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    • 81. 发明公开
    • CRYSTAL GROWTH APPARATUS AND METHOD
    • 方法和设备晶体生长
    • EP1080256A1
    • 2001-03-07
    • EP99918189.4
    • 1999-04-29
    • The Secretary of State for Defence
    • BESWICK, John, Alfred
    • C30B15/26C30B15/20C30B15/10C30B15/12
    • C30B15/10C30B15/12C30B15/20C30B15/26Y10T117/10Y10T117/1004Y10T117/1008Y10T117/1052
    • Crystal growth apparatus comprising a crucible for containing a supply of molten material from which the crystal may be grown and first reflection means for receiving radiation directed along an input path and reflecting radiation towards second reflection means, whereby the second reflection means reflect output radiation along an output path. The first and second reflection means are arranged at or in close proximity with the surface of the molten material such that during crystal growth they maintain a substantially constant position relative to the surface of the molten material. The apparatus may comprise support means for supporting the first and second reflection means, whereby the support means are arranged to float on the molten material. The apparatus may be a single crucible apparatus or a double crucible apparatus. In the double crucible apparatus, the support means may be a second, inner crucible containing molten material in fluid communication with the molten material in the first crucible, whereby the inner crucible floats on the molten material in the first crucible and the first and second reflection means are supported on the inner crucible. The apparatus may also comprise image processing means for forming an image of the crystal or any part of the growth interface region and for determining crystal diameter measurement or meniscus diameter measurement during growth. The apparatus may also comprise means for controlling growth of the crystal in response to the measured crystal or meniscus region diameter. The invention also relates to a crucible for use in growing crystals and a crystal growth method.
    • 89. 发明公开
    • A method and apparatus for the growth of a single crystal
    • 维尔法伦和Vorrichtung zurZüchtungeines Einkristalles
    • EP0732427A2
    • 1996-09-18
    • EP96301808.0
    • 1996-03-15
    • SUMITOMO ELECTRIC INDUSTRIES, LIMITED
    • Hashio, KatsushiSawada, Shin-ichiTatsumi, Masami
    • C30B15/12C30B15/22C30B27/02
    • C30B15/00C30B15/22C30B15/305C30B29/42Y10S117/90Y10T117/10Y10T117/1004Y10T117/1008Y10T117/1016Y10T117/1032
    • According to the present invention, in the growth of an oxide single crystal or a compound semiconductor single crystal such as GaAs single crystal by the CZ method or LEC method, the tendency of concave solid-liquid interface shape at the periphery of the growing crystal can be suppressed to prevent polycrystallization without localized heating of the solid-liquid interface, while well controlling the diameter of the growing crystal even when using a crucible with a larger diameter, thus improving the yield of crystal on a commercial scale. The feature consists in that the end of a cylindrical body having an inner diameter of larger than the predetermined diameter of straight part of the growing crystal is immersed in the raw material melt or liquid encapsulant and the crystal is pulled while preventing the shape of the solid-liquid interface from becoming concave by controlling the rotation rate of at least one of a crucible holding the raw materialmelt, the growing crystal and cylindrical body.
    • 根据本发明,在通过CZ法或LEC法生长氧化物单晶或化合物半导体单晶如GaAs单晶的过程中,生长晶体周围的凹面固液界面形状的倾向可以 被抑制以防止多结晶,而不会局部加热固 - 液界面,同时即使使用具有较大直径的坩埚也能很好地控制生长晶体的直径,从而以商业规模提高了晶体的产率。 其特征在于,将具有大于生长晶体的直线部分的预定直径的内径的圆柱体的端部浸入原料熔体或液体密封剂中,并且在防止固体的形状的同时拉动晶体 通过控制保持原料熔体,生长晶体和圆柱体的坩埚中的至少一个的旋转速率,液体界面变得凹陷。