专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明公开

EP1867014A2 GAS DISCHARGE LASER OUTPUT LIGHT BEAM PARAMETER CONTROL 有权
标题翻译：控制在所述主梁的气体放电激光器的参数
公开(公告)号：EP1867014A2
公开(公告)日：2007-12-19
申请号：EP06748813.0
申请日：2006-03-27
申请人： Cymer, Inc.
发明人： BESAUCELE, Herve, A. , FOMENKOV, Igor, V. , PARTLO, William, N. , TRINTICHOUK, Fedor , TON-THAT, Hao
IPC分类号： H01S3/22
CPC分类号： H01S3/036 , H01S3/038 , H01S3/097 , H01S3/09702 , H01S3/134
摘要： A line narrowed gas discharge laser system and method of operation are disclosed which may comprise: an oscillator cavity; a laser chamber comprising a chamber housing containing a lasing medium gas; at least one peaking capacitor electrically connected to the chamber housing and to a first one of a pair of electrodes; a second one of the pair of electrodes connected to an opposite terminal of the at least one peaking capacitor; a current return path connected to the chamber housing; the one terminal, the first one of the electrodes, the lasing medium gas, the second one of the electrodes, the current return path and the second terminal forming a head current inductive loop having an inductance unique to the particular head current inductive loop; a spectral quality tuning mechanism comprising a mechanism for changing the particular head current inductive loop inductance value for the particular head current inductance loop.

2. 发明公开

EP1323216A1 VERY NARROW BAND, TWO CHAMBER, HIGH REP RATE GAS DISCHARGE LASER SYSTEM 审中-公开
标题翻译：具有两室和高重复率非常狭窄的气体喷出激光系统
公开(公告)号：EP1323216A1
公开(公告)日：2003-07-02
申请号：EP01977198.9
申请日：2001-09-25
申请人： Cymer, Inc.
发明人： MYERS, David, W. , BESAUCELE, Herve, A. , ERSHOV, Alexander, I. , PARTLO, William, N. , SANDSTROM, Richard, L. , DAS, Palash, P. , ANDERSON, Stuart, L. , FOMENKOV, Igor, V. , UJAZDOWSKI, Richard, C. , PAN, Xiaojiang, J. , ONKELS, Eckehard, D. , NESS, Richard, M. , BROWN, Daniel, J. W.
IPC分类号： H01S3/10
CPC分类号： H01S3/2366 , G01J9/00 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333
摘要： An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers (10A, 12A) are provided, one of which is a part of a master oscillator (10) producing a very narrow band seed beam which is amplified in the second discharge chamber (12). The chambers (10A, 12A) can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator (10) and optimization of pulse energy parameters in the amplifying chamber (12A). A preferred embodiment in an ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber (10A, 12A) comprises a single tangential fan (10A, 10) providing sufficient gas flow (11) to permit operation at pulse rates of 4,000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator (10) is equipped with a line narrowing package (16, 16A) having a very fast tuning mirror capable of controlling centerline wavelength on a pulse-to-pulse basis at repetition rates of 4,000 Hz or greater to a precision of less than 0.2 pm.

3. 发明授权

EP1060542B1 LASER CHAMBER WITH MINIMIZED ACOUSTIC AND SHOCK WAVE DISTURBANCES 有权
标题翻译：干扰减少的BY声波和激波激光室
公开(公告)号：EP1060542B1
公开(公告)日：2008-05-21
申请号：EP99908340.5
申请日：1999-02-22
申请人： Cymer, Inc.
发明人： JUHASZ, Tibor , UJAZDOWSKI, Richard, C. , BESAUCELE, Herve, A. , OZARSKI, Robert, G. , AZZOLA, James, H.
IPC分类号： H01S3/036 , H01S3/225
CPC分类号： H01S3/036
摘要： A laser chamber (100) had angled reflectors (116, 118) that reflect acoustic and shock waves away from the laser discharge area (103) to minimize acoustic and shock wave disturbances. The angled reflector may have different configurations to assist in the dissipation of the acoustic and shock waves. For example, the angled reflector (116, 118) may have a modulated reflective surface, such as having grooves or holes defined within the surface. Further, the angled reflector (116, 118) may have a reflective surface with acoustic and shock wave absorbing properties. The reflective surface with absorbent properties may be a felt metal or have multiple layered porous surfaces. In addition, the walls of the laser chamber (100) may be modulated to assist in the dissipation of the acoustic waves and shock waves through absorption, scattering, and by generating interference within the reflected waves. Multiple layered porous surfaces may be used along the walls to absorb and scatter incident waves. The walls of the laser chamber (100) may also be covered with an acoustic and shock wave absorbing material, such as felt metal. In other embodiments, the walls of the laser chamber (100) are modulated with grooves (132), such as triangular or rectangular horizontal grooves, which scatter incident waves and generate interference within reflected waves.

4. 发明公开

EP1010040A1 LASER-ILLUMINATED STEPPER OR SCANNER WITH ENERGY SENSOR FEEDBACK 失效
标题翻译：激光照射步进器或扫描器ENERGIESENSORRÜCKOPPLUNG
公开(公告)号：EP1010040A1
公开(公告)日：2000-06-21
申请号：EP98939150.3
申请日：1998-07-31
申请人： Cymer, Inc.
发明人： SANDSTROM, Richard, L. , DAS, Palash, P. , FOMENKOV, Igor V. , BESAUCELE, Herve, A. , OZARSKI, Robert, G.
IPC分类号： G03B27/42 , G03B27/54 , G03B27/60 , G03B27/72 , H01S3/10 , H01S3/18
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70358 , G03F7/70558 , G03F7/70575 , H01S3/03 , H01S3/036 , H01S3/08009 , H01S3/134 , H01S3/225 , H01S3/2251 , H01S3/2256
摘要： A laser-illuminated wafer-exposing system such as a stepper (20) or scanner having a first light intensity detector (44) located within the exposing system near a mask (36) and second light intensity detector (46) located near the output of the laser (12). A feedback control system (14) controls the output of the laser based on signals detected by at least one of the detectors. The feedback control system includes a processor programmed with an algorithm which is used to control the laser discharge voltage in order to provide light pulses having desired intensity at the mask with the laser operating in a burst mode. The algorithm utilizes at least the following parameters; a previously measured pulse energy, a calculated energy error, a calculated dose error, a value for the rate of change of pulse energy with voltage, and at least one reference voltage. In a preferred embodiment the algorithm uses the pulse energy measured with the light intensity detector located near the mark to provide the feedback control and uses the light intensity detector at the output of the laser to assure that the output of the laser is maintained within a predetermined range.

6. 发明公开

EP1438772A2 LINE SELECTED F 2? TWO CHAMBER LASER SYSTEM 审中-公开
标题翻译：与选行LASER F2-TWO腔系统
公开(公告)号：EP1438772A2
公开(公告)日：2004-07-21
申请号：EP02773221.3
申请日：2002-08-19
申请人： Cymer, Inc.
发明人： KNOWLES, David, S. , BROWN, Daniel, J., W. , SANDSTROM, Richard, L. , RYLOV, German, E. , ONKELS, Eckehard, D. , BESAUCELE, Herve, A. , MYERS, David, W. , ERSHOV, Alexander, I. , PARTLO, William, N. , FOMENKOV, Igor, V. , UJAZDOWSKI, Richard, C. , NESS, Richard, M. , SMITH, Scot, T. , HULBURD, William, G.
IPC分类号： H01S3/11
CPC分类号： H01S3/2366 , G01J9/00 , G03F7/70025 , G03F7/70041 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333
摘要： An injection seeded modular gas discharge laser system (2) capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator (10) producing a very narrow band seed beam, which is amplified (12) in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in the ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan (10A) providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The masters oscillator is equipped with a line narrowing package having a very fast tuning mirror capable of controlling centerline wavelength an a pulse to pulse basis at repetition rates of 4,000 Hz or greater to precision of less that 0.2 pm.

7. 发明公开

EP1060543A1 RELIABLE, MODULAR, PRODUCTION QUALITY NARROW-BAND KrF EXCIMER LASER 有权
标题翻译：模块化的，窄带KrF准分子激光
公开(公告)号：EP1060543A1
公开(公告)日：2000-12-20
申请号：EP99938017.3
申请日：1999-02-16
申请人： Cymer, Inc.
发明人： KNOWLES, David, S. , AZZOLA, James, H. , BESAUCELE, Herve, A. , DAS, Palash, P. , ERSHOV, Alexander I. , JUHASZ, Tibor , NESS, Richard, M. , OZARSKI, Robert, G. , PARTLO, William, N. , ROTHWEIL, Daniel, A. , SANDSTROM, Richard, L. , UJAZDOWSKI, Richard, C. , WATSON, Tom, A. , FOMENKOV, Igor, V.
IPC分类号： H01S3/22 , H01S3/097 , H01S3/08
CPC分类号： G03F7/70358 , G03F7/70025 , G03F7/70041 , G03F7/70558 , G03F7/70575 , H01S3/03 , H01S3/036 , H01S3/08009 , H01S3/1055 , H01S3/134 , H01S3/1392 , H01S3/225 , H01S3/2251 , H01S3/2256
摘要： A reliable, modular, production quality narrow-band KrF excimer laser capable of producing 10 mJ laser pulses at 1000 Hz with a bandwith of about 0.6 pm or less. The present invention is especially suited to long-term round-the-clock operation in the lithographic production of integrated circuits. Improvements over prior art lasers include a single upstream preionizer tube (56) and acoustic baffles. A preferred embodiment includes reduced fluorine concentration, an anode support bar shaped to reduce aerodynamic reaction forces on blower bearings, a modified pulse power system providing faster pulse rise time, an output coupler (65) with substantially increased reflectivity, a line narrowing module with CaF prism beam expanders, a more accurate wavemeter, a laser computer controller programmed with new and improved pulse energy control algorithm.

8. 发明授权

EP1867014B1 GAS DISCHARGE LASER OUTPUT LIGHT BEAM PARAMETER CONTROL 有权
标题翻译：控制在所述主梁的气体放电激光器的参数
公开(公告)号：EP1867014B1
公开(公告)日：2013-08-21
申请号：EP06748813.0
申请日：2006-03-27
申请人： Cymer, Inc.
发明人： BESAUCELE, Herve, A. , FOMENKOV, Igor, V. , PARTLO, William, N. , TRINTICHOUK, Fedor , TON-THAT, Hao
IPC分类号： H01S3/225 , H01S3/036 , H01S3/038 , H01S3/134 , H01S3/097
CPC分类号： H01S3/036 , H01S3/038 , H01S3/097 , H01S3/09702 , H01S3/134

9. 发明授权

EP1010040B1 LASER-ILLUMINATED STEPPER OR SCANNER WITH ENERGY SENSOR FEEDBACK 失效
标题翻译：激光照射步进器或扫描器ENERGIESENSORRÜCKOPPLUNG
公开(公告)号：EP1010040B1
公开(公告)日：2009-06-24
申请号：EP98939150.3
申请日：1998-07-31
申请人： Cymer, Inc.
发明人： SANDSTROM, Richard, L. , DAS, Palash, P. , FOMENKOV, Igor, V. , BESAUCELE, Herve, A. , OZARSKI, Robert, G.
IPC分类号： H01S3/134 , G03F7/20
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70358 , G03F7/70558 , G03F7/70575 , H01S3/03 , H01S3/036 , H01S3/08009 , H01S3/134 , H01S3/225 , H01S3/2251 , H01S3/2256
摘要： A laser-illuminated wafer-exposing system such as a stepper (20) or scanner having a first light intensity detector (44) located within the exposing system near a mask (36) and second light intensity detector (46) located near the output of the laser (12). A feedback control system (14) controls the output of the laser based on signals detected by at least one of the detectors. The feedback control system includes a processor programmed with an algorithm which is used to control the laser discharge voltage in order to provide light pulses having desired intensity at the mask with the laser operating in a burst mode. The algorithm utilizes at least the following parameters; a previously measured pulse energy, a calculated energy error, a calculated dose error, a value for the rate of change of pulse energy with voltage, and at least one reference voltage. In a preferred embodiment the algorithm uses the pulse energy measured with the light intensity detector located near the mark to provide the feedback control and uses the light intensity detector at the output of the laser to assure that the output of the laser is maintained within a predetermined range.

10. 发明授权

EP1019992B1 PULSE ENERGY CONTROL FOR EXCIMER LASER 有权
标题翻译：脉冲功率控制的准分子激光
公开(公告)号：EP1019992B1
公开(公告)日：2006-06-14
申请号：EP98945820.3
申请日：1998-09-01
申请人： Cymer, Inc.
发明人： SANDSTROM, Richard, L. , BESAUCELE, Herve, A. , FOMENKOV, Igor V. , DAS, Palash, P.
IPC分类号： H01S3/134 , H01S3/225
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70216 , G03F7/70558 , G03F7/70575 , H01S3/03 , H01S3/036 , H01S3/08009 , H01S3/134 , H01S3/225 , H01S3/2251 , H01S3/2256
摘要： A process for controlling pulse energy in burst of pulses produced by an excimer laser. The energy of each pulse in each burst is measured. The rate of change of pulse energy with charging voltage is determined. A pulse energy error is determined for a previous pulse of the present burst. An integrated dose error is also determined for all previous pulses in the current burst. A charging voltage for the next pulse is determined using the pulse energy error, the integrated dose error, the rate of change of energy with charging voltage and a reference voltage. In a preferred embodiment, the rate of change of energy with voltage is determined by dithering the voltage during two pulses of each burst, once lower and once higher. The reference voltage is a voltage calculated using prior voltage and energy data. In this embodiment the method of determining the reference voltage during a first portion of the pulse is different from the method used during a latter portion of the burst. During the first set of pulses, for each pulse, (40 in this embodiment) a specified voltage calculated using voltage and energy data from a corresponding pulse in a previous burst is utilized as a prediction of the voltage needed to produce a pulse energy converging on a target pulse energy. For pulses (41) and thereafter the reference voltage for each pulse is the specified voltage for the previous pulse.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式