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    • 65. 发明公开
    • Adjustable mounting unit for an optical element of a gas laser
    • 用于在气体激光器的光学元件保持器可调
    • EP1130699A3
    • 2002-05-22
    • EP01104173.8
    • 2001-02-21
    • TuiLaser AG
    • Kodeda, HansFrowein, HelmutStrowitzki, ClausHohla, Alexander
    • H01S3/034H01S3/086
    • H01S3/086H01S3/034H01S3/225
    • An adjustable mounting unit (103,120) for an optical element (116) of a gas laser (100) is provided. The typical gas laser for which the mounting unit will be used comprises a tube (101) having a first end wall (96) at one end and a second end wall (98) at the other end, an optical axis extending longitudinally through the tube (101), and a port (97) in the first end wall (96) through which the optical axis passes. The mounting unit includes a rigid support structure (117) having an aperture (122) therein and an optical element mounted within the aperture. In addition, at least three adjustable mounting devices are used to attach the support structure to the laser tube (101). The mounting points are preferably selected so that they are displaced in an axial direction by substantially the same amount due to dimensional changes in the laser occurring during operation of the laser. When attached to the laser, the rigid support (117) is spaced apart from the laser tube (101) to allow for the adjustment of the angular positioning of the optical element (116). Furthermore, the aperture and optical element are disposed transverse to the optical axis and are aligned with the optical axis. Adjustment of the adjustable mounting devices (103,120) changes the angular position of the optical element (116) relative to the optical axis.
    • 69. 发明公开
    • Excimer or molecular fluorine laser devices
    • 荧光激光紫外线激发剂
    • EP1137132A2
    • 2001-09-26
    • EP01106068.8
    • 2001-03-12
    • Ushio Research Institute of Technology, Inc.
    • Kakizaki, KojiTada, Akifumi
    • H01S3/223H01S3/225
    • H01S3/225
    • To provide an ArF excimer laser device capable of a pulsewidth FWHM of 20 ns or more, a pulse duration time of 50 ns or more, and a spectrum line width FWHM of 0.35 pm or less, and to provide a KrF excimer laser device and a fluorine laser device with stretched pulse widths. The ArF excimer laser device connects to the output terminal of a magnetic pulse compression circuit and has a pair of laser discharge electrodes located within the laser chamber and a peaking capacitor connected in parallel with the pair of laser discharge electrodes. The output waveform of the laser pulse has a bifurcated form with a front half peak and a later half peak and, if the peak value of the front half peak is P 1 and the peak value of the later half peak is P 2 and the (proportion of the pulse later half peak) = P 2 / (P 1 + P 2 ) x 100 (%), then the (proportion of the pulse later half peak) is 50% or more.
    • 为了提供能够具有20ns以上的脉冲宽度FWHM,50ns以上的脉冲持续时间和0.35μm以下的谱线宽度FWHM的ArF准分子激光装置,并且提供KrF准分子激光装置和 氟激光器件具有拉伸的脉冲宽度。 ArF准分子激光装置连接到磁脉冲压缩电路的输出端子,并且具有位于激光室内的一对激光放电电极和与该对激光放电电极并联连接的峰值电容器。 激光脉冲的输出波形具有前半峰和后半峰的分叉形式,如果前半峰的峰值为P1,后半峰的峰值为P2,则(( 脉冲后半峰)= P2 /(P1 + P2)×100(%),则(脉冲后半峰的比例)为50%以上。