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1. 发明公开

EP1788382A1 Electrochemical residual chlorine measuring method and device with a doped diamond working electrode 审中-公开
标题翻译：一种电化学方法和设备，用于测量残余的氯与掺杂金刚石工作电极
公开(公告)号：EP1788382A1
公开(公告)日：2007-05-23
申请号：EP06024071.0
申请日：2006-11-20
申请人： HORIBA, LTD. , Keio University
发明人： Nomura, Satoshi , Einaga, Yasuaki Keio University , Matsumoto, Koichi , Murata, Michio Keio University , Shibata, Mamoru Keio University
IPC分类号： G01N27/30 , G01N27/49
CPC分类号： G01N27/308 , G01N27/4045 , G01N33/0052
摘要： A residual chlorine measuring method includes the steps of: bringing a counter electrode 4, a working electrode 2 and a reference electrode 3 into contact with a sample solution containing residual chlorine; applying a voltage between the counter electrode 4 and the working electrode 2; and measuring a current value when applying the voltage to calculate a concentration of the residual chlorine. The working electrode 2 is an electrically conductive diamond electrode to which boron is doped. The reference electrode 3 is a silver/silver chloride electrode. A current value when setting the potential of the electrically conductive diamond electrode 2 to the silver/silver chloride electrode 3 to +0.5 V to +1.5 V is measured.
摘要翻译：甲残留氯测定方法包括以下步骤：使对电极4，工作电极2和参比电极3与含有残氯的试样溶液接触; 施加对置电极4和工作电极2之间施加电压; 和测量的电流值。当将电压施加到计算的残留氯的浓度。工作电极2是导电性金刚石电极有硼掺杂。参比电极3是银/氯化银电极。的电流值。当导电性金刚石电极2的电位设定为银/氯化银电极为3〜0.5 V至1.5 V的测定。

2. 发明公开

EP0877243A1 Material evaluation method 失效
标题翻译： Materialbewertungsmethode
公开(公告)号：EP0877243A1
公开(公告)日：1998-11-11
申请号：EP98108468.4
申请日：1998-05-08
申请人： HORIBA, LTD. , Research Institute of Innovative Technology for the Earth
发明人： Nomura, Satoshi , Takamatsu, Shuji , Nakao, Motoi
IPC分类号： G01N27/30
CPC分类号： G01N27/305
摘要： The present invention relates to a method for evaluating materials, which can evaluate the properties of various materials easily and quickly as well as accurately and reliably even if there exists only a small amount of the material. The method can display for example a pH change as a two-dimensional chemical image. The method for evaluating according to this invention provides a solution or gas (24) in contact with a sensor surface (7) on a semiconductor substrate (5). The material to be evaluated (23) is brought into contact with the solution or gas (24). Said semiconductor substrate (5) is scanned in x and y directions by a laser beam (3) and a resulting photocurrent is detected which represents subtle changes in distribution of substance concentration or property parameters induced in the solution or gas and a two dimensional image thereof is displayed.
摘要翻译：本发明涉及一种评价材料的方法，即使只存在少量的材料，也能够容易，快速，准确可靠地评价各种材料的性质。该方法可以显示例如作为二维化学图像的pH变化。根据本发明的评估方法提供了与半导体衬底（5）上的传感器表面（7）接触的溶液或气体（24）。要评估的材料（23）与溶液或气体（24）接触。所述半导体衬底（5）通过激光束（3）沿x和y方向扫描，并且检测到所得到的光电流，其表示在溶液或气体中诱导的物质浓度或特性参数的分布的微小变化及其二维图像被展示。

3. 发明授权

EP0745683B1 Process for measuring microbial activity state 失效
标题翻译：一种用于微生物活性的测量方法
公开(公告)号：EP0745683B1
公开(公告)日：2001-08-16
申请号：EP96108466.2
申请日：1996-05-28
申请人： HORIBA, LTD.
发明人： Iwasaki, Hiroshi , Fukushige, Tomoaki , Akano, Hirofumi , Nomura, Satoshi , Tomita, Katsuhiko
IPC分类号： C12Q1/02
CPC分类号： C12M41/46 , C12Q1/04

4. 发明公开

EP0745683A1 Process for measuring microbial activity state 失效
标题翻译： Verfahren zur Messung der mikrobiellenAktivität
公开(公告)号：EP0745683A1
公开(公告)日：1996-12-04
申请号：EP96108466.2
申请日：1996-05-28
申请人： HORIBA, LTD.
发明人： Iwasaki, Hiroshi , Fukushige, Tomoaki , Akano, Hirofumi , Nomura, Satoshi , Tomita, Katsuhiko
IPC分类号： C12Q1/02
CPC分类号： C12M41/46 , C12Q1/04
摘要： The invention relates to a process for measuring the state of microbial activities comprising: calling microorganisms into activity in a process or environment in which microorganisms are desired to be active; cultivating the microorganisms in a culture medium; observing a change of chemical substances varied by the then metabolism of the microorganisms; and obtaining the activity state of the microorganisms based on said change.
摘要翻译：本发明涉及一种用于测量微生物活性状态的方法，包括：将微生物称为在期望活性微生物的方法或环境中的活性; 培养培养基中的微生物; 观察随着微生物代谢变化的化学物质的变化; 并基于所述变化获得微生物的活性状态。

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