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1. 发明公开

EP0856872A2 Charged-particle-beam exposure apparatus 失效
标题翻译： Gerätzur Belichtung mittels geladenem Teilchenstrahl
公开(公告)号：EP0856872A2
公开(公告)日：1998-08-05
申请号：EP98101410.3
申请日：1998-01-27
申请人： NIKON CORPORATION
发明人： Morita,Kenji, Nikon Corporation , Nakasuji,Mamoru, Nikon Corporation
IPC分类号： H01L21/00
CPC分类号： G03F7/70716 , H01J37/18 , H01J2237/204 , H01J2237/3175
摘要： Apparatus and methods are disclosed for increasing the throughput of a charged-particle-beam exposure apparatus while maintaining alignment and exposure accuracy. The apparatus comprises a main chamber where exposure of sensitive substrates is performed using a charged-particle beam. At least one transport system moves and prepares the sensitive substrates for exposure in the main chamber. The transport system comprises at least one chamber. An evacuation device and a venting device are used to vary the pressure in the chambers as required. At least one switching valve is situated between the main chamber and a chamber in the transport system to isolate these chambers from one another. A flexible conduit connects the main chamber to the transport system. The apparatus and methods have especial utility for the processing of sub-micron level semiconductors.
摘要翻译：公开了用于在保持对准和曝光精度的同时增加带电粒子束曝光装置的生产量的装置和方法。该装置包括使用带电粒子束进行敏感基板的曝光的主室。至少一个运输系统移动并准备敏感基板以在主室中曝光。运输系统包括至少一个室。抽真空装置和排气装置用于根据需要改变腔室中的压力。至少一个切换阀位于主室和传送系统中的腔室之间，以将这些腔室彼此隔离。柔性导管将主室连接到运输系统。该装置和方法对于亚微米级半导体的处理具有特别的实用价值。

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