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    • 3. 发明公开
    • Laser diode device
    • Laserdiodenvorrichtung
    • EP2463972A2
    • 2012-06-13
    • EP11008998.4
    • 2011-11-11
    • Sony CorporationTohoku University
    • Oki, TomoyukiWatanabe, HidekiKoda, RintaroKuramoto, MasaruYokoyama, Hiroyuki
    • H01S5/10H01S5/065H01S5/0625H01S5/343H01S5/022
    • H01S5/34333B82Y20/00H01S5/06253H01S5/0658H01S5/1014H01S5/1064H01S5/141H01S5/22
    • A laser diode device includes a laminated structure in which a first compound semiconductor layer (30), a third compound semiconductor layer (40) that has a light emitting region (41) and a saturable absorption region (42), and a second compound semiconductor layer (50) are sequentially layered, a second electrode (62), and a first electrode (61). The laminated structure has ridge stripe structure (56). The second electrode is separated into a first section (62A) to obtain forward bias state by applying a direct current to the first electrode through the light emitting region and a second section (62B) to add electric field to the saturable absorption region by an isolation trench (62C). When minimum width of the ridge stripe structure is W MIN , and width of the ridge stripe structure of the second section of the second electrode in an interface between the second section of the second electrode and the isolation trench is W 2 , 1 2 /W MIN is satisfied.
    • 激光二极管装置包括层叠结构,其中具有发光区域(41)和可饱和吸收区域(42)的第一化合物半导体层(30),第三化合物半导体层(40)和第二化合物半导体 层(50)顺序层叠,第二电极(62)和第一电极(61)。 层叠结构具有脊状结构(56)。 第二电极被分成第一部分(62A),以通过通过发光区域向第一电极施加直流电流以及第二部分(62B)来获得正向偏置状态,以通过隔离将电场加到可饱和吸收区域 沟槽(62C)。 当脊条纹结构的最小宽度为W MIN时,第二电极的第二部分与隔离沟槽之间的界面中的第二电极的第二部分的脊状条纹结构的宽度为W 2,1
    • 5. 发明公开
    • GaN laser diode and method of driving a laser diode
    • GaN激光二极管和Verfahren zum Antrieb einer激光二极管
    • EP2367245A2
    • 2011-09-21
    • EP11001865.2
    • 2009-07-28
    • Sony CorporationTohoku University
    • Yokoyama, HiroyukiKono, ShunsukeOki, TomoyukiMasao, IkedaMiyajima, TakaoWatanabe, Hideki
    • H01S5/042H01S5/20H01S5/22H01S5/323H01S5/062
    • H01S5/06216H01S5/0428
    • An ultrashort pulse/ultra-high power laser diode with a simple structure and configuration is provided including a GaN-based laminate structure body comprising: a first compound semiconductor layer (30), a second compound semiconductor layer (50) comprising a p-type compound semiconductor layer (53, 54, 55), wherein a part of the p-type semiconductor layer (54, 55) is removed to form a ridge section (56), an active layer (40) having a quantum well structure and being arranged between the first compound semiconductor layer (30) and the second compound semiconductor layer (50), a first electrode (61) electrically connected to the first compound semiconductor layer (30), and a second electrode (62) electrically connected to the second compound semiconductor layer (50), wherein the distance from the active layer (40) to the p-type compound semiconductor layer (53, 54, 55) is 1.2x10- 7 m or less, the distance from the active layer (40) to the second electrode (62) is 1 µm or less, and the width of the ridge section (56) is 2 µm or less. In a method of driving a laser diode, the laser diode is driven by a pulse current which is 10 or more times higher than a threshold current value. The width of the pulse current is preferably 10 nanoseconds or less, and the value of the pulse current is specifically 0.4 amperes or over.
    • 提供了具有简单结构和结构的超短脉冲/超大功率激光二极管,其包括:GaN基层压结构体,包括:第一化合物半导体层(30),包含p型的第二化合物半导体层(50) 化合物半导体层(53,54,55),其中去除p型半导体层(54,55)的一部分以形成脊部(56),具有量子阱结构的有源层(40)和 布置在第一化合物半导体层(30)和第二化合物半导体层(50)之间,电连接到第一化合物半导体层(30)的第一电极(61)和与第二化合物半导体层(50)电连接的第二电极 化合物半导体层(50),其中从有源层(40)到p型化合物半导体层(53,54,55)的距离为1.2×10 -7 m以下,与有源层(40)的距离 到第二电极(62)的厚度为1μm以下 脊部(56)的宽度为2μm以下。 在驱动激光二极管的方法中,激光二极管由比阈值电流值高10或更多倍的脉冲电流来驱动。 脉冲电流的宽度优选为10纳秒以下,脉冲电流的值为0.4安培以上。
    • 8. 发明公开
    • Semiconductor optical amplifier
    • OptischerHalbleiterverstärker
    • EP2403080A2
    • 2012-01-04
    • EP11004801.4
    • 2011-06-10
    • Sony CorporationTOHOKU UNIVERSITY
    • Kuramoto, MasaruIkeda, MasaoKoda, RintaroOki, TomoyukiWatanabe, HidekiMiyajima, TakaoYokoyama, Hiroyuki
    • H01S5/50H01S5/16H01S5/323H01S5/10
    • H01S5/1064H01S5/0425H01S5/0602H01S5/0657H01S5/16H01S5/22H01S5/32341H01S5/34333H01S5/50
    • A semiconductor optical amplifier (200) includes: a laminated structure sequentially including a first compound semiconductor layer (230) composed of GaN compound semiconductor and having a first conductivity type, a third compound semiconductor layer (240) having a light amplification region (241) composed of GaN compound semiconductor, and a second compound semiconductor layer (250) composed of GaN compound semiconductor and having a second conductivity type; a second electrode (262) formed on the second compound semiconductor layer; and a first electrode (261) electrically connected to the first compound semiconductor layer. The laminated structure has a ridge stripe structure (258), wherein the width of the ridge stripe structure in a light output end face W out is larger than the width W in in a light incident end face. A carrier non-injection region (205) is provided in an internal region of the laminated structure from the light output end face along an axis line of the semiconductor optical amplifier.
    • 半导体光放大器(200)包括:顺序地包括由GaN化合物半导体构成的第一导电类型的第一化合物半导体层(230)和具有光放大区域(241)的第三化合物半导体层(240) 由GaN化合物半导体构成,第二化合物半导体层(250)由GaN化合物半导体构成,具有第二导电型; 形成在第二化合物半导体层上的第二电极(262) 和与第一化合物半导体层电连接的第一电极(261)。 层叠结构具有棱条结构(258),其中光输出端面W out中的脊条结构的宽度大于光入射端面中的宽度W in。 载流子非注入区域(205)沿着半导体光放大器的轴线从光输出端面设置在层叠结构的内部区域中。