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1. 发明公开

EP0708367A1 Pattern delineating apparatus for use in the EUV spectrum 有权
标题翻译： Gerätzur Darstellung von Mustern zum Einsatz im extremen UV-Bereich
公开(公告)号：EP0708367A1
公开(公告)日：1996-04-24
申请号：EP95307180.0
申请日：1995-10-11
申请人： AT&T Corp.
发明人： Tennant, Donald Milan , Wood II, Obert Reeves , White, Donald Lawrence
IPC分类号： G03F1/00
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/26 , G03F1/32
摘要： The operating principle of the attenuated phase mask is incorporated in a reflecting structure for use with extreme ultraviolet radiation. A working projection-reduction system for use with 0.18µm and smaller features combines the mask with all-reflecting optics.
摘要翻译：衰减相位掩模的工作原理结合在用于极紫外辐射的反射结构中。一个用于0.18微米和更小功能的工作投影降低系统将面罩与全反射光学组合。

2. 发明公开

EP0605961A1 Method for repairing an optical element which includes a multilayer coating 失效
标题翻译： Verfahren zur Reparatur eines mehrschichtigen optischen Elementes。
公开(公告)号：EP0605961A1
公开(公告)日：1994-07-13
申请号：EP93309760.2
申请日：1993-12-06
申请人： AT&T Corp.
发明人： Early, Kathleen Regina , Tennant, Donald Milan , Waskiewicz, Warren Kazmir , Windt, David Lee
IPC分类号： G03F1/00 , G21K1/06
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/72 , G21K1/062 , G21K2201/061 , G21K2201/067
摘要： The invention in one aspect involves a method for repairing an optical system. The optical system includes at least one optical element which comprises, in turn, a substrate (10) having a principal surface, and a multilayer coating (60) overlying the principal surface. The substrate comprises a first material, and the multilayer coating comprises plural second and at least third material layers (20, 30) in alternation. The method includes the steps of removing the multilayer coating from the substrate, and redepositing a new multilayer coating on the substrate. The old multilayer coating is removed in a single etching step while preserving the quality of the principal surface to such an extent that the peak reflectivity of the new multilayer coating is at least 80% the reflectivity of the old multilayer coating.
In a second aspect, the invention involves a method for repairing an optical system of the kind described above, in which the optical element comprises a substrate having a principal surface, a layer of chromium overlying the principal surface, and a first layer of iridium overlying the chromium layer. The method comprises the steps of removing the first iridium layer from the substrate; and forming a second iridium coating on the substrate. The iridium layer is removed by exposing the iridium and chromium layers to an aqueous solution comprising potassium ferricyanide and sodium hydroxide, resulting in substantial dissolution of the chromium layer.
摘要翻译：本发明的一个方面涉及一种修复光学系统的方法。光学系统包括至少一个光学元件，该光学元件又包括具有主表面的基底（10）和覆盖在主表面上的多层涂层（60）。所述基板包括第一材料，并且所述多层涂层交替地包括多个第二和至少第三材料层（20,30）。该方法包括从衬底上去除多层涂层并将新的多层涂层重新沉积在衬底上的步骤。在单个蚀刻步骤中除去旧的多层涂层，同时保持主表面的质量，使得新的多层涂层的峰值反射率为旧多层涂层的反射率的至少80％。在第二方面，本发明涉及一种用于修复上述类型的光学系统的方法，其中光学元件包括具有主表面的基底，覆盖在主表面上的铬层和第一层铱覆盖层铬层。该方法包括从衬底去除第一铱层的步骤; 以及在所述基底上形成第二铱涂层。通过将铱和铬层暴露于含有铁氰化钾和氢氧化钠的水溶液中来除去铱层，导致铬层的实质溶解。

3. 发明公开

EP0602829A2 Grating fabrication using electron beam lithography 失效
标题翻译： Gitterherstellung unter Verwendung von Elektronenstrahllithographie。
公开(公告)号：EP0602829A2
公开(公告)日：1994-06-22
申请号：EP93309585.3
申请日：1993-12-01
申请人： AT&T Corp.
发明人： Koch, Thomas Lawson , Ostermayer, Frederick William, Jr. , Tennant, Donald Milan , Verdiell, Jean-Marc
IPC分类号： G03F7/20 , G03F1/14 , G03F7/00 , G02B5/18 , G03F1/00
CPC分类号： G03F7/7035 , G02B6/12007 , G02B6/124 , G03F7/001 , G03F7/2059 , G03F7/704
摘要： A technique is disclosed for utilizing direct-write electron-beam photolithography and holographic optical exposure to form gratings in optoelectronic structures. The direct-write e-beam process is used to form rectangular grating teeth in a mask substrate, where the mask is then used as a phase mask to transfer the pattern to the optoelectronic device. Advantageously, the utilization of a direct write e-beam technique to form the grating pattern on the photomask allows for the formation of any desired number and location of abrupt phase shifts, multiple grating pitches, alignment fiducials, and any other desired features. Therefore, a single exposure of the direct write e-beam mask allows for a plurality of different grating patterns to be simultaneously printed.
摘要翻译：公开了一种利用直写式电子束光刻和全息光学曝光在光电结构中形成光栅的技术。直写式电子束工艺用于在掩模基板中形成矩形光栅齿，其中掩模然后用作相位掩模以将图案转移到光电子器件。有利地，利用直接写入电子束技术在光掩模上形成光栅图案允许形成任何期望数量和位置的突变相移，多个光栅间距，对准基准以及任何其它期望的特征。因此，直接写入电子束掩模的单次曝光允许同时打印多个不同的光栅图案。

4. 发明授权

EP0605966B1 X-ray optical element 失效
标题翻译：用于X射线的辐射的光学元件
公开(公告)号：EP0605966B1
公开(公告)日：1998-04-29
申请号：EP93309857.6
申请日：1993-12-08
申请人： AT&T Corp.
发明人： Early, Kathleen Regina , Howard, Richard Edwin , Tennant, Donald Milan , Waskiewicz, Warren Kazmir , Windt, David Lee
IPC分类号： G21K1/06
CPC分类号： B82Y10/00 , G21K1/062 , G21K2201/061 , G21K2201/067

5. 发明授权

EP0605961B1 Method for repairing an optical element which includes a multilayer coating 失效
标题翻译：修复的多层光学元件的方法
公开(公告)号：EP0605961B1
公开(公告)日：1997-10-01
申请号：EP93309760.2
申请日：1993-12-06
申请人： AT&T Corp.
发明人： Early, Kathleen Regina , Tennant, Donald Milan , Waskiewicz, Warren Kazmir , Windt, David Lee
IPC分类号： G03F1/00 , G21K1/06
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/72 , G21K1/062 , G21K2201/061 , G21K2201/067

6. 发明公开

EP0710890A1 Device fabrication using DUV/EUV pattern delineation 有权
标题翻译：使用图案在远分别极端UV范围内产生的辐射的器件的制造
公开(公告)号：EP0710890A1
公开(公告)日：1996-05-08
申请号：EP95307227.9
申请日：1995-10-11
申请人： AT&T Corp.
发明人： Tennant, Donald Milan , Wood II, Obert Reeves , White, Donald L.
IPC分类号： G03F7/20
CPC分类号： G03F1/32 , B82Y10/00 , B82Y40/00 , G03F1/24 , G03F7/70058 , G03F7/70233
摘要： The fabrication of integrated circuit devices (24) built to design rules of 0.18µm and below uses patterning radiation (20) in the EUV spectrum. Optimized processing conditions take advantage of independently developed EUV characteristics such as short resist absorption lengths.
摘要翻译：集成电路装置（24）的制造内置设计的12时18微米的规则和下面使用在EUV光谱构图辐射（20）。优化加工条件采取的unabhängig开发EUV特征优点：如短抗蚀剂吸收长度。

7. 发明公开

EP0605966A1 X-ray optical element 失效
标题翻译： Optische KomponentefürRöntgenbestrahlungen。
公开(公告)号：EP0605966A1
公开(公告)日：1994-07-13
申请号：EP93309857.6
申请日：1993-12-08
申请人： AT&T Corp.
发明人： Early, Kathleen Regina , Howard, Richard Edwin , Tennant, Donald Milan , Waskiewicz, Warren Kazmir , Windt, David Lee
IPC分类号： G21K1/06
CPC分类号： B82Y10/00 , G21K1/062 , G21K2201/061 , G21K2201/067
摘要： In one aspect, the invention involves an optical element in an x-ray imaging system. The element comprises a substrate (10) overlain by a multilayer coating (60). The multilayer coating comprises plural first and at least second material layers in alternation. This coating is soluble in at least one etchant solution at an etching temperature less than 100°C. The optical element further comprises a barrier layer (50) intermediate the substrate and the multilayer coating. The barrier layer is relatively insoluble in the etchant solution at the etching temperature.
In a second aspect of the invention, the optical element comprises a substrate and a multilayer coating as described above, and further comprises a release layer that underlies the multilayer coating. The release layer comprises a material that is relatively soluble in at least one etchant solution at an etching temperature less than 100°C. In contrast to release layers of the prior art, the inventive release layer comprises germanium.
摘要翻译： X射线成像系统包括具有阻挡层的光学元件和以X射线波长反射的外部多层涂层。多层涂层可溶于低于130℃的蚀刻剂溶液，但阻挡层是不溶的或具有比多层涂层至少低100倍的溶解度。县。多层涂层包含Si和Mo层，阻挡层为C或Ru。在另一个实施方案中，包括释放层。

8. 发明授权

EP0710890B1 Device fabrication using DUV/EUV pattern delineation 有权
标题翻译：使用图案在远分别极端UV范围内产生的辐射的器件的制造
公开(公告)号：EP0710890B1
公开(公告)日：1999-12-29
申请号：EP95307227.9
申请日：1995-10-11
申请人： AT&T Corp.
发明人： Tennant, Donald Milan , Wood II, Obert Reeves , White, Donald L.
IPC分类号： G03F7/20
CPC分类号： G03F1/32 , B82Y10/00 , B82Y40/00 , G03F1/24 , G03F7/70058 , G03F7/70233

9. 发明授权

EP0708367B1 Pattern delineating apparatus for use in the EUV spectrum 有权
标题翻译：设备，用于极紫外区域中所使用的模式的显示
公开(公告)号：EP0708367B1
公开(公告)日：1998-01-14
申请号：EP95307180.0
申请日：1995-10-11
申请人： AT&T Corp.
发明人： Tennant, Donald Milan , Wood II, Obert Reeves , White, Donald Lawrence
IPC分类号： G03F1/00
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/26 , G03F1/32

10. 发明公开

EP0769787A1 X-ray optical element 失效
标题翻译： Optische KomponentefürRöntgenstrahlungen
公开(公告)号：EP0769787A1
公开(公告)日：1997-04-23
申请号：EP96120959.0
申请日：1993-12-08
申请人： AT&T Corp.
发明人： Early, Kathleen Regina , Tennant, Donald Milan , Waskiewicz, Warren Kazmir , Howard, Richard Edwin , Windt, David Lee
IPC分类号： G21K1/06
CPC分类号： B82Y10/00 , G21K1/062 , G21K2201/061 , G21K2201/067
摘要： In one aspect, the invention involves an optical element in an x-ray imaging system. The element comprises a substrate (10) overlain by a multilayer coating (60). The multilayer coating comprises plural first and at least second material layers in alternation. This coating is soluble in at least one etchant solution at an etching temperature less than 100°C. The optical element further comprises a barrier layer (50) intermediate the substrate and the multilayer coating. The barrier layer is relatively insoluble in the etchant solution at the etching temperature.
In a second aspect of the invention, the optical element comprises a substrate and a multilayer coating as described above, and further comprises a release layer that underlies the multilayer coating. The release layer comprises a material that is relatively soluble in at least one etchant solution at an etching temperature less than 100°C. In contrast to release layers of the prior art, the inventive release layer comprises germanium.
摘要翻译：在一个方面，本发明涉及x射线成像系统中的光学元件。元件包括由多层涂层（60）覆盖的基底（10）。多层涂层交替地包括多个第一和至少第二材料层。该涂层在小于100℃的蚀刻温度下可溶于至少一种蚀刻剂溶液。光学元件还包括位于基底和多层涂层之间的阻挡层（50）。在蚀刻温度下，阻挡层相对不溶于蚀刻剂溶液。在本发明的第二方面，光学元件包括如上所述的基底和多层涂层，并且还包括在多层涂层下面的释放层。释放层包括在低于100℃的蚀刻温度下相对可溶于至少一种蚀刻剂溶液的材料。与现有技术的剥离层相反，本发明的剥离层包括锗。

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