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1. 发明公开

EP4379466A1 ALIGNMENT METHOD AND ASSOCIATED ALIGNMENT AND LITHOGRAPHIC APPARATUSES 审中-公开
公开(公告)号：EP4379466A1
公开(公告)日：2024-06-05
申请号：EP22210353.3
申请日：2022-11-29
申请人： ASML Netherlands B.V.
发明人： HULSEBOS, Edo, Maria , BIJNEN, Franciscus, Godefridus, Casper , DAI, Jin
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F9/708 , G03F9/7076 , G03F9/7088 , G03F7/70683 , G03F9/7092
摘要： Disclosed is a method of correcting position measurement data for an effect of a scan offset, the method comprising: obtaining position measurement data relating to an obliquely scanned measurement along an oblique scan direction over one or more alignment marks, each said one or more alignment marks comprising one or more first direction sub-marks for measurement in a first direction and one or more second direction sub-marks for measurement in a second direction different from said first direction; determining a signal amplitude imbalance metric from said position measurement data, the signal amplitude imbalance metric comprising a ratio of a signal amplitude metric in the first direction to a signal amplitude metric in the second direction; and correcting said position measurement data using said signal amplitude imbalance metric.

2. 发明授权

EP1796136B1 ALIGNMENT INFORMATION DISPLAY METHOD, PROGRAM THEREOF, ALIGNMENT METHOD, EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, DISPLAY SYSTEM, DISPLAY DEVICE, PROGRAM, AND MEASUREMENT/INSPECTION DEVICE 失效转让
标题翻译：登记信息显示方法，及其程序，校直法，曝光方法元法，显示系统，显示设备，程序和测量/检测设备
公开(公告)号：EP1796136B1
公开(公告)日：2015-09-30
申请号：EP05772567.3
申请日：2005-08-19
申请人： Nikon Corporation
发明人： Okita, Shinichi
IPC分类号： H01L21/027 , G03F9/00 , H01L21/00 , G05B15/00 , G05B19/418 , G06Q50/00 , B23Q41/08
CPC分类号： H01L21/682 , G03F7/70633 , G03F9/7003 , G03F9/7046 , G03F9/7092 , Y02P90/86
摘要： [PROBLEM] To provide an information display method enabling efficient analysis and evaluation of alignment results and thereby facilitating the setting of effective alignment conditions or parameters. [MEANS FOR SOLUTION] The alignment information display method of the present invention receives as input the data of the results of processing relating to alignment measurement, receives as input information relating to the parameters of the alignment measurement, finds the information for display from the data of the results of processing based on the input parameters, and displays the found desired information for display by a display mode by which the effects on the alignment measurement become clear. Therefore, in setting the desired conditions, it is possible to easily confirm the results of analysis by the set conditions, that is, the effects of the set conditions. Therefore, a user can easily detect the optimum alignment conditions and parameters.

3. 发明授权

EP1285223B1 DATA AGE ADJUSTMENTS 有权
标题翻译：适应数据的AGE
公开(公告)号：EP1285223B1
公开(公告)日：2009-04-08
申请号：EP01935631.0
申请日：2001-05-16
申请人： ZYGO CORPORATION
发明人： DEMAREST, Frank, C.
IPC分类号： G01B9/02 , G01J9/02 , G03F9/00
CPC分类号： G01B9/02062 , G01B9/02003 , G01B9/02083 , G01B2290/70 , G01J3/45 , G03F7/70775 , G03F9/7049 , G03F9/7092
摘要： A method for compensating data age in measurement signals from an interferometer includes measuring a value of the measurement signal and adjusting the measured value based on the measurement signal with a data age adjustment value to correct for data age.

4. 发明公开

EP1843210A3 Method of aligning and exposing a substrate 审中-公开
标题翻译：对准和曝光的基板的方法
公开(公告)号：EP1843210A3
公开(公告)日：2007-11-28
申请号：EP07251283.3
申请日：2007-03-26
申请人： ASML Netherlands BV
发明人： Werkman, Roy , Mos, Everhardus Cornelis
IPC分类号： G03F9/00 , G03F7/20
CPC分类号： G03F7/70633 , G03F9/7092
摘要： Correcting for misalignment of a substrate before it is exposed is performed using offset corrections and process corrections that are calculated based on alignment offset measurements of alignment marks and overlay measurements of overlay targets on substrates in previous batches.

5. 发明公开

EP1150249A4 MARK DETECTING METHOD, EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, MARK DETECTOR, EXPOSURE APPARATUS, AND DEVICE 审中-公开
标题翻译：用于确定品牌，曝光方法，用于生产部件，标检测器，曝光装置及零件
公开(公告)号：EP1150249A4
公开(公告)日：2007-10-31
申请号：EP99931487
申请日：1999-07-22
申请人： NIPPON KOGAKU KK
发明人： NAKAJIMA SHIN-ICHI
IPC分类号： G03F9/00 , G06T7/00 , G01B11/00 , H01L21/027
CPC分类号： G03F9/7092 , G03F9/70 , G03F9/7088
摘要： The object of the present invention is to provide a mark detection method, an exposure method, a device manufacturing method, a mark detection apparatus, an exposure apparatus, and a device manufactured by the use of the exposure apparatus, which are capable of reducing a position measurement error in a short time even in the case where a sampling interval must be set to about 0.2 times or more of a lower limit of a minimum periodic component. In the present invention, a mark formed on an object is irradiated with a detection beam, an image of the mark is picked up through an image-forming system, the image of the mark formed on an image pickup device is converted into an electrical image signal, a signal related to the image signal is output at predetermined sampling intervals, and a signal related to the image signal is interpolated in a cycle equal to or less than the predetermined sampling interval.

6. 发明公开

EP1843210A2 Method of aligning and exposing a substrate 审中-公开
标题翻译：对准和暴露基板的方法
公开(公告)号：EP1843210A2
公开(公告)日：2007-10-10
申请号：EP07251283.3
申请日：2007-03-26
申请人： ASML Netherlands BV
发明人： Werkman, Roy , Mos, Everhardus Cornelis
IPC分类号： G03F9/00 , G03F7/20
CPC分类号： G03F7/70633 , G03F9/7092
摘要： Correcting for misalignment of a substrate before it is exposed is performed using offset corrections and process corrections that are calculated based on alignment offset measurements of alignment marks and overlay measurements of overlay targets on substrates in previous batches.
摘要翻译：在衬底未曝光之前，使用偏移校正和工艺校正来校正衬底的未对准，所述偏移校正和工艺校正基于对准标记的对准偏移测量和先前批次中衬底上的重叠目标的重叠测量来计算。

7. 发明公开

EP1184896A1 PATTERN MATCHING METHOD AND DEVICE, POSITION DETERMINING METHOD AND DEVICE, POSITION ALIGNING METHOD AND DEVICE, EXPOSING METHOD AND DEVICE, AND DEVICE AND ITS PRODUCTION METHOD 审中-公开
标题翻译：模型比较的方法和装置，位置检测方法和装置，调整位置的方法和设备和装置及其制造
公开(公告)号：EP1184896A1
公开(公告)日：2002-03-06
申请号：EP00900417.7
申请日：2000-01-18
申请人： Nikon Corporation
发明人： YOSHIDA, Kouji, Nikon Corporation
IPC分类号： H01L21/027
CPC分类号： H01L23/544 , G03F7/70491 , G03F9/7092 , G06K9/00536 , H01L2223/54453 , H01L2223/5446 , H01L2924/0002 , H01L2924/00
摘要： A template generator (32) generates a waveform template including an expected value of a signal value at each value of a parameter and a probability template including a piece of occurrence probability information of the expected value at each value of the parameter, based on a plurality of measured signal waveforms, and a matching judgment unit (33) performs template matching between a newly measured signal waveform and the waveform template by using pieces of occurrence probability information of the expected values as pieces of weight information at respective values of the parameter, the pieces of occurrence probability information composing the probability template. Additionally, the template generator (32) updates the waveform template and probability template taking into account the newly measured signal waveform so as to prepare next pattern matching. In this way, the template matching on the signal waveform that varies according to the change of the parameter's value is performed with improved accuracy of matching.
摘要翻译：模板生成器（32）基因率基于多个波形模板包含上在一个参数和一个概率模板包含在该参数的每个值的一块的预期值的发生概率信息的每个值的信号值的预期值，测量的信号的波形，和一个匹配判断单元（33）执行一个新测定的信号波形，并通过使用的预期值的发生概率信息作为参数的respectivement值的权重信息的波形模板之间的模板匹配，则的发生概率信息构成的概率模板件。此外，模板生成器（32）更新波形模板和模板的概率考虑到新测量的信号波形，以制备下一个模式匹配。通过这种方式，在信号波形模板匹配确实不定雅鼎的参数值的变化，进行与之搭配的改进的精度。

8. 发明公开

EP1164352A1 POSITION SENSING METHOD AND POSITION SENSOR, EXPOSING METHOD AND EXPOSING APPARATUS, AND DEVICE AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译： POSITIONSDETEKTIERUNGSVERFAHREN，位置传感器，照明装置和方法，器件及其制造方法
公开(公告)号：EP1164352A1
公开(公告)日：2001-12-19
申请号：EP00903969.4
申请日：2000-02-16
申请人： Nikon Corporation
发明人： YOSHIDA, Kouji, Nikon Corporation
IPC分类号： G01B21/00 , G01B11/00 , H01L21/027 , G03F9/00
CPC分类号： G03F9/7046 , G03F9/7003 , G03F9/7092
摘要： A parameter calculation unit (33) statistically calculates the estimations and their certainty of a predetermined number of parameters, which uniquely specify any position on an object, for each of a plurality of measured sample sets on the basis of position information of marks composing the sample set. A valid value calculation unit (34) calculates statistically valid values of the predetermined number of parameters on the basis of groups of the estimations and their certainty of the predetermined number of parameters for the respective sample sets. Furthermore, an evaluation unit (35) statistically evaluates if the number of marks composing a sample set can be reduced. If it is determined that the number of marks can be reduced, the parameter calculation unit (33) calculates values of the predetermined number of parameters by using a new sample set having reduced number of marks. Using the values of the predetermined number of parameters calculated in this manner, the position of any area on the object can be accurately detected.
摘要翻译：参数计算单元（33）统计学计算的估计及其参数的预定数量的确定性，其唯一地指定任何位置上的对象，对于每个测量的样品设定多个的标记的位置信息构成样品的基础上设置。有效的值计算单元（34）计算的估计及其为respectivement样本集合参数的预定数量的确定性的组的基础上的参数的预定数量的统计上有效的值。进一步，以评估单元（35）统计学评估是否可以减少构成一个样品组标记的数目。如果它被确定开采并能够减少标记的数量，参数计算单元（33）通过使用具有降低的标记的数目的新的采样集计算的参数的预定数量的值。使用以这种方式计算出的参数的预定数量的值，能够准确地设定检测到的任何区域的对象上的位置。

9. 发明公开

EP1122612A2 Position detection 审中-公开
标题翻译： Positionsdetektion
公开(公告)号：EP1122612A2
公开(公告)日：2001-08-08
申请号：EP01300784.4
申请日：2001-01-30
申请人： Nikon Corporation
发明人： Yoshida, Kouji, c/o Nikon Corporation
IPC分类号： G03F9/00
CPC分类号： G03F9/7088 , G03F9/7092
摘要： After the plural marks are picked-up by the image pick-up system AS under the image pick-up condition including the plural defocus states, the relationship between the picked-up image of the mark and the defocus amount is obtained. The relationship is the manner in the change of the picked-up image of the mark depending on the varied defocus amount. From the relationship between the obtained picked-up image of the mark and the defocus amount, the positional information of the mark is estimated. That is, the positional information of the mark is that should be obtained by using the image of the mark at the focus state. As a result, even when the contrast between the line pattern portion and the space pattern portion in the picked-up image of the mark at the focus state is low, the positional information of the mark is precisely detected.
摘要翻译：在包括多个散焦状态的图像拾取条件下，由图像拾取系统AS拾取多个标记之后，获得标记的拾取图像与散焦量之间的关系。关系是根据变化的散焦量改变标记的拾取图像的方式。根据获得的标记的拍摄图像与散焦量之间的关系，估计标记的位置信息。也就是说，标记的位置信息应该通过在聚焦状态下使用标记的图像来获得。结果，即使当在聚焦状态下标记的拾取图像中的线图案部分和空间图案部分之间的对比度低时，也能够精确地检测标记的位置信息。

10. 发明公开

EP1091255A2 Method of aligning mask and workpiece in exposure device 审中-公开
标题翻译： Verfahren zur Ausrichtung einer Maske und einesWerkstücks在einer Belichtungsvorrichtung
公开(公告)号：EP1091255A2
公开(公告)日：2001-04-11
申请号：EP00121522.7
申请日：2000-09-30
申请人： USHIODENKI KABUSHIKI KAISHA
发明人： Tanaka, Yoneta
IPC分类号： G03F9/00
CPC分类号： G03F9/7088 , G03F9/7076 , G03F9/7092 , H05K3/0008 , H05K3/0082
摘要： A mask and workpiece are aligned with good accuracy even if the shape of workpiece marks, etc., should deform due to process defects by a plurality of workpiece marks (WAM) being affixed in proximity on a workpiece W so as to lie within a field of an alignment microscope, and a plurality of workpiece mark images that are imaged by the alignment microscope are fed to processing unit. The processing unit detects the spatial coordinates of the plurality of workpiece marks and averages their spatial coordinates. Then, a workpiece stage or mask stage is moved so that mask mark has a prescribed spatial relationship with respect to the spatial coordinates determined through the aforementioned averaging, and the mask is aligned with workpiece. Then, the reliability of the spatial coordinates of each of a plurality of workpiece marks is verified and only those workpiece marks which permit the required alignment accuracy to be ensured are be selected.
摘要翻译：即使工件标记等的形状由于多个工件标记（WAM）附近被固定在工件W上的工艺缺陷而变形，掩模和工件也被准确地对准，以便位于工件并且通过对准显微镜成像的多个工件标记图像被馈送到处理单元。处理单元检测多个工件标记的空间坐标，并平均其空间坐标。然后，移动工件台或掩模台，使得掩模标记相对于通过上述平均确定的空间坐标具有规定的空间关系，并且掩模与工件对准。然后，验证多个工件标记中的每一个的空间坐标的可靠性，并且仅选择能够确保所需对准精度的那些工件标记。

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