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2. 发明公开

EP1804126A1 An optical metrology system and metrology mark characterization method 有权
标题翻译： Optisches metrologisches System und Charakterisierungsverfahrenfüreine Metrologiemarke
公开(公告)号：EP1804126A1
公开(公告)日：2007-07-04
申请号：EP06256399.4
申请日：2006-12-15
申请人： ASML Netherlands B.V.
发明人： Van Der AA, Nicolaas Petrus , Den Boef, Arie Jeffrey , Mattheij, Robert Martinus Maria , Ter Morsche, Henricus Gerhardus
IPC分类号： G03F9/00
CPC分类号： G03F9/7049 , G03F9/7011 , G03F9/7019 , G03F9/7076 , G03F9/7092
摘要： An optical metrology system is disclosed that has a measuring system configured to irradiate a metrology mark and record a portion of a reflected, a transmitted, or both, electromagnetic field and a characterization device configured to determine from the recorded field a mark shape parameter indicative of the structure of the metrology mark, the characterization device comprising: a field calculation unit configured to calculate an expected field for reflection, transmission, or both, from a theoretical reference mark based on an algebraic eigenvalue-eigenvector representation of the expected field, a field derivative calculation unit configured to calculate a first order derivative, a higher order derivative, or both, of the expected field with respect to the mark shape parameter by first deriving analytical forms for corresponding derivatives of eigenvalues and eigenvectors of the eigenvalue-eigenvector representation, and an optimization unit configured to use the outputs from the field and field derivative calculation units to determine an optimized mark shape parameter for which the expected field substantially matches the recorded field.
摘要翻译：公开了一种光学测量系统，其具有被配置为照射计量标记并记录反射的，发射的或两者的电磁场的一部分的测量系统和被配置成从记录场确定指示所述计量标记的结构，所述表征装置包括：场计算单元，被配置为基于所述预期场的代数特征值特征向量表示从理论参考标记计算反射，透射或两者的预期场，场导数计算单元，被配置为通过首先导出特征值特征向量表示的特征值和特征向量的相应导数的分析形式来计算相对于标记形状参数的预期字段的一阶导数，高阶导数或两者，以及配置为使用来自所述输出的输出的优化单元场和场导数计算单元，以确定预期场与记录场基本一致的优化标记形状参数。

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