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    • 4. 发明公开
    • SEMICONDUCTOR DEVICE
    • 半导体器件
    • EP2565922A1
    • 2013-03-06
    • EP11775053.9
    • 2011-04-27
    • Nissan Motor Co., Ltd
    • YAMAGAMI, ShigeharuHAYASHI, TetsuyaSUZUKI, Tatsuhiro
    • H01L27/04H01L21/336H01L29/12H01L29/47H01L29/78H01L29/872
    • H01L21/8213H01L21/046H01L21/0485H01L21/823487H01L27/0727H01L29/0619H01L29/0696H01L29/0865H01L29/1095H01L29/1602H01L29/1608H01L29/165H01L29/2003H01L29/6606H01L29/66068H01L29/7806H01L29/7813H01L29/861H01L29/872
    • An object of the invention is to reduce distance between each pair of adjacent insulating gate portions and thereby miniaturize a semiconductor device. A drift region is provided on a semiconductor substrate; first well regions are provided in upper part of the drift region; and source regions are provided in upper part of the first well regions. Each insulating gate portion forms a channel (a inversion layer) in part of the first well region located between the drift region and source region. A first main electrode forms junctions with part of the drift region exposed in the major surface to constitute unipolar diodes and is connected to the first well regions and the source regions. The plurality of insulating gate portions have linear patterns parallel to each other when viewed in the normal direction of the major surface. Between each pair of adjacent insulating gate portions, junction portions in which the first main electrode forms junctions with the drift region and the first well regions are arranged along the direction that the insulating gate portions extend. The channels are formed at least in the normal direction of the major surface.
    • 本发明的目的是减小每对相邻的绝缘栅极部分之间的距离,从而使半导体器件小型化。 漂移区域设置在半导体衬底上; 第一阱区设置在漂移区的上部; 并且在第一阱区的上部提供源极区。 每个绝缘栅极部分在位于漂移区和源极区之间的第一阱区的一部分中形成沟道(反型层)。 第一主电极与在主表面中暴露的漂移区的一部分形成结以构成单极二极管并连接到第一阱区和源极区。 当在主表面的法线方向上观察时,多个绝缘栅极部分具有彼此平行的线性图案。 在每对相邻的绝缘栅极部分之间,第一主电极与漂移区域和第一阱区域形成结的结部分沿着绝缘栅极部分延伸的方向布置。 通道至少在主表面的法线方向上形成。