会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 1. 发明公开
    • PHOTOSENSITIVE ORGANIC PARTICLE
    • LICHTEMPFINDLICHES有机硅TEILCHEN
    • EP2698669A1
    • 2014-02-19
    • EP12771827.8
    • 2012-04-11
    • Nissan Chemical Industries, Ltd.
    • KISHIOKA, TakahiroUMEZAKI, MakikoKIMURA, ShigeoNISHIMAKI, HirokazuOHASHI, TomoyaUSUI, Yuki
    • G03F7/038C08F220/54C08L101/00G03F7/004
    • G03F7/20C08F220/20C08F220/30C08F220/54C08F220/56C08F220/58G03F7/004G03F7/0045G03F7/0046G03F7/0048G03F7/038G03F7/0382G03F7/0388G03F7/32
    • There is provided a material, which makes it possible to form a pattern by applying a photosensitive composition to a base material and drying to form a photosensitive coating and performing exposure and development, and a method for forming the pattern. A photosensitive composition comprising water-soluble organic particles, and a solvent, wherein the solvent is a poor solvent for the water-soluble organic particles. Preferably, the photosensitive wherein the water-soluble organic particles include a polymer which contains a unit structure (A) for forming organic particles, a unit structure (B) for forming interparticle crosslinkage, and a unit structure (C) for imparting dispersibility, and the photosensitive composition further comprises a photoacid generator. In addition, the photosensitive wherein the water-soluble organic particles include a polymer which contains the unit structure (A) for forming organic particles, the unit structure (B) for forming interparticle crosslinkage, the unit structure (C) for imparting dispersibility, and a unit structure (D) having a photoacid generating group. A pattern forming method comprising: a step of applying the photosensitive composition to a base material and drying to form a photosensitive coating; a step of exposing the coating to light through a mask; and a step of performing developing using a developer.
    • 提供了一种材料,其可以通过将感光性组合物施加到基材上并干燥以形成感光性涂层并进行曝光和显影而形成图案,以及形成图案的方法。 包含水溶性有机颗粒和溶剂的光敏组合物,其中溶剂是水溶性有机颗粒的不良溶剂。 优选地,其中水溶性有机颗粒包括含有用于形成有机颗粒的单元结构(A)的聚合物,用于形成颗粒间交联的单元结构(B)和用于赋予分散性的单元结构(C))的感光体,以及 光敏组合物还包含光致酸产生剂。 此外,其中水溶性有机颗粒包括含有用于形成有机颗粒的单元结构(A)的聚合物,用于形成颗粒间交联的单元结构(B),用于赋予分散性的单元结构(C))和 具有光酸产生基团的单元结构(D)。 一种图案形成方法,包括:将所述感光性组合物施加到基材上并干燥以形成感光性涂层的步骤; 通过掩模使涂层曝光的步骤; 以及使用显影剂进行显影的步骤。