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81. 发明授权

EP2288963B1 Fourier optical system, illumination system and microlithography exposure apparatus 失效
标题翻译：傅立叶光学系统，照明系统和微光刻曝光系统
公开(公告)号：EP2288963B1
公开(公告)日：2013-08-21
申请号：EP09741805.7
申请日：2009-04-17
申请人： Carl Zeiss SMT GmbH
发明人： SCHWAB, Markus , LAYH, Michael , DEGUENTHER, Markus , HOEGELE, Artur
IPC分类号： G03F7/20
CPC分类号： G03F7/70116 , G03F7/70075

82. 发明授权

EP2354853B1 Optical raster element, optical integrator and illumination system of a microlithographic projection exposure apparatus 有权
标题翻译：一个光学光栅元件，光学积分器和微光刻投射曝光设备的照明系统
公开(公告)号：EP2354853B1
公开(公告)日：2013-01-02
申请号：EP10001311.9
申请日：2010-02-09
申请人： Carl Zeiss SMT GmbH
发明人： Patra, Michael
IPC分类号： G03F7/20
CPC分类号： G03F7/70075

83. 发明授权

EP2146248B1 Illumination system of a microlithographic projection exposure apparatus 有权转让
标题翻译：微光刻投射曝光设备的照明系统
公开(公告)号：EP2146248B1
公开(公告)日：2012-08-29
申请号：EP08012815.0
申请日：2008-07-16
申请人： Carl Zeiss SMT GmbH
发明人： Degünther, Markus
IPC分类号： G03F7/20 , G02B19/00
CPC分类号： G03F7/70141 , G02B26/02 , G02B26/0833 , G02B26/101 , G03F7/70066 , G03F7/70075 , G03F7/70116 , G03F7/70158 , G03F7/702

84. 发明公开

EP2407828A1 Optical element and illumination optics for microlithography 审中-公开
标题翻译： Optisches Element und Beleuchtungsoptikfürdie Mikrolithografie
公开(公告)号：EP2407828A1
公开(公告)日：2012-01-18
申请号：EP11184955.0
申请日：2007-12-20
申请人： Carl Zeiss SMT GmbH
发明人： Gerhard, Dr. Michael
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G03F7/70075 , G03F7/70083
摘要： An optical element serves to influence a nominal beam angle, preset over a beam cross-section, of a radiation beam (26) hitting the optical element. The optical element has a spatial optical structure (16) which generates a first part of the influence exerted on the nominal beam angle when exposed to the radiation beam (26). An optical coating (24) applied on the spatial optical structure or on a carrier layer carrying the spatial optical structure (16) causes a defined attenuation of parts of the radiation beam (26) when exposed to the latter, thus resulting in a second part of the influence exerted on the nominal beam angle. The optical effects of the structure (16) and the coating (24) are such that they complement each other in influencing the nominal beam angle. The manufacturing effort required to obtain this effect is quite low. Moreover, this leads to new possibilities in terms of influencing the nominal beam angle.
摘要翻译：光学元件用于影响击中光学元件的辐射束（26）的在横截面上预设的标称光束角。光学元件具有空间光学结构（16），其在暴露于辐射束（26）时产生施加在标称光束角上的影响的第一部分。施加在空间光学结构上或承载空间光学结构（16）的载体层上的光学涂层（24）当暴露于辐射束（26）的部分被暴露时，导致限定的衰减，从而导致第二部分对标称光束角的影响。结构（16）和涂层（24）的光学效应使得它们在影响标称光束角度时相互补充。获得此效果所需的制造工作相当低。此外，这导致了影响标称光束角度的新的可能性。

85. 发明授权

EP1835312B1 Illumination device for a microlithographic projection apparatus having an element made of uniaxial crystal and having a plurality of refractive or diffractive structures extending along an axis being parallel or perpendicular to the crystal axis 有权转让
$Illumination device for a microlithographic projection apparatus having an element made of uniaxial crystal and having a plurality of refractive or diffractive structures extending along an axis being parallel or perpendicular to the crystal axis$
标题翻译：对于具有几个平行制成的单轴晶体或布置成垂直于折射或衍射结构的晶轴的光学元件的微光刻投射曝光设备的照明装置
公开(公告)号：EP1835312B1
公开(公告)日：2011-05-04
申请号：EP07103867.3
申请日：2007-03-09
申请人： Carl Zeiss SMT GmbH
发明人： Schuster, Karl-Heinz , Hartmaier, Jürgen , Maul, Manfred , Schmerek, Dieter , Müller, Detlev , Hahnemann, Otto , Marianek, Frank , Weiss, Gundula , Fiolka, Damian
IPC分类号： G02B1/08 , G02B3/00 , G02B27/00 , G03B27/72
CPC分类号： G03F7/70075 , G02B1/02 , G02B1/08 , G02B3/005 , G02B3/0068 , G02B5/1823 , G02B5/1833 , G02B5/1838 , G02B5/1866 , G03B27/72 , G03F7/70158 , G03F7/70566 , G03F7/70958 , G03F7/70966

86. 发明公开

EP2020679A4 ILLUMINATING OPTICAL APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：光学照明设备，曝光设备和仪器RATHER定位过程，
公开(公告)号：EP2020679A4
公开(公告)日：2011-04-13
申请号：EP07742128
申请日：2007-04-23
申请人： NIPPON KOGAKU KK
发明人： KOMATSUDA HIDEKI
IPC分类号： H01L21/027
CPC分类号： G03F7/702 , G03F7/70075
摘要： There is an illumination optical apparatus capable of forming an intensity distribution profile of light in an exit pupil that is substantially symmetrical with respect to an axis or substantially symmetrical and substantially identical in shape in two perpendicular directions with respect to an axis to illuminate an illumination surface under desired illumination conditions. The illumination optical apparatus includes a first fly's-eye optical system (18a) having first optical components and a second fly's-eye optical system (18b) having second optical components arranged in parallel in one-to-one correspondence to the first optical components. An illumination surface (M) is illuminated with light from each of the second optical components in an overlapping manner. The correspondence relationship between the first optical components and the second optical components is established so that an intensity distribution profile of light in an exit pupil of the illumination optical apparatus is substantially symmetrical with respect to an axis or substantially symmetrical and substantially identical in shape in two perpendicular directions with respect to an axis.

87. 发明公开

EP2288963A1 ILLUMINATION SYSTEM COMPRISING A FOURIER OPTICAL SYSTEM 失效
标题翻译：傅立叶光学系统，照明系统和微光刻曝光系统
公开(公告)号：EP2288963A1
公开(公告)日：2011-03-02
申请号：EP09741805.7
申请日：2009-04-17
申请人： Carl Zeiss SMT GmbH
发明人： SCHWAB, Markus , LAYH, Michael , DEGUENTHER, Markus , HOEGELE, Artur
IPC分类号： G03F7/20
CPC分类号： G03F7/70116 , G03F7/70075
摘要： An illumination system (190) for a microlithography projection exposure apparatus (100) for illuminating an illumination field (165) with the light from a primary light source (102) has a variably adjustable pupil shaping unit (150) for receiving light from the primary light source (102) and for generating a variably adjustable two-dimensional intensity distribution in a pupil shaping surface (110) of the illumination system. The pupil shaping unit (150) has a Fourier optical system (500) for converting an entrance beam bundle (105) entering through an entrance plane of the Fourier optical system into an exit beam bundle exiting from an exit plane of the Fourier optical system. The Fourier optical system has a focal length f
FOS and a structural length L measured between an entrance-side first system surface and an exit-side last system surface along an optical axis and the condition (L/f
FOS )

88. 发明授权

EP1927892B1 Beleuchtungsoptik für die EUV-Projektions-Mikrolithographie, Projektionsbelichtungsanlage und Verfahren zur Herstellung eines mikrostrukturierten Bauteils 有权
标题翻译：照明光学器件，用于EUV投射微光刻投射曝光设备和方法，用于制造微结构元件
公开(公告)号：EP1927892B1
公开(公告)日：2010-12-15
申请号：EP07020745.1
申请日：2007-10-24
申请人： Carl Zeiss SMT AG
发明人： Warm, Berndt , Dengel, Günther
IPC分类号： G03F7/20
CPC分类号： G03F7/702 , G03F7/70075 , G03F7/70116

89. 发明公开

EP2253997A2 Illumination system for a microlithographic contact and proximity exposure apparatus 审中-公开
标题翻译：用于微光刻接触和接近曝光设备的照明系统
公开(公告)号：EP2253997A2
公开(公告)日：2010-11-24
申请号：EP09169158.4
申请日：2009-09-01
申请人： Süss MicroTec Lithography GmbH
发明人： Völkel, Reinhard , Vogler, Uwe , Bich, Andreas , Weible, Kenneth J. , Eisner, Martin , Hornung, Michael , Kaiser, Paul , Zoberbier, Ralph , Cullmann, Elmar
IPC分类号： G03F7/20
CPC分类号： G03F7/7035 , G03F7/7005 , G03F7/70075 , G03F7/70566
摘要： An illumination system for a micro-lithographic contact and proximity exposure apparatus comprising a light source (1), a collector (2), two optical integrators (3,6), two Fourier lenses (4,7), at least one angle defining element (5); and at least one field lens (8). The first optical integrator (3) comprises optical sub-elements and produces a plurality of secondary light sources (6a) each emitting a light bundle. A first Fourier lens (7) effects a superposition of the light bundles and uniform irradiance in its Fourier plane (4a). The second optical integrator (6) is located at the Fourier plane (7a) of the first Fourier lnes (7), comprises optical sub-elements and produces a plurality of tertiary light sources (6a) each emitting a light bundle. A second Fourier lens (7) effects a superposition of the light bundles, uniform irradiance and a desired and uniform angular distribution of light illuminating a mask (9) for contact or proximity lithographic printing. The field lens (8) in the Fourier plane (7a) ensures telecentric illumination the mask (9). The optional field lens (12) in the Fourier plane (4a) of the first optical integrator (3) ensures telecentric illumination of the second optical integrator (6). The angle defining element (5) comprises optical sub-elements and defines the angular distribution of the light illuminating the mask (9). A change of the position of the second Fourier lens (7) or the use of a Fourier zoom lens (62) or hybrid Fourier lens (63) allows run-out control (registration error correction) of the lateral dimensions of the printed miniature pattern in the resist layer on the surface of the wafer (10).
摘要翻译：一种用于微光刻接触和接近曝光装置的照明系统，包括光源（1），集光器（2），两个光学积分器（3,6），两个傅立叶透镜（4,7），至少一个角度限定元素（5）; 和至少一个场镜（8）。第一光学积分器（3）包括光学子元件并且产生多个发射光束的二级光源（6a）。第一傅立叶透镜（7）在其傅立叶平面（4a）中实现光束的叠加和均匀的辐照度。第二光学积分器（6）位于第一傅立叶单元（7）的傅立叶平面（7a）处，包括光学子元件并且产生多个发射光束的多个第三光源（6a）。第二傅立叶透镜（7）实现光束的叠加，均匀的辐照度以及照射用于接触或邻近平版印刷的掩模（9）的期望且均匀的角度分布。傅立叶平面（7a）中的场透镜（8）确保掩模（9）的远心照明。第一光学积分器（3）的傅立叶平面（4a）中的可选的场透镜（12）确保第二光学积分器（6）的远心照明。角度限定元件（5）包括光学子元件并且限定照射面罩（9）的光的角度分布。第二傅立叶透镜（7）的位置或使用傅里叶变焦透镜（62）或混合傅立叶透镜（63）的改变允许印刷的微型图案的横向尺寸的偏斜控制（配准误差校正）在晶片（10）表面上的抗蚀剂层中。

90. 发明公开

EP1870772A3 Lithographic apparatus and device manufacturing method 有权
标题翻译：一种光刻设备和方法，用于制造物品
公开(公告)号：EP1870772A3
公开(公告)日：2010-10-06
申请号：EP07018092.2
申请日：2003-03-17
申请人： ASML Netherlands B.V.
发明人： Dierichs, Marcel Mathijs Theodore Marie
IPC分类号： G03F7/20
CPC分类号： G03F7/70091 , G03F7/70066 , G03F7/70075 , G03F7/70558
摘要： In an illumination system using mirrors, the facets of a field facet mirror focus plural source images on respective facets of a pupil facet mirror to perform the function of an integrator. A facet masking means is provided for selectively blocking facets of the filed or pupil facet mirrors. The facet masking means has a grid selectively interposable in the projection beam to provide intermediate illumination settings. The grid has a spacing smaller than the source images but larger than the wavelength of the projection beam so that there is no diffraction.

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