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1. 发明公开

EP3410213A1 FILM MASK, METHOD FOR MANUFACTURING SAME, AND METHOD FOR FORMING PATTERN USING FILM MASK 有权
公开(公告)号：EP3410213A1
公开(公告)日：2018-12-05
申请号：EP17744618.4
申请日：2017-01-31
申请人： LG Chem, Ltd.
发明人： HWANG, Ji Young , SEO, Han Min , BAE, Nam Seok , LEE, Seung Heon , OH, Dong Hyun , PARK, Chan Hyoung , KIM, Ki-Hwan , LEE, Ilha
IPC分类号： G03F7/20 , H01L21/033
CPC分类号： G03F1/54 , G03F1/38 , G03F1/48 , G03F1/50 , G03F1/56 , G03F7/20 , G03F7/2014 , G03F7/2035 , G03F7/703 , G03F7/7035 , G03F7/70791 , H01L21/033
摘要： The present application relates to a film mask including: a transparent substrate; a darkened light-shielding pattern layer provided on the transparent substrate; and a release force enhancement layer provided on the darkened light-shielding pattern layer and having surface energy of 30 dynes/cm or less, a method for manufacturing the same, and a method for forming a pattern using the film mask.

2. 发明公开

EP3391152A1 METHODS AND SYSTEMS FOR PRINTING ARRAYS OF FEATURES 有权
公开(公告)号：EP3391152A1
公开(公告)日：2018-10-24
申请号：EP16825567.7
申请日：2016-12-14
申请人： EULITHA A.G.
发明人： CLUBE, Francis , SOLAK, Harun
IPC分类号： G03F7/20
CPC分类号： G03F7/70408 , G03F7/70091 , G03F7/7035
摘要： A method for printing a desired periodic pattern into a photosensitive layer on a substrate includes providing a mask bearing a periodic pattern whose period is a multiple of that of the desired pattern. The substrate is disposed in proximity to the mask, at least one beam is provided for illuminating the mask pattern to generate a transmitted light-field described by a Talbot distance. The layer is exposed to time-integrated intensity distributions in a number of sub-exposures by illuminating the mask pattern with the at least one beam while changing the separation between substrate and mask by at least a certain fraction of, but less than, the Talbot distance. The illumination or the substrate is configured relative to the mask for the different sub-exposures so that the layer is exposed to the same time-integrated intensity distributions that are mutually laterally offset by a certain distance and in a certain direction.

3. 发明授权

EP2368153B1 Method of preparation of an optical fiber and device for implementing the method. 失效转让
标题翻译：光纤的制备方法和实施该方法的装置。
公开(公告)号：EP2368153B1
公开(公告)日：2017-11-08
申请号：EP09761040.6
申请日：2009-11-19
申请人： Vereniging voor Christelijk Hoger Onderwijs, Wetenschappelijk Onderzoek en Patiëntenzorg
发明人： IANNUZZI, Davide , PETRUSIS, Andrius , RECTOR, Jan Hendrik
IPC分类号： G03F7/00 , G02B6/42
CPC分类号： G03F7/0005 , G02B6/02061 , G02B6/262 , G03F7/7035

4. 发明公开

EP2926197A4 HEAT ACTUATED AND PROJECTED LITHOGRAPHY SYSTEMS AND METHODS 审中-公开
标题翻译： VERFAHREN公司研发的LITHOGRAFIESYSTEMEN
公开(公告)号：EP2926197A4
公开(公告)日：2016-09-07
申请号：EP13851211
申请日：2013-10-15
申请人： UNIV NORTH WESTERN
发明人： MIRKIN CHAD A , LIAO XING , BROWN KEITH A , LIU GUOLIANG , SCHMUCKER ABRIN L , HE SHU , SHIM WOOYOUNG , EICHELSDOERFER DANIEL J , RASIN BORIS
IPC分类号： G03F7/00 , G03F7/16 , G03F7/20 , G03F7/207 , G03F9/02
CPC分类号： G03F7/7035 , B05D1/26 , B05D3/06 , B82Y40/00 , G02B13/143 , G03F7/0002 , G03F7/20 , G03F7/2049 , G03F7/70141 , G03F7/70325 , G03F7/70383 , G03F7/7045
摘要： In accordance with an embodiment of the disclosure, a method of patterning can include dividing an image into a set of frame sections; determining a tip pattern for a respective portion of an image to be patterned by each tip of the tip array in each frame section of the set of frame sections; disposing the tip array in a patterning position in a first location of the substrate corresponding to a location of the substrate in which the first frame section in the set of frame sections is to be patterned; projecting a first pattern of radiation onto the tip array to selectively irradiate one or more tips of the tip array and pattern the substrate, wherein the first pattern of radiation corresponds to a tip pattern for the first frame section; disposing the tip array in a patterning position in a second location of the substrate corresponding to a location of the substrate in which the second frame section in the set of frame sections is to be patterned; projecting a second pattern of radiation onto the tip array to selectively irradiate tips of the tip array and pattern the substrate, wherein the second pattern of radiation corresponds to a tip pattern for the second frame section; and repeating the disposing and projecting for each frame section in the set of frame sections to pattern the image.
摘要翻译：根据本公开的实施例，图案化的方法可以包括将图像划分成一组帧部分; 在所述一组框架部分的每个框架部分中确定要由所述尖端阵列的每个尖端构图的图像的相应部分的尖端图案; 将所述末端阵列布置在所述基板的第一位置中的图案化位置中，所述第一位置对应于所述基板的位置，所述框架部分组中的第一框架部分将被构图; 将第一辐射模式投影到所述尖端阵列上以选择性地照射所述尖端阵列中的一个或多个尖端并对所述衬底进行图案化，其中所述第一辐射图案对应于所述第一框架部分的尖端图案; 将所述末端阵列设置在所述基板的第二位置中的对应于所述基板的位置的图案化位置中，在所述基板的所述位置中，所述一组框架部分中的第二框架部分将被图案化; 将第二辐射图案投影到所述尖端阵列上以选择性地照射所述尖端阵列的尖端并对所述衬底进行图案化，其中所述第二辐射图案对应于所述第二框架部分的尖端图案; 并且重复对所述一组帧部分中的每个帧部分的布置和投影以对图像进行图案化。

5. 发明授权

EP2663898B1 METHOD AND SYSTEM FOR PRINTING HIGH-RESOLUTION PERIODIC PATTERNS 有权
标题翻译：方法和系统印刷图案周期性高位解决方案
公开(公告)号：EP2663898B1
公开(公告)日：2015-03-25
申请号：EP12708160.2
申请日：2012-01-10
申请人： Eulitha A.G.
发明人： CLUBE, Francis , SOLAK, Harun
IPC分类号： G03F7/20
CPC分类号： G03F7/70091 , G03F7/7035 , G03F7/70408

6. 发明授权

EP2591400B1 METHOD AND APPARATUS FOR PRINTING A PERIODIC PATTERN WITH LARGE DEPTH OF FOCUS 有权
标题翻译：方法和系统用于成像的周期结构，伟大的聚焦深度
公开(公告)号：EP2591400B1
公开(公告)日：2015-01-28
申请号：EP11755123.4
申请日：2011-07-05
申请人： Eulitha AG
发明人： CLUBE, Francis , DAIS, Christian , SOLAK, Harun
IPC分类号： G03F7/20
CPC分类号： G03F7/70408 , G03B27/54 , G03F7/70325 , G03F7/7035

7. 发明授权

EP1922588B1 PATTERN EXPOSURE METHOD AND PATTERN EXPOSURE APPARATUS 有权
标题翻译：结构曝光方法以及元件结构曝光
公开(公告)号：EP1922588B1
公开(公告)日：2015-01-07
申请号：EP06797772.8
申请日：2006-09-05
申请人： FUJIFILM Corporation
发明人： MINO, Satoshi , FUJII, Takeshi , TAKADA, Norihisa
IPC分类号： G03F7/20 , G02B26/12
CPC分类号： G03F7/70791 , G03F7/7035

8. 发明公开

EP2544218A4 PROCESS FOR PRODUCTION OF PHOTORESIST PATTERN 有权
标题翻译：用于生产PHOTO PAINT格局
公开(公告)号：EP2544218A4
公开(公告)日：2014-01-15
申请号：EP11750372
申请日：2011-03-01
申请人： UNIV HOKKAIDO NAT UNIV CORP
发明人： UENO KOSEI , MISAWA HIROAKI
IPC分类号： G03F1/50 , G03F7/20 , H01L21/027
CPC分类号： H01L21/0274 , G03F1/50 , G03F7/2014 , G03F7/7035 , G03F7/70375 , G03F7/70408

9. 发明公开

EP2591400A1 A METHOD AND APPARATUS FOR PRINTING A PERIODIC PATTERN WITH LARGE DEPTH OF FOCUS 有权
标题翻译：方法和系统用于成像的周期结构，伟大的聚焦深度
公开(公告)号：EP2591400A1
公开(公告)日：2013-05-15
申请号：EP11755123.4
申请日：2011-07-05
申请人： Eulitha AG
发明人： CLUBE, Francis , DAIS, Christian , SOLAK, Harun
IPC分类号： G03F7/20
CPC分类号： G03F7/70408 , G03B27/54 , G03F7/70325 , G03F7/7035
摘要： A method for printing a desired pattern into a photosensitive layer that includes providing a mask bearing a pattern of linear features that are parallel to a first direction, arranging the layer parallel to and separated from said mask, generating substantially monochromatic light, and illuminating the mask pattern with said light over a range of angles of incidence in a plane parallel to said first direction, at substantially a single angle in an orthogonal plane of incidence and so that the light of each angle of incidence transmitted by the mask forms a light-field component at the layer whereby the integration of said components prints the desired pattern, wherein the range of angles is selected so that the integration of said components is substantially equivalent to an average of the range of transversal intensity distributions formed between Talbot image planes by light at one of the angles of incidence.

10. 发明公开

EP2556412A1 VERFAHREN UND VORRICHTUNG ZUM HERSTELLEN VON KONTAKTKOPIEN VON REFLEXIONS-VOLUMENHOLOGRAMMEN 有权
标题翻译：方法和装置反射式体积全息图进行接触副本
公开(公告)号：EP2556412A1
公开(公告)日：2013-02-13
申请号：EP11714733.0
申请日：2011-04-07
申请人： Hologram Industries Research GmbH
发明人： DAUSMANN, Günther
IPC分类号： G03H1/20
CPC分类号： G03H1/202 , G03F7/7035 , G03F7/70408 , G03H1/0248 , G03H2001/0415 , G03H2001/0473 , G03H2227/04 , G03H2270/23 , G03H2270/31
摘要： The invention relates to a method and device for producing copies/replicas of a volume reflection hologram, wherein a holographic film (4) is guided over a drum having a polygonal cross-section with at least two planar (polygonal) master surfaces (3), on each of which in the circumferential direction at least one master (7) is fastened, wherein the film is brought in contact with at least one master hologram (7) and exposed over the entire surface area to laser. It is essential to the invention that a laser exposure unit (22) is associated with at least one of the master surfaces (5) having a film guided thereover, said laser exposure unit enabling full exposure of the respective master surface to parallel, coherent laser beams (6), and that the at least one exposure unit (22) in each section follows the rotational movement of the drum about a pitch angle at the same speed and in the process exposes the related master surface (5) so as to then be quickly reset again and perform the same angular pivoting motion and exposure together with the following master surface. This enables highly productive duplication in high quality of even large-surface-area reflection holograms.

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