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1. 发明公开

EP2407828A1 Optical element and illumination optics for microlithography 审中-公开
标题翻译： Optisches Element und Beleuchtungsoptikfürdie Mikrolithografie
公开(公告)号：EP2407828A1
公开(公告)日：2012-01-18
申请号：EP11184955.0
申请日：2007-12-20
申请人： Carl Zeiss SMT GmbH
发明人： Gerhard, Dr. Michael
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G03F7/70075 , G03F7/70083
摘要： An optical element serves to influence a nominal beam angle, preset over a beam cross-section, of a radiation beam (26) hitting the optical element. The optical element has a spatial optical structure (16) which generates a first part of the influence exerted on the nominal beam angle when exposed to the radiation beam (26). An optical coating (24) applied on the spatial optical structure or on a carrier layer carrying the spatial optical structure (16) causes a defined attenuation of parts of the radiation beam (26) when exposed to the latter, thus resulting in a second part of the influence exerted on the nominal beam angle. The optical effects of the structure (16) and the coating (24) are such that they complement each other in influencing the nominal beam angle. The manufacturing effort required to obtain this effect is quite low. Moreover, this leads to new possibilities in terms of influencing the nominal beam angle.
摘要翻译：光学元件用于影响击中光学元件的辐射束（26）的在横截面上预设的标称光束角。光学元件具有空间光学结构（16），其在暴露于辐射束（26）时产生施加在标称光束角上的影响的第一部分。施加在空间光学结构上或承载空间光学结构（16）的载体层上的光学涂层（24）当暴露于辐射束（26）的部分被暴露时，导致限定的衰减，从而导致第二部分对标称光束角的影响。结构（16）和涂层（24）的光学效应使得它们在影响标称光束角度时相互补充。获得此效果所需的制造工作相当低。此外，这导致了影响标称光束角度的新的可能性。

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