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    • 49. 发明公开
    • Mechanism for mounting and actuating a momentum wheel with high vibration isolation
    • 用于安装和用于具有高振动隔离的一飞轮的致动的装置
    • EP0742146A1
    • 1996-11-13
    • EP95303193.7
    • 1995-05-11
    • Hughes Aircraft Company
    • Harrell, John P.
    • B64G1/28G01C19/16
    • G01C19/16B64G1/281B64G1/285
    • An apparatus for mounting a momentum wheel assembly (10) to a spacecraft (54). The momentum wheel assembly (10) includes a momentum wheel which has a primary spin axis coinciding with the primary spin axis of the spacecraft and spins in a direction opposite that of the spacecraft (54). Suspension isolation struts (20) attach the momentum wheel assembly (10) to the spacecraft (54) and provide substantial vibration isolation between the spacecraft (54) and the momentum wheel assembly (10). Voice coil actuators (40) attach to an adaptor ring (14) which in turn attaches to the spacecraft (54). The voice coil actuators (40) magnetically interact with a magnetically conductive element (42) attached to the momentum wheel assembly case (12). Interaction between the voice coil actuators (40) and the magnetic element (42) provides forces which displace the momentum wheel assembly case (12) in two axes orthogonal to the primary spin axis.
    • 对于动量轮组件(10)安装到航天器(54)的装置。 动量轮组件(10)包括一个动量轮其中有一个主旋轴与航天器的主旋轴线重合和旋转在相反的方向上做了航天器(54)的。 悬浮液隔离支柱(20)的动量轮组件(10)连接到航天器(54),并提供太空船(54)和动量轮组件(10)之间的显着的振动隔离。 音圈致动器(40)附连到适配环(14),其依次附连到航天器(54)。 音圈致动器(40)磁性地附连到动量轮组件壳体(12)导磁元件(42)相互作用。 音圈致动器(40)和所述磁性元件(42)之间的相互作用提供力,其在移位两个正交轴到主自旋轴的动量轮组件壳体(12)。
    • 50. 发明公开
    • Cofocal optical systems for thickness measurements of patterned wafers
    • Optisches KonfokalsystemfürDickenmessungen a einer Halbleiterscheibe mit einem Muster。
    • EP0647828A3
    • 1996-11-13
    • EP94307402.1
    • 1994-10-10
    • Hughes Aircraft Company
    • Ledger, Anthony M.
    • G01B11/06
    • G03F7/70483G01B11/06
    • An optical system (10) for providing low and high resolution images of a patterned wafer (11) to provide for film thickness measurements thereof. The optical system (10) comprises a spectrally filtered light source (18) for providing light to illuminate the wafer (11). A low resolution imaging system (34) is provided for imaging the wafer (11) at a relatively low resolution. A high resolution imaging system (37) is provided for imaging a subarea of the wafer (11) at a relatively high resolution to create an enlarged image in the same object plane as the wafer (11). An image producing system (35) is provided for producing a visual image of the wafer (11) derived from the low and high resolution images. The high resolution imaging system (37) uses subaperture optical elements, comprising either a small scanning lens or a sparse array of lenses, to image small areas of the wafer (11) at higher resolution, and the subaperture optical elements (37) create an enlarged image in the same object plane as the actual wafer (11). Both areas are then imaged onto the image producing system (35) such as a CCD array (35) of a CCD camera (35a), by the low resolution imaging system (34) (a lens or reflector) to provide a common or cofocal feature of the present invention. This arrangement avoids frequent refocussing to make thickness measurements on different parts of the wafer (11). The present invention allows the determination of thin film thicknesses of patterned wafers (11), planar wafers (11), and silicon-on-insulator (SOI) wafers (11), even though the spatial frequencies of the patterns are radically different in all these cases. The present invention provides the ability to make thickness maps of magnified regions within a semiconductor chip as well as test pads located in scribe alleys thereon. The use of high resolution multispectral subimages significantly increases the speed at which thickness maps of these patterned regions are generated. The invention may also be used to measure the that also allows determination of position and orientation of the wafer (11) since the wafer edges are in focus.
    • 一种用于提供图形化晶片(11)的低分辨率图像以提供其薄膜厚度测量的光学系统(10)。 光学系统(10)包括用于提供光以照亮晶片(11)的经光谱滤波的光源(18)。 提供了一种低分辨率成像系统(34),用于以相对低的分辨率对晶片(11)进行成像。 提供了一种高分辨率成像系统(37),用于以相对高的分辨率对晶片(11)的子区域进行成像,以在与晶片(11)相同的物体平面中产生放大的图像。 提供了一种图像产生系统(35),用于产生从低和高分辨率图像导出的晶片(11)的视觉图像。 高分辨率成像系统(37)使用包括小扫描透镜或稀疏阵列的子孔径光学元件以较高分辨率对晶片(11)的小区域进行成像,并且子孔径光学元件(37)产生 在与实际晶片(11)相同的物平面内的放大图像。 然后将这两个区域通过低分辨率成像系统(34)(透镜或反射器)成像到诸如CCD相机(35a)的CCD阵列(35)的图像产生系统(35)上,以提供共同或共焦 特征。 这种布置避免了频繁地重新聚焦以在晶片(11)的不同部分上进行厚度测量。 本发明允许确定图案化晶片(11),平面晶片(11)和绝缘体上硅(SOI)晶片(11)的薄膜厚度,即使图案的空间频率完全不同 这些情况。 本发明提供了制造半导体芯片内的放大区域的厚度图以及位于其上的划线槽中的测试焊盘的能力。 使用高分辨率多光谱子图像显着地增加了这些图案化区域的厚度图产生的速度。 本发明还可以用于测量由于晶片边缘被聚焦而允许确定晶片(11)的位置和取向。