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    • 3. 发明公开
    • X-ray image photographing method and X-ray image photographing apparatus
    • Röntgenstrahlbild-Fotografierverfahren undRöntgenstrahlbild-Fotografiervorrichtung
    • EP2439589A2
    • 2012-04-11
    • EP11184314.0
    • 2011-10-07
    • Rigaku Corporation
    • Omote, KazuhikoKambe, MakotoTakeda, Yoshihiro
    • G03B42/00
    • G03B42/02A61B6/4035A61B6/484A61B6/588A61B6/589
    • There is provided an X-ray image photographing method and an X-ray image photographing apparatus capable of photographing a high resolution phase contrast image and a high resolution absorption contrast image in a short time according to the purpose only by finely adjusting the distance between a specimen and a detector with respect to an X-ray source.
      The X-ray image photographing method enables photographing of a fine structure with a high space resolution while using an X-ray source having a finite size, and d/L is sufficiently smaller than 1, when L is a distance from an X-ray source 110 to a specimen 500 and d is a distance from the specimen 500 to a detector 130. Further, a distance between a peak position and a valley position of a phase contrast is not less than 1/3Δ and not more than 3Δ, when λ is an average wavelength of X-ray to be irradiated from the X-ray source 110 and Δ is a resolution of the detector 130.
    • 本发明提供一种能够根据目的在短时间内拍摄高分辨率相位差图像和高分辨率吸收对比图像的X射线图像拍摄方法和X射线图像摄影装置,只需通过精细地调整 样品和检测器相对于X射线源。 当使用具有有限尺寸的X射线源时,X射线图像拍摄方法能够以高空间分辨率拍摄精细结构,并且当L是距离X射线的距离时,d / L足够小于1 源110到样本500,d是从样本500到检测器130的距离。另外,相位对比度的峰值位置和谷点位置之间的距离不小于1/3“且不大于3” 当»是从X射线源110照射的X射线的平均波长,“是检测器130的分辨率时。
    • 10. 发明公开
    • Method and apparatus for film thickness measurement
    • Verfahren und Vorrichtung zur Filmdickenmessung
    • EP1559993A2
    • 2005-08-03
    • EP05001701.1
    • 2005-01-27
    • Rigaku Corporation
    • Omote, KazuhikoHimeda, Akihiro
    • G01B15/02G01N23/20
    • G01N23/20G01B15/02
    • The thickness of a thin film (14) can be measured based on the X-ray diffraction method. An X-ray (16) is allowed to be incident upon a surface of the thin film (14). An intensity of a diffracted X-ray (20) is measured with the incident angle α being changed to obtain a measured rocking curve. On the other hand, a theoretical rocking curve is calculated in consideration of an orientation density distribution function ρ of the thin film (14). A scale factor is predetermined for a standard sample having a known film thickness. A parameter fitting operation is carried out in a manner that the characteristic parameter of the function ρ and the film thickness t are adjusted so that the theoretical rocking curve including the scale factor can approach the measured rocking curve as closely as possible.
    • 可以基于X射线衍射法测量薄膜(14)的厚度。 允许X射线(16)入射到薄膜(14)的表面上。 测量衍射X射线(20)的强度,其中入射角度±改变以获得测量的摇摆曲线。 另一方面,考虑到薄膜(14)的取向密度分布函数Á来计算理论摇摆曲线。 对于具有已知膜厚度的标准样品,比例因子是预定的。 参数拟合操作以调整功能Á的特征参数和膜厚度t的方式进行,使得包括比例因子的理论摇摆曲线可以尽可能接近测量的摇摆曲线。