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1. 发明公开

EP2489757A2 Plasma grid implant system for use in solar cell fabrications 无效
标题翻译：疟原虫 - 植入物系统zen Verwendung bei der Herstellung von Solarzellen
公开(公告)号：EP2489757A2
公开(公告)日：2012-08-22
申请号：EP12164231.8
申请日：2010-06-23
申请人： Intevac, Inc.
发明人： Chun, Moon , Adibi, Babak
IPC分类号： C23C14/04 , C23C14/48 , H01J37/32 , H01L21/223
CPC分类号： H01L31/1876 , C23C14/042 , C23C14/48 , H01J37/185 , H01J37/3171 , H01J37/32412 , H01J37/32422 , H01J2237/0437 , H01J2237/184 , H01J2237/201 , H01J2237/327 , H01J2237/3365 , H01L21/2236 , H01L31/068 , H01L31/0682 , H01L31/1804 , H01L31/1864 , Y02E10/547 , Y02P70/521
摘要： A method of ion implantation comprising: providing a plasma within a plasma region of a chamber; positively biasing a first grid plate, wherein the first grid plate comprises a plurality of apertures; negatively biasing a second grid plate, wherein the second grid plate comprises a plurality of apertures; flowing ions from the plasma in the plasma region through the apertures in the positively-biased first grid plate; flowing at least a portion of the ions that flowed through the apertures in the positively-biased first grid plate through the apertures in the negatively-biased second grid plate; and implanting a substrate with at least a portion of the ions that flowed through the apertures in the negatively-biased second grid plate.
摘要翻译：一种离子注入的方法，包括：在室的等离子体区域内提供等离子体; 使第一格栅板向正偏置，其中第一格板包括多个孔; 负偏置第二格栅板，其中所述第二格板包括多个孔; 使来自等离子体区域中的等离子体的离子通过正偏压的第一格栅板中的孔流动; 使流经所述正偏置的第一格栅板中的孔的至少一部分离子流过负偏置的第二格栅板中的孔; 以及用至少部分离子注入衬底，所述离子流过所述负偏压的第二栅格板中的所述孔。

2. 发明公开

EP2814051A1 Shadow mask implantation system 审中-公开
标题翻译：阴影掩模植入系统
公开(公告)号：EP2814051A1
公开(公告)日：2014-12-17
申请号：EP14176404.3
申请日：2011-02-09
申请人： Intevac, Inc.
发明人： Chun, Moon , Adibi, Babak
IPC分类号： H01J37/317 , H01L21/266
CPC分类号： H01J37/3171 , G03F1/20 , H01J2237/31711 , H01L21/266
摘要： An adjustable shadow mask implantation system comprising: an ion source configured to provide ions; a first occlusion mask having a first set of elongated openings substantially parallel to a first axis; and a second occlusion mask having a second set of elongated openings substantially parallel to the first axis, wherein the first occlusion mask and the second occlusion mask are configured such that the first set of elongated openings overlap with, but are offset from, the second set of elongated openings to form a resulting set of elongated openings through which ions from the ion source are selectively allowed to pass therethrough to a substrate where they are implanted, each elongated opening of the resulting set being smaller than each elongated opening of the first and second sets.
摘要翻译：一种可调节荫罩植入系统，包括：配置成提供离子的离子源; 第一阻塞掩模，其具有基本平行于第一轴线的第一组细长开口; 以及具有基本平行于所述第一轴线的第二组细长开口的第二阻塞掩模，其中所述第一阻塞掩模和所述第二阻塞掩模被配置成使得所述第一组细长开口与所述第二组重叠但偏离的细长开口以形成最终的一组细长开口，来自离子源的离子通过该开口被选择性地允许穿过其到达其中它们被注入的衬底，所得到的组的每个细长开口比第一和第二集。

3. 发明公开

EP2489757A3 Plasma grid implant system for use in solar cell fabrications 无效
标题翻译：等离子体晶格植入物在太阳能电池的制造中使用的系统
公开(公告)号：EP2489757A3
公开(公告)日：2016-01-06
申请号：EP12164231.8
申请日：2010-06-23
申请人： Intevac, Inc.
发明人： Chun, Moon , Adibi, Babak
IPC分类号： C23C14/04 , C23C14/48 , H01J37/32 , H01L21/223 , H01L31/18 , H01J37/18 , H01J37/317
CPC分类号： H01L31/1876 , C23C14/042 , C23C14/48 , H01J37/185 , H01J37/3171 , H01J37/32412 , H01J37/32422 , H01J2237/0437 , H01J2237/184 , H01J2237/201 , H01J2237/327 , H01J2237/3365 , H01L21/2236 , H01L31/068 , H01L31/0682 , H01L31/1804 , H01L31/1864 , Y02E10/547 , Y02P70/521
摘要： A method of ion implantation comprising: providing a plasma within a plasma region of a chamber; positively biasing a first grid plate, wherein the first grid plate comprises a plurality of apertures; negatively biasing a second grid plate, wherein the second grid plate comprises a plurality of apertures; flowing ions from the plasma in the plasma region through the apertures in the positively-biased first grid plate; flowing at least a portion of the ions that flowed through the apertures in the positively-biased first grid plate through the apertures in the negatively-biased second grid plate; and implanting a substrate with at least a portion of the ions that flowed through the apertures in the negatively-biased second grid plate.

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