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1. 发明公开

EP2310909A1 NEGATIVE-WORKING IMAGING ELEMENTS AND METHODS OF USE 有权
标题翻译：相关的压力板光刻负工作平版印版前体，使用方法
公开(公告)号：EP2310909A1
公开(公告)日：2011-04-20
申请号：EP09788900.0
申请日：2009-07-13
申请人： Eastman Kodak Company
发明人： BAUMANN, Harold , DWARS, Udo , SIMPSON, Christopher , STREHMEL, Bernd , FLUGEL, Michael
IPC分类号： G03F7/033 , G03F7/11 , B41C1/10 , G03F7/031
CPC分类号： G03F7/031 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/10 , B41C2201/12 , B41C2201/14 , B41C2210/04 , B41C2210/06 , B41C2210/08 , B41C2210/20 , B41C2210/22 , B41C2210/24 , B41C2210/266 , G03F7/033 , G03F7/092 , G03F7/3035
摘要： Negative-working imageable elements such as lithographic printing plate precursors, include a free-radically polymerizable component, an initiator composition that is capable of generating free radicals sufficient to initiate polymerization of the free-radically polymerizable component upon exposure to imaging radiation in the presence of a radiation absorbing compound, a radiation absorbing compound, an aerobic free radical inhibitor, optionally a polymeric binder that is not a free radically polymerizable component, and an anaerobic free radical inhibitor. The molar ratio of the anaerobic free radical inhibitor to the aerobic free radical inhibitor is at least 1 :1. This combination of inhibitors provides increased shelf life and good latent image stability particularly when the element includes a polymeric topcoat layer that functions as an oxygen barrier.

2. 发明公开

EP2217970A1 IMAGEABLE ELEMENTS WITH COMPONENTS HAVING 1H-TETRAZOLE GROUPS 失效
标题翻译：具有1H-四唑基团的组分的可形成元素
公开(公告)号：EP2217970A1
公开(公告)日：2010-08-18
申请号：EP08856766.4
申请日：2008-11-21
申请人： Eastman Kodak Company
发明人： BAUMANN, Harald , DWARS, Udo , STREHMEL, Bernd , SIMPSON, Christopher , SAVARIAR-HAUCK, Celin , HAUCK, Gerhard
IPC分类号： G03F7/033 , B41C1/10
CPC分类号： G03F7/033 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , B41C2210/266 , Y10S430/121
摘要： Radiation-sensitive compositions and imageable elements include a polymeric or non-polymeric component in an imageable layer, which component includes 1H-tetrazole groups. The non-polymeric components can be radically polymerizable compounds. The polymeric components can have 1H-tetrazole groups that are pendant to the backbone. The use of such components in negative- or positive-working imageable elements provides high photospeed and improved developability for providing imaged and developed elements, such as lithographic printing plates that show improved chemical resistance and run length.
摘要翻译：辐射敏感组合物和可成像元件包括可成像层中的聚合物或非聚合物组分，该组分包括1H-四唑基团。非聚合物组分可以是可自由基聚合的化合物。聚合物组分可以具有悬垂在主链上的1H-四唑基团。在负像或正像工作的可成像元件中使用这些组件提供了高感光度和改进的可显影性以提供成像和显影元件，例如显示出改进的耐化学性和运行长度的平版印刷版。

3. 发明授权

EP1910896B1 PHOTOPOLYMER COMPOSITION SUITABLE FOR LITHOGRAPHIC PRINTING PLATES 有权
标题翻译：用于金属印刷板SUITABLE光聚合物
公开(公告)号：EP1910896B1
公开(公告)日：2009-09-02
申请号：EP06762358.7
申请日：2006-07-03
申请人： Eastman Kodak Company
发明人： BAUMANN, Harald , STREHMEL, Bernd , PIETSCH, Detlef , DWARS, Udo , EBHARDT, Tanja , DRABER, Axel
IPC分类号： G03F7/027 , B41M5/40
CPC分类号： G03F7/027 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/20 , B41C2210/22 , B41C2210/24 , B41M5/368 , B41M5/41 , B41M5/42 , B41M2205/40
摘要： Radiation-sensitive element comprising (a) a substrate and (b) a radiation-sensitive coating comprising (i) at least one component selected from photoinitiators and sensitizer/coinitiator systems which absorbs radiation of a wavelength in the range of 250 to 1,200 nm; (ii) at least one oligomer A of formula (I) wherein X1, X2 and X3 are independently selected from straight-chain or cyclic C4-C12 alkylene and C6-C10 arylene, a heterocyclic group, a heteroaromatic group and combinations of two or more of the above, R1, R2 and R3 are independently selected from (II) and (III) with the proviso that (1) n = 0 in at least one of the groups R1, R2 and R3, and (2) n > 2 in at least one of the groups R1, R2 and R3, and (3) at least one group R6 is different from H in formula (III).

4. 发明公开

EP2646876A1 DEVELOPER AND ITS USE TO PEPARE LITHOGRAPHIC PRINTING PLATES 审中-公开
标题翻译：开发商及其用途用于生产平版印刷版
公开(公告)号：EP2646876A1
公开(公告)日：2013-10-09
申请号：EP11802991.7
申请日：2011-11-30
申请人： Eastman Kodak Company
发明人： STREHMEL, Bernd , PIESTERT, Oliver , BAUMANN, Harald
IPC分类号： G03F7/32 , B41C1/10
CPC分类号： G03F7/322 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/04 , B41C2210/06 , B41C2210/08 , B41C2210/22 , B41C2210/24
摘要： A developer solution can be used to prepare lithographic printing plates from negative-working precursors. The developer solution has a pH of at least 4 and up to and including 11. It also comprises both an ethylene/propylene glycol block copolymer and either or both of a sugar alcohol or a mono- or oligosaccharide. This combination of components provides desired processing to provide lithographic printing plates that can be used for printing without any post-development treatments with other solutions.

5. 发明公开

EP2406687A1 NEGATIVE-WORKING IMAGEABLE ELEMENTS WITH OVERCOAT 有权
标题翻译：负性工作可成像元件DESCKSCHICHT
公开(公告)号：EP2406687A1
公开(公告)日：2012-01-18
申请号：EP10710473.9
申请日：2010-03-08
申请人： Eastman Kodak Company
发明人： SIMPSON, Christopher , BAUMANN, Harold , DWARS, Udo , STREHMEL, Bernd
IPC分类号： G03F7/09 , G03F7/11
CPC分类号： G03F7/092 , G03F7/11 , Y10T428/24802
摘要： Negative-working imageable element can be used to provide lithographic printing plates. The imageable element has a suitable radiation-sensitive imageable layer and a water-soluble overcoat disposed on the imageable layer. This overcoat comprises at least one poly(vinyl alcohol) having a saponification degree of at least 90%, an alkoxylation product of an alkanol, and either a 2-sulfonato succinic acid dialkylester or an alkoxylation product of a 1,4-butanediol.

6. 发明授权

EP2217450B1 PROCESSING OF LITHOGRAPHIC PRINTING PLATES WITH HYDROPHILIC POLYMER IN FINISHER SOLUTION 有权
标题翻译：处理与亲水性聚合物的平版印刷版在生产解
公开(公告)号：EP2217450B1
公开(公告)日：2011-06-15
申请号：EP08852201.6
申请日：2008-11-19
申请人： Eastman Kodak Company
发明人： STREHMEL, Bernd , SIMPSON, Christopher , PIESTERT, Oliver , BAUMANN, Harald
IPC分类号： B41N3/08 , G03F7/40
CPC分类号： B41N3/08 , G03F7/40
摘要： Process for the production of a lithographic printing plate, comprising (a) providing a lithographic printing plate precursor comprising (i) a substrate; (ii) a radiation-sensitive coating comprising one or more layers and (iii) optionally an oxygen-impermeable overcoat; (b) image-wise exposing the lithographic printing plate precursor to radiation of a wavelength to which the radiation-sensitive coating is sensitive; (c) optionally subjecting the image-wise exposed precursor to a preheat treatment and/or rinsing with water; (d) removing the non-image areas from the image-wise exposed precursor by means of an alkaline developer solution; (e) optionally subjecting the imaged precursor obtained in step (d) to rinsing with water; (f) treating the imaged lithographic printing plate obtained in step (d) or (e) with a finisher solution; and (g) optionally subjecting the finisher treated plate obtained in step (f) to at least one further process step selected from rinsing with water, drying and baking; characterized in that the finisher solution comprises 0.01 to 15 wt.%, based on the total weight of the finisher, of a hydrophilic polymer comprising: (ml) primary, secondary and/or tertiary amino groups, and (m2) acid groups selected from -COOH, -SO3H, -PO2H2 and PO3H2, and (m3) optionally alkylene oxide units -(CHR1-CH2-O)P-, wherein each R1 independently represents H or -CH3 and p is an integer from 1 to 50.

7. 发明公开

EP2260351A1 NEGATIVE-WORKING IMAGEABLE ELEMENTS WITH IMPROVED ABRASION RESISTANCE 失效
标题翻译： WITH增加的磨损的负性工作平版印刷版原版
公开(公告)号：EP2260351A1
公开(公告)日：2010-12-15
申请号：EP09720351.7
申请日：2009-02-12
申请人： Eastman Kodak Company
发明人： HAUCK, Gerhard , SAVARIAR-HAUCK, Celin , DWARS, Udo , BAUMANN, Harald , STREHMEL, Bernd , SIMPSON, Christopher
IPC分类号： G03F7/004 , G03F7/075
CPC分类号： G03F7/075 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/04 , B41C2210/06 , B41C2210/10 , B41C2210/20 , B41C2210/22 , B41C2210/24 , B41C2210/266 , G03F7/0047
摘要： Negative-working imageable elements are prepared with radiation-sensitive imageable layers that contain surface-modified silica particles such as fumed silica particles and sol-gel silica particles, that are present in an amount of from about 1 to about 40 weight %, have an average particle size of from about 1 to about 500 nm, have surface hydroxy groups, and have a carbon content of from about 0.5 to about 15 weight % that is derived from surface hydrophobic groups having 1 to 30 carbon atoms. The presence of the surface-modified silica particles provides improved abrasion resistance, reduced tackiness, and various other desired properties.

8. 发明授权

EP2406687B1 NEGATIVE-WORKING IMAGEABLE ELEMENTS WITH OVERCOAT 有权
标题翻译：负性工作可成像元件DESCKSCHICHT
公开(公告)号：EP2406687B1
公开(公告)日：2013-06-12
申请号：EP10710473.9
申请日：2010-03-08
申请人： Eastman Kodak Company
发明人： SIMPSON, Christopher , BAUMANN, Harald , DWARS, Udo , STREHMEL, Bernd
IPC分类号： G03F7/09 , G03F7/11
CPC分类号： G03F7/092 , G03F7/11 , Y10T428/24802

9. 发明授权

EP2310909B1 NEGATIVE-WORKING IMAGEABLE LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHODS OF USE, LITHOGRAPHIC PRINTING PLATE THEREOF 有权
标题翻译：相关的压力板光刻负工作平版印版前体，使用方法
公开(公告)号：EP2310909B1
公开(公告)日：2013-02-13
申请号：EP09788900.0
申请日：2009-07-13
申请人： Eastman Kodak Company
发明人： BAUMANN, Harold , DWARS, Udo , SIMPSON, Christopher , STREHMEL, Bernd , FLUGEL, Michael
IPC分类号： G03F7/033 , G03F7/09 , G03F7/031 , B41C1/10 , G03F7/30
CPC分类号： G03F7/031 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/10 , B41C2201/12 , B41C2201/14 , B41C2210/04 , B41C2210/06 , B41C2210/08 , B41C2210/20 , B41C2210/22 , B41C2210/24 , B41C2210/266 , G03F7/033 , G03F7/092 , G03F7/3035

10. 发明公开

EP2217450A1 PROCESSING OF LITHOGRAPHIC PRINTING PLATES WITH HYDROPHILIC POLYMER IN FINISHER SOLUTION 有权
标题翻译：处理与亲水性聚合物的平版印刷版在生产解
公开(公告)号：EP2217450A1
公开(公告)日：2010-08-18
申请号：EP08852201.6
申请日：2008-11-19
申请人： Eastman Kodak Company
发明人： STREHMEL, Bernd , SIMPSON, Christopher , PIESTERT, Oliver , BAUMANN, Harald
IPC分类号： B41N3/08 , G03F7/40
CPC分类号： B41N3/08 , G03F7/40
摘要： Process for the production of a lithographic printing plate, comprising (a) providing a lithographic printing plate precursor comprising (i) a substrate; (ii) a radiation-sensitive coating comprising one or more layers and (iii) optionally an oxygen-impermeable overcoat; (b) image-wise exposing the lithographic printing plate precursor to radiation of a wavelength to which the radiation-sensitive coating is sensitive; (c) optionally subjecting the image-wise exposed precursor to a preheat treatment and/or rinsing with water; (d) removing the non-image areas from the image-wise exposed precursor by means of an alkaline developer solution; (e) optionally subjecting the imaged precursor obtained in step (d) to rinsing with water; (f) treating the imaged lithographic printing plate obtained in step (d) or (e) with a finisher solution; and (g) optionally subjecting the finisher treated plate obtained in step (f) to at least one further process step selected from rinsing with water, drying and baking; characterized in that the finisher solution comprises 0.01 to 15 wt.%, based on the total weight of the finisher, of a hydrophilic polymer comprising: (ml) primary, secondary and/or tertiary amino groups, and (m2) acid groups selected from -COOH, -SO3H, -PO2H2 and PO3H2, and (m3) optionally alkylene oxide units -(CHR1-CH2-O)P-, wherein each R1 independently represents H or -CH3 and p is an integer from 1 to 50.

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