专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明公开

EP3208639A4 METHOD FOR MANUFACTURING MICROARRAY LENS 审中-公开
公开(公告)号：EP3208639A4
公开(公告)日：2018-06-20
申请号：EP14904019
申请日：2014-10-15
申请人： MPNICS CO LTD
发明人： KANG SANG DO , KWON HYUNG JUN , BAEK SEUNG JUN , OH SEUNG KEUN
IPC分类号： G02B3/00 , B29D11/00
CPC分类号： G02B3/0012 , B29D11/00298 , C03B11/082 , C03B23/02 , C03C17/02 , C03C2217/21 , C03C2218/151 , G02B3/00 , G02B3/0031 , Y02P40/57
摘要： The present invention relates to a method of manufacturing a microarray lens and, more particularly, to a method of manufacturing a microarray lens, the method being able to form a plurality of depression in precise aspheric shapes on a substrate and to easily adjust or change the number and the gaps of lenses by forming depressions on a substrate using a probe and depositing a lens layer on the substrate with the depressions.

2. 发明公开

EP3328623A1 LENS SUBSTRATE, SEMICONDUCTOR DEVICE, AND ELECTRONIC APPARATUS 有权
公开(公告)号：EP3328623A1
公开(公告)日：2018-06-06
申请号：EP16751674.9
申请日：2016-07-19
申请人： Sony Semiconductor Solutions Corporation
发明人： SHIRAIWA, Toshiaki , OKAMOTO, Masaki , MATSUGAI, Hiroyasu , ITOU, Hiroyuki , SAITO, Suguru , OHSHIMA, Keiji , FUJII, Nobutoshi , TAZAWA, Hiroshi , ISHIDA, Minoru
IPC分类号： B29D11/00 , G02B3/00
CPC分类号： G02B3/0062 , B29D11/00009 , B29D11/00307 , B29D11/00375 , G02B3/0031 , G02B3/0068 , G02B3/0075 , G02B13/0085 , H01L27/14627 , H04N5/2254
摘要： Influence of chipping in case of dicing a plurality of stacked substrates is reduced. Provided is a semiconductor device where a substrate, in which a groove surrounding a pattern configured with a predetermined circuit or part is formed, is stacked. The present technology can be applied to, for example, a stacked lens structure where through-holes are formed in each substrate and lenses are disposed in inner sides of the through-holes, a camera module where a stacked lens structure and a light-receiving device are incorporated, a solid-state imaging device where a pixel substrate and a control substrate are stacked, and the like.

3. 发明公开

EP3319813A1 METHODS OF MANUFACTURING SECURITY DOCUMENTS AND SECURITY DEVICES 有权
公开(公告)号：EP3319813A1
公开(公告)日：2018-05-16
申请号：EP16741114.9
申请日：2016-07-11
申请人： De La Rue International Limited
发明人： HOLMES, Brian William
IPC分类号： B42D25/45 , B42D25/455 , B42D25/324 , B42D25/46 , B42D25/342 , G02B3/00 , B29D11/00 , B42D25/425
CPC分类号： G06T1/0014 , B29D11/00298 , B29D11/00365 , B29D11/00442 , B41M3/14 , B42D25/23 , B42D25/24 , B42D25/29 , B42D25/324 , B42D25/342 , B42D25/351 , B42D25/355 , B42D25/378 , B42D25/425 , B42D25/45 , B42D25/455 , B42D25/46 , B42D25/47 , B42D25/48 , G02B1/041 , G02B3/0006 , G02B3/0012 , G02B3/0031 , G02B3/005 , G06K9/3216 , G06K9/3275 , G06K2009/3225 , G06T7/80 , G06T2207/30144 , H04N1/00267 , H04N5/23212 , H04N5/247
摘要： A method of making a security device, comprising: forming an array of primary focusing elements on a first region of a focusing element support layer, by applying at least one transparent curable material either to the focusing element support layer or to a casting tool carrying a surface relief over an area which includes at least the first region, the surface relief comprising portions corresponding to the primary focusing elements; forming the transparent curable material(s) with the casting tool; and curing the transparent curable material(s) so as to retain the surface relief in the first region; wherein the surface relief further includes a plurality of structures of greater depth than the height of the primary focusing elements such that the cured transparent material(s) include a plurality of features protruding above the height of the primary focusing elements between primary focusing elements of the array.

4. 发明授权

EP2745165B1 OPTIONALLY TRANSFERABLE OPTICAL SYSTEM WITH A REDUCED THICKNESS 有权
标题翻译：可选的可转移光学系统，厚度减小
公开(公告)号：EP2745165B1
公开(公告)日：2017-10-11
申请号：EP12768923.0
申请日：2012-08-17
申请人： Visual Physics, LLC
发明人： JORDAN, Gregory, R. , CAPE, Samuel, M. , PALM, Scott, K. , GOSNELL, Jonathan, D. , KENNEDY, Caroline, B.
IPC分类号： G02B27/22 , B29D11/00 , G03B35/24
CPC分类号： G02B3/0006 , B29D11/00278 , G02B3/0031 , G02B5/09 , G02B27/2214 , G02B27/4205
摘要： An optionally transferable optical system with a reduced thickness is provided. The inventive optical system is basically made up of a synthetic image presentation system in which one or more arrangements of structured image icons are substantially in contact with, but not completely embedded within, one or more arrangements of focusing elements. The focusing element and image icon arrangements cooperate to form at least one synthetic image. By way of the subject invention, the requirement for an optical spacer to provide the necessary focal distance between the focusing elements and their associated image icons(s) is removed. As a result, overall system thicknesses are reduced, suitability as a surface, applied authentication system is enabled, and tamper resistance is improved.

5. 发明公开

EP3204822A2 DIRECT VIEW DISPLAY DEVICE AND LIGHT UNIT FOR DIRECT VIEW DISPLAY DEVICE 审中-公开
标题翻译：直视式显示装置和直观式显示装置用光单元
公开(公告)号：EP3204822A2
公开(公告)日：2017-08-16
申请号：EP15784839.1
申请日：2015-10-07
申请人： Corning Incorporated
发明人： GAHAGAN, Kevin Thomas , GOLLIER, Jacques , KUKSENKOV, Dmitri Vladislavovich
IPC分类号： G02F1/1335 , G02B3/00 , F21S13/14 , G02B6/00
CPC分类号： G02F1/133606 , G02B3/0031 , G02B3/0068 , G02B6/0053 , G02B6/0055 , G02F1/133502 , G02F1/133504 , G02F1/133512 , G02F1/133526 , G02F1/133603 , G02F1/133605 , G02F1/133611 , G02F2001/133562 , G02F2001/133607 , H01L51/5275
摘要： A direct view display device includes a light unit, a collimating unit, an image display unit, and a contrast enhancement unit. The contrast enhancement unit includes opposing first and second major surfaces. The first major surface includes an array of optical elements. The second major surface includes a light absorbing layer and an array of apertures in the light absorbing layer and corresponding to the array of optical elements. The optical elements are disposed between the light unit and the light absorbing layer. The collimating unit is disposed between the light unit and the contrast enhancement unit. The image display unit is disposed between the collimating unit and the contrast enhancement unit. The contrast enhancement unit and the image display unit are arranged such that each optical element of the contrast enhancement unit is aligned with at least one corresponding pixel of the image display unit.
摘要翻译：直视型显示装置包括照明单元，准直单元，图像显示单元和对比度增强单元。对比度增强单元包括相对的第一主表面和第二主表面。第一个主要表面包括一系列光学元件。第二主表面包括光吸收层和光吸收层中的孔阵列并对应于光学元件阵列。光学元件设置在光单元和光吸收层之间。准直单元设置在照明单元和对比度增强单元之间。图像显示单元设置在准直单元和对比度增强单元之间。对比度增强单元和图像显示单元被布置为使得对比度增强单元的每个光学元件与图像显示单元的至少一个对应像素对齐。

6. 发明公开

EP3203275A1 DIFFUSING PLATE AND METHOD FOR PRODUCING DIFFUSING PLATE 审中-实审
标题翻译：扩散板及生产扩散板的方法
公开(公告)号：EP3203275A1
公开(公告)日：2017-08-09
申请号：EP15846865.2
申请日：2015-09-29
申请人： Kuraray Co., Ltd.
发明人： UCHIDA, Atsushi , HIRAI, Masashi , KARAI, Masaru
IPC分类号： G02B5/02 , G02B3/00
CPC分类号： G02B5/0221 , G02B3/00 , G02B3/0031 , G02B3/0043 , G02B5/02 , G02B5/0268 , G02B5/0294 , G02B5/3083 , G02B27/48
摘要： The present invention provides a diffuser plate and a method for producing a diffuser plate that can improve variations in luminance of transmitted light or reflected light in a simple structure and that enable easy design and production. The diffuser plate according to the present invention is a diffuser plate where a plurality of microlenses are placed on a principal surface, wherein a phase difference generation part is inserted between the plurality of microlenses and the principal surface, the plurality of microlenses have two or more types of lens shapes, and the number of microlenses having the two or more types of lens shapes is determined so that a quantity ratio of the two or more types of lens shapes is a specific value, each of the lens shape types is selected corresponding to each of coordinates on the principal surface in which centers of undersurfaces of the plurality of microlenses are placed, and an angle range in which the diffuse light intensity is substantially uniform is in a range of +10% to -10% of a desired angle range.
摘要翻译：本发明提供了一种漫射板和一种用于制造漫射板的方法，该漫射板能够以简单的结构改善透射光或反射光的亮度变化并且能够容易地设计和制造。本发明的扩散板是在主面上配置有多个微透镜的扩散板，在多个微透镜与主面之间插入有相位差产生部，多个微透镜具有两个以上确定透镜形状的类型和具有两种或更多种类型的透镜形状的微透镜的数量，使得两种或更多种透镜形状的数量比是特定值，选择每种透镜形状类型以对应于多个微透镜的下表面的中心所在的主表面上的每个坐标以及漫射光强度基本均匀的角度范围处于期望角度范围的+ 10％至-10％的范围内。

7. 发明公开

EP2347171A4 HIGH IRRADIANCE THROUGH OFF-CENTER OPTICS 审中-公开
标题翻译：霍尔·斯德哥尔摩·德累斯顿
公开(公告)号：EP2347171A4
公开(公告)日：2017-05-31
申请号：EP09819828
申请日：2009-10-07
申请人： PHOSEON TECH INC
发明人： MARSON JONATHAN L
IPC分类号： F21V5/00 , G02B19/00
CPC分类号： B29D11/00278 , B29D11/00807 , F21V5/007 , F21Y2105/10 , F21Y2115/10 , G02B3/0031 , G02B3/0043 , G02B19/0014 , G02B19/0066 , G02B27/123
摘要： A light fixture has an array of light emitting diodes arranged on a substrate, an array of lenses arranged adjacent the diodes, each lens corresponding to a diode, and having a center, the array of lenses arranged such that the each lens center is offset from a location of the diode. A light fixture has an array of light emitting diodes arranged in a x-y grid on a substrate, and an array of lenses arranged adjacent the array of light emitting diodes, each lens corresponding to a diode and having a center, the array of lenses arranged such that each lens center is offset a distance along a location axis of the diode.
摘要翻译：灯具具有布置在基板上的发光二极管阵列，邻近二极管布置的透镜阵列，每个透镜对应于二极管，并且具有中心，透镜阵列布置成使得每个透镜中心偏离二极管的位置。灯具具有布置在基板上的xy格栅中的发光二极管阵列和与发光二极管阵列相邻布置的透镜阵列，每个透镜对应于二极管并具有中心，所述透镜阵列布置成每个透镜中心沿着二极管的位置轴线偏移一段距离。

8. 发明授权

EP2552598B1 PRECISION CONTROL OF WEB MATERIAL HAVING MICRO-REPLICATED LENS ARRAY 有权
标题翻译：与微复制透镜栅格，铁道物资的精确控制
公开(公告)号：EP2552598B1
公开(公告)日：2017-04-19
申请号：EP11714178.8
申请日：2011-03-30
申请人： 3M Innovative Properties Company
发明人： HOFELDT, David, L. , BROTT, Robert, L. , CARLSON, Daniel, H. , DOBBS, James, N. , JAWORSKI, Andrzej, P. , JERRY, Glen, A. , STRAND, John, T. , SYKORA, Michael, J. , STENSVAD, Karl, K.
IPC分类号： G01B11/26 , G02B3/00
CPC分类号： G02B3/0075 , B29C43/58 , B29C59/026 , B29C59/046 , B29C2043/585 , B29C2059/023 , B29D11/00663 , G02B3/0031
摘要： A manufacturing system includes a sensing system that provides high-resolution feedback for web guiding and tension control. The system may be especially useful for web material that is manufactured to include micro-replicated structures with micron size scale. A micro-replication station forms a pattern of micro-replicated lenses on a web material. The sensing system illuminates a measurement area on the web material and detects an angular distribution of light exiting a set of the micro-replicated lenses within the first measurement area. A control system that adjusts at least one process control parameter of the transport system based on the detected angular distribution.

9. 发明公开

EP3142839A1 MANUFACTURE OF OPTICAL ELEMENTS BY REPLICATION AND CORRESPONDING REPLICATION TOOLS AND OPTICAL DEVICES 有权
标题翻译：生产光学元件的由复制复制和相关的工具和光学器件
公开(公告)号：EP3142839A1
公开(公告)日：2017-03-22
申请号：EP15792431.7
申请日：2015-05-14
申请人： Heptagon Micro Optics Pte. Ltd.
发明人： BIETSCH, Alexander , BARGE, Michel
IPC分类号： B29B11/00 , B29C59/02 , G02B3/00
CPC分类号： G02B3/0031 , B29D11/00
摘要： A replication tool for producing an optical structure comprising an optical element includes a central section having the shape defining a negative of a portion of the optical structure and a vertically aligned central axis; a surrounding section laterally surrounding the central section; and one or more contact standoffs defining a plane referred to as contact plane. In a first azimuthal range, the surrounding portion provides a first compensation surface facing away from the central axis, and in a second azimuthal range, the surrounding portion provides a second compensation surface facing away from the central axis. In any cross-section containing the central axis in the second azimuthal range, a steepness of the second compensation surface is higher than a steepness of the first compensation surface in any cross-section containing the central axis in the first azimuthal range.
摘要翻译：在光学结构产生包含光学元件的复制工具包括具有确定形状的光学结构的一部分和一个垂直对准的中心轴的负的中央部; 周围区间尾盘反弹围绕中央部分; 和一个或多个接触支座限定通过向称为接触平面的平面中。在第一方位角范围，周围部分提供面向从中心轴离开的第一补偿表面，以及在第二方位范围，周围部分提供了从中心轴背对的第二补偿表面。在任何横截面包含在所述第二方位范围的中心轴线，所述第二补偿表面的陡度比所述第一补偿表面在任何横截面包含在第一方位角范围中的中心轴的陡度更高。

10. 发明公开

EP2639033A4 WAFER LENS PRODUCTION METHOD 审中-公开
标题翻译：用于生产晶圆级图像
公开(公告)号：EP2639033A4
公开(公告)日：2016-12-21
申请号：EP11840602
申请日：2011-11-09
申请人： KONICA MINOLTA INC
发明人： EGURO KOUICHI , SARUYA NOBUHIRO
IPC分类号： B29C39/24 , B29C35/08 , B29C39/10 , B29D11/00 , B29L11/00 , G02B3/00
CPC分类号： B29D11/0073 , B29C35/0888 , B29C39/10 , B29C2035/0827 , B29D11/00192 , B29D11/00307 , B29L2011/00 , G02B3/0031 , G02B3/0056

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式