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    • 72. 发明公开
    • MAGNETIC SENSOR AND METHOD FOR FABRICATING THE SAME
    • VERFAHREN ZUR HERSTELLUNG DAVON的MAGNETSENSOR
    • EP2960667A1
    • 2015-12-30
    • EP15177698.6
    • 2007-03-28
    • Asahi Kasei EMD Corporation
    • KATAOKA, MakotoKAKUTA, KatsumiYAMAGATA, YoKANAYAMA, Yuichi
    • G01R33/07H01L43/06
    • G01R33/07G01R33/0011H01L27/22H01L43/06
    • The present invention relates to a magnetic sensor with which magnetic characteristics are made extremely stable by consideration of an area of contact of a base layer of a magnetic substance and a semiconductor substrate. On a semiconductor substrate (111) a plurality of Hall elements (112a, 112b) are embedded so as to be coplanar to a top surface of the semiconductor substrate while being mutually spaced apart by a predetermined distance, and above the Hall elements and the semiconductor substrate, a base layer (114), having coefficient of thermal expansion differing from that of the Hall elements and partially covers a region of each Hall elements, is formed via a protective layer (113), and a magnetic flux concentrator (115), having an area larger than the base layer and with magnetic amplification, is formed on the base layer. An area of contact of the base layer of the magnetic substance and the semiconductor substrate is made small to lessen the generation of an offset voltage.
    • 磁传感器技术领域本发明涉及考虑到磁性物质的基底层与半导体基板的接触面积而使磁特性非常稳定的磁传感器。 在半导体衬底(111)上嵌入多个霍尔元件(112a,112b),以便与半导体衬底的顶表面共面一个预定距离相互间隔开,并且在霍尔元件和半导体 通过保护层(113)和磁通集中器(115)形成具有与霍尔元件的热膨胀系数不同的部分的基底层(114),并部分地覆盖每个霍尔元件的区域, 在基底层上形成具有大于基底层并且具有磁放大的面积的区域。 使磁性物质的基底层与半导体基板的接触面积小,以减少偏移电压的产生。
    • 74. 发明公开
    • SPUTTERING THIN FILM FORMING APPARATUS
    • VORRICHTUNG ZUR BILDUNG EINES SPUTTERING-DÜNNFILMS
    • EP2752501A1
    • 2014-07-09
    • EP11871690.1
    • 2011-08-30
    • EMD Corporation
    • SETSUHARA, YuichiEBE, Akinori
    • C23C14/34C23C14/35H05H1/46
    • H01J37/3411C23C14/3471C23C14/358H01J37/321H01J37/3211H01J37/3408H01J37/3417
    • A thin-film formation sputtering device capable of forming a high-quality thin film at high rates is provided. A sputtering device 10 includes a target holder 14 provided in a vacuum container 11, a substrate holder 15 facing the target holder 14, a means 19 for introducing a plasma generation gas into the vacuum container 11, a means 161 for generating an electric field for sputtering in a region including a surface of a target T, an antenna placement room 182 provided between inner and outer surfaces of a wall of the vacuum container as well as separated from an inner space of the vacuum container by a dielectric window 183, and a radio-frequency antenna 13, which is provided in the antenna placement room 182, for generating a radio-frequency induction electric field in the region including the surface of the target held by the target holder.
    • 提供能够以高速率形成高质量薄膜的薄膜形成溅射装置。 溅射装置10包括设置在真空容器11中的靶保持器14,面向靶保持器14的基板保持件15,用于将等离子体产生气体引入真空容器11的装置19,用于产生电场的装置161 在包括目标T的表面的区域中的溅射,设置在真空容器的壁的内表面和外表面之间的天线放置室182,以及通过电介质窗183与真空容器的内部空间分离, 设置在天线放置室182中的射频天线13,用于在包括由目标保持器保持的目标的表面的区域中产生射频感应电场。
    • 78. 发明公开
    • PLASMA PROCESSING APPARATUS
    • PLASMAVERARBEITUNGSVORRICHTUNG
    • EP2408276A1
    • 2012-01-18
    • EP10750875.6
    • 2010-03-10
    • EMD Corporation
    • SETSUHARA, YuichiEBE, Akinori
    • H05H1/46C23C16/505H01L21/205H01L21/3065
    • H01J37/321H01J37/3211H01J37/32477H05H1/46H05H2001/4667
    • The present invention provides a plasma processing device capable of inducing a strong radio-frequency electric field within a vacuum container while preventing sputtering of the antenna conductor, an increase in the temperature of the antenna conductor and the formation of particles. A plasma processing device 10 according to the present invention includes a vacuum containem11, a radio-frequency antenna 21 placed between an inner surface 111A and an outer surface 111B of a wall of the vacuum container 11, and a dielectric separating member 16 for separating the radio-frequency antenna 21 from an internal space of the vacuum container 11. As compared to a device using an external antenna, the present device can induce a stronger magnetic field in the vacuum container 11. The separating member 16 has the effects of preventing the radio-frequency antenna 21 from undergoing sputtering by the plasma produced in the vacuum container 11, suppressing an increase in the temperature of the radio-frequency antenna 21, and preventing the formation of particles.
    • 本发明提供一种等离子体处理装置,其能够在防止天线导体的溅射,天线导体的温度升高和颗粒的形成的同时在真空容器内产生强的射频电场。 根据本发明的等离子体处理装置10包括真空容器11,放置在真空容器11的壁的内表面111A和外表面111B之间的射频天线21和用于将真空容器11分离的电介质分离构件16 射频天线21与真空容器11的内部空间相比。与使用外部天线的装置相比,本装置可以在真空容器11中产生更强的磁场。分离构件16具有防止 射频天线21通过在真空容器11中产生的等离子体进行溅射,抑制高频天线21的温度上升,防止颗粒的形成。