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1. 发明公开

KR20180021206A 다층 구조물의 층들 사이의 오버레이를 측정하기 위한 기법 审中-公开
标题翻译：用于测量多层结构的层之间的重叠的技术
公开(公告)号：KR20180021206A
公开(公告)日：2018-02-28
申请号：KR20187004381
申请日：2016-07-06
申请人： APPLIED MATERIALS ISRAEL LTD
发明人： RATHORE DHANANJAY SINGH , WEINBERG YAKOV , SCHWARZBAND ISHAI , KRIS ROMAN , ZAUER ITAY , GOLDMAN RAN , NOVAK OLGA , ADAN OFER , LEVI SHIMON
IPC分类号： G03F7/20 , G03F1/44 , G03F7/11 , H01L21/768
CPC分类号： G06T7/0006 , G06K9/525 , G06T7/001 , G06T7/10 , G06T7/11 , G06T7/12 , G06T7/143 , G06T7/194 , G06T7/30 , G06T7/337 , G06T2207/10061 , G06T2207/20116 , G06T2207/30148
摘要： 다층구조물의층들사이의오버레이를결정하기위한방법은상기다층구조물을나타내는주어진이미지를획득하는단계, 상기다층구조물의층들에대한예상되는이미지들을획득하는단계, 상기층들의예상되는이미지들의조합으로서상기다층구조물의조합된예상되는이미지를제공하는단계, 상기조합된예상되는이미지에대해상기주어진이미지의레지스트레이션을수행하는단계, 상기주어진이미지의세그먼테이션을제공함으로써, 세그먼트화된이미지, 및상기다층구조물의층들의맵들을생성하는단계를포함한다. 이방법은상기다층구조물의임의의 2개의선택된층 사이의오버레이를, 상기 2개의선택된층의예상되는이미지들과함께상기 2개의선택된층의맵들을처리함으로써결정하는단계를추가로포함할수 있다.
摘要翻译：一种用于确定所述多层结构的层之间的重叠方法是一组获得的预期图像的预期图像，用于获得给定的图像，代表该多层结构，该多层结构的层的层为提供组合的投影图像，并且对于该组合的投影图像，通过设置给定的图像的分割为的给定图像进行配准，分割所述多层结构的图像的步骤，并且所述多层并生成结构图层。然后，该方法可以包括通过处理所述的地图为多层结构中的任意两个选定的层之间的重叠确定的进一步的步骤，与所述两个所选择的层的期望图像的两个所选择的层。

2. 发明专利

JP2013232422A High throughput sem tool 有权
标题翻译：高通量扫描仪刀具
公开(公告)号：JP2013232422A
公开(公告)日：2013-11-14
申请号：JP2013125732
申请日：2013-06-14
申请人： Applied Materials Israel Ltd , アプライドマテリアルズイスラエルリミテッド
发明人： GILAD ALMOGY , AVISHAI BARTOV , JUERGEN FROSIEN , PAVEL ADAMEC , HELMUT BANZHOF
IPC分类号： H01J37/28 , H01L21/66
CPC分类号： H01J37/05 , H01J37/10 , H01J37/147 , H01J37/28 , H01J2237/0635 , H01J2237/1508 , H01J2237/2449 , H01J2237/2817
摘要： PROBLEM TO BE SOLVED: To provide a multi-beam scanning type electron beam device.SOLUTION: A multi-beam scanning type electron beam device having a column comprises: a multi-beam emitter for emitting plural electron beams; at least one common electron beam optical element having a common aperture for at least two of the plural electron beams and constituted to commonly act on at least two of the plural electron beams; at least one individual electron beam optical element for individually acting on the plural electron beams; a common objective lens assembly for converging the plural electron beams having common magnetization for converging at least two of the plural electron beams, and constituted to converge the plural electron beams on a specimen for generating plural signal beams; and a detection assembly for individually detecting each signal beam on a corresponding detection element.
摘要翻译：要解决的问题：提供一种多光束扫描型电子束装置。解决方案：具有列的多光束扫描型电子束装置包括：用于发射多个电子束的多光束发射器; 至少一个共用电子束光学元件具有用于所述多个电子束中的至少两个的公共孔，并且被构造成共同作用于所述多个电子束中的至少两个; 至少一个单独的电子束光学元件，用于单独地作用在所述多个电子束上; 用于会聚具有用于会聚多个电子束中的至少两个的共同磁化的多个电子束的公共物镜组件，并且被构造成将多个电子束会聚在用于产生多个信号光束的样本上; 以及检测组件，用于单独地检测相应的检测元件上的每个信号光束。

3. 发明专利

JP2013219001A Photo-detector device and method for biasing photomultiplier tube 有权
标题翻译：光电检测器装置和偏光管的方法
公开(公告)号：JP2013219001A
公开(公告)日：2013-10-24
申请号：JP2012180265
申请日：2012-07-30
申请人： Applied Materials Israel Ltd , アプライドマテリアルズイスラエルリミテッド
发明人： MICHAEL HEIFETS , PAVEL MARGULIS
IPC分类号： H01J40/12
CPC分类号： G01J1/44 , G01J2001/4453 , H01J43/20
摘要： PROBLEM TO BE SOLVED: To provide a photo-detector and a method for operating the same.SOLUTION: The photo-detector comprises: a photomultiplier tube comprising a plurality of electrodes, each having a photocathode, an anode, a first dynode, intermediate dynodes and a last dynode; and a biasing circuit that comprises a sequence of voltage follower elements, a voltage divider and a current source. The voltage divider is coupled to both ends of a high voltage power supply and different dynodes are coupled to different ones of the voltage follower elements, control inputs of the voltage follower elements being coupled to different junctions of the voltage divider. The current source is coupled to the voltage divider, to the sequence of the voltage follower elements and to the cathode. The anode is coupled to a load element coupled to a positive pole of the high voltage power supply and arranged to receive an output signal of the anode and convert it to an output signal of the photo-detector.
摘要翻译：要解决的问题：提供光电检测器及其操作方法。解决方案：光电检测器包括：光电倍增管，其包括多个电极，每个电极具有光电阴极，阳极，第一倍增电极，中间倍增电极和最后一个倍数以及偏置电路，其包括一系列电压从动元件，分压器和电流源。分压器耦合到高压电源的两端，并且不同的倍增电极耦合到不同的电压从动元件，电压从动元件的控制输入耦合到分压器的不同结。电流源耦合到分压器，连接到电压从动元件和阴极的序列。阳极耦合到耦合到高电压电源的正极的负载元件，并被布置成接收阳极的输出信号并将其转换成光电检测器的输出信号。

4. 发明专利

JP2013161485A System, method and computer program product for cad-based registration 有权
标题翻译：用于基于CAD的注册的系统，方法和计算机程序产品
公开(公告)号：JP2013161485A
公开(公告)日：2013-08-19
申请号：JP2013036386
申请日：2013-02-07
申请人： Applied Materials Israel Ltd , アプライドマテリアルズイスラエルリミテッド
发明人： ZVI GOREN , NIR BEN-DAVID
IPC分类号： G06T1/00 , G01N21/88 , G01N21/956
CPC分类号： G06T7/0008 , G01B11/14 , G01N21/9501 , G01N2201/10 , G01N2201/125 , G01N2201/127 , G06T7/32 , G06T2207/30148
摘要： PROBLEM TO BE SOLVED: To provide a system, method and computer program product for CAD-based registration.SOLUTION: A system for location-based wafer analysis comprises (i) a first input interface, (ii) a second input interface, (iii) a correlator, and (iv) a processor, and is configured to generate inspection results for the inspected wafer, with the help of at least one frame run-time displacement.
摘要翻译：要解决的问题：提供一种用于基于CAD的注册的系统，方法和计算机程序产品。解决方案：用于基于位置的晶片分析的系统包括（i）第一输入接口，（ii）第二输入接口，（iii ）相关器，以及（iv）处理器，并且被配置为通过至少一个帧运行时位移来产生被检查晶片的检查结果。

5. 发明专利

JP2012247409A Defect classification with optimized purity 有权
标题翻译：优化分类与优化
公开(公告)号：JP2012247409A
公开(公告)日：2012-12-13
申请号：JP2011176369
申请日：2011-07-26
申请人： Applied Materials Israel Ltd , アプライドマテリアルズイスラエルリミテッド
发明人： VLADIMIR SHLAIN , ASSAF GLAZER
IPC分类号： G01N21/956 , G01N21/88 , G06T1/00 , G06T7/00 , H01L21/66
CPC分类号： G06K9/6292 , G06K9/6256 , G06K9/6263 , G06K9/6269 , G06K9/628 , G06K9/6284 , G06K9/6857
摘要： PROBLEM TO BE SOLVED: To provide a method and a system for automatic inspection, in particular, for analysis of manufacturing defects.SOLUTION: A method for defect analysis includes identifying single-class classifiers for a plurality of defect classes, the plurality of defect classes being characterized by respective ranges of inspection parameter values. Each single-class classifier is configured for each class to identify defects belonging to each class on the basis of the inspection parameter values, while identifying the defects not in each class as unknown defects. A multi-class classifier is identified which is configured to assign each defect to one of the plurality of the defect classes on the basis of the inspection parameter values. Inspection data is received, and both the single-class and multi-class classifiers are applied to the inspection data to assign the defect to one of the defect classes.
摘要翻译：要解决的问题：提供用于自动检查的方法和系统，特别是用于分析制造缺陷。解决方案：一种用于缺陷分析的方法包括识别多个缺陷类别的单类分类器，所述多个缺陷类别由检查参数值的相应范围表征。为每个类配置每个单一类分类器，以便根据检查参数值识别属于每个类的缺陷，同时将每个类中不存在的缺陷识别为未知缺陷。识别多级分类器，其被配置为基于检查参数值将每个缺陷分配给多个缺陷类别中的一个。接收到检查数据，并且将单类和多类分类器应用于检查数据，以将缺陷分配给缺陷类之一。版权所有（C）2013，JPO＆INPIT

6. 发明专利

JP2012108488A INSPECTION SYSTEM AND METHOD FOR FAST CHANGES OF FOCUS 审中-公开
公开(公告)号：JP2012108488A
公开(公告)日：2012-06-07
申请号：JP2011230159
申请日：2011-09-30
申请人： APPLIED MATERIALS ISRAEL LTD
发明人： HAIM FELDMAN , BORIS MORGENSTERN , ADAM BAER
IPC分类号： G02B7/28 , G02B7/36 , G03F1/84 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide an inspection system capable of achieving fast focus changes.SOLUTION: An inspection system includes a first focusing unit 40 that executes fast focus changes to a first focusing function applied to an incident light beam. A moving lens acousto-optic unit 50 receives a light beam focused by the first focusing function and uses multiple moving lenses generated in response to a radio-frequency signal to form a focused spot. The moving lenses apply a second focusing function, and the moving lens acousto-optic unit changes the second focusing function at a fast rate. The inspection system also includes an optical element that leads the focused spot to a position on an inspected object and leads emission from an inspected object 200 to a sensor.

7. 发明专利

JP2010097940A Variable rate scanning in an electron microscope 有权
标题翻译：电子显微镜中的可变速率扫描
公开(公告)号：JP2010097940A
公开(公告)日：2010-04-30
申请号：JP2009219081
申请日：2009-09-24
申请人： Applied Materials Israel Ltd , アプライドマテリアルズイスラエルリミテッド
发明人： SHOHAM AMIR , SENDER BENZION , LITMAN ALON
IPC分类号： H01J37/22 , H01J37/20 , H01J37/28 , H01L21/66
CPC分类号： H01J37/28 , G01N23/2208 , G01N23/2251 , H01J37/222 , H01J2237/221 , H01J2237/24495 , H01J2237/2809 , H01J2237/2823
摘要： PROBLEM TO BE SOLVED: To provide a method and a device for imaging a surface by irradiation of a charged particle beam. SOLUTION: The method for imaging a surface includes: scanning a first region of the surface with a primary charged particle beam at a first scan rate so as to generate a first secondary charged particle beam from the first region; and scanning a second region of the surface with the primary charged particle beam at a second scan rate faster than the first scan rate so as to generate a second secondary charged particle beam from the second region. The method also includes: receiving the first secondary charged particle beam and the second secondary charged particle beam at a detector configured to generate a signal in response to the beams; and forming an image of the first and the second regions in response to the signal. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种通过照射带电粒子束来对表面进行成像的方法和装置。解决方案：用于对表面进行成像的方法包括：以第一扫描速率用初级带电粒子束扫描表面的第一区域，以便从第一区域产生第一次级带电粒子束; 以及以比所述第一扫描速率快的第二扫描速率用所述初级带电粒子束扫描所述表面的第二区域，以便从所述第二区域产生第二次级带电粒子束。该方法还包括：在检测器处接收第一次级带电粒子束和第二次级带电粒子束，其被配置为响应于该波束而产生信号; 以及响应于所述信号形成所述第一和第二区域的图像。版权所有（C）2010，JPO＆INPIT

8. 发明专利

JP2009075089A Method and system for imaging cross section of specimen 审中-公开
标题翻译：用于成像样本的横截面的方法和系统
公开(公告)号：JP2009075089A
公开(公告)日：2009-04-09
申请号：JP2008211998
申请日：2008-08-20
申请人： Applied Materials Israel Ltd , アプライドマテリアルズイスラエルリミテッド
发明人： SHEMESH DROR
IPC分类号： G01N1/32 , G01N1/28 , H01L21/66
CPC分类号： G01N1/32
摘要： PROBLEM TO BE SOLVED: To provide a method and a system for obtaining an image of a cross section of a specimen.
SOLUTION: The method includes: the step of milling the specimen so as to expose the cross section of the specimen, whereas the cross section comprises at least one first portion made of a first material and at least one second portion made of a second material; the step of smoothing the cross section; the step of performing a gas assisted etching of the cross section so as to generate a topography difference between the at least one first portion and the at least one second portion of the cross section; the step of coating the cross section with a thin layer of a conductive material; and the step of obtaining an image of the cross section; wherein the steps of milling, smoothing, performing the etching, coating and obtaining are carried out while the specimen is placed in a vacuumed chamber.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于获得样本的横截面的图像的方法和系统。解决方案：该方法包括：铣削样品以暴露样品的横截面的步骤，而横截面包括由第一材料制成的至少一个第一部分和由第一材料制成的至少一个第二部分第二材料平滑横截面的步骤; 对所述横截面进行气体辅助蚀刻以在所述截面的所述至少一个第一部分和所述至少一个第二部分之间产生形貌差异的步骤; 用导电材料的薄层涂覆横截面的步骤; 以及获得横截面图像的步骤; 其中在样本被放置在真空室中时进行研磨，平滑，进行蚀刻，涂覆和获得的步骤。版权所有（C）2009，JPO＆INPIT

9. 发明专利

JP2008181124A Method and system for evaluating evaluated pattern of mask 有权
标题翻译：评估掩模图案的方法和系统
公开(公告)号：JP2008181124A
公开(公告)日：2008-08-07
申请号：JP2008003611
申请日：2008-01-10
申请人： Applied Materials Israel Ltd , アプライドマテリアルズイスラエルリミテッド
发明人： SCHWARZBAND ISHAI , MANGAN SHMOOLIK , BRAUDE CHAIM , BEN-YISHAI MICHAEL , GREENBERG GADI
IPC分类号： G03F1/08 , H01L21/027
CPC分类号： G06T7/0006 , G06T7/66 , G06T2207/30148
摘要： PROBLEM TO BE SOLVED: To provide a method, a system and a computer program product for evaluating an evaluated pattern of a mask.
SOLUTION: The method includes: receiving multiple moments that represent an image of the evaluated pattern, wherein a size of information required for representing the multiple moments is substantially smaller than a size of pixel information that form the image of the evaluated pattern; and processing the multiple moments in order to determine at least one shape parameter of the evaluated pattern.
COPYRIGHT: (C)2008,JPO&INPIT

10. 发明专利

JP2008014631A Method and device for sample formation and microanalysis in vacuum chamber 审中-公开
标题翻译：真空室中样品形成和微观分析的方法和装置
公开(公告)号：JP2008014631A
公开(公告)日：2008-01-24
申请号：JP2005205873
申请日：2005-07-14
申请人： Applied Materials Israel Ltd , アプライドマテリアルズイスラエルリミテッド
发明人： KIDRON EITAN , SHEMESH DROR
IPC分类号： G01N23/04 , G01N1/28 , G01N1/32 , G01N23/203 , G01N23/225 , G01N23/227 , H01L21/66
CPC分类号： H01J2237/208
摘要： PROBLEM TO BE SOLVED: To prepare a thin sample for testing internal structure of a manufactured device to form an image. SOLUTION: The present invention discloses a method and a device for forming the sample of an object, for extracting the sample from the object, and for subjecting the sample to microanalysis including surface analysis and electron transmittance analysis in a vacuum chamber. A method of image-forming an object cross-sectional surface of the extracted sample is provided in one embodiment of the present invention. The sample is thinned repeatedly in the vacuum chamber to be image-formed, optionally. The sample is positioned in a sample support including an optional aperture, in another embodiment. The sample is positioned optionally on a surface of the sample support to make the object cross-sectional surface substantially parallel to the surface of the sample support. The sample is subjected to the microanalysis in the vacuum chamber, or is loaded onto a load station, when mounted on the sample support. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了制备用于测试制造的装置的内部结构以形成图像的薄样品。解决方案：本发明公开了一种用于形成物体样品的方法和装置，用于从物体中提取样品，并对真空室中的样品进行微量分析，包括表面分析和电子透射分析。在本发明的一个实施例中提供了提取的样品的成像物体横截面的成像方法。样品可以在真空室中重复稀释成图像形成，可选地。在另一个实施例中，样品定位在包括可选孔的样品支架中。样品可选地位于样品载体的表面上，以使物体横截面基本上平行于样品载体的表面。将样品在真空室中进行微量分析，或者当安装在样品载体上时，将其装载到载体台上。版权所有（C）2008，JPO＆INPIT

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