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1. 发明公开

EP0837489A2 Thermal control apparatus for inductively coupled RF plasma reactor having an overhead solenoidal antenna 失效
标题翻译：一种用于与顶部线圈中感应耦合RF等离子体反应器的温度控制装置布置的天线
公开(公告)号：EP0837489A2
公开(公告)日：1998-04-22
申请号：EP97307035.2
申请日：1997-09-10
申请人： Applied Materials, Inc.
发明人： Collins, Kenneth , Rice, Michael , Askarinam, Eric , Buchberger, Douglas , Roderick, Craig
IPC分类号： H01J37/32
CPC分类号： H01J37/32458 , C23C16/517 , H01F2029/143 , H01J37/32082 , H01J37/321 , H01J37/32146 , H01J37/32165 , H01J37/32467 , H01J37/32522 , H01J37/32688 , H01J37/32706 , H01J37/32871 , H01J2237/3343 , H01J2237/3345 , H01J2237/3346 , H01L21/31116 , H01L21/6831
摘要： The invention is embodied in a plasma reactor including a plasma reactor chamber (40) and a workpiece support (54) for holding a workpiece (56) near a support plane inside the chamber during processing, the chamber having a reactor enclosure portion (52) facing the support, a cold body (74) overlying the reactor enclosure portion, a plasma source power applicator (42, 68) between the reactor enclosure portion and the cold body and a thermal conductor (75) between and in contact with the cold body and the reactor enclosure. The thermal conductor and the cold sink define a cold sink interface therebetween, the reactor preferably further including a thermally conductive substance within the cold sink interface for reducing the thermal resistance across the cold sink interface. The thermally conductive substance can be a thermally conductive gas filling the cold body interface. Alternatively, the thermally conductive substance can be a thermally conductive solid material. The reactor can include a gas manifold (1000) in the cold body communicable with a source (1010) of the thermally conductive gas an inlet through the cold body from the gas manifold and opening out to the cold body interface. The reactor can further include an O-ring (1070) sandwiched between the cold body and the thermal conductor and defining a gas-containing volume in the cold body interface of nearly infinitesimal thickness in communication with the inlet from the cold body. More generally, the reactor can include the facilitation of thermal transfer across an interface between a hot and/or cold sink and any part exposed to the reactor chamber interior atmosphere, such as the ceiling, wall or polymer-hardening precursor ring, for example, by the insertion into that interface of a thermally conductive gas or substance.
摘要翻译：本发明体现在等离子体反应器包括等离子体反应器腔室（40）和工件支撑件（54），用于在处理期间保持工件（56）的支撑面附近的腔室内，该腔室具有一反应器罩壳部分（52）面对支撑，冷体（74）之间并与所述冷体接触覆盖该反应器罩壳部分，所述反应器壳体部分和冷体和热导体（75）之间的等离子体源功率施加器（42，68）和反应器外壳。热导体和冷水槽限定冷却散热器接口其间，反应器优选还包括在冷却散热器接口用于在冷穴界面降低了热阻内的热传导物质。导热物质可以是导热性气体填充所述冷体接口。可替代地，所述导热物质可以是导热固体材料。该反应器可以包括在冷体通信与导热气体的入口从气体歧管和开口出到冷体界面的源极（1010）过冷体的气体歧管（1000）。该反应器可进一步包括上夹在冷体和热导体之间的O形环（1070）和限定在几乎无限小厚度的冷体接口含气体的体积连通从冷体入口。多个基因的反弹，该反应器可以包括一个热和/或冷的散热器和任何部分暴露于所述反应器腔室内部的气氛，：如天花板，墙壁或聚合物硬化前体环，例如之间横跨热传递界面的便利化，通过插入做了导热性气体或物质的界面。

2. 发明公开

EP0680071A3 Protective collar for a vacuum seal in a plasma etch reactor 失效
标题翻译：保护套筒用于真空密封在等离子体蚀刻反应器中。
公开(公告)号：EP0680071A3
公开(公告)日：1996-04-03
申请号：EP95302587.1
申请日：1995-04-19
申请人： APPLIED MATERIALS, INC.
发明人： Rice, Michael , Askarinam, Eric
IPC分类号： H01J37/32 , H01J37/18 , F16J15/32
CPC分类号： H01L21/67126 , H01J37/18 , H01J37/32431 , H01J2237/166 , Y10S277/913
摘要： The disclosure relates to a vacuum seal that can be used in a plasma etch reactor to seal the chamber interior (10) from the outside environment consists of a protective collar (66) that is injection molded or machined of a high strength, high temperature and corrosion resistant thermoplastic material. The collar has an elastomeric gasket (68) installed therein and is used in combination with a second elastomeric gasket (76) to achieve a fluid-tight seal between two rigid surfaces (74,72) made of silicon and quartz, respectively.

3. 发明公开

EP0892422A3 Improvements in or relating to plasma reactors 失效
标题翻译：在等离子体反应器的改进
公开(公告)号：EP0892422A3
公开(公告)日：1999-04-14
申请号：EP98305588.0
申请日：1998-07-14
申请人： Applied Materials, Inc.
发明人： Collins, Kenneth , Rice, Michael , Buchberger, Douglas , Roderick, Craig , Askarinam, Eric , Schneider, Gerhard , Trow, John , Tsui, Joshua , Grimard, Dennis , Yin, Gerald , Wu, Robert
IPC分类号： H01J37/32
CPC分类号： H01J37/32522 , C23C16/517 , H01F2029/143 , H01J37/32082 , H01J37/321 , H01J37/32146 , H01J37/32165 , H01J37/32458 , H01J37/32467 , H01J37/32688 , H01J37/32706 , H01J37/32871 , H01J2237/3343 , H01J2237/3345 , H01J2237/3346 , H01L21/31116 , H01L21/6831
摘要： A plasma reactor has a chamber (50) for containing a plasma and a passageway (60) communicating with the chamber is enhanced with a first removable plasma confinement magnet module placed adjacent the passageway including a first module housing (20,10) and a first plasma confinement magnet (80) inside the housing. It may further include a second removable plasma confinement magnet module placed adjacent the passageway including a second module housing (20,20), and a second plasma confinement magnet (82). Preferably, the first and second modules are located on opposite sides of the passageway. Moreover, the first and second plasma confinement magnets have magnetic orientations which tend to oppose plasma transport or leakage through the passageway. Preferably, the module housing includes a relatively non-magnetic thermal conductor such as aluminum and is in thermal contact with said chamber body. Cooling apparatus can be thermally coupled to the chamber body, whereby to maintain the first plasma confinement magnet below its Curie temperature. If the reactor includes a pumping annulus adjacent to a periphery of the chamber, then the passageway can be one which communicates between the chamber and the pumping annulus. Also, the passageway can be a wafer slit valve or a gas feed inlet. Such a gas feed inlet can be a center gas feed through a ceiling of the chamber. The module housing (20,20) can rest upon the chamber side wall and the chamber ceiling (52) can rest upon the module housing.

4. 发明公开

EP0892422A2 Improvements in or relating to plasma reactors 失效
标题翻译：有关等离子反应器的改进
公开(公告)号：EP0892422A2
公开(公告)日：1999-01-20
申请号：EP98305588.0
申请日：1998-07-14
申请人： Applied Materials, Inc.
发明人： Collins, Kenneth , Rice, Michael , Buchberger, Douglas , Roderick, Craig , Askarinam, Eric , Schneider, Gerhard , Trow, John , Tsui, Joshua , Grimard, Dennis , Yin, Gerald , Wu, Robert
IPC分类号： H01J37/32
CPC分类号： H01J37/32522 , C23C16/517 , H01F2029/143 , H01J37/32082 , H01J37/321 , H01J37/32146 , H01J37/32165 , H01J37/32458 , H01J37/32467 , H01J37/32688 , H01J37/32706 , H01J37/32871 , H01J2237/3343 , H01J2237/3345 , H01J2237/3346 , H01L21/31116 , H01L21/6831
摘要： A plasma reactor has a chamber (50) for containing a plasma and a passageway (60) communicating with the chamber is enhanced with a first removable plasma confinement magnet module placed adjacent the passageway including a first module housing (20,10) and a first plasma confinement magnet (80) inside the housing. It may further include a second removable plasma confinement magnet module placed adjacent the passageway including a second module housing (20,20), and a second plasma confinement magnet (82). Preferably, the first and second modules are located on opposite sides of the passageway. Moreover, the first and second plasma confinement magnets have magnetic orientations which tend to oppose plasma transport or leakage through the passageway. Preferably, the module housing includes a relatively non-magnetic thermal conductor such as aluminum and is in thermal contact with said chamber body. Cooling apparatus can be thermally coupled to the chamber body, whereby to maintain the first plasma confinement magnet below its Curie temperature. If the reactor includes a pumping annulus adjacent to a periphery of the chamber, then the passageway can be one which communicates between the chamber and the pumping annulus. Also, the passageway can be a wafer slit valve or a gas feed inlet. Such a gas feed inlet can be a center gas feed through a ceiling of the chamber. The module housing (20,20) can rest upon the chamber side wall and the chamber ceiling (52) can rest upon the module housing.
摘要翻译：等离子体反应器具有用于容纳等离子体的腔室（50），与腔室连通的通道（60）通过邻近通道放置的第一可移除等离子体约束磁体模块得到增强，所述第一可移除等离子体约束磁体模块包括第一模块壳体（20,10）和第一模块壳体等离子体约束磁体（80）。它还可以包括邻近通道放置的第二可移除等离子体约束磁体模块，第二等离子体约束磁体模块包括第二模块壳体（20,20）和第二等离子体约束磁体（82）。优选地，第一和第二模块位于通道的相对侧上。此外，第一和第二等离子体约束磁体具有倾向于阻止等离子体传输或通过通道泄漏的磁性取向。优选地，模块壳体包括诸如铝的相对非磁性的热导体并且与所述腔室主体热接触。冷却设备可热耦合到腔室主体，由此将第一等离子体约束磁体保持在其居里温度以下。如果反应器包括邻近腔室外围的泵送环形空间，则通道可以是在腔室和泵送环形空间之间连通的通道。而且，通道可以是晶片狭缝阀或气体供给入口。这种气体供给入口可以是通过腔室顶部的中心气体供给。模块壳体（20,20）可以搁置在腔室侧壁上并且腔室天花板（52）可以搁置在模块壳体上。

5. 发明公开

EP0838843A3 Parallel-plate electrode plasma reactor having inductive antenna and adjustable radial distribution of plasma ion density 失效
标题翻译：与等离子体离子密度的感性天线和可调，径向划分平行平板电极的等离子体反应器
公开(公告)号：EP0838843A3
公开(公告)日：1999-01-13
申请号：EP97308402.3
申请日：1997-10-22
申请人： Applied Materials, Inc.
发明人： Collins, Kenneth , Rice, Michael , Trow, John , Buchberger, Douglas , Askarinam, Eric , Tsui,Joshua , Groechel, David , Hung, Raymond
IPC分类号： H01J37/32 , H05H1/46 , C23C16/50
CPC分类号： H01J37/321 , H01J37/32165 , H01J37/32458 , H01J37/32467 , H01J37/32522 , H01L21/6831
摘要： There is disclosed a plasma reactor for processing a semiconductor workpiece such as a wafer, including a chamber having an overhead ceiling with a three-dimensional shape such as a hemisphere or dome. The reactor further includes an inductive antenna over the ceiling which may be conformal or nonconformal in shape with the ceiling. The ceiling may be a semiconductor material so that it can function as both a window for the inductive field of the antenna as well as an electrode which can be grounded, or to which RF power may be applied or which may be allowed to float electrically. The reactor includes various features which allow the radial distribution of the plasma ion density across the wafer surface to be adjusted to an optimum distribution for processing uniformity across the wafer surface.

6. 发明公开

EP0838843A2 Parallel-plate electrode plasma reactor having inductive antenna and adjustable radial distribution of plasma ion density 失效
标题翻译： Parallelplattenelektrode-Plasmareaktor mit induktiver Antenne und einstellbarer，radialer Teilung der Plasma-Ionendichte
公开(公告)号：EP0838843A2
公开(公告)日：1998-04-29
申请号：EP97308402.3
申请日：1997-10-22
申请人： Applied Materials, Inc.
发明人： Collins, Kenneth , Rice, Michael , Trow, John , Buchberger, Douglas , Askarinam, Eric , Tsui,Joshua , Groechel, David , Hung, Raymond
IPC分类号： H01J37/32 , H05H1/46 , C23C16/50
CPC分类号： H01J37/321 , H01J37/32165 , H01J37/32458 , H01J37/32467 , H01J37/32522 , H01L21/6831
摘要： There is disclosed a plasma reactor for processing a semiconductor workpiece such as a wafer, including a chamber having an overhead ceiling with a three-dimensional shape such as a hemisphere or dome. The reactor further includes an inductive antenna over the ceiling which may be conformal or nonconformal in shape with the ceiling. The ceiling may be a semiconductor material so that it can function as both a window for the inductive field of the antenna as well as an electrode which can be grounded, or to which RF power may be applied or which may be allowed to float electrically. The reactor includes various features which allow the radial distribution of the plasma ion density across the wafer surface to be adjusted to an optimum distribution for processing uniformity across the wafer surface.
摘要翻译：公开了一种用于处理诸如晶片的半导体工件的等离子体反应器，其包括具有诸如半球或圆顶的三维形状的顶棚顶板的室。反应器还包括在天花板上的感应天线，其可以与天花板的形状保形或非共形。天花板可以是半导体材料，使得其可以用作天线的感应场的窗口以及可以接地的电极，或者可以施加RF功率或可以被允许电浮动的电极。反应器包括允许跨晶片表面的等离子体离子密度的径向分布被调整到最佳分布以处理晶片表面的均匀性的各种特征。

7. 发明公开

EP0680071A2 Protective collar for a vacuum seal in a plasma etch reactor 失效
标题翻译：在einem Plasma-Ätzreaktor中的Vakuumdichtung的Schutzmanschette。
公开(公告)号：EP0680071A2
公开(公告)日：1995-11-02
申请号：EP95302587.1
申请日：1995-04-19
申请人： APPLIED MATERIALS, INC.
发明人： Rice, Michael , Askarinam, Eric
IPC分类号： H01J37/32 , H01J37/18 , F16J15/32
CPC分类号： H01L21/67126 , H01J37/18 , H01J37/32431 , H01J2237/166 , Y10S277/913
摘要： The disclosure relates to a vacuum seal that can be used in a plasma etch reactor to seal the chamber interior (10) from the outside environment consists of a protective collar (66) that is injection molded or machined of a high strength, high temperature and corrosion resistant thermoplastic material. The collar has an elastomeric gasket (68) installed therein and is used in combination with a second elastomeric gasket (76) to achieve a fluid-tight seal between two rigid surfaces (74,72) made of silicon and quartz, respectively.
摘要翻译：本公开涉及一种可用于等离子体蚀刻反应器以将室内部（10）从外部环境密封的真空密封件，其由注塑或机加工而成的高强度，高温度的保护套环（66）和耐腐蚀热塑性材料。套环具有安装在其中的弹性垫圈（68），并且与第二弹性体垫圈（76）组合使用以分别在由硅和石英制成的两个刚性表面（74,72）之间实现流体密封。

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