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1. 发明公开

EP3140697A1 ENCLOSURE FOR A TARGET PROCESSING MACHINE 审中-公开
标题翻译： GEHÄUSEFÜREINE ZIELBEARBEITUNGSMASCHINE
公开(公告)号：EP3140697A1
公开(公告)日：2017-03-15
申请号：EP15728208.8
申请日：2015-05-01
申请人： Mapper Lithography IP B.V.
发明人： VIJVERBERG, Joep Gerard , PLANDSOEN, Laurens Vincent , VAN GELDER, Bas , DE BOER, Guido , DANSBERG, Michel Pieter
IPC分类号： G03F7/20
CPC分类号： B25J11/00 , G03F7/7075 , G03F7/70808 , G03F7/70841 , G03F9/7096 , H01J37/16 , H01J37/3177 , H01J2237/024 , H01J2237/166 , H01L21/6719 , H01L21/67225 , H01L21/67775
摘要： The invention relates to an assembly (1) for enclosing a target processing machine. The assembly comprises an enclosure (2) and a transfer unit (3). The enclosure comprises a base plate (21) for arranging said target processing machine thereon, side wall panels (22), which are fixed to said base plate, and a top wall panel (23) which is fixed to said side wall panels. In addition, the enclosure comprises an access opening (24) in a side wall of the enclosure. The transfer unit comprising one or more transfer elements (31) for moving the transfer unit with respect to the base plate. The transfer unit further comprises a door panel (32) which is arranged for closing the access opening, wherein the door panel is movably mounted to the transfer unit by means of a flexible coupling (33) which allows a movement of the door panel with respect to the transfer unit at least in a direction towards and/or away from the enclosure.
摘要翻译：本发明涉及用于封闭目标加工机器的组件。组件包括外壳和转移单元。外壳包括用于在其上布置所述目标处理机的基板，固定到所述基板的侧壁板和固定到所述侧壁板的顶壁板。此外，外壳包括在外壳的侧壁中的进入开口。传送单元包括用于相对于基板移动传送单元的一个或多个传送元件。传送单元还包括门板，其被布置成用于关闭进入开口，其中门板通过柔性联接件可移动地安装到传送单元，该柔性联接器允许门板相对于传送单元至少移动在朝向和/或远离外壳的方向上。

2. 发明公开

EP2513961A2 CYLINDRICAL MAGNETIC LEVITATION STAGE AND LITHOGRAPHY 有权
标题翻译：曝光装置
公开(公告)号：EP2513961A2
公开(公告)日：2012-10-24
申请号：EP10837772.2
申请日：2010-10-28
申请人： Korea Electro Technology Research Institute
发明人： JEON, Jeong Woo , OH, Hyun Seok , CARAIANI, Mitica , CHUNG, Sung Il , KIM, Hyeon Taeg , LEE, Chang Rin , KIM, Jong Moon
IPC分类号： H01L21/68 , H01L21/027 , G03F7/20
CPC分类号： G03F7/70716 , G03F7/24 , G03F7/703 , G03F7/70725 , G03F7/70758 , G03F7/70791 , G03F7/70816 , G03F7/70825 , G03F7/70841 , H01L21/68
摘要： The present invention provides a cylindrical magnetic levitation stage and an exposure apparatus, which can form a nanoscale pattern of a large area directly on the surface of a large cylinder. The present invention provides an exposure apparatus including a new type of cylindrical magnetic levitation stage, which can levitate, rotate, and move a cylinder in the axial direction by the principle of magnetic levitation in a non-contact manner and form a nanoscale pattern on the surface of the cylinder, and a light source for irradiating light on the surface of the cylinder, thereby reducing the position error of the cylindrical magnetic levitation stage to a nanoscale size and correcting the error caused by mechanical processing in real time. Moreover, the present invention provides an exposure apparatus, which includes a differential vacuum means combined with the cylindrical magnetic levitation stage to create a partial vacuum environment between the light source and the surface of the cylinder, and thus it is possible to employ light sources such as X-rays, electron beams, extreme ultraviolet (EUV) rays, etc.

3. 发明公开

EP2181449A4 SYSTEM MANAGING GAS FLOW BETWEEN CHAMBERS OF AN EXTREME ULTRAVIOLET (EUV) PHOTOLITHOGRAPHY APPARATUS 有权
标题翻译：系统，用于调节玻璃流EUV光刻设备的照片室之间
公开(公告)号：EP2181449A4
公开(公告)日：2012-02-08
申请号：EP08795348
申请日：2008-08-15
申请人： CYMER INC
发明人： BYKANOV ALEXANDER N , BRANDT DAVID C , FOMENKOV IGOR C , PARTLO WILLIAM N
IPC分类号： G21G4/00
CPC分类号： G03F7/70916 , B82Y10/00 , G03F7/70033 , G03F7/70808 , G03F7/70841 , G03F7/70883 , G03F7/70908

4. 发明公开

EP2181449A1 SYSTEM MANAGING GAS FLOW BETWEEN CHAMBERS OF AN EXTREME ULTRAVIOLET (EUV) PHOTOLITHOGRAPHY APPARATUS 有权
标题翻译：调控系统的气流EUV光刻设备的照片室之间
公开(公告)号：EP2181449A1
公开(公告)日：2010-05-05
申请号：EP08795348.5
申请日：2008-08-15
申请人： Cymer, Inc.
发明人： BYKANOV, Alexander, N. , BRANDT, David, C. , FOMENKOV, Igor, C. , PARTLO, William, N.
IPC分类号： G21G4/00
CPC分类号： G03F7/70916 , B82Y10/00 , G03F7/70033 , G03F7/70808 , G03F7/70841 , G03F7/70883 , G03F7/70908
摘要： A gas flow management system may comprise a first and second enclosing walls at least partially surrounding first and second respective spaces; a system generating plasma in the first space, the plasma emitting extreme ultraviolet light; an elongated body restricting flow from the first space to the second space, the body at least partially surrounding a passageway and having a first open end allowing EUV light to enter the passageway from the first space and a second open end allowing EUV light to exit the passageway into the second space, the body shaped to establish a location having a reduced cross-sectional area relative to the first and second ends; and a flow of gas exiting an aperture, the aperture positioned to introduce gas into the passageway at a position between the first end of the body and the location having a reduced cross-sectional area.

5. 发明公开

EP2012348A1 EXPOSURE APPARATUS 审中-公开
标题翻译： BELICHTUNGSVORRICHTUNG
公开(公告)号：EP2012348A1
公开(公告)日：2009-01-07
申请号：EP07737040.1
申请日：2007-04-10
申请人： Nikon Corporation
发明人： KAWATA, Shintaro
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70858 , G03F7/70841
摘要： An exposure apparatus is equipped with a chamber, a dry-sealed vacuum pump, an evacuation duct and an infrared ray shielding section. The chamber accommodates components constituting the exposure apparatus therein. The dry-sealed vacuum pump evacuates gas in the chamber. The evacuation duct connects the chamber and the dry-sealed vacuum pump. The infrared ray shielding section is formed at least at an inlet part of the evacuation duct in the chamber or in the evacuation duct, and prevents incidence of infrared ray from the dry-sealed vacuum pump into the chamber.
摘要翻译：曝光装置配备有室，干式真空泵，排气管和红外线屏蔽部。该室容纳构成其中的曝光装置的部件。干密封的真空泵排出腔室中的气体。排气管连接室和干密封真空泵。红外线屏蔽部至少形成在室内或排气管内的排气管的入口部分，并且防止红外线从干式真空泵入射到室中。

6. 发明公开

EP1396758A3 Differential pumping system and exposure apparatus 有权
标题翻译：差动泵送装置和曝光装置
公开(公告)号：EP1396758A3
公开(公告)日：2008-09-24
申请号：EP03255177.2
申请日：2003-08-21
申请人： CANON KABUSHIKI KAISHA
发明人： Ohgushi, Nobuaki Canon Kabushiki Kaisha , Miyake, Akira Canon Kabushiki Kaisha , Hasegawa, Takayuki Canon Kabushiki Kaisha , Ito, Jun Canon Kabushiki Kaisha
IPC分类号： G03F7/20 , G21K1/04
CPC分类号： B82Y10/00 , G03F7/70033 , G03F7/70041 , G03F7/7055 , G03F7/70841 , G03F7/70916 , G21K1/043
摘要： A differential pumping system includes a first chamber for storing a light source that emits pulsed light, a first exhaust unit for exhausting said first chamber, a second chamber being connectible to the first chamber to receive the pulsed light, a second exhaust unit for exhausting said second chamber, and a connection control mechanism between the first and second chambers for connecting the first chamber to the second chamber when the pulsed light emits, and for disconnecting the first chamber from the second chamber when the pulsed light does not emit.

7. 发明公开

EP1756672A2 VACUUM SYSTEM FOR IMMERSION PHOTOLITHOGRAPHY 有权转让
标题翻译：不倒翁系统FUDR DIY IMMERSIONSFOTOLITHOGRAPHIE
公开(公告)号：EP1756672A2
公开(公告)日：2007-02-28
申请号：EP05747245.8
申请日：2005-06-06
申请人： The BOC Group plc
发明人： HARPHAM, Andrew John, c/o Boc Edwards , SHECHTER, Paul, John,c/o Boc Edwards , STOCKMAN, Paul, Alan
IPC分类号： G03F7/20 , B01D57/00
CPC分类号： G03F7/70858 , G03F7/70341 , G03F7/70841
摘要： A vacuum system for extracting a stream of a multi-phase fluid from a photo-lithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.
摘要翻译：用于从光刻工具提取多相流体流的真空系统包括用于从工具拉出流体的泵送装置和位于泵送装置上游的抽出罐，用于将从工具拉出的流体分离成气相和液相。泵送装置包括用于从罐中提取气体的第一泵和用于从罐中提取液体的第二泵。为了最小化从真空系统传回到工具内的流体的任何压力波动，压力控制系统通过调节罐内的液体和气体的量来保持罐中基本恒定的压力。

8. 发明公开

EP1628161A3 Lithographic apparatus and device manufacturing method 有权
公开(公告)号：EP1628161A3
公开(公告)日：2006-06-07
申请号：EP05254783.3
申请日：2005-07-29
申请人： ASML Netherlands B.V.
发明人： Cadee, Theodorus Petrus Maria , Jacobs, Johannes Henricus Wilhelmus , Ten Kate, Nicolaas , Loopstra, Erik Roelof , Van Meer, Aschwin Lodewijk Hendricus Johannes , Mertens, Jeroen Johannes Sophia Maria , De Mol, Christianus Gerardus Maria , Muitjens, Marcel Johannus Elisabeth Hubertus , Van der Net, Antonius Johannus , Ottens, Joost Jeroen , Quaedackers, Johannes Anna , Reuhman-Huisken, Maria Elisabeth , Stavenga, Marco Koert , Tinnemans, Patricius Aloysius Jacobus , Verhagen, Martinus Cornelis Maria , Verspaij, Jacobus Johannus Leonardus Hendricus , De Jong, Frederik Eduard , Goorman, Koen , Menchtchikov, Boris , Boom, Herman , Nihtianov, Stoyan , Moerman, Richard , Smeets, Martin Frans Pierre , Schoondermark, Bart Leonard Peter , Janssen, Franciscus Johannes Joseph , RIepen, Michel
IPC分类号： G03F7/20
CPC分类号： G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875
摘要： A lithographic apparatus comprising: an illumination system (IL) configured to condition a radiation beam (PB); a support (MT) constructed to support a patterning device (MA), the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table (WT) constructed to hold a substrate (W); a projection system (PL) configured to project the patterned radiation beam onto a target portion of the substrate; a liquid supply system (130) configured to at least partly fill a space (25) between a final element of said projection system and said substrate with liquid; a seal member (12) arranged substantially to contain said liquid within said space between said final element of the projection system and said substrate; and elements (30,50,60,120,140) to control and/or compensate for evaporation of immersion liquid from said substrate.

9. 发明公开

EP1455233A3 Processing method and system 审中-公开
标题翻译： Behandlungsverfahren und -vorrichtung
公开(公告)号：EP1455233A3
公开(公告)日：2006-02-22
申请号：EP04251332.5
申请日：2004-03-08
申请人： CANON KABUSHIKI KAISHA
发明人： Kawakami, Eigo
IPC分类号： G03F7/20 , H01L21/00
CPC分类号： G03F7/70808 , C23C14/566 , C23C16/54 , G03F7/70841 , G03F7/70858 , G03F7/70933 , H01L21/67017
摘要： A processing method uses a processing system which includes an atmosphere replacing chamber having first and second gate valves (3,4), and a chamber (1) that has an inside maintained in a reduced pressure or vacuum atmosphere and provides a predetermined process to an object, wherein the atmosphere replacing chamber (2) is connected to the chamber (1) through the first gate valve (3) and a space different from the chamber (1) through the second gate valve (4). The processing method includes the steps of exhausting the atmosphere replacing chamber (2) while introducing first gas below predetermined humidity to the atmosphere replacing chamber (2), and vacuum-pumping the atmosphere replacing chamber (2) after said exhausting step, by reducing an amount of the first gas to be introduced into the atmosphere replacing chamber (2).
摘要翻译：处理方法使用包括具有第一和第二闸阀（3,4）的气氛置换室和具有保持在减压或真空气氛中的内部的室（1）的处理系统，并且向其特征在于，所述气氛置换室（2）通过所述第一闸阀（3）与所述室（1）连接，并且通过所述第二闸阀（4）与所述室（1）不同的空间连接。该处理方法包括以下步骤：在第一气体低于预定湿度的同时将气氛置换室（2）排出到大气置换室（2），并且在所述排气步骤之后对所述气氛置换室（2）进行真空抽吸，待引入大气置换室（2）的第一气体的量。

10. 发明公开

EP1491954A1 Sealing assembly, lithographic projection apparatus, and device manufacturing method 审中-公开
标题翻译： Dichtungsanordnung，石版画家Projektionsapparat，和Verfahren zur Herstellung einer Vorrichtung
公开(公告)号：EP1491954A1
公开(公告)日：2004-12-29
申请号：EP03077014.3
申请日：2003-06-27
申请人： ASML Netherlands B.V.
发明人： Brewster, Barrie Dudley , Jacobs, Johannes Henricus Wilhelmus , Livesey, Robert Gordon
IPC分类号： G03F7/20 , F16J15/00
CPC分类号： G03F7/70808 , F16J15/04 , F16J15/443 , G03F7/70841
摘要： Sealing assembly for sealing a slit, wherein the assembly comprises sealing means extending substantially in a longitudinal slit direction for at least partially preventing particle transmission in a transversal slit direction (T), wherein the sealing means comprises vacuum pumping means (5).
The invention further provides a lithographic projection apparatus, comprising at least one vacuum chamber containing:

a substrate holder for holding at least one substrate;
patterning means for patterning a projection beam according to a desired pattern; and
projection means for projecting said patterned projection beam onto a target portion of said substrate.

The invention further provides a device manufacturing method.
摘要翻译：组件具有沿纵向狭缝方向延伸并包括真空抽吸单元的密封单元。泵送单元布置在切口的弯曲部分中，该狭缝使投射装置的两个部分（1,2）分离。泵送单元具有两个颗粒吸收单元，例如低温管，其在使得狭缝部分打开的方向上延伸。吸收单元吸收在狭缝端之间流动的颗粒。还包括以下独立权利要求：（a）具有密封组件的光刻投影装置（b）装置制造方法。

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