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31. 发明公开

EP0880162A2 Dual walled exhaust tubing for vacuum pump 失效
标题翻译： DoppelwändigeAbpumpröhrefürVakuumpumpe
公开(公告)号：EP0880162A2
公开(公告)日：1998-11-25
申请号：EP98303518.9
申请日：1998-05-05
申请人： EATON CORPORATION
发明人： Verrier, Kevin Richard , Quill, James Patrick , Denholm, Alec Stuart
IPC分类号： H01J37/18 , H01J37/317
CPC分类号： H01J37/18 , H01J2237/31701
摘要： A dual walled exhaust assembly (28) is provided for an ion implantation system for connecting system components residing at differing voltage potentials. The assembly comprises a disposable corrugated inner tube (84) connected between inner mounting portions of a first end mount and a second end mount, and a permanent outer tube (82) connected between outer mounting portions of the first and second end mounts. The inner and outer tubes (84, 82) are constructed from polytetrafluoroethylene (PTFE), or some similar dielectric material with appropriate non-flammable properties. The inner corrugated surface of the tube (84) has a plurality of surfaces which are pitched downwardly toward an axis (87) of the inner tube to prevent contaminant accumulation. The corrugated surface also reduces the risk of arcing between the system components residing at differing voltage levels by effectively increasing the length of the ground path that a leakage current would need to traverse across the length of the tube. The outer tube provides a containment mechanism for containing the toxic effluent if the thinner inner wall should puncture, perhaps due to electrical discharge which might still occur as a result of contaminant build-up on the inner surface of the inner tube.
摘要翻译：提供了一种双壁排气组件（28），用于离子注入系统，用于连接驻留在不同电压电位的系统组件。组件包括连接在第一端部安装件的内部安装部分和第二端部安装件之间的一次性波纹状内管（84）和连接在第一和第二端部安装件的外部安装部分之间的永久性外部管（82）。内管和外管（84,82）由聚四氟乙烯（PTFE）或具有适当的非易燃性质的一些相似的介电材料构成。管（84）的内波纹表面具有多个朝向内管的轴线（87）向下倾斜的表面，以防止污染物积聚。波纹表面还通过有效地增加泄漏电流需要穿过管的长度的接地路径的长度来降低驻留在不同电压水平的系统组件之间的电弧的风险。如果较薄的内壁应该穿刺，外管可以提供一种容纳有毒污染物的容纳机构，这可能是由于内管内表面上的污染物积聚而可能发生的放电。

32. 发明公开

EP0856872A2 Charged-particle-beam exposure apparatus 失效
标题翻译： Gerätzur Belichtung mittels geladenem Teilchenstrahl
公开(公告)号：EP0856872A2
公开(公告)日：1998-08-05
申请号：EP98101410.3
申请日：1998-01-27
申请人： NIKON CORPORATION
发明人： Morita,Kenji, Nikon Corporation , Nakasuji,Mamoru, Nikon Corporation
IPC分类号： H01L21/00
CPC分类号： G03F7/70716 , H01J37/18 , H01J2237/204 , H01J2237/3175
摘要： Apparatus and methods are disclosed for increasing the throughput of a charged-particle-beam exposure apparatus while maintaining alignment and exposure accuracy. The apparatus comprises a main chamber where exposure of sensitive substrates is performed using a charged-particle beam. At least one transport system moves and prepares the sensitive substrates for exposure in the main chamber. The transport system comprises at least one chamber. An evacuation device and a venting device are used to vary the pressure in the chambers as required. At least one switching valve is situated between the main chamber and a chamber in the transport system to isolate these chambers from one another. A flexible conduit connects the main chamber to the transport system. The apparatus and methods have especial utility for the processing of sub-micron level semiconductors.
摘要翻译：公开了用于在保持对准和曝光精度的同时增加带电粒子束曝光装置的生产量的装置和方法。该装置包括使用带电粒子束进行敏感基板的曝光的主室。至少一个运输系统移动并准备敏感基板以在主室中曝光。运输系统包括至少一个室。抽真空装置和排气装置用于根据需要改变腔室中的压力。至少一个切换阀位于主室和传送系统中的腔室之间，以将这些腔室彼此隔离。柔性导管将主室连接到运输系统。该装置和方法对于亚微米级半导体的处理具有特别的实用价值。

33. 发明授权

EP0384754B1 Localized vacuum apparatus and method 失效
标题翻译：部分真空的装置和方法
公开(公告)号：EP0384754B1
公开(公告)日：1997-05-14
申请号：EP90301905.7
申请日：1990-02-22
申请人： MICRION CORPORATION
发明人： Economou, Nicholas P. , Guarino, Nicholas , Edwards, David, Jr.
IPC分类号： H01J37/18 , H01J37/30 , H01L21/00
CPC分类号： H01J37/18 , H01J2237/006

34. 发明公开

EP0680071A2 Protective collar for a vacuum seal in a plasma etch reactor 失效
标题翻译：在einem Plasma-Ätzreaktor中的Vakuumdichtung的Schutzmanschette。
公开(公告)号：EP0680071A2
公开(公告)日：1995-11-02
申请号：EP95302587.1
申请日：1995-04-19
申请人： APPLIED MATERIALS, INC.
发明人： Rice, Michael , Askarinam, Eric
IPC分类号： H01J37/32 , H01J37/18 , F16J15/32
CPC分类号： H01L21/67126 , H01J37/18 , H01J37/32431 , H01J2237/166 , Y10S277/913
摘要： The disclosure relates to a vacuum seal that can be used in a plasma etch reactor to seal the chamber interior (10) from the outside environment consists of a protective collar (66) that is injection molded or machined of a high strength, high temperature and corrosion resistant thermoplastic material. The collar has an elastomeric gasket (68) installed therein and is used in combination with a second elastomeric gasket (76) to achieve a fluid-tight seal between two rigid surfaces (74,72) made of silicon and quartz, respectively.
摘要翻译：本公开涉及一种可用于等离子体蚀刻反应器以将室内部（10）从外部环境密封的真空密封件，其由注塑或机加工而成的高强度，高温度的保护套环（66）和耐腐蚀热塑性材料。套环具有安装在其中的弹性垫圈（68），并且与第二弹性体垫圈（76）组合使用以分别在由硅和石英制成的两个刚性表面（74,72）之间实现流体密封。

35. 发明授权

EP0385709B1 Fluid flow control method and apparatus for minimizing particle contamination 失效
标题翻译：用于控制液体的过程中的微粒污染的最小化的方法和装置。
公开(公告)号：EP0385709B1
公开(公告)日：1995-05-24
申请号：EP90302052.7
申请日：1990-02-27
申请人： EATON CORPORATION
发明人： Mack, Michael Edward
IPC分类号： H01J37/18 , H01J37/317 , G05D16/20
CPC分类号： C23C14/566 , C23C14/564 , G05D16/2053 , H01J37/18 , H01J37/3171 , Y10T137/0396 , Y10T137/7761

36. 发明授权

EP0257394B1 Electron beam apparatus 失效
标题翻译：电子束设备
公开(公告)号：EP0257394B1
公开(公告)日：1992-04-15
申请号：EP87111348.6
申请日：1987-08-05
申请人： KABUSHIKI KAISHA TOSHIBA
发明人： Miyoshi, Motosuke Patent Division , Okumura, Katsuya Patent Division
IPC分类号： H01J7/16 , H01J37/16 , H01J41/12
CPC分类号： H01J37/18 , H01J41/12

37. 发明公开

EP0473216A2 Charged particle beam device 失效
标题翻译： Ladungspartikelstrahlanordnung。
公开(公告)号：EP0473216A2
公开(公告)日：1992-03-04
申请号：EP91202016.1
申请日：1991-08-06
申请人： Philips Electronics N.V.
发明人： Mul, Petrus Maria
IPC分类号： H01J37/073 , H01J37/248 , H01J37/18
CPC分类号： H01J37/18 , H01J37/073 , H01J37/248 , H01J2237/0216
摘要： In a charged particle beam device, comprising a charged particle source (9) for emitting a charged particle beam, a column comprising particle-optical elements which are enclosed by a column jacket (10) and which serve to accelerate and focus the charged particle beam, the charged particle source comprising an emitter (11) which is accommodated in an emitter chamber (19), a vibration-insensitive suspension of the emitter is achieved by connecting the emitter chamber to the column jacket via a tubular electrode system (25). Because the pumping device (39) cooperating with the emitter chamber is arranged above the emitter chamber and in the prolongation of the column, disturbing effects of the pumping device on the emitter are reduced. Because the power supply unit (47) is arranged in the vicinity of the emitter, high-voltage supply leads can be dispensed with, so that interference signals cannot reach the emitter via the supply leads. The use of optical communication via optical fibres (51) prevents the occurrence of undesirable potentials in the equipment.
摘要翻译：在带电粒子束装置中，包括用于发射带电粒子束的带电粒子源（9），包括由柱护套（10）包围并且用于加速和聚焦带电粒子束的粒子 - 光学元件通过经由管状电极系统（25）将发射器室连接到柱护套，实现了包括发射器（11）的带电粒子源，该发射器（11）容纳在发射器室（19）中，发射器的不振动悬浮。因为与发射室协作的泵送装置（39）布置在发射室的上方，并且在塔的延长期间，减少了泵送装置对发射器的干扰作用。由于电源单元（47）布置在发射极附近，所以可以省略高压电源线，使得干扰信号不能通过电源线到达发射极。通过光纤（51）的光通信的使用防止设备中出现不期望的电位。

38. 发明授权

EP0106510B1 Envelope apparatus for localized vacuum processing 失效
标题翻译：用于本地化真空处理的包装设备
公开(公告)号：EP0106510B1
公开(公告)日：1991-11-13
申请号：EP83305269.9
申请日：1983-09-08
申请人： VARIAN ASSOCIATES, INC.
发明人： Lamattina, John R. , Petric, Paul Francis
IPC分类号： H01J37/18 , H01J37/301 , H01J37/317
CPC分类号： H01J37/301 , F16J15/006 , F16J15/168 , H01J37/18 , H01J2237/006

39. 发明公开

EP0392704A1 Shuttle system for rapidly manipulating a workpiece into and out of an atmospherically controlled chamber 失效
标题翻译：用于在相对及其大气监测空间迅速操纵工件摆支撑系统。
公开(公告)号：EP0392704A1
公开(公告)日：1990-10-17
申请号：EP90303380.1
申请日：1990-03-29
申请人： CAMBRIDGE VACUUM ENGINEERING LTD.
发明人： Trillwood, Richard E.
IPC分类号： B23K15/00
CPC分类号： H01L21/67748 , B23K15/06 , H01J37/18 , H01L21/67126 , Y10S414/139
摘要： An automated workpiece handling system rapidly moves a workpiece (127) into a controlled atmosphere chamber (11) such as a vacuum chamber, to a work station and withdraws the piece (127) after the work has been completed. While at the work station, the handling system manipulates the piece (127) linearly and in rotation, as desired, according to a set program. The workpiece (127) is loaded and unloaded at the same location outside the chamber (11), at atmosphere pressure. A split piston having a headstock (49) and tailstock (50) holds the workpiece (127). The piston seals the vacuum chamber (11) during loading and unloading, and during the work cycle. During transfer into the vacuum chamber (11), pressure around the workpiece is reduced. A pneumatic counterbalance system (111,143,141,109) reduces the loading on the piston drive system caused by the pressure differential between the vacuum chamber (11) and atmosphere.
摘要翻译：一种自动工件处理系统快速移动工件（127）到一个控制气氛的室（11）：如在真空室中，到工作位置和撤回片（127）的工作已经完成之后。而在工作站，所述处理系统操纵件（127）线性地和旋转时，如所希望的，gemäß到一组程序。工件（127）被加载，并在在大气压下的室（11）外面相同的位置卸载。具有头部的库存（49）和尾架（50）的分割活塞保持所述工件（127）。活塞装卸过程中密封所述真空室（11），和工作周期内。期间传递到真空腔室（11），围绕所述工件压力降低。气动平衡系统（111143141109）减少了由真空室（11）和大气之间的压力差引起的活塞驱动系统上的负载。

40. 发明公开

EP0158800A3 Vacuum-to-vacuum entry system apparatus 失效
标题翻译：真空真空入口系统装置真空真空入口系统装置
公开(公告)号：EP0158800A3
公开(公告)日：1987-12-09
申请号：EP85102202
申请日：1985-02-28
申请人： International Business Machines Corporation
发明人： Carter, Donald L.
IPC分类号： H05K13/00 , H05K13/02 , H01J37/18 , H01L21/00
CPC分类号： H01J37/18 , F16J15/40 , H01L21/67745
摘要： A vacuum-to-vacuum entry system which uses a rotary transport (20) to transfer workpieces (M, T) between two vacuum environments (23, 90) in a direction parallel to its axis of rotation (3) and through the interface of a combination rotary gas bearing and seal (1, 2). The combination gas bearing and seal seals off a zone in the gap (S) between its two planar bearing surfaces that is radially offset from the axis of rotation (3) of the bearing which is coincidental with the transport axis. Two arcuate gas sink channels (7, 8) on one of the bearing surfaces (1A) sink the gas of the bearing away from the zone. The bearing gas outside the zone in the gap and the two channels coact to effect a peripheral seal about the zone allowing the two vacuum environments when appropriately aligned to be in sealed communication with each other through the zone. A preferred embodiment is described for the transfer of ceramic substrates with circuitized surfaces between two vacuum environments.

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