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61. 发明公开

EP1047162A3 Excimer laser device 有权
标题翻译：准分子Laservorrichtung
公开(公告)号：EP1047162A3
公开(公告)日：2003-10-01
申请号：EP00108648.7
申请日：2000-04-20
申请人： EBARA CORPORATION
发明人： Sekiguchi, Shinichi , Shinozaki, Hiroyuki , Barada, Toshimitsu , Nakazawa, Toshiharu
IPC分类号： H01S3/225 , H01S3/036
CPC分类号： F16C32/047 , H01S3/036 , H01S3/225
摘要： The object of the present invention is to provide an excimer laser device which is capable of keeping the rotational speed of a fan constant and uniformizing a laser gas flow between main discharge electrodes even when the pressure of a laser gas filled in a casing varies. The excimer laser device comprises: a casing (1) filled with a laser gas; a pair of main discharge electrodes (2) disposed in said casing for producing an electric discharge to discharge-pump the laser gas at a high repetition rate; a fan (3) for producing a high-speed laser gas flow between said main discharge electrodes; bearings (8,9,10,11), said fan having a rotatable shaft (4) rotatably supported by said bearings; a motor (12) for actuating said fan; rotational speed detecting device for detecting a rotational speed of said fan; and control device (30) for controlling at least one of a voltage and a frequency to be supplied to said motor based on the rotational speed of said fan detected by said rotational speed detecting device, thereby to control the rotational speed of said fan at a constant level.

62. 发明公开

EP1323216A1 VERY NARROW BAND, TWO CHAMBER, HIGH REP RATE GAS DISCHARGE LASER SYSTEM 审中-公开
标题翻译：具有两室和高重复率非常狭窄的气体喷出激光系统
公开(公告)号：EP1323216A1
公开(公告)日：2003-07-02
申请号：EP01977198.9
申请日：2001-09-25
申请人： Cymer, Inc.
发明人： MYERS, David, W. , BESAUCELE, Herve, A. , ERSHOV, Alexander, I. , PARTLO, William, N. , SANDSTROM, Richard, L. , DAS, Palash, P. , ANDERSON, Stuart, L. , FOMENKOV, Igor, V. , UJAZDOWSKI, Richard, C. , PAN, Xiaojiang, J. , ONKELS, Eckehard, D. , NESS, Richard, M. , BROWN, Daniel, J. W.
IPC分类号： H01S3/10
CPC分类号： H01S3/2366 , G01J9/00 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333
摘要： An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers (10A, 12A) are provided, one of which is a part of a master oscillator (10) producing a very narrow band seed beam which is amplified in the second discharge chamber (12). The chambers (10A, 12A) can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator (10) and optimization of pulse energy parameters in the amplifying chamber (12A). A preferred embodiment in an ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber (10A, 12A) comprises a single tangential fan (10A, 10) providing sufficient gas flow (11) to permit operation at pulse rates of 4,000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator (10) is equipped with a line narrowing package (16, 16A) having a very fast tuning mirror capable of controlling centerline wavelength on a pulse-to-pulse basis at repetition rates of 4,000 Hz or greater to a precision of less than 0.2 pm.

63. 发明授权

EP0759215B1 PULSE POWER GENERATING CIRCUIT WITH ENERGY RECOVERY 失效
标题翻译：具有能量回收功率脉冲发生器
公开(公告)号：EP0759215B1
公开(公告)日：2003-06-04
申请号：EP96903678.9
申请日：1996-01-26
申请人： Cymer, Inc. , Advanced Pulse Power Technologies, Inc.
发明人： BIRX, Daniel, L. , DAS, Palash, P. , FOMENKOV, Igor, V. , PARTLO, William, N. , WATSON, Tom, A.
IPC分类号： H01S3/00 , H03K3/57 , H01S3/097 , H03K17/80
CPC分类号： H05H1/06 , H01S3/097 , H01S3/225 , H03K3/57 , H03K17/80 , H03K2217/0036

64. 发明公开

EP1303894A1 EXTREME REPETITION RATE GAS DISCHARGE LASER WITH IMPROVED BLOWER MOTOR 审中-公开
标题翻译：具有改进鼓风机电机EXTREME重复率气体放电激光器
公开(公告)号：EP1303894A1
公开(公告)日：2003-04-23
申请号：EP01970516.9
申请日：2001-06-07
申请人： Cymer, Inc.
发明人： OLIVER, I., Roger , PARTLO, William, N.
IPC分类号： H01S3/22
CPC分类号： H01S3/225 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/097 , H01S3/09702 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/134 , H01S3/22 , H01S3/2207 , H03K3/57 , H03K17/80
摘要： A gas discharge laser capable of operating at pulse rates in the range of 4,000 Hz to 6,000 Hz at pulse energies in the range of 5 mJ to 10 mJ or greater. Important improvements over the prior art designs include: (1) a squirrel cage type fan (46A) for producing gas velocities in the discharge region of more than 67 m/s, (2) a liquid cooled drive motor having a low loss sealing member separating the motor from the motor starter and protecting the motor from the laser and breach detection device for detecting any breach of the sealing member, (3) a heat exchanger system (58A) capable of removing in excess of 16 kW of heat energy from the laser gas and (4) a pulse power system capable of providing precisely controlled electrical pulses to the electrodes (18A, 20A) to produce laser pulses at the desired pulse energies in the range of 5 mJ to 10 mJ or greater at pulse repetition rates in the range of 4,000 Hz to 6,000 Hz.

65. 发明公开

EP1101258A4 HIGH PULSE RATE PULSE POWER SYSTEM 有权
标题翻译：具有高脉冲频率脉冲发生器系统
公开(公告)号：EP1101258A4
公开(公告)日：2002-09-18
申请号：EP99930661
申请日：1999-06-24
申请人： CYMER INC
发明人： PARTLO WILLIAM N , BIRX DANIEL L , NESS RICHARD M , ROTHWEIL DANIEL A , MELCHER PAUL C , SMITH BRETT D
IPC分类号： H01F30/00 , G03F7/20 , H01S3/097 , H01S3/225 , H03K3/57 , H03K17/80 , H01S3/0971
CPC分类号： G03F7/70483 , G03F7/70025 , G03F7/70041 , G03F7/70575 , H01S3/097 , H01S3/225 , H03K3/57 , H03K17/80
摘要： A high pulse rate pulse power source (20) for supplying controlled high energy electrical pulses at rates of 2000 Hz or greater. The source (20) includes a pulse generating circuit (30) including a charging capacitor (42), a solid state switch (46) and a current limiting inductor (48). Pulses generated in the pulse generating circuit (30) are compressed in at least two pulse compression circuits (61, 65) and a step-up pulse transformer (56) increases peak voltage to at least 12,000 volts. A very fast regulated power supply is provided for charging the charging capacitor (42) in less than 400 microseconds and a pulse control system including a programmed processor (102) controls the charging of the charging capacitor (42) to an accuracy of less than about one percent at a rate of at least 2000 charges per second.

66. 发明公开

EP1226634A1 SINGLE CHAMBER GAS DISCHARGE LASER WITH LINE NARROWED SEED BEAM 审中-公开
标题翻译：与缩减带宽核爆炸一院的气体放电激光器
公开(公告)号：EP1226634A1
公开(公告)日：2002-07-31
申请号：EP00990902.9
申请日：2000-10-10
申请人： Cymer, Inc. , Partlo, William N. , Pan, Xiaojiang , Onkels, Eckehard D.
发明人： PARTLO, William, N. , PAN, Xiaojiang , ONKELS, Eckehard, D.
IPC分类号： H01S3/03
CPC分类号： H01S3/2366 , G03F7/70025 , G03F7/70041 , G03F7/70575 , H01S3/036 , H01S3/073 , H01S3/225 , H01S3/2333
摘要： A single chamber gas discharge laser system having a pulse power source for producing electrical discharges at the rate of at least 1000 pulses per second. The discharge, along with laser optics, create two short lived gain media, one for producing a seed beam and the other for amplifying the seed beam. Laser gas circulation around a chamber circulation path is provided and the electrodes (18A) and discharges are arranged so that debris from one of the gain medium is not circulated to the other gain medium during discharges until the debris has made a loop around at least 90 % of the chamber circulation path.

67. 发明公开

EP1218980A1 VERY NARROW BAND INJECTION SEEDED F 2? LITHOGRAPHY LASER 审中-公开
标题翻译：非常窄的带注射F 2？光刻激光
公开(公告)号：EP1218980A1
公开(公告)日：2002-07-03
申请号：EP00968374.9
申请日：2000-09-19
申请人： Cymer, Inc.
发明人： ERSHOV, Alexander, I. , ONKELS, Eckehard, D. , DAS, Palash, P. , PARTLO, William, N. , HOFMANN, Thomas
IPC分类号： H01S3/10
CPC分类号： H01S3/10092 , G03F7/70025 , G03F7/70041 , G03F7/70483 , G03F7/70575 , H01S3/03 , H01S3/036 , H01S3/0385 , H01S3/08004 , H01S3/08009 , H01S3/0943 , H01S3/097 , H01S3/09705 , H01S3/0971 , H01S3/139 , H01S3/223 , H01S3/225 , H01S3/2258 , H01S3/2308 , H01S3/2325 , H01S3/2333 , H01S3/2366
摘要： A turnable injection seeded very narrow band F2 lithography laser. The laser (60) combines modular design features of prior art long life reliable lithography lasers with special techniques to produce a seed beam (LNP15) operated in a first gain medium which beam (102) is used to stimulate narrow bnd lasing in a second gain medium to produce a very narrow band laser useful for integrated circuit lithography. In a preferred embodiment, two tunable etalon output couplers (164A, 164B) are used to narrow band an F2 laser and the output of the seed laser is amplified in an F2 amplifier.
摘要翻译：可转动的注射接种非常窄的F2光刻激光器。激光器（60）将现有技术的长寿命可靠光刻激光器的模块化设计特征与特殊技术结合以产生在第一增益介质中操作的种子光束（LNP15），该光束（102）用于以第二增益刺激窄带激光介质来产生用于集成电路光刻的非常窄带的激光器。在一个优选实施例中，使用两个可调校准器输出耦合器（164A，164B）来使F2激光器的频带变窄，并且在F2放大器中放大种子激光器的输出。

68. 发明公开

EP1100167A3 F2 laser with visible red and IR control 有权
标题翻译： F2激光与可见的红光和IR范围的控制
公开(公告)号：EP1100167A3
公开(公告)日：2002-03-27
申请号：EP00111119.4
申请日：2000-05-23
申请人： Cymer, Inc.
发明人： Onkels, Eckehard D. , Sandstrom, Richard L. , Duffey, Thomas P.
IPC分类号： H01S3/225 , H01S3/097 , H01S3/03
CPC分类号： H01S3/10092 , G03F7/70025 , G03F7/70041 , G03F7/70483 , G03F7/70558 , G03F7/70575 , H01S3/036 , H01S3/225
摘要： A reliable, modular, production quality F 2 excimer laser capable of producing, at repetition rates in the range of 1,000 to 2,000 Hz or greater, laser pulses with pulse energies greater than 10 mJ with a full width half, maximum bandwidth of about 1 pm or less at wavelength in the range of 157 nm. Laser gas concentrations are disclosed for reducing unwasted infrared emissions from the laser. Also disclosed are UV energy detectors which are substantially insensitive to infrared light. Preferred embodiments of the present invention can be operated in the range of 1000 to 4000 Hz with pulse energies in the range of 10 to 5 mJ with power outputs in the range of 10 to 40 watts. Using this laser as an illumination source, stepper or scanner equipment can produce integrated circuit resolution of 0.1 µm or less. Replaceable modules include a laser chamber and a modular pulse power system. In a preferred embodiment the laser was tuned to the F 2 157.6 nm line using a set of two external prisms. In a second preferred embodiment the laser is operated broad band and the 157.6 nm line is selected external to the resonance cavity. In a third preferred embodiment a line width of 0.2 pm is provided using injection seeding. Another embodiment utilizes a grating for line selection and increases the tuning range by operating the laser at a pressure in excess of 4 atmospheres.

69. 发明公开

EP1184944A2 Excimer-Laser und Verfahren zum Betreiben eines Excimer-Lasers 审中-公开
公开(公告)号：EP1184944A2
公开(公告)日：2002-03-06
申请号：EP01120322.1
申请日：2001-08-24
申请人： TuiLaser AG
发明人： Strowitzki, Claus
IPC分类号： H01S3/097
CPC分类号： H01S3/0975 , H01S3/225
摘要： Die vorliegende Erfindung betrifft einen Excimer-Laser mit einem Ladekreis umfassend eine Parallelschaltung eines Speicherkondensators (C B ) mit einer Serienschaltung aus einer Umschwinginduktivität (L B ), einer Ladeinduktivität (L L ) und einer Zündvorrichtung (Z) zum Zünden des Excimer-Lasers, wobei der Speicherkondensator (C B ) zwei Kontakte zum Anschließen einer Stromversorgung (U L ) aufweist, einem Peakingkondensator (C P ), der der Ladeinduktivität (L L ) parallelgeschaltet ist, einer Entladestrecke umfassend zwei sich gegenüberliegende Elektroden (E1, E2), die dem Peakingkondensator (C P ) parallelgeschaltet ist, und einer Ansteuervorrichtung zur Ansteuerung der Zündvorrichtung (Z), wobei die Zündvorrichtung (Z) als MOSFET-Array ausgebildet ist. Die Erfindung betrifft auch ein korrespondierendes Verfahren zum Betreiben eines derartigen Excimer-Lasers.
摘要翻译：激光器具有与包括振荡电感器（LB），充电电感器（LL）和点火装置（Z）的串联电路并联的存储电容器。点火装置由MOSFET阵列形成。可以包括多个电容器的峰值电容器（CP）与充电电感器并联布置。包括用于操作准分子激光器的方法的独立权利要求。

70. 发明授权

EP0854003B1 LASER APPARATUS 失效
公开(公告)号：EP0854003B1
公开(公告)日：2001-11-21
申请号：EP96932031.6
申请日：1996-09-27
申请人： KOMATSU LTD.
发明人： MIZOGUCHI, Hakaru , WAKABAYASHI, Osamu , KOBAYASHI, Yukio , AMADA, Yoshiho , MIMURA, Tatsuo
IPC分类号： B23K26/00 , H01S3/134
CPC分类号： G03F7/70041 , B23K26/03 , B23K26/06 , B23K26/702 , G03F7/70025 , H01S3/134 , H01S3/225

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