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    • 2. 发明公开
    • PHOTOSENSITIVE ORGANIC PARTICLE
    • LICHTEMPFINDLICHES有机硅TEILCHEN
    • EP2698669A1
    • 2014-02-19
    • EP12771827.8
    • 2012-04-11
    • Nissan Chemical Industries, Ltd.
    • KISHIOKA, TakahiroUMEZAKI, MakikoKIMURA, ShigeoNISHIMAKI, HirokazuOHASHI, TomoyaUSUI, Yuki
    • G03F7/038C08F220/54C08L101/00G03F7/004
    • G03F7/20C08F220/20C08F220/30C08F220/54C08F220/56C08F220/58G03F7/004G03F7/0045G03F7/0046G03F7/0048G03F7/038G03F7/0382G03F7/0388G03F7/32
    • There is provided a material, which makes it possible to form a pattern by applying a photosensitive composition to a base material and drying to form a photosensitive coating and performing exposure and development, and a method for forming the pattern. A photosensitive composition comprising water-soluble organic particles, and a solvent, wherein the solvent is a poor solvent for the water-soluble organic particles. Preferably, the photosensitive wherein the water-soluble organic particles include a polymer which contains a unit structure (A) for forming organic particles, a unit structure (B) for forming interparticle crosslinkage, and a unit structure (C) for imparting dispersibility, and the photosensitive composition further comprises a photoacid generator. In addition, the photosensitive wherein the water-soluble organic particles include a polymer which contains the unit structure (A) for forming organic particles, the unit structure (B) for forming interparticle crosslinkage, the unit structure (C) for imparting dispersibility, and a unit structure (D) having a photoacid generating group. A pattern forming method comprising: a step of applying the photosensitive composition to a base material and drying to form a photosensitive coating; a step of exposing the coating to light through a mask; and a step of performing developing using a developer.
    • 提供了一种材料,其可以通过将感光性组合物施加到基材上并干燥以形成感光性涂层并进行曝光和显影而形成图案,以及形成图案的方法。 包含水溶性有机颗粒和溶剂的光敏组合物,其中溶剂是水溶性有机颗粒的不良溶剂。 优选地,其中水溶性有机颗粒包括含有用于形成有机颗粒的单元结构(A)的聚合物,用于形成颗粒间交联的单元结构(B)和用于赋予分散性的单元结构(C))的感光体,以及 光敏组合物还包含光致酸产生剂。 此外,其中水溶性有机颗粒包括含有用于形成有机颗粒的单元结构(A)的聚合物,用于形成颗粒间交联的单元结构(B),用于赋予分散性的单元结构(C))和 具有光酸产生基团的单元结构(D)。 一种图案形成方法,包括:将所述感光性组合物施加到基材上并干燥以形成感光性涂层的步骤; 通过掩模使涂层曝光的步骤; 以及使用显影剂进行显影的步骤。
    • 3. 发明公开
    • FILM-FORMING COMPOSITION INCLUDING FLUORINE-CONTAINING SURFACTANT
    • 迷迭香ZUSAMMENSETZUNG MIT FLUORHALTIGEM TENSID
    • EP3106921A1
    • 2016-12-21
    • EP15749601.9
    • 2015-01-30
    • Nissan Chemical Industries, Ltd.
    • UMEZAKI, MakikoKARASAWA, RyoSHIGAKI, ShuheiMIZUOCHI, Ryuta
    • G03F7/11C08L33/04C08L101/00C08L101/04
    • C09D133/12C08F220/14C08L33/14C08L101/00C08L101/04G03F7/0752G03F7/094G03F7/11G03F7/16G03F7/20G03F7/30H01L21/0276C08F212/14
    • There is provided a film with reduced formation of an edge reservoir at a periphery of a film in which the edge reservoir causes an unnecessary residue that cannot be removed by an etching process, and a method for forming the film. A film forming composition for use in a lithography process, the film forming composition comprising a surfactant containing a polymer and an oligomer having a C 3-5 perfluoroalkyl partial structure. The perfluoroalkyl partial structure preferably has a carbon number of 4. The perfluoroalkyl partial structure may further include an alkyl partial structure, and the polymer and the oligomer are preferably a (meth)acrylate polymer and a (meth)acrylate oligomer, respectively. The surfactant is contained in an amount of 0.0001% by mass to 1.5% by mass based on the total solid content of the film forming composition. The film forming composition further comprises a coating film resin, and the coating film resin is a novolac resin, a condensation epoxy resin, a (meth)acylic resin, a polyether-based resin, or a silicon-containing resin, etc. The formed film can be used as a resist underlayer film or a resist overlayer film.
    • 提供了一种薄膜,其在边缘储存器的周围形成边缘储存器,其中边缘储存器引起不能通过蚀刻工艺去除的不必要的残留物,以及用于形成膜的方法。 一种用于光刻工艺的成膜组合物,所述成膜组合物包含含有聚合物的表面活性剂和具有C 3-5全氟烷基部分结构的低聚物。 全氟烷基部分结构优选碳数为4.全氟烷基部分结构还可以包括烷基部分结构,聚合物和低聚物分别优选为(甲基)丙烯酸酯聚合物和(甲基)丙烯酸酯低聚物。 表面活性剂的含量相对于成膜组合物的总固体成分为0.0001质量%〜1.5质量%。 成膜组合物还包含涂膜树脂,涂膜树脂是酚醛清漆树脂,缩合环氧树脂,(甲基)酰基树脂,聚醚基树脂或含硅树脂等。形成的 膜可以用作抗蚀剂下层膜或抗蚀剂覆盖膜。