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    • 7. 发明公开
    • Method and apparatus for measuring a bump on a substrate
    • Verfahren und Vorrichtung zum Messen einer Beule auf einem Substrat
    • EP2058623A2
    • 2009-05-13
    • EP09002532.1
    • 2001-06-12
    • Shinko Electric Industries Co., Ltd.
    • Murayama, KeiMitsutoshi, Higashi
    • G01B15/02
    • G01B15/02H01L24/11H01L24/13H01L2224/117H01L2224/13022H01L2224/131H01L2224/13111H01L2924/01082H01L2924/00014H01L2924/01047H01L2924/014
    • A method for measuring heights of first and second bumps formed on first and second surfaces, respectively, of a work of substrate in which materials of the first and second bumps are different from each other, a planar arrangement of the first bumps being the same as that of the second bumps. The method comprises irradiating at least two kinds of X-rays having different wavelengths toward the materials constituting the first and second bumps, respectively, and detecting first and second linear absorption coefficients of the X-rays; memorizing the first and second linear absorption coefficients of the X-rays as known data; and irradiating the to kinds of X-rays toward the first and second works respectively, and detecting the first and second X-ray transmitted intensities at a position on which the first and second bumps are formed; and determining the heights of the first and second bumps from the first and second X-ray transmitted intensities on the basis of the known data.
    • 一种用于测量在第一和第二凸块的材料彼此不同的基板的工件的第一和第二表面上分别形成的第一和第二凸块的高度的方法,第一凸块的平面布置与 第二个颠簸的。 该方法包括分别向构成第一和第二凸块的材料照射具有不同波长的至少两种X射线,并检测X射线的第一和第二线性吸收系数; 记录X射线的第一和第二线性吸收系数作为已知数据; 并且分别向所述第一和第二工件照射各种X射线,并且在形成有所述第一和第二凸块的位置处检测所述第一和第二X射线透射强度; 以及基于已知数据从第一和第二X射线透射强度确定第一和第二凸起的高度。