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1. 发明公开

EP2216804A1 PLASMA PROCESSING APPARATUS 审中-公开
标题翻译：等离子体处理装置
公开(公告)号：EP2216804A1
公开(公告)日：2010-08-11
申请号：EP08848700.4
申请日：2008-11-12
申请人： EMD Corporation , Evatech Co., Ltd.
发明人： SETSUHARA, Yuichi , EBE, Akinori , INO, Eiji , ISHIHARA, Shinichiro , ASHIDA, Hajime , WATANABE, Akira
IPC分类号： H01L21/205 , C23C16/509 , H01L21/3065
CPC分类号： C23C16/503 , C03C17/22 , C03C2217/28 , C03C2218/153 , C23C16/24 , C23C16/509 , H01J37/321 , H01J37/3211 , H01J37/32715
摘要： The present invention aims at providing a plasma processing apparatus for performing a plasma processing on a planar substrate body to be processed, the apparatus being capable of generating the plasma with good uniformity and efficiently using the plasma, and having a high productivity. That is, the plasma processing apparatus according to the present invention includes: a vacuum chamber 11; one or plural antenna supporters (plasma generator supporters) 12 projecting into the internal space 111 of the vacuum chamber 11; radio-frequency antennas (plasma generators) 13 attached to each antenna supporter 12; and a pair of substrate body holders 16 provided across the antenna supporter 12 in the vacuum chamber 11, for holding a planar substrate body to be processed 21.
摘要翻译：本发明的目的在于提供一种等离子体处理装置，该等离子体处理装置用于对平面状的被处理基板进行等离子体处理，该等离子体处理装置能够良好地均匀地生成等离子体，并且能够高效率地使用等离子体，生产率高。即，根据本发明的等离子体处理装置包括：真空室11; 伸入真空室11的内部空间111的一个或多个天线支撑件（等离子体发生器支撑件）12; 连接到每个天线支架12的射频天线（等离子体发生器）13; 以及一对基板主体保持件16，设置在真空室11中的天线支撑件12的两侧，用于保持平面的待处理基板主体21。

2. 发明公开

EP2213595A1 SUBSTRATE PROCESSING APPARATUS 审中-公开
标题翻译： SUBSTRATVERARBEITUNGSVORRICHTUNG
公开(公告)号：EP2213595A1
公开(公告)日：2010-08-04
申请号：EP08839220.4
申请日：2008-09-29
申请人： Evatech Co., Ltd.
发明人： INO, Eiji , WATANABE, Akira , ASHIDA, Hajime
IPC分类号： B65G49/06 , C23C14/56 , C23C16/44 , H01L21/205 , H01L21/3065 , H01L21/677
CPC分类号： C23C16/54 , B65G49/061 , B65G49/063 , B65G49/068 , B65G2249/02 , H01L21/67173 , H01L21/67196 , H01L21/67706 , H01L21/67712 , H01L21/67718 , H01L21/67724 , H01L21/67751 , H01L21/67757 , H01L21/6776
摘要： The present invention provides a substrate processing apparatus capable of achieving space saving and cost reduction.
That is, the present invention provides a substrate processing apparatus for carrying a substrate W in a standing position and performing a predetermined process to the substrate W, including: a plurality of substrate processing chambers 230, 240, and 250; and a common carrying delivery chamber 220 for carrying a substrate to each of the substrate processing chambers, where: at least one of the substrate processing chambers 230, 240 and 250 is provided above or below the common carrying delivery chamber 220; and a substrate passage opening through which the substrate W can pass is provided at the boundaries between the processing chambers and the carrying chamber 220.
摘要翻译：本发明提供能够实现节省空间并降低成本的基板处理装置。也就是说，本发明提供了一种用于将基板W承载在竖立位置并对基板W执行预定处理的基板处理装置，包括：多个基板处理室230,240和250; 以及用于将基板承载到每个基板处理室的公共搬运室220，其中：至少一个基板处理室230,240和250设置在公共搬运输送室220的上方或下方; 并且在处理室和输送室220之间的边界处设置有衬底W可以通过的衬底通道开口。

3. 发明公开

EP2360716A1 PLASMA PROCESSING APPARATUS 审中-公开
标题翻译： PLASMAVERARBEITUNGSVORRICHTUNG
公开(公告)号：EP2360716A1
公开(公告)日：2011-08-24
申请号：EP09827341.0
申请日：2009-11-17
申请人： Evatech Co., Ltd.
发明人： INO, Eiji , WATANABE, Akira , ISHIHARA, Shunichi , ASHIDA, Hajime , SHOJI, Hiroshi , YOSHIMURA, Keiichi
IPC分类号： H01L21/205 , C23C16/509 , H01L31/04
CPC分类号： H01J37/32568 , C23C16/45578 , C23C16/509 , H01J37/3244
摘要： A plasma processing device 10 according to the present invention includes a plasma processing chamber 11 consisting of a vacuum container, a pair of substrate holders 12 standing opposite each other in the plasma processing chamber 11, a plurality of first reaction gas tubes 13 provided between the two substrate holders 12, and a plurality of second reaction gas tubes 14 provided between the plurality of first reaction gas tubes 13 and each of the two substrate holders 12. The first reaction gas tubes 13, which are made of an electrically conductive material, are electrically connected to a first radio-frequency power source 151 or second radio-frequency power source 152. The first reaction gas tubes 13 double as a radio-frequency antenna, while the second reaction gas tubes 14 double as an electrode.
摘要翻译：根据本发明的等离子体处理装置10包括：等离子体处理室11，其由真空容器，在等离子体处理室11中彼此相对定位的一对基板保持件12组成，多个第一反应气体管13，两个基板保持件12以及设置在多个第一反应气体管13和两个基板保持器12中的每一个之间的多个第二反应气体管14.由导电材料制成的第一反应气体管13是电连接到第一射频电源151或第二射频电源152.第一反应气体管13作为射频天线加倍，而第二反应气体管14作为电极加倍。

4. 发明公开

EP2216277A1 SUBSTRATE HOLDING MECHANISM, SUBSTRATE DELIVERY/RECEPTION MECHANISM, AND SUBSTRATE PROCESSING DEVICE 审中-公开
标题翻译：机制ZUM HALTEN VON SUBSTRATEN，SUBSTRATABGABE - / - AUFNAHMEMECHANISMUS UNDSTRATBEARBEITUNGSVORRICHTUNG
公开(公告)号：EP2216277A1
公开(公告)日：2010-08-11
申请号：EP08836514.3
申请日：2008-09-29
申请人： Evatech Co., Ltd.
发明人： ISHIHARA, Shinichiro , ASHIDA, Hajime , WATANABE, Akira
IPC分类号： B65G49/06 , H01L21/677
CPC分类号： H01L21/67236 , B65G49/063 , B65G49/064 , B65G49/067 , B65G2249/02 , H01L21/67706 , H01L21/67712 , H01L21/67718 , H01L21/67748 , H01L21/67751
摘要： The present invention provides a substrate holding mechanism capable of assuredly holding a substrate and delivering/receiving it: a substrate holding mechanism including a substrate holding unit for holding a rectangular substrate W, comprising: a plurality of substrate holding rollers 120 provided at positions corresponding to two opposite sides of the substrate W on the substrate holding unit and pivotally supported by the substrate holding unit; and a roller driver for rotating the substrate holding rollers 120, wherein: the substrate holding roller 120 comprises a cylinder part 121 and a holding flange 123a or 123b provided along a portion of a circumference of each end of the cylinder part 121; and each of the substrate holding rollers 120 is rotated by the roller driver so that a state of holding edges of the substrate W by the holding flange 123a or 123b and a state of releasing the edges can be switched in accordance with a rotation angle of the substrate holding rollers 120.
摘要翻译：本发明提供一种能够可靠地保持基板并传送/接收基板的基板保持机构：具有用于保持矩形基板W的基板保持单元的基板保持机构，包括：多个基板保持辊120，其设置在与基板保持单元上的基板W的两个相对侧并由基板保持单元枢转地支撑; 以及用于旋转基板保持辊120的辊驱动器，其中：基板保持辊120包括沿着圆筒部121的每个端部的圆周的一部分设置的圆筒部121和保持凸缘123a或123b; 并且每个基板保持辊120被辊驱动器旋转，使得通过保持凸缘123a或123b保持基板W的保持边缘的状态和释放边缘的状态可以根据旋转角度基板保持辊120。

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