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1. 发明专利

JP2006059799A Method of scanning object including a plurality of important areas using scanning beam array 有权
标题翻译：使用扫描光束阵列扫描对象包括重要区域的方法
公开(公告)号：JP2006059799A
公开(公告)日：2006-03-02
申请号：JP2005180730
申请日：2005-06-21
申请人： Applied Materials Israel Ltd , アプライドマテリアルズイスラエルリミテッド
发明人： LITMAN ALON , SENDER BENZION
IPC分类号： H01J37/28 , G01N23/225 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide an effective system and a method for scanning and inspecting wafers or reticles including a plurality of important areas by using a scanning beam array.
SOLUTION: The inspection system 10 comprises (i) a beam array generating device 20 fitted so as to generate the beam array 202 characterized by a beam array axis; and (ii) an X-stage 30, a Y-stage 31, and a θ-stage 32, fitted so as to position the wafer 100 under the beam array 202 in a manner that at least two beams positioned along the beam array axis scan the object virtually simultaneously.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种通过使用扫描光束阵列来扫描和检查包括多个重要区域的晶片或掩模版的有效系统和方法。检查系统10包括（i）光束阵列发生装置20，该束阵列发生装置20被安装成产生以束阵列轴为特征的束阵列202; 以及（ii）X级30，Y级31和θ级32，以将晶片100定位在光束阵列202的下方，使得沿着光束阵列轴线定位的至少两个光束几乎同时扫描物体。版权所有（C）2006，JPO＆NCIPI

2. 发明专利

JP2010097940A Variable rate scanning in an electron microscope 有权
标题翻译：电子显微镜中的可变速率扫描
公开(公告)号：JP2010097940A
公开(公告)日：2010-04-30
申请号：JP2009219081
申请日：2009-09-24
申请人： Applied Materials Israel Ltd , アプライドマテリアルズイスラエルリミテッド
发明人： SHOHAM AMIR , SENDER BENZION , LITMAN ALON
IPC分类号： H01J37/22 , H01J37/20 , H01J37/28 , H01L21/66
CPC分类号： H01J37/28 , G01N23/2208 , G01N23/2251 , H01J37/222 , H01J2237/221 , H01J2237/24495 , H01J2237/2809 , H01J2237/2823
摘要： PROBLEM TO BE SOLVED: To provide a method and a device for imaging a surface by irradiation of a charged particle beam. SOLUTION: The method for imaging a surface includes: scanning a first region of the surface with a primary charged particle beam at a first scan rate so as to generate a first secondary charged particle beam from the first region; and scanning a second region of the surface with the primary charged particle beam at a second scan rate faster than the first scan rate so as to generate a second secondary charged particle beam from the second region. The method also includes: receiving the first secondary charged particle beam and the second secondary charged particle beam at a detector configured to generate a signal in response to the beams; and forming an image of the first and the second regions in response to the signal. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种通过照射带电粒子束来对表面进行成像的方法和装置。解决方案：用于对表面进行成像的方法包括：以第一扫描速率用初级带电粒子束扫描表面的第一区域，以便从第一区域产生第一次级带电粒子束; 以及以比所述第一扫描速率快的第二扫描速率用所述初级带电粒子束扫描所述表面的第二区域，以便从所述第二区域产生第二次级带电粒子束。该方法还包括：在检测器处接收第一次级带电粒子束和第二次级带电粒子束，其被配置为响应于该波束而产生信号; 以及响应于所述信号形成所述第一和第二区域的图像。版权所有（C）2010，JPO＆INPIT

3. 发明专利

JP2006012822A Method and system for focusing charged particle beam 有权
标题翻译：用于聚焦充电颗粒束的方法和系统
公开(公告)号：JP2006012822A
公开(公告)日：2006-01-12
申请号：JP2005180723
申请日：2005-06-21
申请人： Applied Materials Israel Ltd , アプライドマテリアルズイスラエルリミテッド
发明人： SENDER BENZION
IPC分类号： H01J37/21
CPC分类号： H01J37/21 , H01J37/28 , H01J2237/216
摘要： PROBLEM TO BE SOLVED: To provide an efficient method for determining a focus error.
SOLUTION: This method is used for focusing a charged particle beam. The method comprises: (a) a step for changing a focal point of the charged particle beam according to a first focal point pattern, scanning a first zone of a sample, and, at the same time, collecting a first set of detection signals; (b) a step 330 for changing a focal point of the charged particle beam according to a second focal point pattern, scanning a second zone ideally identical with the first zone, and, at the same time, collecting a second set of detection signals; and (c) a step 340 for processing the first and second sets of detection signals to determine a focal point characteristic. The first focal point pattern and the second focal point pattern are different depending on the location of the optimum focal point.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种用于确定聚焦误差的有效方法。
解决方案：该方法用于聚焦带电粒子束。该方法包括：（a）根据第一焦点图案改变带电粒子束的焦点的步骤，扫描样本的第一区域，并且同时收集第一组检测信号; （b）用于根据第二焦点图案改变带电粒子束的焦点的步骤330，扫描理想地与第一区域相同的第二区域，并且同时收集第二组检测信号; 和（c）用于处理第一和第二组检测信号以确定焦点特性的步骤340。第一焦点图案和第二焦点图案根据最佳焦点的位置而不同。版权所有（C）2006，JPO＆NCIPI

4. 发明专利

AU2003263776A8 A system and method for determining a cross sectional feature of a structural element having a sub-micron cross section 未知
公开(公告)号：AU2003263776A8
公开(公告)日：2004-02-02
申请号：AU2003263776
申请日：2003-07-11
申请人： SENDER BENZION , DROR OPHIR , APPLIED MATERIALS ISRAEL LTD , TAM AVIRAM , MENADEVA OVADYA , KRIS ROMAN , APPLIED MATERIALS INC
发明人： DROR OPHIR , TAM AVIRAM , MENADEVA OVADYA , KRIS ROMAN , SENDER BENZION
IPC分类号： G01B15/00 , H01J37/28 , H01L21/027 , H01L21/66 , G03F7/20
摘要： A method and system for determining a cross sectional feature of a structural element having a sub-micron cross section, the cross section is defined by an intermediate section that is located between a first and a second traverse sections. The method includes: (a) determining a first traverse section cross sectional feature in response to one or more scans of the structural element with an electron beam that is tilted at one or more corresponding tilt angle, such as to illuminate at least the top section and a first transverse section; (b) selecting, in response to a first parameter, whether to (i) determine a second traverse section cross sectional feature in response to the first traverse cross sectional feature, or (ii) to determine the second traverse section cross sectional feature in response to one or more scans of the structural element with an electron beam that is tilted at one or more corresponding tilt angle, such as to illuminate at least the top section and the second transverse section; and (c) determining the second traverse section cross sectional feature in response to the selection.

5. 发明专利

AU2003207700A1 A SYSTEM AND METHOD FOR INSPECTING CHARGED PARTICLE RESPONSIVE RESIST 未知
公开(公告)号：AU2003207700A1
公开(公告)日：2003-09-02
申请号：AU2003207700
申请日：2003-01-27
申请人： APPLIED MATERIALS ISRAEL LTD , APPLIED MATERIALS INC
发明人： SENDER BENZION , DROR OPHIR , EYTAN GUY
IPC分类号： G01N23/22 , H01J37/28 , H01L21/66 , G01R31/305 , G01R31/265 , G01B15/04
摘要： An apparatus and method for scanning a pattern. The method includes: (i) directing a charged particle beam such as to interact with the pattern along a first scan path, and (ii) directing a beam such as to interact with the pattern along a second scan path. The pattern changes one of its characteristics as a result of an interaction with the beam. The distance between the first and the second scan paths may be bigger than the diameter of the charged electron beam. Each of the first and second scan paths may include a plurality of consecutive samples and the distance between the first and second scan paths may be bigger than a distance between adjacent samples. The location of scan paths may be changed between measurements and especially between measurement sessions. The charged particle beam may have an ellipsoid cross section.

6. 发明申请

WO2004008255A8 METHOD AND APPARATUS FOR MEASURING CRITICAL DIMENSIONS WITH A PARTICLE BEAM 审中-公开
标题翻译：用粒子束测量临界尺寸的方法和设备
公开(公告)号：WO2004008255A8
公开(公告)日：2004-07-22
申请号：PCT/US0321690
申请日：2003-07-11
申请人： APPLIED MATERIALS INC , APPLIED MATERIALS ISRAEL LTD , SENDER BENZION , DROR OPHIR , TAM AVIRAM , MENADEVA OVADYA , KRIS ROMAN
发明人： SENDER BENZION , DROR OPHIR , TAM AVIRAM , MENADEVA OVADYA , KRIS ROMAN
IPC分类号： G01B15/00 , H01J37/28 , H01L21/027 , H01L21/66 , G01N23/225 , G06T11/00
CPC分类号： H01J37/28 , H01J2237/2816
摘要： A method and system for determining a cross sectional feature of a structural element having a sub-micron cross section, the cross section is defined by an intermediate section that is located between a first and a second traverse sections. The method includes: (a) determining a first traverse section cross sectional feature in response to one or more scans of the structural element with an electron beam that is tilted at one or more corresponding tilt angle, such as to illuminate at least the top section and a first transverse section; (b) selecting, in response to a first parameter, whether to (i) determine a second traverse section cross sectional feature in response to the first traverse cross sectional feature, or (ii) to determine the second traverse section cross sectional feature in response to one or more scans of the structural element with an electron beam that is tilted at one or more corresponding tilt angle, such as to illuminate at least the top section and the second transverse section; and (c) determining the second traverse section cross sectional feature in response to the selection.
摘要翻译：一种用于确定具有亚微米横截面的结构元件的横截面特征的方法和系统，横截面由位于第一和第二横向部分之间的中间部分限定。该方法包括：（a）响应于以一个或多个对应倾斜角倾斜的电子束对结构元件的一个或多个扫描来确定第一横向截面横截面特征，以便至少照亮顶部部分和第一横向部分; （b）响应于第一参数选择是否（i）响应于第一横向截面特征确定第二横向截面横截面特征，或（ii）响应于第二横向截面特征确定第二横向截面横截面特征利用以一个或多个对应倾斜角倾斜的电子束对结构元件进行一次或多次扫描，以至少照亮顶部部分和第二横向部分; （c）响应于该选择确定第二横断面截面特征。

7. 发明申请

WO2004008255A2 A SYSTEM AND METHOD FOR DETERMINING A CROSS SECTIONAL FEATURE OF A STRUCTURAL ELEMENT HAVING A SUB-MICRON CROSS SECTION 审中-公开
标题翻译：一种用于确定具有子麦克风截面的结构元件的交叉部分特征的系统和方法
公开(公告)号：WO2004008255A2
公开(公告)日：2004-01-22
申请号：PCT/US0321690
申请日：2003-07-11
申请人： APPLIED MATERIALS INC , APPLIED MATERIALS ISRAEL LTD , SENDER BENZION , DROR OPHIR , TAM AVIRAM , MENADEVA OVADYA , KRIS ROMAN
发明人： SENDER BENZION , DROR OPHIR , TAM AVIRAM , MENADEVA OVADYA , KRIS ROMAN
IPC分类号： G01B15/00 , H01J37/28 , H01L21/027 , H01L21/66 , G03F7/20
CPC分类号： H01J37/28 , H01J2237/2816
摘要： A method and system for determining a cross sectional feature of a structural element having a sub-micron cross section, the cross section is defined by an intermediate section that is located between a first and a second traverse sections. The method includes: (a) determining a first traverse section cross sectional feature in response to one or more scans of the structural element with an electron beam that is tilted at one or more corresponding tilt angle, such as to illuminate at least the top section and a first transverse section; (b) selecting, in response to a first parameter, whether to (i) determine a second traverse section cross sectional feature in response to the first traverse cross sectional feature, or (ii) to determine the second traverse section cross sectional feature in response to one or more scans of the structural element with an electron beam that is tilted at one or more corresponding tilt angle, such as to illuminate at least the top section and the second transverse section; and (c) determining the second traverse section cross sectional feature in response to the selection.
摘要翻译：用于确定具有亚微米横截面的结构元件的横截面特征的方法和系统，所述横截面由位于第一和第二横移部分之间的中间部分限定。该方法包括：（a）响应于结构元件的一次或多次扫描确定第一横截面横截面特征，其中电子束以一个或多个相应的倾斜角倾斜，例如至少照亮顶部和第一横截面; （b）响应于第一参数选择是否（i）响应于第一横截面特征确定第二横截面横截面特征，或（ii）确定响应中的第二横截面横截面特征以一个或多个扫描结构元件，其中电子束以一个或多个相应的倾斜角倾斜，例如至少照射顶部和第二横截面; 和（c）响应于选择确定第二横截面横截面特征。

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