70616 , G03F9/7011 , G03F9/7019 , H01L21/02271
摘要： A detection method for detecting a property of an extended pattern formed by at least one line generally extending in a first direction. The extended pattern is formed on a substrate or on a substrate table and preferably extends over a length of at least 50x the width of the line. The extended pattern is focus sensitive. The detection method includes moving the substrate table in a first direction and measuring along that first direction a property of the extended pattern. The property can be a result of a physical property of the extended pattern in a second direction perpendicular to the first direction. In a next step a calibration of the substrate table position can be derived from the measured position of the extended pattern.

5. 发明授权

EP1744217B1 Method of selecting a grid model for correcting grid deformations in a lithographic apparatus and lithographic assembly using the same 有权
标题翻译：在光刻组件选择网格模型用于在光刻设备中校正栅网的变形，并使用相同的方法
公开(公告)号：EP1744217B1
公开(公告)日：2012-03-14
申请号：EP06116659.1
申请日：2006-07-05
申请人： ASML Netherlands B.V.
发明人： Simons, Hubertus Johannes Gertrudus , Megens, Henricus Johannes Lambertus , Mos, Everhardus Cornelis , Verstappen, Leonardus Henricus Marie , Werkman, Roy , Verhoeven, Henricus Jacobus Maria
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F9/7003 , G03F7/70516 , G03F7/70616 , G03F7/70633 , G03F9/7011 , G03F9/7019

6. 发明授权

EP1413928B1 Apparatus and method for scanning exposure 失效
标题翻译：装置和方法，用于扫描
公开(公告)号：EP1413928B1
公开(公告)日：2011-05-11
申请号：EP03078743.6
申请日：1996-07-30
申请人： CANON KABUSHIKI KAISHA
发明人： Yamada, Yuichi , Uzawa, Shigeyuki
IPC分类号： G03F9/00 , G03F7/20
CPC分类号： G03F9/7026 , G03F7/70358 , G03F7/70716 , G03F7/70725 , G03F9/7011

7. 发明授权

EP1918777B1 Lithographic apparatus and method 有权
标题翻译：光刻设备和方法
公开(公告)号：EP1918777B1
公开(公告)日：2011-02-23
申请号：EP07075929.5
申请日：2007-10-26
申请人： ASML Netherlands BV
发明人： Loopstra, Erik Roelof , Onvlee, Johannes
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F7/70775 , G03F1/42 , G03F1/44 , G03F7/707 , G03F9/7011

8. 发明公开

EP2131245A2 Lithographic apparatus and its focus determination method 审中-公开
标题翻译： Lithografische Vorrichtung und deren Fokusbestimmungsverfahren
公开(公告)号：EP2131245A2
公开(公告)日：2009-12-09
申请号：EP09161548.4
申请日：2009-05-29
申请人： ASML Netherlands BV
发明人： Hofmans, Gerardus , Segers, Bart
IPC分类号： G03F9/00 , G03F7/20
CPC分类号： G03F9/7076 , G03F7/70516 , G03F7/70616 , G03F9/7011 , G03F9/7019 , H01L21/02271
摘要： A detection method for detecting a property of an extended pattern formed by at least one line generally extending in a first direction. The extended pattern is formed on a substrate or on a substrate table and preferably extends over a length of at least 50x the width of the line. The extended pattern is focus sensitive. The detection method includes moving the substrate table in a first direction and measuring along that first direction a property of the extended pattern. The property can be a result of a physical property of the extended pattern in a second direction perpendicular to the first direction. In a next step a calibration of the substrate table position can be derived from the measured position of the extended pattern.
摘要翻译：一种用于检测由通常沿第一方向延伸的至少一条线形成的延伸图案的特性的检测方法。延伸图案形成在衬底或衬底台上，并且优选地在线的宽度的至少50倍的长度上延伸。扩展模式是焦点敏感的。所述检测方法包括沿第一方向移动所述衬底台并沿着所述第一方向测量所述延伸图案的特性。该属性可以是在垂直于第一方向的第二方向上延伸图案的物理特性的结果。在下一步骤中，可以从扩展图案的测量位置导出衬底台位置的校准。

9. 发明公开

EP1755152A4 MEASURING METHOD, MEASURING EQUIPMENT, EXPOSING METHOD AND EXPOSING EQUIPMENT 失效转让
标题翻译：测量方法，测量曝光的方法及曝光装置
公开(公告)号：EP1755152A4
公开(公告)日：2009-10-28
申请号：EP05734605
申请日：2005-04-20
申请人： NIPPON KOGAKU KK
发明人： KOBAYASHI MITSURU , YASUDA MASAHIKO
IPC分类号： H01L21/027 , G03F9/00
CPC分类号： G03F9/7046 , G03F9/7003 , G03F9/7011 , G03F9/7019 , G03F9/7084
摘要： To perform high-speed and highly accurate measurement by setting desired measuring conditions for each measuring object. In an alignment sensor of exposure apparatus, in the case of performing position measurement for a plurality of sample shots, measurement is performed by changing the measuring conditions, in response to a measuring axis direction, a mark or a layer whereupon a mark to be measured exists. At that time, for the measuring objects to be measured under the same measuring conditions, for example, a position in a Y axis direction and a position in an X axis direction, measurement is continuously performed. When the measuring condition is changed, a baseline value is remeasured. The changeable measuring conditions are wavelength of measuring light, use and selection of a retarder, NA and Ã of an optical system, a light quantity of measuring light, illumination shape, signal processing algorithm, etc.

10. 发明授权

EP1804126B1 An optical metrology system and metrology mark characterization method 有权
标题翻译：光学计量系统和表征方法，用于计量标记
公开(公告)号：EP1804126B1
公开(公告)日：2009-02-04
申请号：EP06256399.4
申请日：2006-12-15
申请人： ASML Netherlands B.V.
发明人： Van Der AA, Nicolaas Petrus , Den Boef, Arie Jeffrey , Mattheij, Robert Martinus Maria , Ter Morsche, Henricus Gerhardus
IPC分类号： G03F9/00
CPC分类号： G03F9/7049 , G03F9/7011 , G03F9/7019 , G03F9/7076 , G03F9/7092

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