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51. 发明授权

EP1929595B1 THERMAL-EXPANSION TOLERANT, PREIONIZER ELECTRODE FOR A GAS DISCHARGE LASER 有权转让
标题翻译：热膨胀容错VORIONISIERERELEKTRODE用于气体放LASER
公开(公告)号：EP1929595B1
公开(公告)日：2010-11-03
申请号：EP06804111.0
申请日：2006-09-25
申请人： Cymer, Inc. (A Nevada Corporation)
发明人： STEIGER, Thomas, D. , UJAZDOWSKI, Richard, C.
IPC分类号： H01S3/097 , H01S3/038 , H01S3/22
CPC分类号： H01S3/09713 , H01S3/036 , H01S3/0384 , H01S3/0385 , H01S3/0388 , H01S3/225
摘要： A corona-discharge type, preionizer assembly for a gas discharge laser is disclosed. The assembly may include an electrode and a hollow, dielectric tube that defines a tube bore. In one aspect, the electrode may include a first elongated conductive member having a first end disposed in the bore of the tube. In addition, the electrode may include a second elongated conductive member having a first end disposed in the bore and spaced from the first end of the first conductive member. For the assembly, the first and second conductive members may be held at a same voltage potential.

52. 发明公开

EP1689552A4 LASER THIN FILM POLY-SILICON ANNEALING OPTICAL SYSTEM 失效转让
标题翻译：光学薄膜膜LASERWÄRMEAUSGLÜHSYSTEM多晶硅
公开(公告)号：EP1689552A4
公开(公告)日：2008-12-03
申请号：EP04810725
申请日：2004-11-12
申请人： TCZ PTE LTD
发明人： PARTLO WILLIAM N , DAS PALASH P , HUDYMA RUSSEL , THOMAS MICHAEL
IPC分类号： B23K26/00 , B23K26/06 , B23K26/073 , C30B1/02 , C30B13/24 , H01L21/20 , H01S3/22 , H01S3/223
CPC分类号： B23K26/0732 , B23K26/0622 , B23K26/0738 , C30B1/023 , C30B13/24 , H01L21/2026
摘要： A high energy, high repetition rate workpiece surface heating method and apparatus are disclosed which may comprise a pulsed XeF laser operating operating at or above 4000 Hz and producing a laser output light pulse beam at a center wavelength of about 351 nm; an optical system narrowing the laser output light pulse beam to less than 20 [mu]m in a short axis of the laser output light pulse beam and expanding the laser output light pulse beam to form in a long axis of the beam workpiece covering extent of the long axis; the optical system including a field stop intermediate the laser and the workpiece; the workpiece comprising a layer to be heated; ; wherein the optical system focuses the laser output light pulse beam at a field stop with a magnification sufficient to maintain an intensity profile that has sufficiently steep side walls to allow the field stop to maintain a sufficiently steep beam profile at the workpiece without blocking the beam profile at too high an intensity level 2. The apparatus may also have a high average power in the laser output light pulse beam as delivered to the workpiece and a linebow correction mechanism in a short axis optical assembly. The linebow correction mechanism may comprise a plurality of weak cross cylinders. The system may comprise a catadioptric projection system. The line width due to laser diffraction and divergence may be less than geometric limitations.; The system may project adjacent peaks of the nominal XeF spectrum to improve overall depth of focus through the separate center wavelengths of each respective adjacent peak having a different focal plane at the workpiece. The system may comprise a linebow is correction mechanism within a field stop optical assembly correcting linebow at the field stop plane and within a workpiece projection optical assembly correcting linebow at the workpiece plane.

53. 发明公开

EP1754291A4 GAS DISCHARGE LASER CHAMBER IMPROVEMENTS 有权转让
标题翻译：气体放电激光器室的改进
公开(公告)号：EP1754291A4
公开(公告)日：2008-04-09
申请号：EP05733083
申请日：2005-03-03
申请人： CYMER INC
发明人： PARTLO WILLIAM N , AMADA YOSHIHO , CARMICHAEL JAMES A , DYER TIMOTHY S , GILLESPIE WALTER D , MOOSMAN BRYAN G , RETTIG CURTIS L , STRATE BRIAN D , STEIGER THOMAS D , TRINTCHOUK FEDOR B , UJAZDOWSKI RICHARD C
IPC分类号： H01S3/22 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/041 , H01S3/097 , H01S3/0971 , H01S3/225
CPC分类号： H01S3/036 , H01S3/0384 , H01S3/041 , H01S3/0971 , H01S3/225
摘要： A method and apparatus if disclosed which may comprise a high power high repetition rate gas discharge laser UV light source which may comprise: a gas discharge chamber comprising an interior wall comprising a vertical wall and an adjacent bottom wall; a gas circulation fan creating a gas flow path adjacent the interior vertical wall and the adjacent bottom wall; an in-chamber dust trap positioned a region of low gas flow, which may be along an interior wall and may comprise at least one meshed screen, e.g., a plurality of meshed screens, which may comprise at least two different gauge meshed screens. The dust trap may extend along the bottom interior wall of the chamber and/or a vertical portion of the interior wall. The dust trap may comprise a first meshed screen having a first gauge; a second meshed screen having a second gauge smaller than the first gauge; and the second meshed screen intermediate the first meshed screen and the interior wall. The chamber may comprise a plurality of dust collecting recesses in at least one of the vertical interior wall and the bottom wall of the chamber which may be selected from a group comprising a one-part recess and a multi-part recess, which may comprise two sections angled with respect to each other. The dust trap may comprise a pressure trap positioned between a portion of a main insulator and an interior wall of the chamber. The chamber may comprise a gas circulating fan comprising a cross-flow fan with a fan cutoff that may comprise a vortex control pocket. The chamber may comprise a preionization mechanism comprising a preionization tub containing a ground rod within an elongated opening in the preionization tube that may comprise a compliant member, an automatic preionization shut-off mechanism, a preionization onset control mechanism and/or a focusing element. The chamber may comprise an elongated baffle plate that may comprise a plurality of pyramidal structures including varying numbers of generally pyramidal elements and oriented in groups of varying numbers of generally pyramidal elements and oriented along and transverse to the longitudinal axis. Acoustic resonances within the chamber may also be reduced by introducing an artificial fitter into the timing of the laser discharges varying the inter-pulse period randomly or in a repeating pattern from pulse to pulse within a burst.

54. 发明公开

EP1831974A2 LINE NARROWING MODULE 有权转让
标题翻译：线收窄
公开(公告)号：EP1831974A2
公开(公告)日：2007-09-12
申请号：EP05826233.8
申请日：2005-11-28
申请人： Cymer, Inc.
发明人： ALGOTS, Martin, J. , BERGSTEDT, Robert, A. , GILLESPIE, Walter, D. , KULGEYKO, Vladimir, A. , PARTLO, William, N. , RYLOV, German, E. , SANDSTROM, Richard. L. , STRATE, Brian, D. , DYER, Timothy, S.
IPC分类号： H01S3/22
CPC分类号： H01S3/1055 , G03F7/70025 , G03F7/70041 , H01S3/005 , H01S3/036 , H01S3/08 , H01S3/08004 , H01S3/08059 , H01S3/097 , H01S3/106 , H01S3/2251
摘要： A line narrowing module (28) for a gas discharge laser producing a pulsed light beam comprising: a grating (22) mounted along an optical path of the line narrowing module (28), selecting at least one center wavelength for the pulsed light beam as determined at least in part by an angle of incidence of the pulsed light beam on the grating (22); a beam expander prism assembly (64) comprising three or more prisms (82, 84, 86, 88) including: a first prism ( 82)moveable to select an angle of incidence of the pulsed light beam on the grating (22) and having a relatively larger impact on the angle of incidence; and a second prism (84) moveable to select an angle of incidence of the pulsed light beam on the grating (22) and having a relatively smaller impact on the angle of incidence; wherein the first prism (82) has a magnification that is larger than the magnification of the second prim (84); and a controller configured to control the movement of the first (82) and second (84) prisms based on feedback from a center wavelength detector that detects a center wavelength of the pulsed light beam.

55. 发明授权

EP1256149B1 ELECTRIC DISCHARGE LASER WITH ACOUSTIC CHIRP CORRECTION 有权
标题翻译：声学修正CHIRP电气放电激光器
公开(公告)号：EP1256149B1
公开(公告)日：2007-07-25
申请号：EP01901827.4
申请日：2001-01-05
申请人： Cymer, Inc.
发明人： PARTLO, William, N. , FOMENKOV, Igor, V. , HUEBER, Jean-Marc , BOR, Zsolt , ONKELS, Echeard, D. , CATES, Michael, C. , UJAZDOWSKI, Richard, C. , FLEUROV, Vladimir, B. , GAIDARENKO, Dmitri, V.
IPC分类号： H01S3/036 , H01S3/22 , H01S3/223 , H01S3/04
CPC分类号： G03F7/70025 , G03F7/70575 , G03F7/708 , H01S3/036 , H01S3/038 , H01S3/0381 , H01S3/0382
摘要： The invention incorporates methods and structural changes in gas discharge lasers for minimizing wavelength chirp at high pulse rates. The major cause of wavelength chirp in high pulse rate gas discharge lithography lasers as pressure waves from a discharge reflecting back to the discharge region coincident with a subsequent discharge. During burst mode operation, the laser gas temperature in prior art lasers changes. This in turn changes the location of the coincident pressure waves from pulse to pulse, which ultimately alters the beam direction, causing the grating in the LNP to reflect back to the discharge region light at a slightly different wavelength. A solution to the problem is to include in the laser chamber structural elements to moderate or disperse the pressure waves and to maintain a constant laser gas temperature. One embodiment has a laser gas discharge chamber with baffles (70), heat exchanger (40), and a fan (38).

56. 发明公开

EP1370383A4 MONOLITHIC CERAMIC LASER STRUCTURE AND METHOD OF MAKING SAME 审中-公开
标题翻译：单片陶瓷激光器设计及其制造方法
公开(公告)号：EP1370383A4
公开(公告)日：2007-06-27
申请号：EP02753649
申请日：2002-03-18
申请人： NUTFIELD TECHNOLOGIES INC
发明人： MORROW CLIFFORD E
IPC分类号： H01S3/03 , C04B37/00 , H01S3/034 , H01S3/081 , H01S3/22 , H01S3/223
CPC分类号： H01S3/0305 , H01S3/034 , H01S3/0813 , H01S3/0815 , H01S3/0816 , H01S3/2222 , H01S3/2232 , Y10T156/1064
摘要： A monolithic ceramic waveguide laser body is made by forming and grinding two or more plates (1, 2) of alumina ceramic to produce internal (5, 6, 7, 8) and external features otherwise impossible to fabricate in a single ceramic body. The plates are bonded together by use of glass frit or by self-friting (diffusion bonding) methods to achieve a vacuum tight enclosure. The ceramic surfaces to be bonded have an 'as ground' finish. One internal structure created by this method includes a channel (6) of dimensions from 8 to 1.5 mm square or round that confines an RF or DC electrical discharge and comprises a laser resonator cavity. The channel can be ground to form a 'V', 'U' or 'Z' shape folded cavity. Another internal structure is a gas reservoir (7) connected to the resonator cavity. Various other important features are described that can only be created by this method of building a laser. The plates are bonded together in a furnace at temperatures ranging between 450 degrees C and 1700 degrees C, depending on the method used.

57. 发明公开

EP1649568A4 ANODES FOR FLUORINE GAS DISCHARGE LASERS 审中-公开
标题翻译：阳极的FLUOR气体放电激光器
公开(公告)号：EP1649568A4
公开(公告)日：2007-02-28
申请号：EP04778486
申请日：2004-07-16
申请人： CYMER INC
发明人： DYER TIMOTHY S , MORTON RICHARD , GILLESPIE WALTER D , STEIGER THOMAS D
IPC分类号： H01S3/038 , H01M20060101 , H01S3/036 , H01S3/097 , H01S3/0971 , H01S3/22 , H01S3/223 , H01S3/225
CPC分类号： H01S3/038 , H01S3/036 , H01S3/0381 , H01S3/0382 , H01S3/0385 , H01S3/0388 , H01S3/097 , H01S3/09702 , H01S3/09713 , H01S3/225 , H01S3/2251 , H01S3/2256
摘要： Electrodes for a fluorine gas discharge laser are disclosed which may comprise a crown straddling the centerline axis between the pair of side walls and the pair of end walls, comprising a first material, forming at least a portion of the discharge region of the electrode; the crown in traverse cross section having the shape of the upper half of a canted ellipse rotated in the preionizer direction, such that a tangent to the short centerline axis of the ellipse forms an angle with the horizontal.

58. 发明公开

EP1412182A4 LASER SPECTRAL ENGINEERING FOR LITHOGRAPHIC PROCESS 审中-公开
标题翻译： LASER-SPEKTRALTECHNIKFÜRLITHOGRAPHISCHE VERFAHREN
公开(公告)号：EP1412182A4
公开(公告)日：2006-06-28
申请号：EP02752300
申请日：2002-07-11
申请人： CYMER INC
发明人： SPANGLER RONALD L , LIPCON JACOB P , RULE JOHN A , JACQUES ROBERT N , KROYAN ARMEN , LALOVIC IVAN , FOMENKOV IGOR V , ALGOTS JOHN M
IPC分类号： B41C20060101 , B41C1/00 , G03F7/20 , H01L21/027 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/081 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/10 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/11 , H01S3/13 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/225
CPC分类号： G03F7/70575 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70933 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/0812 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/13 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258
摘要： An integrated circuit lithography technique called (spectral engineering for bandwidth control of an electric discharge laser. A computer models lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism (104) adjusts the center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment (106) is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond. A wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second in phase with the repetition rate of the laser.
摘要翻译：一种集成电路光刻技术被称为（用于放电激光器的带宽控制的光谱工程）计算机模拟光刻参数以确定产生期望光刻结果所需的期望激光光谱快速响应调谐机构（104）调节中心波长激光脉冲以脉冲突发的形式获得用于接近期望的激光光谱的脉冲突发的集成光谱。控制激光光束带宽以产生具有至少两个光谱峰值的有效光束光谱，以便在照片中产生改善的图案分辨率提供线变窄设备（106），其具有至少一个压电驱动器和具有小于约2.0毫秒的时间响应的快速带宽检测控制系统;波长调谐镜以大于每分钟500次的抖动与激光的重复频率同相。

59. 发明公开

EP1339519A4 FOUR KHz GAS DISCHARGE LASER 审中-公开
标题翻译：四KHZ气体放电激光器
公开(公告)号：EP1339519A4
公开(公告)日：2006-06-28
申请号：EP01975156
申请日：2001-05-23
申请人： CYMER INC
发明人： NEWMAN PETER C , DUFFEY THOMAS P , PARTLO WILLIAM N , SANDSTROM RICHARD L , MECHER PAUL C , JOHNS DAVID M , SAETHRE ROBERT B , FLEUROV VLADIMIR B , NESS RICHARD M , RETTIG CURTIS L , SHANNON ROBERT A , UJAZDOWSKI RICHARD C , ROKNI SHAHRYAR , PAN XIAOJIANG J , KULGEYKO VLADIMIR , SMITH SCOTT T , ANDERSON STUART L , ALGOTS JOHN M , SPANGLER RONALD L , FOMENKOV IGOR V
IPC分类号： H01S3/134 , H01S3/225 , G01J1/42 , G01J9/00 , G03F7/20 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/11 , H01S3/13 , H01S3/131 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/223
CPC分类号： H01S3/225 , G01J1/4257 , G01J3/027 , G01J9/0246 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/097 , H01S3/09702 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2308
摘要： The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5mJ or greater. A preferred embodiments is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.

60. 发明公开

EP1305855A4 COMPACT, FLEXIBLE, RAPID-PULSED, MOLECULAR GAS LASER 审中-公开
标题翻译：紧凑，灵活，快速脉冲，分子气体激光器
公开(公告)号：EP1305855A4
公开(公告)日：2006-04-26
申请号：EP01948195
申请日：2001-03-01
申请人： HILL ALAN E
发明人： HILL ALAN E
IPC分类号： H01S1/00 , H01S3/036 , H01S3/038 , H01S3/041 , H01S3/097 , H01S3/0971 , H01S3/102 , H01S3/223 , H01S3/22
CPC分类号： H01S1/005 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/041 , H01S3/097 , H01S3/09702 , H01S3/09707 , H01S3/0971 , H01S3/1024 , H01S3/2232
摘要： A compact molecular gas laser and circuit apparatus for same. A plasma volume and active laser gain region (110) is positioned centrally between two substantially symmetrical flow corridors (210, 210'). The laser gain region is further positioned between two electrodes (cathode (120) and anode (150)). An acoustic chamber (212) comprises at least one cylindrical metal speaker driver housing (200) for mounting at least two loudspeaker flow reciprocators (230, 230'), which comprise planar honeycomb loudspeaker driver diaphragms (240, 240').

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