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31. 发明授权

EP0326531B1 Improved RF plasma processing apparatus 失效
标题翻译：改进的射频等离子体处理设备
公开(公告)号：EP0326531B1
公开(公告)日：1993-09-22
申请号：EP89850011.1
申请日：1989-01-16
申请人： International Business Machines Corporation
发明人： Hendrix, Howard Allan , Schmidt, Howard William, Jr. , Ward, Ernest Spencer
IPC分类号： C23C14/40 , H01J37/34
CPC分类号： H01J37/3441 , H01J37/34

32. 发明公开

EP0504477A1 Vorrichtung zum Beschichten eines Substrats 失效
标题翻译： Vorrichtung zum Beschichten eines Substrats。
公开(公告)号：EP0504477A1
公开(公告)日：1992-09-23
申请号：EP91118309.3
申请日：1991-10-28
申请人： LEYBOLD AKTIENGESELLSCHAFT
发明人： Latz, Rudolf, Dr.
IPC分类号： H01J37/34
CPC分类号： H01J37/3441 , H01J37/3408
摘要： Bei einer Vorrichtung zum Beschichten eines Substrats (1) mit elektrisch leitenden Materialien (2), umfassend eine Gleichstrom- und/oder eine Wechselstromquelle (10 bzw. 38), die an eine in einer evakuierbaren Beschichtungskammer (15, 15a, 15b) angeordnete Elektrode angeschlossen ist, die elektrisch mit einem Target (3, 32) in Verbindung steht, das zerstäubt wird und dessen zerstäubte Teilchen sich auf dem Substrat (1) niederschlagen, wobei in die Beschichtungskammer (15, 15a, 15b) ein Prozeßgas einbringbar ist und wobei toroidförmige Magnetfelder durch das Target hindurchgreifen, deren Feldlinien im Bereich der Magnetpole aus der Oberfläche des Targets (3) austreten, weist das Target (3) eine im wesentlichen längliche, flache, ovale Form auf und ist außerdem von einer Dunkelraumabschirmung (34) umschlossen, deren dem Substrat (1) zugewandter, umlaufender Rand (35) geringfügig die Vorderfläche der Kathodenwanne (4) übergreift, wobei die in der Kathodenwanne (4) angeordnete, auf einem Joch (6) gehaltene Magnetanordnung aus einer mittleren, sich in Targetlängsrichtung erstreckenden Reihe von schmalen Magneten (8), einer weiteren an der Randpartie des Jochs (6) angeordneten endlosen Reihe von schmalen Magneten (7, 9) und zwei Rundmagneten gebildet ist, die sich jeweils an jedem Ende der mittleren Reihe von Magneten (8) befinden.
摘要翻译：在用于用导电材料（2）涂覆基板（1）的装置中，其包括连接到布置在涂布室（15）中的电极的DC和/或AC源（10和38） 15a，15b），哪个电极与溅射的靶（3,32）电连接，并且其溅射的颗粒在基板（1）上沉淀，可以将处理气体引入涂覆室（15,15a，15b），并且由此环形磁场穿过靶，其磁场线在磁极的区域中从靶（3）的表面出射，靶（3）具有基本上细长的平坦椭圆形，并且另外被围绕衬底（1）的周缘（35）略微接合在阴极沟槽（4）的前表面上的暗空间屏蔽（34）围绕，所述磁体装置布置在阴极沟槽（4）并保持在一个轭（6）上由沿着目标纵向方向延伸的中心排的窄磁体（8）形成，设置在磁轭（6）的边缘部分上的另外的环形排的窄磁体（7,9），以及两个圆形磁体壳体位于中心排的磁体（8）的每一端。 ... ...

33. 发明公开

EP0207801A3 Cathode/ground shield arrangement in a target for a sputter coating apparatus 失效
标题翻译：防喷器涂层设备目标中的阴极/接地屏蔽布置
公开(公告)号：EP0207801A3
公开(公告)日：1989-02-01
申请号：EP86305184.3
申请日：1986-07-03
申请人： WESTINGHOUSE ELECTRIC CORPORATION
发明人： Glasser, Albert Daniel
IPC分类号： H01J37/34
CPC分类号： H01J37/3441 , H01J37/34
摘要： The invention relates to a sputter-coating-apparatus target (100) comprising a cathode (56) with sputter target material (58) disposed thereon on one side thereof, and a box-like ground shield (84) which encloses the cathode on all sides thereof except the one with the sputter target material thereon, the ground shield and the cathode therein being electrically isolated from each other by a gap (96) defined therebetween. Peripheral strips (90) are mounted on a peripheral edge portion (66) of the cathode surface having the sputter target material thereon, said strips forming a continuous peripheral ledge (94) which extends laterally outward from the cathode surface and overhangs the gap (96) and the adjacent edge (86) of the sidewall (88) of the box-like ground shield to prevent loose flakes of sputtered target material from bridging the gap and thereby creating a short between the cathode and ground shield.

35. 发明授权

EP2705522B1 GLOW DISCHARGE APPARATUS AND METHOD WITH LATERAL ROTATING ARC CATHODES 有权转让
标题翻译：辉光放电装置和具有横向旋转电极的方法
公开(公告)号：EP2705522B1
公开(公告)日：2017-06-28
申请号：EP12719954.5
申请日：2012-05-03
申请人： Pivot A.S.
发明人： CSELLE, Tibor , MOJMIR, Jilek , LÜMKEMANN, Andreas
IPC分类号： H01J37/34 , H01J37/32 , C23C14/32 , C23C14/34
CPC分类号： C23C14/3464 , C23C14/0641 , C23C14/325 , C23C14/34 , H01J37/32055 , H01J37/34 , H01J37/3405 , H01J37/3411 , H01J37/3438 , H01J37/3441

36. 发明公开

EP2521159A1 Glow discharge apparatus and method with lateral rotating arc cathodes 审中-公开
标题翻译： Glimmentladungsvorrichtung und Verfahren mit seitlich rotierenden Lichtbogenkathoden
公开(公告)号：EP2521159A1
公开(公告)日：2012-11-07
申请号：EP11165152.7
申请日：2011-05-06
申请人： Pivot a.s.
发明人： Cselle, Tibor , Mojmir, Jilek
IPC分类号： H01J37/34 , H01J37/32
CPC分类号： C23C14/3464 , C23C14/0641 , C23C14/325 , C23C14/34 , H01J37/32055 , H01J37/34 , H01J37/3405 , H01J37/3411 , H01J37/3438 , H01J37/3441
摘要： To improve the result of a glow discharge process is disclosed to be performed in a Physical Vapor Deposition (PVD) coating apparatus comprising a door, at least 2 lateral rotating cathodes with targets. The apparatus is equipped by rotating shields or tube shutters (4). The method comprises the steps of operating the apparatus so that the arc of said second electrode (2) burns directly to said door. The rotary shield or tube shutter on a first electrode (1) is open and said rotary shield or tube shutter (4) on a second electrode (2) is closed. Then a positive potential is applied on said first electrode (1), so that a potential between said second electrode (2) and said first electrode (1) is applied. The positive potential applied on said first electrode (1) is selected so that the electron stream does not burn only against the door since the electrons being affected by the higher potential to said first electrode (1).
摘要翻译：公开了在包括门的物理气相沉积（PVD）涂覆设备中执行辉光放电过程的结果，至少两个具有目标的侧向旋转阴极。该装置通过旋转屏蔽或管快门（4）来装备。该方法包括以下步骤：操作所述设备，使得所述第二电极（2）的电弧直接燃烧到所述门。第一电极（1）上的旋转屏蔽或管快门是开放的，并且第二电极（2）上的所述旋转屏蔽或快门（4）关闭。然后在所述第一电极（1）上施加正电位，使得施加所述第二电极（2）和所述第一电极（1）之间的电位。选择施加在所述第一电极（1）上的正电势，使得电子流不会仅仅靠在门上，因为电子受到所述第一电极（1）的较高电位的影响。

37. 发明公开

EP2482305A1 Device for supporting a rotatable target and sputtering apparatus 审中-公开
标题翻译： Vorrichtung zumStützeneiner drehbaren Target- und Sputter-Vorrichtung
公开(公告)号：EP2482305A1
公开(公告)日：2012-08-01
申请号：EP11152612.5
申请日：2011-01-28
申请人： Applied Materials, Inc.
发明人： Schnappenberger, Frank , Multerer, Jürgen
IPC分类号： H01J37/34
CPC分类号： H01J37/3405 , H01J37/3435 , H01J37/3441
摘要： It is provided a device for supporting a rotatable target (1) of a deposition apparatus for sputtering material onto a substrate (20), wherein the device includes a drive unit (2) for rotating the rotatable target (1); a ring-shaped part (3) connected to the drive unit (2) for attaching the drive unit to the rotatable target (1); and, a shield (4) for covering the ring-shaped part (3). The shield (4) is adapted for rotating together with the ring-shaped part (3) and includes a plurality of parts assembled together. Furthermore, a sputtering apparatus and a method for supporting a rotatable target are provided.
摘要翻译：提供了一种用于将用于溅射材料的沉积设备的可旋转靶材（1）支撑到基底（20）上的装置，其中该装置包括用于使可旋转靶材（1）旋转的驱动单元（2）。连接到所述驱动单元（2）的用于将所述驱动单元附接到所述可旋转靶（1）的环形部分（3）; 以及用于覆盖所述环形部分（3）的屏蔽（4）。护罩（4）适于与环形部件（3）一起旋转并且包括组装在一起的多个部件。此外，提供了一种用于支撑可旋转靶的溅射装置和方法。

38. 发明公开

EP1614139A1 SPUTTERING CHAMBER COMPRISING A LINER 审中-公开
标题翻译：与衬里溅射舱
公开(公告)号：EP1614139A1
公开(公告)日：2006-01-11
申请号：EP04759501.2
申请日：2004-04-13
申请人： Cardinal CG Company
发明人： STEBBINS, David , STANEK, Roger , HARTIG, Klaus
IPC分类号： H01J37/32 , C23C14/56
CPC分类号： H01J37/3441 , C23C14/564 , H01J37/34 , H01J37/3405
摘要： A sputtering chamber comprising a liner is provided. The liner is adapted to reduce spalling of sputtered coating (overcoat) from interior surfaces of the chamber. The liner can be mounted adjacent a selected interior surface of the chamber. The liner is preferably removable. Also provided are sputtering methods wherein the present liners are used.

39. 发明授权

EP0681616B1 CYLINDRICAL MAGNETRON SHIELD STRUCTURE 失效
标题翻译：园筒形微波SHIELD
公开(公告)号：EP0681616B1
公开(公告)日：2002-11-13
申请号：EP94908576.5
申请日：1994-01-07
申请人： THE BOC GROUP, INC.
发明人： SIECK, Peter A. , PORTER, John R.
IPC分类号： C23C14/34 , H01J37/34
CPC分类号： H01J37/3441 , C23C14/35 , H01J37/3405 , H01J37/3426
摘要： A rotating cylindrical sputtering target surface (29) as part of a magnetron has cylindrical shields (70) adjacent each end of the target (29) that are shaped at their respective inner edges (70) to maximize etching and to prevent condensation and subsequent arcing that undesirably occurs when certain materials, particularly dielectrics, are being sputtered. If two or more rotating targets (29) are employed in a single magnetron system, each is similarly shielded. In an alternative form, the target (29) is provided with a single cylindrical shield (69) that is cut away for a significant portion of the distance around the cylinder to provide an opening through which a sputtering region of the target is accessible, while maintaining shielding of the target end regions. This alternative single shield (69) is similarly shaped at portions of its inner edges adjacent to the opening to maximize etching and to prevent undesired condensation and subsequent arcing. The preferred shield structure (69) is rotatable in order to allow the position of the sputtering activity to be selected.

40. 发明公开

EP0836218A3 Active shield for generating a plasma for sputtering 失效
标题翻译：有源屏蔽用于产生用于溅射的等离子体
公开(公告)号：EP0836218A3
公开(公告)日：1998-09-16
申请号：EP97307864.5
申请日：1997-10-06
申请人： APPLIED MATERIALS, INC.
发明人： Edelstein, Sergio , Subramani, Mani
IPC分类号： H01J37/34 , H01J37/32
CPC分类号： H01J37/321 , H01J37/3408 , H01J37/3411 , H01J37/3441 , H01J2237/3327
摘要： A combination coil and shield (104) for a plasma chamber (100) in a semiconductor fabrication system is provided. The coil-shield has a plurality of turns to couple energy efficiently into a plasma and also substantially blocks deposition material from reaching a second shield (106) positioned behind the first shield.

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