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3. 发明公开

EP4336540A1 SMALL-TARGET X-RAY SYSTEM 审中-公开
公开(公告)号：EP4336540A1
公开(公告)日：2024-03-13
申请号：EP22195135.3
申请日：2022-09-12
申请人： Excillum AB
发明人： NILSSON, Daniel , LUNDSTRÖM, Ulf
IPC分类号： H01J35/08 , H01J35/14 , H01J35/30 , H05G1/52
摘要： An X-ray system comprising an X-ray source; a sample position; a detector arranged to detect X-ray radiation downstream of said sample position; and a controller is disclosed. The X-ray source comprises an electron source arranged to provide an electron beam; a target arranged to produce X-ray radiation upon impact by said electron beam at an electron beam spot, wherein said target comprises a substrate and a target layer, and wherein said target layer exhibits a hole having a diameter smaller than a diameter of the electron beam spot; a deflector for directing the electron beam to a first position on said target where the electron beam spot is formed at a uniform portion of said target layer away from said hole, and to a second position on said target where the electron beam spot is formed at a portion of said target exhibiting said hole. The controller is configured to acquire, using said detector, a first image with the electron beam directed to said first position, and a second image with the electron beam directed to said second position, and to generate a difference image between the first image and the second image. A corresponding method is also disclosed.

5. 发明公开

EP4195235A1 METHOD AND ARRANGEMENT FOR AN X-RAY SOURCE 无效
公开(公告)号：EP4195235A1
公开(公告)日：2023-06-14
申请号：EP21213046.2
申请日：2021-12-08
申请人： Excillum AB
发明人： TAKMAN, Per , TUOHIMAA, Tomi , LUNDSTRÖM, Ulf
IPC分类号： H01J35/14 , H01J35/06 , H05G1/52
摘要： There is provided an X-ray source comprising an electron source for providing an electron beam, the electron source comprising a cathode, a Wehnelt, and an anode; an electron optic arrangement configured to deflect and focus the electron beam towards a target for generation of X-ray radiation; an arrangement for determining a quantity indicative of a width of the electron beam; and a controller operatively connected to the electron source, the electron optic arrangement, and the arrangement for determining the quantity indicative of a width of the electron beam, the controller configured to compute a quantity dependent on a divergence of the electron beam at an entrance of the electron optic arrangement based on the quantity indicative of a width of the electron beam; and apply a bias voltage to the Wehnelt such that the quantity dependent on the divergence of the electron beam at the entrance of the electron optic arrangement is adjusted towards a desired value. A corresponding method is also provided.

7. 发明公开

EP4380021A1 CURRENT-PROTECTED ELECTROMAGNETIC PUMP ARRANGEMENT AND METHOD 审中-公开
公开(公告)号：EP4380021A1
公开(公告)日：2024-06-05
申请号：EP22210856.5
申请日：2022-12-01
申请人： Excillum AB
发明人： LUNDSTRÖM, Ulf
IPC分类号： H02K44/04
CPC分类号： H02K44/04
摘要： An electromagnetic pump arrangement configured for circulating a liquid metal is disclosed. The arrangement comprises an electromagnetic pump comprising an inlet and an outlet; a conduit forming at least part of a path for the liquid metal to flow from the outlet to the inlet; a power supply configured to provide a driving voltage to the electromagnetic pump between the inlet and the outlet; and a current limiter configured to limit electrical current flowing from the outlet to the inlet through the conduit and the liquid metal. A corresponding method for circulating liquid metal is also disclosed, as well as a system comprising such electromagnetic pump arrangement.

9. 发明公开

EP4250876A2 MECHANICAL ALIGNMENT OF X-RAY SOURCES 审中-实审
公开(公告)号：EP4250876A2
公开(公告)日：2023-09-27
申请号：EP23184068.7
申请日：2019-11-04
申请人： Excillum AB
发明人： KRONSTEDT, Johan , LUNDSTRÖM, Ulf , TAKMAN, Per
IPC分类号： H05G2/00
摘要： An X-ray source (100), comprising: an electron source (110) adapted to provide an electron beam (e) directed towards a liquid jet target such that the electron beam interacts with the liquid jet target to generate X-ray radiation (X); a deflector arranged for scanning the electron beam over the liquid jet target; a target orientation sensor (270, 272) configured to generate a signal indicating an orientation of the liquid jet target relative to the electron beam by monitoring a quantity indicative of an interaction between the electron beam and the liquid jet target as a function of electron beam position; and a target adjustment means (280) configured to adjust the orientation of the liquid jet target relative to the electron beam. A corresponding method for aligning an X-ray source is also disclosed.

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