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1. 发明授权

EP0598381B1 In-tank conductivity sensor 失效
标题翻译：箱内电导率传感器
公开(公告)号：EP0598381B1
公开(公告)日：1997-03-05
申请号：EP93118489.9
申请日：1993-11-16
申请人： Hughes Aircraft Company
发明人： Reddy, Vilambi NRK, c/o R. Radha Krishnan , Eliash, Bruce M. , Ludwig, Frank , Phan, Nguyet H.
IPC分类号： G01N27/07 , G01R27/22
CPC分类号： G01N27/07 , G01R27/22

2. 发明公开

EP0617280A3 Method of monitoring major constituents in plating baths 失效
标题翻译：在镀浴监测基本组分的方法。
公开(公告)号：EP0617280A3
公开(公告)日：1996-03-13
申请号：EP94104325.9
申请日：1994-03-18
申请人： Hughes Aircraft Company
发明人： Phan, Nguyet H. , Reddy, Vilambi NRK , Ludwig, Frank A. , Eliash, Bruce M.
IPC分类号： G01N27/49 , G01N27/48
CPC分类号： G01N27/49 , G01N27/48
摘要： A method of monitoring major constituents within a plating bath. The method involves applying an electrical signal to a working electrode positioned within the plating bath solution, varying signal parameters, and measuring the resultant response signal. The characteristics of the response signal indicate major constituent concentration levels. The method complements and is easily integrated with known voltammetric techniques for analysis of trace constituents, thus forming an integral part of an efficient overall plating bath analysis system. By adjusting major constituent concentration levels in accordance with measurements made using the method of the present invention, a high quality plating bath can be easily and inexpensively maintained.

3. 发明公开

EP0588323A2 In-tank electrochemical sensor 失效
标题翻译： einemBehälter的ElektrochemischerFühlerzur Nutzung。
公开(公告)号：EP0588323A2
公开(公告)日：1994-03-23
申请号：EP93114851.4
申请日：1993-09-15
申请人： Hughes Aircraft Company
发明人： Reddy, Vilambi NRK , Ludwig, Frank A. , Eliash, Bruce M. , Phan, Nguyet H.
IPC分类号： G01N27/49
CPC分类号： G01N27/28
摘要： An electrochemical sensor adapted for use in the electrochemical analysis of liquids. The sensor includes a cell assembly having a liquid flow control chamber, sensing chamber and liquid exit chamber. Liquids to be measured are pumped into the liquid flow control chamber where any turbulence in the liquid is dampened. The non-turbulent liquid is passed from the liquid flow control chamber to the sensing chamber. The sensing chamber includes a working electrode and a counter-electrode. The non-turbulent liquid is passed from the sensing chamber to the liquid exit chamber where it is contacted with a reference electrode. The liquid then exits the sensor. The sensor is well-suited for use in the electrochemical analysis of plating bath solutions where sub-milliampere type AC and DC voltammetric measurements are required in order to generate electrochemical spectra which are indicative of constituents present in the solution.
摘要翻译：适用于液体电化学分析的电化学传感器。传感器包括具有液体流动控制室，感测室和液体出口室的电池组件。要测量的液体被泵送到液体流动控制室中，其中液体中的任何湍流被抑制。非湍流液体从液体流动控制室传递到感测室。感测室包括工作电极和对电极。非湍流液体从感测室传送到液体出口室，在那里与参比电极接触。然后液体离开传感器。传感器非常适合用于电镀浴溶液的电化学分析，其中需要亚毫安级AC和DC伏安法测量，以产生指示溶液中存在的成分的电化学光谱。

4. 发明授权

EP0569826B1 Method and system for monitoring quality of phosphate coating 失效
标题翻译：用于监测磷酸盐涂层的质量的方法和装置
公开(公告)号：EP0569826B1
公开(公告)日：1997-03-05
申请号：EP93107226.8
申请日：1993-05-04
申请人： Hughes Aircraft Company
发明人： Ludwig, Frank A. , Eliash, Bruce M.
IPC分类号： G01N27/49 , G01N27/416
CPC分类号： G01N17/02 , Y10S204/08

5. 发明公开

EP0617279A2 Method for monitoring purification treatment in plating baths 失效
标题翻译：在Plattierungbädern的Verfahren zurÜberwachungeiner Reinigungsbehandlung。
公开(公告)号：EP0617279A2
公开(公告)日：1994-09-28
申请号：EP94104319.2
申请日：1994-03-18
申请人： Hughes Aircraft Company
发明人： Reddy, Vilambi NRK , Eliash, Bruce M. , Ludwig, Frank A. , Phan, Nguyet H.
IPC分类号： G01N27/49 , G01N27/48
CPC分类号： G01N27/48
摘要： A method for monitoring the status of a plating bath purification treatment cycle. The method involves applying a swept dc measurement signal to a pretreated electrode which is in contact with the plating solution, and monitoring the resultant response current signal. The electrode potential corresponding to the peak current density in the cathodic sweep of the response current signal provides an accurate indication of the status of the purification treatment cycle. The method tracks the progress of the purification process thereby ensuring the optimal termination points for the treatment process. The method can be used in conjunction with voltammetric plating bath analysis methods and equipment, as part of an overall plating bath monitoring and control system.
摘要翻译：净化处理循环施加到电镀溶液。通过以下方式进行监测： - （a）将d.c预处理信号应用于位于电镀溶液中的一个或多个电极。以便从电极中除去吸收的有机物或其它污染物。（b）将扫描的d.c信号施加到清洁的电极以产生相对于治疗周期的状态的响应信号，并在净化期间监测该信号。周期。

6. 发明公开

EP0598381A1 In-tank conductivity sensor 失效
标题翻译：箱内电导率传感器
公开(公告)号：EP0598381A1
公开(公告)日：1994-05-25
申请号：EP93118489.9
申请日：1993-11-16
申请人： Hughes Aircraft Company
发明人： Reddy, Vilambi NRK, c/o R. Radha Krishnan , Eliash, Bruce M. , Ludwig, Frank , Phan, Nguyet H.
IPC分类号： G01N27/07 , G01R27/22
CPC分类号： G01N27/07 , G01R27/22
摘要： A conductivity sensor adapted for use in the conductimetric analysis of liquids includes a pair of conductivity electrodes incorporated into a conductivity cell assembly having a liquid flow control chamber, sensing chamber, and liquid exit chamber. Liquids to be measured are pumped into the liquid flow control chamber, where any turbulence in the liquid is dampened. The non-turbulent liquid is passed from the liquid flow control chamber to the sensing chamber, where the conductivity of the liquid is determined. The sensing chamber is adapted for changing the height of a column of liquid between the pair of conductivity electrodes in order to vary the cell constant of the sensor. The non-turbulent liquid is passed from the sensing chamber to the liquid exit chamber, where it exits the sensor. The sensor is well-suited for use in measuring conductivities of plating bath solutions and monitoring concentrations of major constituents of plating bath solutions.
摘要翻译：适用于液体电导率分析的电导率传感器包括一对并入电导率电极组件中的电导率电极，该电导率电极组件具有液体流量控制室，检测室和液体排出室。待测量的液体被泵入液体流量控制室，液体中的紊流被抑制。非湍流液体从液体流量控制室传送到检测室，在此检测液体的电导率。感测腔室适于改变一对电导电极之间的液柱的高度，以改变传感器的电极常数。非湍流液体从检测室传到液体出口室，在那里离开传感器。该传感器非常适合用于测量电镀槽溶液的电导率，并监测电镀槽液主要成分的浓度。

7. 发明公开

EP0588323A3 In-tank electrochemical sensor 失效
标题翻译：一种用于在容器使用电化学传感器。
公开(公告)号：EP0588323A3
公开(公告)日：1995-05-24
申请号：EP93114851.4
申请日：1993-09-15
申请人： Hughes Aircraft Company
发明人： Reddy, Vilambi NRK , Ludwig, Frank A. , Eliash, Bruce M. , Phan, Nguyet H.
IPC分类号： G01N27/49
CPC分类号： G01N27/28
摘要： An electrochemical sensor adapted for use in the electrochemical analysis of liquids. The sensor includes a cell assembly having a liquid flow control chamber, sensing chamber and liquid exit chamber. Liquids to be measured are pumped into the liquid flow control chamber where any turbulence in the liquid is dampened. The non-turbulent liquid is passed from the liquid flow control chamber to the sensing chamber. The sensing chamber includes a working electrode and a counter-electrode. The non-turbulent liquid is passed from the sensing chamber to the liquid exit chamber where it is contacted with a reference electrode. The liquid then exits the sensor. The sensor is well-suited for use in the electrochemical analysis of plating bath solutions where sub-milliampere type AC and DC voltammetric measurements are required in order to generate electrochemical spectra which are indicative of constituents present in the solution.

8. 发明公开

EP0617280A2 Method of monitoring major constituents in plating baths 失效
标题翻译：在Plattierungsbädern的Verdahren zurÜberwachungvon wesentlichen Bestandteilen。
公开(公告)号：EP0617280A2
公开(公告)日：1994-09-28
申请号：EP94104325.9
申请日：1994-03-18
申请人： Hughes Aircraft Company
发明人： Phan, Nguyet H. , Reddy, Vilambi NRK , Ludwig, Frank A. , Eliash, Bruce M.
IPC分类号： G01N27/49 , G01N27/48
CPC分类号： G01N27/49 , G01N27/48
摘要： A method of monitoring major constituents within a plating bath. The method involves applying an electrical signal to a working electrode positioned within the plating bath solution, varying signal parameters, and measuring the resultant response signal. The characteristics of the response signal indicate major constituent concentration levels. The method complements and is easily integrated with known voltammetric techniques for analysis of trace constituents, thus forming an integral part of an efficient overall plating bath analysis system. By adjusting major constituent concentration levels in accordance with measurements made using the method of the present invention, a high quality plating bath can be easily and inexpensively maintained.
摘要翻译：通过以下步骤来监测电镀浴溶液中存在的主要成分的浓度：（a）将直流电位施加到位于待监测溶液中的预处理电极，其扫描速率的幅度介于2.4和1.5之间在20至1000mv之间。每秒（b）将交流信号叠加在所述电位上，所述信号具有约20至30微米的幅度，频率介于约50至2000赫兹之间; 并且（c）在选择的扫描速率和范围内改变直流电位，同时测量相对于变化的直流电位在工作电极和对电极之间以各种相位角产生的交流电流。产生交流电流谱，其中改变振幅，频率，扫描速率和范围相位角和电极处理的信号参数，以确定其值，并提供最大光谱细节，从中确定和监测溶液中主要成分的影响电镀沉积，其中这些成分占溶液体积的5％以上。

9. 发明公开

EP0617279A3 Method for monitoring purification treatment in plating baths 失效
标题翻译：用于监测放电池净化处理的方法。
公开(公告)号：EP0617279A3
公开(公告)日：1996-03-13
申请号：EP94104319.2
申请日：1994-03-18
申请人： Hughes Aircraft Company
发明人： Reddy, Vilambi NRK , Eliash, Bruce M. , Ludwig, Frank A. , Phan, Nguyet H.
IPC分类号： G01N27/49 , G01N27/48
CPC分类号： G01N27/48
摘要： A method for monitoring the status of a plating bath purification treatment cycle. The method involves applying a swept dc measurement signal to a pretreated electrode which is in contact with the plating solution, and monitoring the resultant response current signal. The electrode potential corresponding to the peak current density in the cathodic sweep of the response current signal provides an accurate indication of the status of the purification treatment cycle. The method tracks the progress of the purification process thereby ensuring the optimal termination points for the treatment process. The method can be used in conjunction with voltammetric plating bath analysis methods and equipment, as part of an overall plating bath monitoring and control system.

10. 发明公开

EP0598380A3 Method of monitoring constituents in plating baths 失效
标题翻译：监控电池组件的方法。
公开(公告)号：EP0598380A3
公开(公告)日：1995-10-11
申请号：EP93118488.1
申请日：1993-11-16
申请人： Hughes Aircraft Company
发明人： Ludwig, Frank A. , Eliash, Bruce M. , Phan, Nguyet H. , Reddy, Vilambi NRK
IPC分类号： G01N27/49
CPC分类号： G01N27/49
摘要： A method of monitoring a plating bath which combines ac and dc voltammetry to accurately measure major and trace constituent concentrations. The method involves applying both ac and dc voltammetric signals to a pretreated electrode in contact with the plating bath solution, measuring the ac and dc response current spectra, and comparing the resultant spectra to determine which provides maximum spectral detail for monitoring particular constituents with minimum interference from other constituents. Then, the ac and dc response current spectra are each used to monitor the particular constituents for which each provides the best accuracy. The method complements and is easily integrated with known voltammetric techniques and equipment.

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