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11. 发明公开

EP1997045A2 COMPUTER-IMPLEMENTED METHODS, CARRIER MEDIA, AND SYSTEMS FOR CREATING A METROLOGY TARGET STRUCTURE DESIGN FOR A RETICLE LAYOUT 有权
标题翻译：计算机实现的方法，存储设备和系统生成测量目标结构对齐对于标线安排
公开(公告)号：EP1997045A2
公开(公告)日：2008-12-03
申请号：EP07758540.4
申请日：2007-03-14
申请人： KLA-Tencor Technologies Corporation
发明人： SMITH, Mark , HARDISTER, Robert , POCHKOWSKI, Mike , WIDMANN, Amir , KASSEL, Elyakim , ADEL, Mike
IPC分类号： G06F17/50
CPC分类号： G06F17/5009 , G03F1/44
摘要： Computer-implemented methods, carrier media, and systems for creating a metrology target structure design for a reticle layout are provided. One computer-implemented method for creating a metrology target structure design for a reticle layout includes simulating how one or more initial metrology target structures will be formed on a wafer based on one or more fabrication processes that will be used to form a metrology target structure on the wafer and one or more initial metrology target structure designs. The method also includes creating the metrology target structure design based on results of the simulating step.

12. 发明公开

EP1883848A2 BROAD BAND OBJECTIVE HAVING IMPROVED LATERAL COLOR PERFORMANCE 有权
标题翻译：具有更高的性能和LATE罗尔夫·阿本相应的方法宽带LENS
公开(公告)号：EP1883848A2
公开(公告)日：2008-02-06
申请号：EP06770625.9
申请日：2006-05-19
申请人： KLA-Tencor Technologies Corporation
发明人： CHUANG, Yung-ho , SHAFER, David , ARMSTRONG, J., Joseph
IPC分类号： G02B21/02
CPC分类号： G02B27/0025 , G01N21/8806 , G02B21/02
摘要： A system and method for inspection is disclosed. The design generally employs as many as four design principles, including employing at least one lens from a relatively low dispersion glass, at least one additional lens from an additional material different from the relatively low dispersion glass, generally matching the relatively low dispersion properties of the relatively low dispersion glass. The design also may include at least one further lens from a further material different from and exhibiting a significantly different dispersion power from the relatively low dispersion glass and the additional material. Finally, the design may include lenses positioned to insert a significant amount of color within the objective, a gap, and additional lenses, the gap and additional lenses serving to cancel the color inserted.

13. 发明公开

EP1877758A2 WAFER EDGE INSPECTION 有权
标题翻译： WAFERRANDPRÜFUNG
公开(公告)号：EP1877758A2
公开(公告)日：2008-01-16
申请号：EP06770029.4
申请日：2006-05-05
申请人： KLA-Tencor Technologies Corporation
发明人： VELIDANDLA, Vamsi , SOMANCHI, Anoop , SOETARMAN, Ronny , MEEKS, Steven, W.
IPC分类号： G01N21/88
CPC分类号： G01N21/94 , G01B11/303 , G01B11/306 , G01N21/21 , G01N21/211 , G01N21/55 , G01N21/9501 , G01N21/9503 , G01N2021/556 , H01L22/12
摘要： In one embodiment, a system (110) to inspect an edge region of a wafer (122), comprises a surface analyzer assembly comprising a radiation targeting assembly that targets a radiation beam onto a surface of the wafer (122); a reflected radiation collection assembly to collect radiation reflected from a surface of the wafer (122); means for rotating the surface analyzer assembly about an edge surface (126) of the wafer (122); and means for detecting one or more defects in the edge region of the wafer.

14. 发明公开

EP1875309A2 METHOD FOR MONITORING A RETICLE 失效
标题翻译：监测方法光罩
公开(公告)号：EP1875309A2
公开(公告)日：2008-01-09
申请号：EP06749311.4
申请日：2006-04-03
申请人： KLA-Tencor Technologies Corporation
发明人： WATSON, Sterling, G. , LEVY, Ady , MACK, Chris, A. , STOKOWSKI, Stanley, E. , SAIDIN, Zain, K.
IPC分类号： G03F1/00 , G03C5/00 , G06K9/00
CPC分类号： G03F1/84 , G03F1/38 , G03F1/50 , G03F7/70433 , G03F7/70625 , Y10S430/146
摘要： Reticles may comprise shading elements (SEs) for locally altering the reticle optical properties. However, such reticles may degrade over time as a result of repeated exposure to radiation in a lithography process, as the radiation may 'heal' the SEs. Disclosed are techniques for monitoring a reticle in order to maintain confidence about the reticle's optical properties and the uniformity of patterns on wafers that are to be printed using the reticle. Reticles undergo periodic inspection comprising reticle transmission measurement and/or aerial imaging of the reticle. When such inspection indicates sufficient reticle degradation, the reticle is tagged for correction prior to its subsequent use in a lithography process.

15. 发明公开

EP1782510A2 FIBER AMPLIFIED BASED LIGHT SOURCE FOR SEMICONDUCTOR INSPECTION 审中-公开
标题翻译： ON光纤增益基光源用于测试半导体
公开(公告)号：EP1782510A2
公开(公告)日：2007-05-09
申请号：EP05813080.8
申请日：2005-08-16
申请人： KLA-Tencor Technologies Corporation
发明人： CHUANG, Yung-Ho , ARMSTRONG, Joseph, J.
IPC分类号： H01S3/08
CPC分类号： H01S3/2383 , G01N21/8806 , G01N21/9501 , G02B6/02347 , G02B6/02366 , H01S3/005 , H01S3/0057 , H01S3/06708 , H01S3/06729 , H01S3/06741 , H01S3/06745 , H01S3/06754 , H01S3/06791 , H01S3/094007 , H01S3/094019 , H01S3/09415 , H01S3/1118
摘要： A laser illuminator for use in an inspection system, such as a semiconductor wafer inspection system or photomask inspection system is provided. The gain medium in the illuminator comprises optical fiber, and amplification, beam splitting, frequency and/or bandwidth conversion, peak power reduction, and q-switching or mode locking may be employed. Certain constructs including doped fiber, gratings, saturable absorbers, and laser diodes are disclosed to provide enhanced illumination.

16. 发明公开

EP1756849A2 SYSTEM AND METHOD FOR SENSING USING ADJUSTABLE MODULATION TRANSFER FUNCTION (MTF) 失效
标题翻译：法测量一个可调调制传递函数的系统和方法（MTF）
公开(公告)号：EP1756849A2
公开(公告)日：2007-02-28
申请号：EP05753269.9
申请日：2005-05-19
申请人： KLA-Tencor Technologies Corporation
发明人： CHUANG, Yung-Ho , ARMSTRONG, Joseph, J. , BROWN, David, Lee , TSAI, Bin-Ming, Benjamin
IPC分类号： H01J5/02 , H01J41/14
CPC分类号： H01L27/14625 , H04N5/3559 , H04N5/357
摘要： A variable modulated transfer function (MTF) design employing a variable gate voltage source for use in inspecting specimens is disclosed. The design applies a variable gate voltage to each pixel of a sensor, wherein applying the variable gate voltage to each pixel adjusts the MTF of the pixel. MTF adjustment improves adverse effects encountered during inspection, such as abasing and maintaining contrast.

17. 发明公开

EP1697729A1 METHODS AND SYSTEMS FOR INSPECTION OF A SPECIMEN USING DIFFERENT INSPECTION PARAMETERS 失效转让
标题翻译： VERFAHREN ZUR INSPEKTION EINER PROBE UNTER VERWENDUNG UNTERSCHIEDLICHER INSPEKTIONSPARAMETER
公开(公告)号：EP1697729A1
公开(公告)日：2006-09-06
申请号：EP04788621.3
申请日：2004-09-03
申请人： KLA-Tencor Technologies Corporation
发明人： LANGE, Steve, R. , MARELLA, Paul, Frank , CEGLIO, Nat , HWANG, Shiow-Hwei , FU, Tao-Yi
IPC分类号： G01N21/95
CPC分类号： G01N21/9501 , G01N21/8806
摘要： Methods and systems for inspection of a specimen using different parameters are provided. One computer-implemented method includes determining optimal parameters for inspection based on selected defects. This method also includes setting parameters of an inspection system at the optimal parameters prior to inspection. Another method for inspecting a specimen includes illuminating the specimen with light having a wavelength below about 350 nm and with light having a wavelength above about 350 nm. The method also includes processing signals representative of light collected from the specimen to detect defects or process variations on the specimen. One system configured to inspect a specimen includes a first optical subsystem coupled to a broadband light source and a second optical subsystem coupled to a laser. The system also includes a third optical subsystem configured to couple light from the first and second optical subsystems to an objective, which focuses the light onto the specimen.
摘要翻译：提供了使用不同参数检查样本的方法和系统。一种计算机实现的方法包括基于所选择的缺陷确定用于检查的最佳参数。该方法还包括在检查之前将检查系统的参数设置为最佳参数。用于检查样本的另一种方法包括用波长低于约350nm的光和波长高于约350nm的光照射样品。该方法还包括处理代表从样品收集的光的信号，以检测样品上的缺陷或过程变化。被配置为检查样本的一个系统包括耦合到宽带光源的第一光学子系统和耦合到激光器的第二光学子系统。该系统还包括配置成将来自第一和第二光学子系统的光耦合到物镜的第三光学子系统，其将光聚焦到样本上。

18. 发明公开

EP1664885A2 CATADIOPTRIC IMAGING SYSTEM FOR BROAD BAND MICROSCOPY 有权
标题翻译：折反射PICTURE SYSTEM FOR宽带观察
公开(公告)号：EP1664885A2
公开(公告)日：2006-06-07
申请号：EP04786521.7
申请日：2004-08-18
申请人： KLA-Tencor Technologies Corporation
发明人： SHAFER, David, R. , CHUANG, Yung-Ho , ARMSTRONG, J., Joseph
IPC分类号： G02B17/00
CPC分类号： G02B21/04 , G02B17/0808 , G02B17/0812 , G02B17/0856 , G02B17/0892 , G02B21/02 , G03F7/70225 , G03F7/70341
摘要： A system and method for inspection is disclosed. The design includes an objective employed for use with light energy having a wavelength in various ranges, including approximately 266 to 1000nm, 157nm through infrared, and other ranges. The objective comprises a focusing lens group (311) comprising at least one focusing lens (304) configured to receive light, a field lens (305) oriented to receive focused light energy from said focusing lens group (311) and provide intermediate light energy, and a Mangin mirror arrangement (312) positioned to receive the intermediate light energy from the field lens (305) and form controlled light energy. Each focusing lens has a reduced diameter, such as a diameter of less than approximately 100mm, and a maximum corrected field size of approximately 0.15mm. An immersion substance, such as oil, water, or silicone gel, may be employed prior to passing controlled light energy to the specimen (310) inspected.

19. 发明授权

EP1049912B1 HIGH-SPEED LOGARITHMIC PHOTO-DETECTOR 有权转让
标题翻译：更快的对数光电探测器
公开(公告)号：EP1049912B1
公开(公告)日：2002-11-27
申请号：EP99903017.4
申请日：1999-01-08
申请人： KLA-Tencor Technologies Corporation
发明人： Wolf, Ralph C.
IPC分类号： G01J1/44
CPC分类号： H01J43/18 , G01J1/44 , H01J43/30

20. 发明授权

EP1749230B1 CATADIOPTRIC IMAGING SYSTEM EMPLOYING IMMERSION LIQUID FOR USE IN BROAD BAND MICROSCOPY, AND CORRESPONDING METHOD 有权
标题翻译：与浸液折反射式图象系统FOR USE IN宽带观察及相应方法
公开(公告)号：EP1749230B1
公开(公告)日：2015-06-03
申请号：EP05731783.6
申请日：2005-03-28
申请人： KLA-Tencor Technologies Corporation
发明人： ARMSTRONG, J., Joseph , CHUANG, Yung-Ho , SHAFER, David, R.
IPC分类号： G02B17/08 , G02B21/04 , G03F7/20 , G02B21/33
CPC分类号： G03F7/70341 , G02B17/023 , G02B17/0808 , G02B17/0812 , G02B17/0856 , G02B17/0892 , G02B21/02 , G02B21/04 , G02B21/33 , G03F7/70225

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