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1. 发明授权

EP2060600B1 Resist composition, method of forming resist pattern, novel compound, and acid generator 有权
标题翻译：抗蚀剂组合物，形成抗蚀剂图案的方法，新型化合物和产酸剂
公开(公告)号：EP2060600B1
公开(公告)日：2017-12-27
申请号：EP08168403.7
申请日：2008-11-05
申请人： TOKYO OHKA KOGYO CO., LTD.
发明人： Seshimo, Takehiro , Utsumi, Yoshiyuki , Kawaue, Akiya , Hada, Hideo , Shimizu, Hiroaki , Nakamura, Tsuyoshi
IPC分类号： C08K5/41 , G03F7/004 , C07D333/50
CPC分类号： G03F7/0045 , C07D327/02 , C07D327/04 , C07D497/08 , C08K5/36 , C08K5/42 , G03F7/0046 , G03F7/0397 , Y10S430/106 , Y10S430/111 , Y10S430/122 , Y10S430/123
摘要： A compound represented by general formula (I); and a compound represented by general formula (b1-1) .[Chemical Formula 1] €ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ X-Q 1 -Y 1 -SO - 3 M + €ƒ€ƒ€ƒ€ƒ€ƒ(1) €ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ X-Q 1 -Y 1 -SO - 3 A + €ƒ€ƒ€ƒ€ƒ€ƒ(b1 - 1) wherein Q 1 represents a divalent linkage group or a single bond; Y 1 represents an alkylene group which may have a substituent or a fluorinated alkylene group which may have a substituent; X represents a cyclic group of 3 to 30 carbon atoms which may have a substituent, and has an -SO 2 - bond in the structure thereof; M + represents an alkali metal ion; and A + represents an organic cation.

2. 发明授权

EP1783550B1 Positive resist composition and pattern formation method using the positive resist composition 有权
公开(公告)号：EP1783550B1
公开(公告)日：2016-07-20
申请号：EP06023246.9
申请日：2006-11-08
申请人： Fujifilm Corporation
发明人： Iwato, Kaoru , Kodama, Kunihiko
IPC分类号： G03F7/039
CPC分类号： G03F7/0397 , G03F7/0392 , G03F7/0395 , Y10S430/106 , Y10S430/111

3. 发明授权

EP1493058B1 ON-PRESS DEVELOPABLE IR SENSITIVE PRINTING PLATES USING BINDER RESINS HAVING POLYETHYLENE OXIDE SEGMENTS 有权转让
标题翻译：与聚环氧乙烷链段含粘合剂树脂中的压力印刷机上显影的红外感光板
公开(公告)号：EP1493058B1
公开(公告)日：2016-06-22
申请号：EP03718373.8
申请日：2003-04-10
申请人： Eastman Kodak Company
发明人： HUANG, Jianbing , MUNNELLY, Heidi, M. , SARAIYA, Shashikant , PAPPAS, Socrates, Peter
IPC分类号： G03F7/033 , G03F7/021 , B41M5/36 , B41C1/10
CPC分类号： G03F7/033 , B41C1/1008 , B41C2210/04 , B41C2210/08 , B41C2210/24 , B41M5/368 , G03C1/04 , G03C1/49863 , G03F7/0212 , Y10S430/106 , Y10S430/117 , Y10S430/145
摘要： The present invention relates to a polymerizable coating composition suitable for the manufacture of printing plates, which may be developable on-press. The coating composition comprises (i) a polymerizable compound and (ii) a polymeric binder comprising polyethylene oxide segments, wherein the polymeric binder is selected from the group consisting of at least one graft copolymer comprising a main chain polymer and polyethylene oxide side chains, a block copolymer having at least one polyethylene oxide block and at least one non-polyethylene oxide block, and a combination thereof. The invention is also directed to an imageable element comprising a substrate and the polymerizable coating composition.

4. 发明授权

EP1447403B1 5-METHYLENE-1,3-DIOXOLAN-4-ONE DERIVATIVES, PROCESS FOR THEIR PRODUCTION, POLYMERS OF THE DERIVATIVES, RESIST COMPOSITIONS, AND PATTERN FORMATION PROCESS 有权
标题翻译： 5-亚甲基-1,3-二氧戊环-4-酮衍生物，用于生产导数的保护涂料组合物，聚合物和图案形成方法
公开(公告)号：EP1447403B1
公开(公告)日：2016-02-03
申请号：EP02777914.9
申请日：2002-10-22
申请人： MITSUBISHI RAYON CO., LTD.
发明人： ANSAI, Ryuichi , KAMON, Yoshihiro , FUJIWARA, Tadayuki , KUWANO, Hideaki , OOTAKE, Atsushi , MOMOSE, Hikaru
IPC分类号： C07D317/34 , C07D317/72 , C08F220/10 , C08F224/00
CPC分类号： C07D317/72 , C07D317/18 , C07D317/34 , C07D317/42 , C08F20/30 , C08F24/00 , G03F7/0392 , G03F7/0397 , Y10S430/106 , Y10S430/111 , Y10S430/143

5. 发明授权

EP1536285B1 Photosensitive composition, compound for use in the photosensitive composition, and pattern forming method using the photosensitive composition 有权
标题翻译：感光性组合物，化合物在该组合物中使用，和使用这样的组合物的图像记录方法
公开(公告)号：EP1536285B1
公开(公告)日：2016-01-06
申请号：EP04027406.0
申请日：2004-11-18
申请人： FUJIFILM Corporation
发明人： Wada, Kenji , Kodama, Kunihiko
IPC分类号： G03F7/004 , G03F7/038 , G03F7/039 , G03F7/075 , G03F7/20 , C07C309/42 , C07C309/39 , C07C323/66 , C07C381/12
CPC分类号： C07C381/12 , C07C309/39 , C07C309/42 , C07C323/66 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0395 , G03F7/0397 , G03F7/0758 , G03F7/2041 , Y10S430/106 , Y10S430/111 , Y10S430/122

6. 发明授权

EP1431032B1 Polymerizable composition and lithographic printing plate precursor 失效转让
标题翻译：可聚合组合物和平版印刷版前体
公开(公告)号：EP1431032B1
公开(公告)日：2015-12-09
申请号：EP03029206.4
申请日：2003-12-18
申请人： FUJIFILM Corporation
发明人： Shimada, Kazuto
IPC分类号： B41C1/10 , B41M5/40 , G03F7/004
CPC分类号： B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/04 , B41C2201/14 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , G03F7/0045 , Y10S430/106 , Y10S430/122 , Y10S430/126 , Y10S430/145

7. 发明授权

EP2082890B1 Thermoplastic material comprising polychromic substances 有权转让
标题翻译：热塑性材料与多色物质
公开(公告)号：EP2082890B1
公开(公告)日：2015-08-19
申请号：EP09151069.3
申请日：2009-01-22
申请人： DataLase Ltd
发明人： Rogers, Neil John , Lamb, Christopher , Jarvis, Anthony Nicholas
IPC分类号： B41M5/26 , B41M5/28 , G03C1/73
CPC分类号： G03C1/73 , B29C47/822 , B41M5/285 , Y10S430/106 , Y10S430/114 , Y10S430/145 , Y10S430/146

8. 发明公开

EP2808736A2 Compound for resist and radiation-sensitive composition 有权
标题翻译： Verbindungfürresist- und strahlungsempfindlic Zusammensetzung
公开(公告)号：EP2808736A2
公开(公告)日：2014-12-03
申请号：EP14182240.3
申请日：2005-12-26
申请人： MITSUBISHI GAS CHEMICAL COMPANY, INC.
发明人： Echigo, Masatoshi , Oguro, Dai
IPC分类号： G03F7/039 , C07C39/15 , C07C43/205 , C07C43/23 , G03F7/004 , H01L21/027
CPC分类号： G03F7/0045 , C07C39/15 , C07C43/164 , C07C43/18 , C07C43/196 , C07C43/2055 , C07C43/225 , C07C43/315 , C07C49/747 , C07C69/96 , C07C2601/14 , C07C2603/74 , G03F7/0392 , Y10S430/106
摘要： A radiation-sensitive composition containing 1 to 80% by weight of a solid component and 20 to 99% by weight of a solvent. The solid component contains a compound B which has (a) a structure derived from a polyphenol compound A by introducing an acid-dissociating group to at least one phenolic hydroxyl group of the polyphenol compound A which is synthesized by a condensation between a compound selected from the group consisting of compounds such as for instance diformylbenzene, diacetylbenzene and diformyltoluene; or a di- to tetrafunctional aromatic ketone or aromatic aldehyde each having 12 to 36 carbon atoms with a compound having 1 to 3 phenolic hydroxyl groups and 6 to 15 carbon atoms, and (b) a molecular weight of 400 to 2000. The composition containing the compound B is useful as an acid-amplified, non-polymeric resist material, because it is highly sensitive to radiation such as KrF excimer lasers, extreme ultraviolet rays, electron beams, and X-rays, and provides resist patterns with a high resolution, high heat resistance, and high etching resistance.
摘要翻译：一种辐射敏感性组合物，其包含1至80重量％的固体组分和20至99重量％的溶剂。该固体成分含有化合物B，该化合物B具有（a）由多酚化合物A衍生的结构，通过在多酚化合物A的至少一个酚羟基上引入酸解离基团，所述酚羟基通过选自由诸如二甲酰基苯，二乙酰基苯和二甲酰甲苯的化合物组成的组; 或具有12至36个碳原子的二至四官能芳族酮或芳族醛与具有1至3个酚羟基和6至15个碳原子的化合物，和（b）分子量为400至2000的组合物。包含化合物B可用作酸扩增的非聚合抗蚀剂材料，因为它对诸如KrF准分子激光器，极紫外线，电子束和X射线的辐射高度敏感，并且提供具有高分辨率的抗蚀剂图案，耐热性高，耐蚀刻性高。

9. 发明授权

EP1403295B1 Ester compounds, polymers, resist compositions and patterning process 有权
标题翻译：酯化合物，聚合物，抗蚀剂用于生产图案组合物和方法
公开(公告)号：EP1403295B1
公开(公告)日：2014-10-22
申请号：EP03256075.7
申请日：2003-09-26
申请人： Shin-Etsu Chemical Co., Ltd.
发明人： Hasegawa, Koji , Kinsho, Takeshi , Watanabe, Takeru
IPC分类号： C08F20/30 , C08F32/08 , G03F7/039
CPC分类号： G03F7/0392 , C08F20/30 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/111

10. 发明授权

EP0952489B1 Positive photosensitive resin composition 有权
标题翻译：一种正型感光性树脂组合物
公开(公告)号：EP0952489B1
公开(公告)日：2014-08-13
申请号：EP99107339.6
申请日：1999-04-21
申请人： FUJIFILM Corporation
发明人： Kawabe, Yasumasa , Sato, Kenichiro , Aoai, Toshiaki
IPC分类号： G03F7/004 , G03F7/039
CPC分类号： G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/108 , Y10S430/111

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