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1. 发明公开

EP4361192A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMATION METHOD 审中-实审
公开(公告)号：EP4361192A1
公开(公告)日：2024-05-01
申请号：EP22828037.6
申请日：2022-03-31
申请人： SHIN-ETSU CHEMICAL CO., LTD.
发明人： MARUYAMA Hitoshi , HAYASHI Kumiko
IPC分类号： C08G59/20 , G03F7/004 , G03F7/038 , G03F7/075 , G03F7/20 , H05K3/28
CPC分类号： C08G59/20 , G03F7/004 , G03F7/038 , G03F7/075 , G03F7/20 , H05K3/28
摘要： Provided is a photosensitive resin composition comprising: (A) a silicone resin having an epoxy group and/or a phenolic hydroxyl group; (B) a photoacid generator represented by formula (B); and (C) a benzotriazole compound.

2. 发明公开

EP3255494A1 POSITIVE PHOTOSENSITIVE SILOXANE COMPOSITION, ACTIVE MATRIX SUBSTRATE, DISPLAY DEVICE, AND METHOD FOR PRODUCING ACTIVE MATRIX SUBSTRATE 审中-实审转让
标题翻译：正性光敏硅氧烷组合物，有源矩阵衬底，显示装置和生产有源矩阵衬底的方法
公开(公告)号：EP3255494A1
公开(公告)日：2017-12-13
申请号：EP16746667.1
申请日：2016-02-03
申请人： Sakai Display Products Corporation , AZ Electronic Materials Luxembourg S.à.r.l.
发明人： NODERA, Nobutake , SHINOZUKA, Akihiro , KOIWA, Shinji , KATO, Masahiro , MATSUMOTO, Takao , FUKE, Takashi , YOKOYAMA, Daishi , TANIGUCHI, Katsuto
IPC分类号： G03F7/023 , G02F1/1333 , G02F1/1368 , G03F7/075
CPC分类号： G03F7/075 , C08G73/08 , C08G77/04 , G02F1/1333 , G02F1/1368 , G03F7/023
摘要： The present invention provides a positive type photosensitive siloxane composition in which a film formed by the same has high heat resistance, high strength and high crack resistance, an active matrix substrate in which by-product is not generated, an occurrence of defects is suppressed, and an interlayer insulating film is easily formed at a low cost while having good transmittance, a display apparatus including the active matrix substrate, and a method of manufacturing the active matrix substrate. An active matrix substrate 30 includes a plurality of gate wirings 11 provided so as to extend parallel to each other on an insulating substrate 10, and a plurality of source wirings 12 provided so as to extend parallel to each other in a direction intersecting the respective gate wirings 11. An interlayer insulating film 14 and a gate insulating film 15 are interposed at portions including the intersecting portions of the gate wirings 11 and the source wirings 12, on a lower side of the source wiring 12. The interlayer insulating film 14 is formed using the positive type photosensitive siloxane composition without using a resist.
摘要翻译：本发明提供一种正型光敏硅氧烷组合物，其中由其形成的膜具有高耐热性，高强度和高抗裂性，其中不产生副产物的有源矩阵基板，抑制了缺陷的发生，以低成本容易地形成层间绝缘膜，同时具有良好的透射率，包括有源矩阵基板的显示装置以及有源矩阵基板的制造方法。有源矩阵基板30具备：在绝缘基板10上相互平行地延伸设置的多个栅极配线11;以及在与各栅极交叉的方向上相互平行地延伸设置的多个源极配线12 布线11.在源极布线12的下侧，在包括栅极布线11和源极布线12的交叉部分的部分处插入层间绝缘膜14和栅极绝缘膜15.层间绝缘膜14形成使用正型光敏硅氧烷组合物而不使用抗蚀剂。

3. 发明授权

EP2260351B1 NEGATIVE-WORKING LITHOGRAPHIC PRINTING PLATE PRECURSORS WITH IMPROVED ABRASION RESISTANCE 失效
标题翻译： WITH增加的磨损的负性工作平版印刷版原版
公开(公告)号：EP2260351B1
公开(公告)日：2012-02-08
申请号：EP09720351.7
申请日：2009-02-12
申请人： Eastman Kodak Company
发明人： HAUCK, Gerhard , SAVARIAR-HAUCK, Celin , DWARS, Udo , BAUMANN, Harald , STREHMEL, Bernd , SIMPSON, Christopher
IPC分类号： G03F7/004 , G03F7/075
CPC分类号： G03F7/075 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/04 , B41C2210/06 , B41C2210/10 , B41C2210/20 , B41C2210/22 , B41C2210/24 , B41C2210/266 , G03F7/0047
摘要： Negative-working imageable elements are prepared with radiation-sensitive imageable layers that contain surface-modified silica particles such as fumed silica particles and sol-gel silica particles, that are present in an amount of from about 1 to about 40 weight %, have an average particle size of from about 1 to about 500 nm, have surface hydroxy groups, and have a carbon content of from about 0.5 to about 15 weight % that is derived from surface hydrophobic groups having 1 to 30 carbon atoms. The presence of the surface-modified silica particles provides improved abrasion resistance, reduced tackiness, and various other desired properties.

4. 发明授权

EP1176468B1 Bi-couche de résine pour photolithographie dans l'extrême ultraviolet (EUV) et procédé de photolithogravure en extrême ultraviolet (EUV) 有权
标题翻译：双层光致抗蚀剂对极紫外辐射和用于远紫外光刻方法
公开(公告)号：EP1176468B1
公开(公告)日：2011-08-24
申请号：EP01401972.3
申请日：2001-07-23
申请人： Fahrenheit Thermoscope LLC
发明人： Schiltz, André
IPC分类号： G03F7/095 , G03F7/075
CPC分类号： G03F7/095 , G03F7/075

5. 发明授权

EP1802694B1 AQUEOUS DEVELOPABLE BENZOCYCLOBUTENE-BASED POLYMER COMPOSITION AND METHOD OF USE OF SUCH COMPOSITIONS 有权
标题翻译：水可显影聚合物组合物及其使用苯并环丁烯程序对这样的组合物
公开(公告)号：EP1802694B1
公开(公告)日：2010-04-28
申请号：EP05807386.7
申请日：2005-10-12
申请人： DOW GLOBAL TECHNOLOGIES INC.
发明人： SO, Ying, Hung , STARK, Edmund, J. , THRUSTON, Shellene, K. , BARANEK, Kayla, J. , LI, Yongfu
IPC分类号： C08K5/42 , C08L65/00 , G03F7/023 , G03F7/075 , G03F7/40
CPC分类号： C08K5/23 , C08K5/42 , G03F7/0226 , G03F7/0233 , G03F7/075 , G03F7/40 , C08L45/00
摘要： The invention is a composition comprising a curable arylcyclobutene based oligomer or polymer and a dissolution inhibitor which comprises a compound comprising at least two diazonaphthoquinone (DNQ) moieties each of which is pendant from different phenyl groups.

6. 发明公开

EP0998695A1 SEDIMENTATION STABILIZED RADIATION-CURABLE FILLED COMPOSITIONS 失效
标题翻译： SEDIMENTATIONSSTABILISIERTESTRAHLUNGSHÄRTBAREGEFÜLLTEZUSAMMENSETZUNGEN
公开(公告)号：EP0998695A1
公开(公告)日：2000-05-10
申请号：EP98939631.2
申请日：1998-07-11
申请人： Ciba Specialty Chemicals Holding Inc.
发明人： MELISARIS, Anastasios, Panayiotis , PANG, Thomas, Hsing
IPC分类号： G03C9/08 , G03F7/027
CPC分类号： G03F7/027 , B33Y10/00 , B33Y70/00 , G03F7/0037 , G03F7/075
摘要： The present invention relates to a process for the production of three-dimensional articles by stereolithography using a radiation-curable composition containing a mixture of at least one cationically polymerizable compound and/or at least one free radical polymerizable compound, at least one filler material, at least one photoinitiator for cationic and/or radical polymerizations and at least one antisedimentation agent. An organic viscosity stabilizer material soluble in the base resin may optionally be brought into contact with the composition. A filler material can be introduced in the composition in an effective amount sufficient to at least delay or prevent a significant viscosity increase. The present invention also relates to cured articles resulting from said processes and a process for preparing said compositions.
摘要翻译：本发明涉及使用含有至少一种阳离子聚合性化合物和/或至少一种自由基聚合性化合物，至少一种填料的混合物的放射线固化性组合物的立体光刻法来制造三维制品的方法，至少一种用于阳离子和/或自由基聚合的光引发剂和至少一种抗沉降剂。可以任选地使可溶于基础树脂的有机粘度稳定剂与组合物接触。填充材料可以以足以至少延迟或防止显着粘度增加的有效量引入组合物中。本发明还涉及由所述方法得到的固化制品和制备所述组合物的方法。

7. 发明授权

EP0642057B1 Photosensitive resin composition 有权
标题翻译：光敏树脂组合物
公开(公告)号：EP0642057B1
公开(公告)日：1998-11-25
申请号：EP94306413.9
申请日：1994-08-31
申请人： HITACHI CHEMICAL CO., LTD.
发明人： Hagiwara, Hideo , Kaji, Makoto , Nunomura, Masataka
IPC分类号： G03F7/037 , G03F7/038 , G03F7/075
CPC分类号： G03F7/0387 , C08G73/10 , G03F7/0125 , G03F7/037 , G03F7/038 , G03F7/075 , H05K3/4676 , Y10S430/106 , Y10S430/107

8. 发明公开

EP0484021A1 Resist composition 失效
标题翻译： Resistzusammensetzung。
公开(公告)号：EP0484021A1
公开(公告)日：1992-05-06
申请号：EP91309659.0
申请日：1991-10-18
申请人： NIPPON PAINT CO., LTD.
发明人： Ohata, Masatoshi , Yamamoto, Masaharu
IPC分类号： G03F7/039 , G03F7/075 , C08F2/50 , C08F20/18 , C08F12/22
CPC分类号： G03F7/039 , G03F7/075
摘要： The present invention provides a positive type resist composition which has excellent photosensitivity in light decomposition. The composition comprises;

(a) a polymer having at least 70 % of isotactic construction, prepared from polymerizable monomers, at least a portion of which is a (meth)acrylate monomer having a group selected from the class consisting of a t-butyl group, a benzyl group, an alpha-methylbenzyl group, an alpha, alpha-dimethylbenzyl group and a trityl group, and
(b) a photoactivator which generates an acid in response to a light irradiation.

The present invention also provides a resist composition into which, instead of the polymer (a), a polymer (c) is formulated which has at least 70 % of isotactic construction and is prepared from polymerizable monomers, at least a portion of which is a hydroxyl styrene selected from the class consisting of p-t-butoxycarbonyloxystyrene, p-t-butoxycarbonyloxy-alpha-methyl-styrene, t-butyl-p-vinyl benzoate and t-butyl-p-isopropenylphenyloxy acetate.
摘要翻译：本发明提供一种在光分解中具有优异的光敏性的正型抗蚀剂组合物。组合物包含（a）由可聚合单体制备的具有至少70％全同立构构型的聚合物，其至少一部分是（甲基）丙烯酸酯单体，其具有选自叔丁基，苄基，α-甲基苄基，α，α-二甲基苄基和三苯甲基，和（b）响应于光照射而产生酸的光活化剂。本发明还提供一种抗蚀剂组合物，代替聚合物（a），配制聚合物（c），其具有至少70％的全同立构构型，并由可聚合单体制备，其中至少一部分为选自对叔丁氧羰基氧基苯乙烯，对叔丁氧羰基氧基-α-甲基苯乙烯，叔丁基对乙烯基苯甲酸酯和叔丁基对异丙烯基苯氧基乙酸酯的羟基苯乙烯。

9. 发明公开

EP4421563A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMATION METHOD 审中-实审
公开(公告)号：EP4421563A1
公开(公告)日：2024-08-28
申请号：EP22883481.8
申请日：2022-10-14
申请人： Shin-Etsu Chemical Co., Ltd.
发明人： MARUYAMA, Hitoshi
IPC分类号： G03F7/075 , C08G59/26 , C08G77/48 , G03F7/004
CPC分类号： C08G59/26 , G03F7/075 , C08G77/48 , G03F7/004
摘要： Provided is a photosensitive resin composition that contains: (A) a silicone resin containing an acid-crosslinkable group; (B) an epoxy compound represented by formula (B); and (C) a photoacid generator.

(In the formula, R51-R55 each independently represent a hydrogen atom or a saturated hydrocarbyl group having 1-6 carbon atoms.)

10. 发明公开

EP4386037A1 SILPHENYLENE-SKELETON-CONTAINING POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND METHOD FOR MANUFACTURING OPTICAL SEMICONDUCTOR DEVICE 审中-实审
公开(公告)号：EP4386037A1
公开(公告)日：2024-06-19
申请号：EP22855730.2
申请日：2022-06-09
申请人： SHIN-ETSU CHEMICAL CO., LTD.
发明人： OMORI Hiroto , MARUYAMA Hitoshi
IPC分类号： C08G77/60 , C08G59/02 , C08G77/14 , C08G77/52 , C08G77/54 , G03F7/004 , G03F7/075 , G03F7/20
CPC分类号： C08G59/02 , C08G77/14 , C08G77/52 , C08G77/54 , C08G77/60 , G03F7/004 , G03F7/075 , G03F7/20
摘要： Provided is a polymer that includes a silphenylene skeleton, an isocyanuric acid skeleton, and a hydroxy-group-substituted alkyl ether skeleton in the main chain, and that includes an epoxy group in a side chain.

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