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    • 65. 发明公开
    • Resonant tunneling semiconductor devices
    • Halbleiteranordnungen mit resonanceem Tunneleffekt。
    • EP0253174A1
    • 1988-01-20
    • EP87109210.2
    • 1987-06-26
    • International Business Machines Corporation
    • Chang, Leroy Li-Gong
    • H01L29/205H01L29/76H01L31/02H01S3/19G02F1/015
    • B82Y20/00G02F1/017H01L29/7606H01L31/0352H01S5/34313H01S5/3432
    • This disclosure relates to resonant tunneling semi­conductor devices useful for transport functions such as switching or amplification, and also for electro-­optical conversions. In the structure of these devices, a central potential well (l0) is formed of an opposite conductivity type of semiconductor material to two semiconductor layers (l2) outside resonant tunneling barriers (l4) on each side of the central potential well, such that electrons in the well can tunnel to and from the outside semiconductor layers. The central potential well serves as the base of a three terminal device in transport applications, and as the light responsive portion for electro-optical applications. In one disclosed embodiment, the device is constructed in five layers of the most commonly used gallium-­aluminium-arsenide compounds, an n GaAs substrate, undoped GaAlAs, p GaAs, undoped GaAlAs, and n GaAs.
    • 本公开涉及对于诸如开关或放大之类的传输功能以及用于电光转换的谐振隧穿半导体器件。 在这些器件的结构中,中心势阱(10)由相对导电类型的半导体材料形成到位于中心势阱的每一侧上的谐振隧穿势垒(14)外的两个半导体层(12),使得电子 在井内隧道往返于外部的半导体层。 中心势阱用作运输应用中的三端装置的基底,以及用于电光应用的光响应部分。 在一个公开的实施例中,器件由五层最常用的镓 - 砷化镓化合物,n型GaAs衬底,未掺杂的GaAlAs,p GaAs,未掺杂的GaAlAs和n GaAs构成。
    • 66. 发明公开
    • Semiconductor lasers
    • 半导体激光器
    • EP0136839A3
    • 1986-11-26
    • EP84306035
    • 1984-09-03
    • XEROX CORPORATION
    • Burnham, RobertHolonyak, Nick, Jr.
    • H01S03/19H01L33/00
    • H01L33/24B82Y20/00H01L33/0062H01L33/0095H01S5/34313H01S5/3432Y10S438/909
    • The method of tuning the wavelength of a quantum well laser to a shorter emission wavelength is accomplished by the step of thermal annealing the laser for a prescribed period of time, the length of the period and the temperature of annealing being based upon what primary emission wavelength is desired. For good results, the annealing is conducted in an elemental anti-outdiffusion environment or the laser structure to be annealed is encapsulated so that any outdiffusion of laser elemental constituents is discouraged during thermal annealing. In an exemplary illustration of the invention, laser heterostructures of the GaAl/GaAlAs regime are utilized and annealed for several hours in an As environment to selectively reduce the emission wavelength by as much as 20. or more. The As environment prevents the outdiffusion of As from the GaAl GaAlAs heterostructure during thermal annealing, elemental As having the lowest temperature of vaporization of elemental Ga, Al and As. High temperature annealing above this temperature may tend to drive elemental As from the heterostructure thereby changing its operating characteristics. Thermal annealing may be carried out in an annealing furnace, generally sealed in a quartz ampoule, or in a thermal pulse annealing system wherein properly prepared wafer samples may be alternately heated uniformly for prescribed periods of time at predetermined temperatures and periodically checked to determine the amount emission wavelength shift as compared to the set emission wavelength desired to be achieved for the laser.
    • 70. 发明公开
    • TERAHERTZ QUANTUM CASCADE LASER DEVICE
    • TERAHERTZ量子级联激光器件
    • EP3293838A1
    • 2018-03-14
    • EP17188987.6
    • 2017-09-01
    • KABUSHIKI KAISHA TOSHIBA
    • Kakuno, TsutomuSaito, ShinjiYamane, Osamu
    • H01S5/0625H01S5/12H01S5/10H01S5/024H01S5/028H01S5/06H01S5/22
    • H01S5/0604H01S5/0206H01S5/02415H01S5/028H01S5/0425H01S5/0612H01S5/06258H01S5/1096H01S5/12H01S5/1203H01S5/22H01S5/3402H01S5/34313
    • A terahertz quantum cascade laser device includes a substrate (10), q semiconductor stacked body (20) and a first electrode (30). The semiconductor stacked body (20) includes an active layer (12) and a first clad layer (14). The active layer (12) is provided on the substrate (10) and is configured to emit infrared laser light by an intersubband optical transition. The first clad layer (14) is provided on the active layer (12). A ridge waveguide (40) is provided in the semiconductor stacked body (20). A first distributed feedback region (14a) and a second distributed feedback region (14b) are provided at an upper surface of the first clad layer (14) to be separated from each other along an extension direction of the ridge waveguide (40). The first electrode (30) is provided at the upper surface of the first clad layer (14). A planar size of the first distributed feedback region (14a) is smaller than a planar size of the second distributed feedback region (14b).
    • 一种太赫兹量子级联激光器件,包括衬底(10),半导体叠层体(20)和第一电极(30)。 半导体叠层体(20)包括有源层(12)和第一覆层(14)。 有源层(12)设置在衬底(10)上并且被配置为通过分带间光学跃迁发射红外激光。 第一覆盖层(14)设置在有源层(12)上。 脊形波导(40)设置在半导体层叠体(20)中。 第一分布反馈区域(14a)和第二分布反馈区域(14b)设置在第一包层(14)的上表面处,以沿着脊形波导(40)的延伸方向彼此分离。 第一电极(30)设置在第一覆层(14)的上表面。 第一分布反馈区域(14a)的平面尺寸小于第二分布反馈区域(14b)的平面尺寸。