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1. 发明授权

EP2993521B1 CHEMICALLY AMPLIFIED POSITIVE RESIST DRY FILM, DRY FILM LAMINATE AND METHOD OF PREPARING LAMINATE 有权
标题翻译：化学增强正涂料干膜，干膜层压结构及其制造方法层压
公开(公告)号：EP2993521B1
公开(公告)日：2017-03-22
申请号：EP15182701.1
申请日：2015-08-27
申请人： Shin-Etsu Chemical Co., Ltd.
发明人： HIRANO, Yoshinori , ASAI, Satoshi , YANAGISAWA, Hideyoshi
IPC分类号： G03F7/039 , G03F7/16
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0048 , G03F7/0392 , G03F7/11 , G03F7/168
摘要： A chemically amplified positive resist dry film to be formed on a support film contains 5-40 wt% of a component having a boiling point of 55-250°C under atmospheric pressure. The resist dry film having flexibility and dimensional stability can be prepared through simple steps. The resist dry film can be efficiently and briefly laid on an article and processed to form a pattern.
摘要翻译：一种化学放大型正型抗蚀剂干膜，要在载体上形成的膜，含有具有55-250℃，在大气压下的沸点的组分的5-40重量％。抗蚀剂干具有薄膜柔韧性和尺寸稳定性可通过简单的步骤来制备。抗蚀剂干膜，可以有效地和简单地在制品放置在并处理以形成图案。

2. 发明公开

EP3025197A4 CROSS-LINKABLE FLUORINATED PHOTOPOLYMER 审中-公开
标题翻译： VERNETZBARES荧光增白剂
公开(公告)号：EP3025197A4
公开(公告)日：2017-03-08
申请号：EP14828695
申请日：2014-07-23
申请人： ORTHOGONAL INC
发明人： ROBELLO DOUGLAS ROBERT , WRIGHT CHARLES WARREN
IPC分类号： G03F7/004 , H01L51/50
CPC分类号： G03F7/0388 , C08F220/18 , C08F220/22 , C08F220/24 , C08F222/18 , C08F2222/185 , C09B1/00 , C09B57/02 , C09B69/008 , C09B69/101 , C09B69/109 , G03F7/0007 , G03F7/0045 , G03F7/0046 , G03F7/0048 , G03F7/038 , G03F7/32 , G03F7/40 , H01L21/0274 , C08F2220/325 , C08F2220/1891
摘要： A photosensitive composition comprises a fluorinated solvent, a photo-acid generator and a copolymer. The copolymer comprises at least three distinct repeating units, including a first repeating unit having a fluorine-containing group, a second repeating unit having an acid-catalyzed cross-linkable group, and a third repeating unit having a sensitizing dye. The composition is useful in the fabrication of electronic devices, especially organic electronic and bioelectronic devices.
摘要翻译：光敏组合物包含氟化溶剂，光酸产生剂和共聚物。共聚物包含至少三个不同的重复单元，包括具有含氟基团的第一重复单元，具有酸催化的可交联基团的第二重复单元和具有敏化染料的第三重复单元。该组合物可用于制造电子器件，特别是有机电子和生物电子器件。

3. 发明授权

EP2088466B1 Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound 有权
标题翻译：的抗蚀剂组合物，用于液浸曝光，形成使用该组合物的抗蚀剂图案的方法，和含氟化合物
公开(公告)号：EP2088466B1
公开(公告)日：2016-10-26
申请号：EP09152046.0
申请日：2009-02-04
申请人： Tokyo Ohka Kogyo Co., Ltd.
发明人： Shiono, Daiju , Dazai, Takahiro , Furuya, Sanae , Hirano, Tomoyuki , Mori, Takayoshi
IPC分类号： G03F7/004 , G03F7/20 , G03F7/039 , C07C69/00 , C07C69/653 , C07C69/712 , G03F7/038 , C08F212/08 , C08F212/14 , C08F220/22 , C08F220/24 , C08F220/26 , C08F220/28
CPC分类号： G03F7/0046 , C07C69/653 , C07C69/67 , C07C69/712 , C07C69/757 , C07C2603/00 , C07C2603/84 , C07C2603/86 , C08F12/20 , C08F12/22 , C08F12/32 , C08F220/22 , C08F220/24 , C08F220/26 , C08F220/28 , C09D125/14 , C09D125/18 , G03F7/0048 , G03F7/0382 , G03F7/0397 , G03F7/2041 , C08F212/14 , C08F2220/1833 , C08F212/32 , C08F2220/185 , C08F2220/283 , C08F220/06

4. 发明公开

EP3051348A1 COMPOSITIONS COMPRISING HETERO-SUBSTITUTED CARBOCYCLIC ARYL COMPONENT AND PROCESSES FOR PHOTOLITHOGRAPHY 审中-公开
标题翻译： ZUSAMMENSETZUNGEN MIT HETEROSUTITERERTER CARBOCYCLISCHER ARYLKOMPONENTE UND FOTOLITHOGRAFIE VERFAHREN
公开(公告)号：EP3051348A1
公开(公告)日：2016-08-03
申请号：EP16159476.7
申请日：2009-03-18
申请人： Rohm and Haas Electronic Materials LLC
发明人： WANG, Deyan , BARCLAY, George G , XU, Cheng-Bai
IPC分类号： G03F7/004 , G03F7/039 , G03F7/038 , G03F7/20
CPC分类号： G03F7/0048 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/2041
摘要： New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprises one or more materials that have hetero-substituted carbocyclic aryl groups. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.
摘要翻译：提供了可用于浸没光刻的新的光致抗蚀剂组合物。本发明优选的光致抗蚀剂组合物包含一种或多种具有杂取代的碳环芳基的材料。本发明的特别优选的光致抗蚀剂可以在浸没光刻处理期间将抗蚀剂材料的浸出降低到与抗蚀剂层接触的浸液中。

5. 发明公开

EP2889321A4 SURFACE CONTROL ADDITIVE FOR RADIATION CURING SYSTEM, PREPARATION METHOD THEREFOR AND APPLICATION THEREOF 有权
标题翻译：用于辐射固化系统的表面控制补充剂，制造方法和应用
公开(公告)号：EP2889321A4
公开(公告)日：2015-10-14
申请号：EP12883275
申请日：2012-10-08
申请人： WANG ZHIJUN , AFCONA CHEMICALS HAIMEN
发明人： WANG ZHIJUN , AFCONA CHEMICALS HAIMEN
IPC分类号： C08G77/46 , C09D7/12 , C09D11/00 , C09D11/03 , G03F7/00
CPC分类号： C09D11/107 , C08G77/20 , C08G77/46 , C09D11/101 , G03F7/0048 , G03F7/0752
摘要： The present invention is related to a surface control additive for a radiation curing system, the method for its preparation as well as its application. The surface control additive has the following structure: wherein A is wherein m is an integer from 0 to 400, n is an integer from 1 to 500, x is an integer from 0 to 800, p is an integer from 0 to 600, q is an integer from 1 to 800, R 4 and R 5 are H or CH 3 respectively, R 6 is H or a linear or a branched alkyl group containing 1-18 carbon atoms or an acyl group containing 2-5 carbon atoms. The surface control additive of the present invention is applied to radiation curing (UV/EB) paint and inks, enables the coatings to maintain non-adhesive and smooth for a long time, and minimizes transferable precipitates from a cured film. In addition, by using different combinations of EO and PO, the surface control additive of the present invention can adapt to a free selection from high-polarity aquosity to a low-polarity aliphatic hydrocarbon solvent system.

6. 发明授权

EP1844364B1 METHOD FOR MANUFACTURING ARRAY FOR DISPLAY DEVICE AND ARRAY BOARD FOR DISPLAY DEVICE 有权
标题翻译：方法用于生产安排，显示装置及显示装置
公开(公告)号：EP1844364B1
公开(公告)日：2015-04-01
申请号：EP06715802.2
申请日：2006-02-01
申请人： KOLON INDUSTRIES, INC.
发明人： KIM, Byoung-Kee , PARK, Se-Hyung , BYUN, Dal-Seok , SONG, Seog-Jeong , PARK, Jong-Min
IPC分类号： G03F7/022 , G02F1/1362 , G03F7/004 , G03F7/16 , H01L27/12 , H01L27/32
CPC分类号： G03F7/161 , G02F1/1362 , G02F2001/136231 , G03F7/0048 , G03F7/022 , H01L27/12 , H01L27/3244 , H01L2227/326

7. 发明公开

EP2710417A4 RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN, COLOR FILTER AND METHOD OF PRODUCING THE SAME, AND SOLID-STATE IMAGE SENSOR 审中-公开
标题翻译：辐射敏感组合物，法形成图案，彩色滤光片及其制造方法和图像感应器SOLID STATE
公开(公告)号：EP2710417A4
公开(公告)日：2015-03-25
申请号：EP12827376
申请日：2012-07-18
申请人： FUJIFILM CORP
发明人： OOTA KAZUYA
IPC分类号： G02B5/20 , C08F2/44 , C08F2/50 , C08F271/00 , C08F283/00 , G03F7/004 , G03F7/027 , G03F7/029 , G03F7/031
CPC分类号： G02B1/04 , C08F2/50 , G02B5/23 , G03F7/0007 , G03F7/0047 , G03F7/0048 , G03F7/027 , G03F7/029 , G03F7/031 , G03F7/033 , G03F7/038

8. 发明公开

EP2710417A1 RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN, COLOR FILTER AND METHOD OF PRODUCING THE SAME, AND SOLID-STATE IMAGE SENSOR 审中-公开
标题翻译：辐射敏感组合物，法形成图案，彩色滤光片及其制造方法和图像感应器SOLID STATE
公开(公告)号：EP2710417A1
公开(公告)日：2014-03-26
申请号：EP12827376.0
申请日：2012-07-18
申请人： FUJIFILM Corporation
发明人： OOTA, Kazuya
IPC分类号： G02B5/20 , C08F2/44 , C08F2/50 , C08F271/00 , C08F283/00 , G03F7/004 , G03F7/027 , G03F7/031
CPC分类号： G02B1/04 , C08F2/50 , G02B5/23 , G03F7/0007 , G03F7/0047 , G03F7/0048 , G03F7/027 , G03F7/029 , G03F7/031 , G03F7/033 , G03F7/038
摘要： The invention provides a radiation-sensitive composition for forming pixels for a solid-state image sensor, the radiation-sensitive composition comprising: titanium dioxide particles; an oligoimine dispersant including a nitrogen atom in at least one of a main chain or a side chain; a polymerizable compound; a photopolymerization initiator; and an organic solvent.

9. 发明公开

EP2698669A1 PHOTOSENSITIVE ORGANIC PARTICLE 审中-公开
标题翻译： LICHTEMPFINDLICHES有机硅TEILCHEN
公开(公告)号：EP2698669A1
公开(公告)日：2014-02-19
申请号：EP12771827.8
申请日：2012-04-11
申请人： Nissan Chemical Industries, Ltd.
发明人： KISHIOKA, Takahiro , UMEZAKI, Makiko , KIMURA, Shigeo , NISHIMAKI, Hirokazu , OHASHI, Tomoya , USUI, Yuki
IPC分类号： G03F7/038 , C08F220/54 , C08L101/00 , G03F7/004
CPC分类号： G03F7/20 , C08F220/20 , C08F220/30 , C08F220/54 , C08F220/56 , C08F220/58 , G03F7/004 , G03F7/0045 , G03F7/0046 , G03F7/0048 , G03F7/038 , G03F7/0382 , G03F7/0388 , G03F7/32
摘要： There is provided a material, which makes it possible to form a pattern by applying a photosensitive composition to a base material and drying to form a photosensitive coating and performing exposure and development, and a method for forming the pattern. A photosensitive composition comprising water-soluble organic particles, and a solvent, wherein the solvent is a poor solvent for the water-soluble organic particles. Preferably, the photosensitive wherein the water-soluble organic particles include a polymer which contains a unit structure (A) for forming organic particles, a unit structure (B) for forming interparticle crosslinkage, and a unit structure (C) for imparting dispersibility, and the photosensitive composition further comprises a photoacid generator. In addition, the photosensitive wherein the water-soluble organic particles include a polymer which contains the unit structure (A) for forming organic particles, the unit structure (B) for forming interparticle crosslinkage, the unit structure (C) for imparting dispersibility, and a unit structure (D) having a photoacid generating group. A pattern forming method comprising: a step of applying the photosensitive composition to a base material and drying to form a photosensitive coating; a step of exposing the coating to light through a mask; and a step of performing developing using a developer.
摘要翻译：提供了一种材料，其可以通过将感光性组合物施加到基材上并干燥以形成感光性涂层并进行曝光和显影而形成图案，以及形成图案的方法。包含水溶性有机颗粒和溶剂的光敏组合物，其中溶剂是水溶性有机颗粒的不良溶剂。优选地，其中水溶性有机颗粒包括含有用于形成有机颗粒的单元结构（A）的聚合物，用于形成颗粒间交联的单元结构（B）和用于赋予分散性的单元结构（C））的感光体，以及光敏组合物还包含光致酸产生剂。此外，其中水溶性有机颗粒包括含有用于形成有机颗粒的单元结构（A）的聚合物，用于形成颗粒间交联的单元结构（B），用于赋予分散性的单元结构（C））和具有光酸产生基团的单元结构（D）。一种图案形成方法，包括：将所述感光性组合物施加到基材上并干燥以形成感光性涂层的步骤; 通过掩模使涂层曝光的步骤; 以及使用显影剂进行显影的步骤。

10. 发明授权

EP1518902B1 Verwendung von hydroxyfunktionellen Polyalkylorganosiloxanen als Lösungsmittel für kationische Photoinitiatoren für die Verwendung in strahlenhärtbaren Siliconen 有权
标题翻译：羟基官能Polyalkylorganosiloxanen的用作可辐射固化的有机硅溶剂用于使用阳离子光引发剂
公开(公告)号：EP1518902B1
公开(公告)日：2014-01-01
申请号：EP04020002.4
申请日：2004-08-24
申请人： Evonik Degussa GmbH
发明人： Oestreich, Sascha, Dr. , Döhler, Hardi
IPC分类号： C08L83/06 , C08G77/16 , C08L83/12
CPC分类号： C09D183/04 , G03F7/0045 , G03F7/0048 , G03F7/0757

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