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1. 发明公开

EP1510872A3 Lithographic apparatus and device manufacturing method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：EP1510872A3
公开(公告)日：2005-05-25
申请号：EP04255118.4
申请日：2004-08-25
申请人： ASML Netherlands B.V.
发明人： Dierichs, Marcel Mathijs Theodore Marie , Donders, Sjoerd Nicolaas Lambertus , Jacobs, Johannes Henricus Wilhelmus , Jansen, Hans , Loopstra,Erik Roelof , Mertens, Jeroen Johannes Sophia Maria , Stavenga, Marco Koert , Streefkerk, Bob , Verhagen, Martinus Cornelis Maria , Seuntiens-Gruda, Lejla
IPC分类号： G03F7/20
CPC分类号： G03F7/70866 , B01D19/0031 , B01D61/025 , B01D61/24 , C02F1/04 , C02F1/20 , C02F1/28 , C02F1/283 , C02F1/32 , C02F1/42 , C02F1/441 , C02F2103/40 , G03F7/2041 , G03F7/70341
摘要： In a lithographic projection apparatus a liquid supply system maintains liquid in a space between a final element of the projection system and the substrate with a liquid confinement system. The liquid supply system further comprises a de-mineralizing unit, a distillation unit and a UV radiating source for the purification of immersion liquid. Chemicals may be added to the immersion liquid for the inhibition of lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms is reduced.
摘要翻译：在光刻投影设备中，液体供应系统利用液体限制系统将液体保持在投影系统的最终元件和衬底之间的空间中。液体供应系统还包括去矿化单元，蒸馏单元和用于净化浸没液体的UV辐射源。为了抑制生命形式生长，化学品可以被添加到浸没液体中，并且液体供应系统的组件可以由对可见光不透明的材料制成，使得生命形式的生长减少。

2. 发明公开

EP1783556A3 Lithographic apparatus and device manufacturing method 有权
公开(公告)号：EP1783556A3
公开(公告)日：2007-05-16
申请号：EP07000192.0
申请日：2005-08-05
申请人： ASML Netherlands B.V.
发明人： Kemper, Nicolaas Rudolf , Cox, Henrikus Herman Marie , Donders, Sjoerd Nicolass Lambertus , De Graaf, Roelof Frederik , Hoogendam, Christiaan Alexander , Ten Kate, Nicolaas , Mertens, Jeroen Johannes Sophia Maria , Van der Meulen, Frits , Teunissen, Franciscus Johannes Herman Maria , Van der Toorn, Jan-Gerard Cornelis , Verhagen, Martinus Cornelis Maria , Belfroid, Stefan Philip Christiaan , Smeulers, Johannes Petrus Maria
IPC分类号： G03F7/20
CPC分类号： G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
摘要： A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

3. 发明公开

EP1628161A2 Lithographic apparatus and device manufacturing method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：EP1628161A2
公开(公告)日：2006-02-22
申请号：EP05254783.3
申请日：2005-07-29
申请人： ASML Netherlands B.V.
发明人： Cadee, Theodorus Petrus Maria , Jacobs, Johannes Henricus Wilhelmus , Ten Kate, Nicolaas , Loopstra, Erik Roelof , Van Meer, Aschwin Lodewijk Hendricus Johannes , Mertens, Jeroen Johannes Sophia Maria , De Mol, Christianus Gerardus Maria , Muitjens, Marcel Johannus Elisabeth Hubertus , Van der Net, Antonius Johannus , Ottens, Joost Jeroen , Quaedackers, Johannes Anna , Reuhman-Huisken, Maria Elisabeth , Stavenga, Marco Koert , Tinnemans, Patricius Aloysius Jacobus , Verhagen, Martinus Cornelis Maria , Verspaij, Jacobus Johannus Leonardus Hendricus , De Jong, Frederik Eduard , Goorman, Koen , Menchtchikov, Boris , Boom, Herman , Nihtianov, Stoyan , Moerman, Richard , Smeets, Martin Frans Pierre , Schoondermark, Bart Leonard Peter , Janssen, Franciscus Johannes Joseph , RIepen, Michel
IPC分类号： G03F7/20
CPC分类号： G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875
摘要： A lithographic apparatus comprising: an illumination system (IL) configured to condition a radiation beam (PB); a support (MT) constructed to support a patterning device (MA), the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table (WT) constructed to hold a substrate (W); a projection system (PL) configured to project the patterned radiation beam onto a target portion of the substrate; a liquid supply system (130) configured to at least partly fill a space (25) between a final element of said projection system and said substrate with liquid; a seal member (12) arranged substantially to contain said liquid within said space between said final element of the projection system and said substrate; and elements (30,50,60,120,140) to control and/or compensate for evaporation of immersion liquid from said substrate.
摘要翻译： 1。一种光刻设备，包括：照射系统（IL），配置成调节辐射束（PB）; 被构造成支撑图案形成装置（MA）的支撑件（MT），所述图案形成装置能够在辐射束的横截面上赋予图案以形成图案化的辐射束; 衬底台（WT），构造成保持衬底（W）; 投影系统（PL），其经配置以将所述经图案化的辐射束投影到所述衬底的目标部分上; 液体供应系统（130），所述液体供应系统（130）被配置为用液体至少部分地填充所述投影系统的最终元件和所述衬底之间的空间（25）; 密封元件（12），基本上将所述液体容纳在所述投影系统的所述最终元件和所述衬底之间的所述空间内; 和元件（30,50,60,120,140）以控制和/或补偿来自所述衬底的浸没液体的蒸发。

4. 发明公开

EP1783556A2 Lithographic apparatus and device manufacturing method 有权
标题翻译： Lithographische Vorrichtung und Verfahren zur Herstellung eines Halbleiterartikels
公开(公告)号：EP1783556A2
公开(公告)日：2007-05-09
申请号：EP07000192.0
申请日：2005-08-05
申请人： ASML Netherlands B.V.
发明人： Kemper, Nicolaas Rudolf , Cox, Henrikus Herman Marie , Donders, Sjoerd Nicolass Lambertus , De Graaf, Roelof Frederik , Hoogendam, Christiaan Alexander , Ten Kate, Nicolaas , Mertens, Jeroen Johannes Sophia Maria , Van der Meulen, Frits , Teunissen, Franciscus Johannes Herman Maria , Van der Toorn, Jan-Gerard Cornelis , Verhagen, Martinus Cornelis Maria , Belfroid, Stefan Philip Christiaan , Smeulers, Johannes Petrus Maria
IPC分类号： G03F7/20
CPC分类号： G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
摘要： A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
摘要翻译：在浸没式光刻投影装置的液体去除系统中使用多孔构件来平滑不均匀的流动。跨越多孔构件的压差可以保持在多孔构件的起泡点以下，从而获得单相液体流。或者，多孔构件可以用于减少两相流中的不均匀性。

5. 发明公开

EP1736831A1 Lithographic apparatus and device manufacturing method 审中-公开
标题翻译： Lithografische Vorrichtung und Verfahren zur Herstellung einer Vorrichtung
公开(公告)号：EP1736831A1
公开(公告)日：2006-12-27
申请号：EP06253116.5
申请日：2006-06-15
申请人： ASML Netherlands B.V.
发明人： Jacobs, Johannes Henricus Wilhelmus , Ten Kate, Nicolaas , Leenders, Martinus Hendrikus Antonius , Loopstra, Erik Roelof , Verhagen, Martinus Cornelis Maria , Boom, Herman , Janssen, Franciscus Johannes Joseph , Bouchoms, Igor Petrus Maria , Kemper, Nicolaas Rudolf , Ottens, Joost Jeroen , Kök, Yücel , Van Es, Johannes
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/70716 , G03F7/70875
摘要： The present invention relates to methods and devices for maintaining the thermal equilibrium of a substrate and an immersion lithographic apparatus by having a timetable containing information regarding the position, speed and acceleration of the substrate; and an evaporation controller or condensation controller acting to decrease localized evaporation and/or increase localized condensation in response to the information in the timetable. Evaporation of water from the surface of the substrate cools it down, while condensing water on its bottom surface heats the substrate locally.
摘要翻译：本发明涉及通过具有包含关于衬底的位置，速度和加速度的信息的时间表来保持衬底和浸没式光刻设备的热平衡的方法和装置; 以及响应于时间表中的信息而起作用以减少局部蒸发和/或增加局部冷凝的蒸发控制器或冷凝控制器。从基材表面蒸发水将其冷却下来，同时冷凝其底部表面的水局部加热基材。

7. 发明授权

EP1510872B1 Lithographic apparatus and device manufacturing method 有权
标题翻译：石版画家Apparat和Verfahren zur Herstellung eines Artikels
公开(公告)号：EP1510872B1
公开(公告)日：2010-11-10
申请号：EP04255118.4
申请日：2004-08-25
申请人： ASML Netherlands B.V.
发明人： Dierichs, Marcel Mathijs Theodore Marie , Donders, Sjoerd Nicolaas Lambertus , Jacobs, Johannes Henricus Wilhelmus , Jansen, Hans , Loopstra, Erik Roelof , Mertens, Jeroen Johannes Sophia Maria , Stavenga, Marco Koert , Streefkerk, Bob , Verhagen, Martinus Cornelis Maria , Seuntiens-Gruda, Lejla
IPC分类号： G03F7/20
CPC分类号： G03F7/70866 , B01D19/0031 , B01D61/025 , B01D61/24 , C02F1/04 , C02F1/20 , C02F1/28 , C02F1/283 , C02F1/32 , C02F1/42 , C02F1/441 , C02F2103/40 , G03F7/2041 , G03F7/70341

8. 发明公开

EP1693708A2 Lithographic projection apparatus and device manufacturing method 有权
标题翻译： LithografischesProjektionsgerätund Verfahren zur Herstellung einer Vorrichtung
公开(公告)号：EP1693708A2
公开(公告)日：2006-08-23
申请号：EP06250757.9
申请日：2006-02-13
申请人： ASML Netherlands B.V.
发明人： Stavenga, Marco Koert , Jacobs, Johannes Henricus Wilhelmus , Jansen, Hans , Verhagen, Martinus Cornelis Maria
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/709
摘要： Various types of pressure regulating devices are disclosed to reduce a pressure gradient in a liquid supply system of a lithographic apparatus, the liquid supply system having a liquid confinement structure configured to at least partially confine a liquid between a projection system and a substrate table of the lithographic apparatus. A high pressure gradient may cause particulate contamination in the liquid supply system and/or liquid confinement structure. A pressure gradient can be reduced by, for example, the use of slow switching in one or more valves (20), a bleed flow (22) around or through one or more valves, diversion of liquid to a drain (24) rather than or in addition to switching a valve off, a pressure regulator or flow restrictor to prevent shock waves, and a buffer volume / damper to compensate for pressure fluctuation.
摘要翻译：公开了各种类型的压力调节装置，以减小光刻设备的液体供应系统中的压力梯度，液体供应系统具有液体限制结构，其被配置为至少部分地将液体限制在投影系统和基板台之间的液体光刻设备高压梯度可能导致液体供应系统和/或液体限制结构中的颗粒污染。压力梯度可以通过例如在一个或多个阀门（20）中使用缓慢的切换来减少，在一个或多个阀门周围或通过一个或多个阀门的排出流（22），将液体转移到排水管（24）而不是或者除了关闭阀门之外，也可以使用压力调节器或限流器来防止冲击波，以及缓冲容积/阻尼器来补偿压力波动。

9. 发明公开

EP1510872A2 Lithographic apparatus and device manufacturing method 有权
公开(公告)号：EP1510872A2
公开(公告)日：2005-03-02
申请号：EP04255118.4
申请日：2004-08-25
申请人： ASML Netherlands B.V.
发明人： Dierichs, Marcel Mathijs Theodore Marie , Donders, Sjoerd Nicolaas Lambertus , Jacobs, Johannes Henricus Wilhelmus , Jansen, Hans , Loopstra,Erik Roelof , Mertens, Jeroen Johannes Sophia Maria , Stavenga, Marco Koert , Streefkerk, Bob , Verhagen, Martinus Cornelis Maria , Seuntiens-Gruda, Lejla
IPC分类号： G03F7/20
CPC分类号： G03F7/70866 , B01D19/0031 , B01D61/025 , B01D61/24 , C02F1/04 , C02F1/20 , C02F1/28 , C02F1/283 , C02F1/32 , C02F1/42 , C02F1/441 , C02F2103/40 , G03F7/2041 , G03F7/70341
摘要： In a lithographic projection apparatus a liquid supply system maintains liquid in a space between a final element of the projection system and the substrate with a liquid confinement system. The liquid supply system further comprises a de-mineralizing unit, a distillation unit and a UV radiating source for the purification of immersion liquid. Chemicals may be added to the immersion liquid for the inhibition of lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms is reduced.

10. 发明公开

EP1503243A1 Lithographic apparatus, device manufacturing method, and device manufactured thereby 审中-公开
标题翻译：石版画家Apparat，Verfahren zur Herstellung eines Artikels und dabei hergesteller Artikel
公开(公告)号：EP1503243A1
公开(公告)日：2005-02-02
申请号：EP03077408.7
申请日：2003-07-31
申请人： ASML Netherlands B.V.
发明人： Verhagen, Martinus Cornelis Maria
IPC分类号： G03F7/20
CPC分类号： G03F7/70808 , G03F7/70883 , G03F7/70933 , G03F7/70975
摘要： In a lithographic projection apparatus the beam path should be free of gaseous material and condensed material that absorb the beam, or could damage the optical components under influence of the beam. To remove this type of material a purge gas is supplied to a chamber that contains at least part of the beam path. The purge gas is supplied at a normal flow rate to purge an unwanted substance from an atmosphere in the beam path while the beam is passed through the beam path. The flow rate is switched back from the normal flow rate to a lower flow rate when the chamber has to be opened for access. The lower flow rate is so high that condensation of the unwanted substance onto an optical element in the beam path is substantially prevented by the flow of purge gas at the further flow rate, but not generally so high as would be necessary to prevent significant absorption from the beam.
摘要翻译：在光刻投影装置中，光束路径应该不含吸收光束的气态材料和冷凝材料，或者可能在光束影响下损坏光学部件。为了去除这种类型的材料，吹扫气体被供应到包含至少一部分光束路径的室。吹扫气体以正常流速供应，以在光束通过光束路径时从光束路径中的大气中吹扫不想要的物质。当腔室必须打开以进入时，流量从正常流量切换回较低的流速。较低的流速是如此之高，使得不必要的物质在光束路径中的光学元件上的冷凝基本上被进一步流速下的吹扫气体的流动阻止，但通常不会如此大以防止显着的吸收梁。

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