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    • 3. 发明公开
    • CHICANE BLANKER ASSEMBLIES FOR CHARGED PARTICLE BEAM SYSTEMS AND METHODS OF USING THE SAME
    • SCHIKANENAUSTASTERANORDNUNG货物的承载梁系统和及其使用方法
    • EP3002775A1
    • 2016-04-06
    • EP15150310.9
    • 2015-01-07
    • FEI COMPANY
    • Kagarice, KevinOtis, CharlesParker, N. William
    • H01J37/04H01J37/05
    • H01J37/045H01J37/05H01J2237/004H01J2237/028H01J2237/057H01J2237/15H01J2237/28H01J2237/31745H01J2237/31749H01J2237/32
    • A chicane blanker assembly for a charged particle beam system includes an entrance and an exit, at least one neutrals blocking structure, a plurality of chicane deflectors, a beam blanking deflector (620), and a beam blocking structure. The entrance is configured to accept a beam of charged particles propagating along an axis. The at least one neutrals blocking structure intersects the axis. The plurality of chicane deflectors includes a first chicane deflector (610), a second chicane deflector, a third chicane deflector, and a fourth chicane deflector sequentially arranged in series between the entrance and the exit and configured to deflect the beam along a path that bypasses the neutrals blocking structure and exits the chicane blanker assembly through the exit. In embodiments, the chicane blanker assembly includes a two neutrals blocking structures. In embodiments, the beam blocking structure is arranged between the third chicane deflector and the fourth chicane deflector.
    • 用于带电粒子束系统中的急弯裸露组件包括在入口和出口处,所述至少一个中性阻挡结构,急弯偏转复数,一个光束消隐偏转器(620),和一个光束阻挡结构。 入口被配置为接受沿轴传播的带电粒子的束。 所述至少一个中性阻挡结构相交的轴线。 急弯偏转器的多元性包括第一急弯偏转器(610),第二急弯偏转器,第三急弯偏转器,并在入口和出口之间并配置串联布置的第四急弯偏转器按顺序沿着路径做旁路到光束偏转 中性粒子阻挡结构并通过出口离开弯道裸组件。 在实施例中,急弯裸组件包括一个两个中性阻挡结构。 在实施例中,束阻挡结构在第三急弯偏转器和所述第四急弯偏转器之间布置。
    • 6. 发明公开
    • Lamella creation method and device using fixed-angle beam and rotating sample stage
    • 板条利用角度稳定的支撑成形方法和装置以及旋转样品台
    • EP2674742A2
    • 2013-12-18
    • EP13171169.9
    • 2013-06-10
    • FEI COMPANY
    • Wells, AndrewParker, N. WilliamChandler, CliveUtlaut, Mark
    • G01N1/32
    • G01N1/32H01J37/3023H01J37/3056H01J2237/31745
    • A method and system for creating a substantially planar face in a substrate, the method including directing one or more beams at a first surface of a substrate to remove material from a first location in the substrate, the beam being offset from a normal to the first surface by a nonzero curtaining angle; sweeping the one or more beams in a plane that is perpendicular to the first surface to mill one or more initial cuts in the substrate, the initial cuts exposing a second surface that is substantially perpendicular to the first surface; rotating the substrate through a nonzero rotation angle about an axis other than an axis that is normal to the first beam or parallel to the first beam; directing the first beam at the second surface to remove additional material from the substrate without changing the first nonzero curtaining angle; and scanning the one or more beams in a pattern across the second surface to mill one or more finishing cuts in the substrate.
    • 一种用于在基片创建基本上平坦的面,所述方法包括在一衬底以从衬底的第一位置移除材料的第一表面引导一个或多个波束的方法和系统中,光束被从正常偏移到所述第一 表面由一个非零垂落角; 在一个平面席卷一个或多个波束并垂直于所述第一表面到磨机中的一个或更多衬底初始切口,初始切口暴露的第二表面所做的是基本上垂直于所述第一表面上; 通过围绕轴线上以外于轴线即垂直于第一光束或平行于所述第一光束非零旋转角度旋转所述基片; 在第二表面引导所述第一光束,以除去从基板附加材料,而不改变第一个非零垂落角; 并扫描一个或多个光束在穿过所述第二表面的图案,以磨中的一个或更多衬底精加工切削。